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1. 发明申请

WO2011146213A3 ENDPOINT CONTROL OF MULTIPLE SUBSTRATES WITH MULTIPLE ZONES ON THE SAME PLATEN IN CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：在化学机械抛光中在同一板上具有多个区域的多个基板的端点控制
公开(公告)号：WO2011146213A3
公开(公告)日：2012-02-23
申请号：PCT/US2011034212
申请日：2011-04-27
申请人： APPLIED MATERIALS INC , LEE HARRY Q , ZHANG JIMIN , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A
发明人： LEE HARRY Q , ZHANG JIMIN , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042
摘要： A plurality of substrates are polished simultaneously on the same polishing pad. A sequence of spectra is measured from each zone of each substrate, and for each measured spectrum in the sequence of spectra for each zone of each substrate, a best matching reference spectrum is determined from a library of reference spectra. For each zone of each substrate, a linear function is fit to a sequence of index values associated with the best matching reference spectra. For at least one zone, a projected time at which the zone will reach a target index value is determined based on the linear function, and the polishing parameter for at least one zone on at least one substrate is adjusted such that the at least one zone of the at least one substrate has closer to the target index at the projected time than without such adjustment.
摘要翻译：多个基板在同一抛光垫上同时被抛光。从每个底物的每个区域测量光谱序列，并且对于每个底物的每个区域的光谱序列中的每个测量的光谱，从参考光谱库确定最佳匹配的参考光谱。对于每个衬底的每个区域，线性函数适合于与最佳匹配参考光谱相关联的索引值序列。对于至少一个区域，基于线性函数确定区域将达到目标指标值的预计时间，并且调整至少一个基底上的至少一个区域的抛光参数，使得至少一个区域的至少一个基板在投影时间比没有这种调整更接近于目标指标。

2. 发明申请

WO2012019044A2 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：将测量的光谱与现场光学监测参考光谱进行匹配的技术
公开(公告)号：WO2012019044A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/046646
申请日：2011-08-04
申请人： APPLIED MATERIALS, INC. , HU, Xiaoyuan , WANG, Zhihong , LEE, Harry Q. , ZHU, Zhize , DAVID, Jeffrey Drue , BENVEGNU, Dominic J. , ZHANG, Jimin , TU, Wen-Chiang
发明人： HU, Xiaoyuan , WANG, Zhihong , LEE, Harry Q. , ZHU, Zhize , DAVID, Jeffrey Drue , BENVEGNU, Dominic J. , ZHANG, Jimin , TU, Wen-Chiang
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B24B37/107 , B24B37/205 , B24B49/045 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用不同于平方差平方和的匹配技术来找到最佳匹配参考谱以产生最佳匹配参考谱的序列，以及基于最佳匹配序列来确定抛光终点或抛光速率的调整中的至少一个参考光谱。寻找最佳匹配参考光谱可以包括执行测量光谱与来自库的多个参考光谱中的两个或更多个中的每一个的互相关，并选择与测量光谱具有最大相关性的参考光谱作为最佳匹配参考谱。

3. 发明申请

WO2011139571A2 DYNAMICALLY OR ADAPTIVELY TRACKING SPECTRUM FEATURES FOR ENDPOINT DETECTION 审中-公开
标题翻译：用于端点检测的动态或自适应跟踪光谱特征
公开(公告)号：WO2011139571A2
公开(公告)日：2011-11-10
申请号：PCT/US2011/033258
申请日：2011-04-20
申请人： APPLIED MATERIALS, INC. , DAVID, Jeffrey Drue , LEE, Harry Q. , LIM, Thian Choi , LAM, Gary Ka Ho
发明人： DAVID, Jeffrey Drue , LEE, Harry Q. , LIM, Thian Choi , LAM, Gary Ka Ho
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/042 , B24B37/005 , B24B49/12 , H01L22/12 , H01L22/26
摘要： A method of controlling polishing includes polishing a substrate and receiving an identification of a selected spectral feature, a wavelength range having a width, and a characteristic of the selected spectral feature to monitor during polishing. A sequence of spectra of light from the substrate is measured while the substrate is being polished. A sequence of values of the characteristic of the selected spectral feature is generated from the sequence of spectra. For at least some spectra from the sequence of spectra, a modified wavelength range is generated based on a position of the spectral feature within a previous wavelength range used for a previous spectrum in the sequence of spectra, the modified wavelength range is searched for the selected spectral feature, and a value of a characteristic of the selected spectral feature is determined.
摘要翻译：控制抛光的方法包括抛光衬底并接收所选择的光谱特征的识别，具有宽度的波长范围以及所选择的光谱特征的特征以在抛光期间进行监视。在衬底被抛光的同时测量来自衬底的光的光谱序列。从光谱序列中产生所选光谱特征的特征值的序列。对于来自光谱序列的至少一些光谱，基于在光谱序列中用于先前光谱的先前波长范围内的光谱特征的位置来生成修改的波长范围，将修改的波长范围搜索所选择的光谱特征和所选光谱特征的特征值被确定。

4. 发明申请

WO2010056679A2 SEMI-QUANTITATIVE THICKNESS DETERMINATION 审中-公开
标题翻译：半定量厚度测定
公开(公告)号：WO2010056679A2
公开(公告)日：2010-05-20
申请号：PCT/US2009/063913
申请日：2009-11-10
申请人： APPLIED MATERIALS, INC. , BENVEGNU, Dominic J. , SWEDEK, Boguslaw A. , DAVID, Jeffrey Drue , LEE, Harry Q.
发明人： BENVEGNU, Dominic J. , SWEDEK, Boguslaw A. , DAVID, Jeffrey Drue , LEE, Harry Q.
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： H01L22/12 , B24B37/013 , B24B49/12 , H01L22/26
摘要： While a substrate is polished, it is also irradiated with light from a light source. A current spectrum of the light reflected from the surface of the substrate is measured. A selected peak, having a first parameter value, is identified in the current spectrum. A value of a second parameter associated with the first parameter is determined from a lookup table using a processor. Depending on the value of the second parameter, the polishing of the substrate is changed. An initial spectrum of light reflected from the substrate before the polishing of the substrate can be measured and a wavelength corresponding to a selected peak of the initial spectrum can be determined.
摘要翻译：当抛光衬底时，它也用来自光源的光照射。测量从衬底表面反射的光的当前光谱。具有第一参数值的选定峰值在当前谱图中被识别。使用处理器从查找表中确定与第一参数相关联的第二参数的值。根据第二参数的值，改变衬底的抛光。可以测量在抛光衬底之前从衬底反射的初始光谱，并且可以确定对应于初始光谱的选定峰值的波长。

5. 发明申请

WO2010028180A2 ADJUSTING POLISHING RATES BY USING SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING 审中-公开
标题翻译：通过在加工过程中使用基板的光谱监测来调整抛光率
公开(公告)号：WO2010028180A2
公开(公告)日：2010-03-11
申请号：PCT/US2009/055935
申请日：2009-09-03
申请人： APPLIED MATERIALS, INC. , DAVID, Jeffrey Drue , BENVEGNU, Dominic J. , LEE, Harry Q. , SWEDEK, Boguslaw A.
发明人： DAVID, Jeffrey Drue , BENVEGNU, Dominic J. , LEE, Harry Q. , SWEDEK, Boguslaw A.
IPC分类号： H01L21/304
CPC分类号： B24B37/005 , B24B37/013 , B24B49/12 , H01L21/302
摘要： A computer implemented method includes receiving a sequence of current spectra of reflected light from a substrate; comparing each current spectrum from the sequence of current spectra to a plurality of reference spectra from a reference spectra library to generate a sequence of best match reference spectra; determining a goodness of fit for the sequence of best match reference spectra; and determining at least one of whether to adjust a polishing rate or an adjustment for the polishing rate, based on the goodness of fit.
摘要翻译：计算机实现的方法包括从基板接收反射光的当前光谱序列; 将来自当前光谱序列的每个当前光谱与来自参考光谱库的多个参考光谱进行比较，以生成最佳匹配参考光谱的序列; 确定最佳匹配参考光谱序列的拟合优度; 以及基于拟合优度确定是否调整抛光速率或抛光速率的调整中的至少一个。

6. 发明申请

WO2007024807A3 APPARATUS AND METHODS FOR SPECTRUM BASED MONITORING OF CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：用于基于频谱监测化学机械抛光的装置和方法
公开(公告)号：WO2007024807A3
公开(公告)日：2007-07-12
申请号：PCT/US2006032659
申请日：2006-08-21
申请人： APPLIED MATERIALS INC , BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGDAN , LEE HARRY Q , KARUPPIAH LAKSHMANAN
发明人： BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGDAN , LEE HARRY Q , KARUPPIAH LAKSHMANAN
IPC分类号： B24B37/04 , B24B49/12
CPC分类号： B24B37/042 , B24B37/205 , B24B49/12
摘要： Apparatus and methods for spectrum based monitoring of chemical mechanical polishing, including spectrum based endpointing, spectrum based polishing rate adjustment, flushing a top surface of an optical head (53), or a pad (30) with a window. The spectrum-based endpointing uses a reference spectrum which is empirically selected for particular spectrum based endpoint determination logic so that the target thickness is achieved when endpoint is called by applying the particular spectrum based endpoint logic. The polishing endpoint can be determined using a difference trace or a sequence of index values. The flushing system creates a laminar gas flow across the top surface of the optical head (53) . The vacuum nozzle (308) and vacuum sources (312) are configured so that the flow of gas is laminar. The window includes a soft plastic portion and a crystalline or glass like portion. The spectrum based polishing rate adjustment includes obtaining spectra for different zones on a substrate.
摘要翻译：用于基于频谱的化学机械抛光监测的装置和方法，包括基于光谱的终点，基于光谱的抛光速率调整，冲洗光学头（53）的顶表面或具有窗口的垫（30）。基于频谱的终点使用参考频谱，该参考频谱是针对特定的基于频谱的端点确定逻辑进行经验选择的，以便通过应用特定的基于频谱的端点逻辑来调用端点时实现目标厚度。可以使用差异迹线或索引值序列来确定抛光终点。冲洗系统在光学头（53）的顶表面上产生层流气流。真空喷嘴（308）和真空源（312）构造成使得气体流是层流的。窗口包括软塑料部分和结晶或玻璃状部分。基于光谱的抛光速率调节包括获得基底上不同区域的光谱。

7. 发明申请

WO2013028389A1 OPTICAL DETECTION OF METAL LAYER CLEARANCE 审中-公开
标题翻译：金属层清晰度的光学检测
公开(公告)号：WO2013028389A1
公开(公告)日：2013-02-28
申请号：PCT/US2012/050607
申请日：2012-08-13
申请人： APPLIED MATERIALS, INC. , DAVID, Jeffrey Drue , BENVEGNU, Dominic J.
发明人： DAVID, Jeffrey Drue , BENVEGNU, Dominic J.
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B24B49/12
摘要： A method of controlling polishing includes polishing a metal layer of a substrate. The metal layer overlies an underlying layer structure. During polishing of the metal layer, a light beam is directed onto the first substrate. The metal layer is sufficiently thin that a portion of the light beam reflects from an exposed surface of the metal layer and a portion of the light beam passes through the metal layer and reflects from the underlying layer structure to generate a reflected light beam. The reflected light beam is monitored during polishing and a sequence of measured spectra is generated from the reflected light beam. At least one of a polishing endpoint or an adjustment for a polishing rate is determined from the sequence of measured spectra.
摘要翻译：控制抛光的方法包括抛光衬底的金属层。金属层覆盖下层结构。在抛光金属层期间，将光束引导到第一基板上。金属层足够薄，使得一部分光束从金属层的暴露表面反射，并且光束的一部分穿过金属层并从下面的层结构反射以产生反射光束。在抛光期间监测反射光束，并从反射光束产生测量光谱序列。从测量光谱的顺序确定抛光终点或抛光速率的调整中的至少一个。

8. 发明申请

WO2012102871A2 GATHERING SPECTRA FROM MULTIPLE OPTICAL HEADS 审中-公开
标题翻译：从多个光学头收集光谱
公开(公告)号：WO2012102871A2
公开(公告)日：2012-08-02
申请号：PCT/US2012021135
申请日：2012-01-12
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , BENVEGNU DOMINIC J , DHANDAPANI SIVAKUMAR
发明人： DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , BENVEGNU DOMINIC J , DHANDAPANI SIVAKUMAR
IPC分类号： H01L21/304
CPC分类号： B24B49/12 , B24B37/013 , B24B37/105
摘要： A polishing apparatus includes a platen to hold a polishing pad having a plurality of optical apertures, a carrier head to hold a substrate against the polishing pad, a motor to generate relative motion between the carrier head and the platen, and an optical monitoring system. The optical monitoring system includes at least one light source, a common detector, and an optical assembly configured to direct light from the at least one light source to each of a plurality of separated positions in the platen, to direct light from each position of the plurality of separated positions to the substrate as the substrate passes over said each position, to receive reflected light from the substrate as the substrate passes over said each position, and to direct the reflected light from each of the plurality of separated positions to the common detector.
摘要翻译：抛光装置包括用于保持具有多个光学孔径的抛光垫的台板，用于将基板保持在抛光垫上的载体头，在载体头与台板之间产生相对运动的电机以及光学监测系统。该光学监测系统包括至少一个光源，公共检测器以及光学组件，该光学组件被配置为将来自至少一个光源的光引导至台板中的多个分离位置中的每一个，以引导来自当衬底经过所述每个位置时将多个分离位置提供给衬底，以便当衬底经过所述每个位置时接收来自衬底的反射光，并将来自多个分离位置中的每一个的反射光引导至公共检测器。

9. 发明申请

WO2012019044A3 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：将测量光谱匹配到用于现场光学监测的参考光谱的技术
公开(公告)号：WO2012019044A3
公开(公告)日：2012-05-18
申请号：PCT/US2011046646
申请日：2011-08-04
申请人： APPLIED MATERIALS INC , HU XIAOYUAN , WANG ZHIHONG , LEE HARRY Q , ZHU ZHIZE , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , ZHANG JIMIN , TU WEN-CHIANG
发明人： HU XIAOYUAN , WANG ZHIHONG , LEE HARRY Q , ZHU ZHIZE , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , ZHANG JIMIN , TU WEN-CHIANG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B24B37/107 , B24B37/205 , B24B49/045 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考光谱。

10. 发明申请

WO2011139524A2 AUTOMATIC GENERATION OF REFERENCE SPECTRA FOR OPTICAL MONITORING 审中-公开
标题翻译：用于光学监测的参考光谱自动生成
公开(公告)号：WO2011139524A2
公开(公告)日：2011-11-10
申请号：PCT/US2011/032650
申请日：2011-04-15
申请人： APPLIED MATERIALS, INC. , DAVID, Jeffrey, Drue , LEE, Harry, Q. , QIAN, Jun , ZHANG, Jimin
发明人： DAVID, Jeffrey, Drue , LEE, Harry, Q. , QIAN, Jun , ZHANG, Jimin
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/042 , B24B37/005 , B24B49/12 , H01L22/12 , H01L22/26
摘要： A computer-implemented method of generating reference spectra includes polishing a first substrate in a polishing apparatus having a rotatable platen, measuring a sequence of spectra from the substrate during polishing with an in-situ monitoring system, associating each spectrum in the sequence of spectra with a index value equal to a number of platen rotations at which the each spectrum was measured, and storing the sequence of spectra as reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括在具有可旋转压板的抛光设备中抛光第一衬底，在用原位监测系统抛光期间测量来自衬底的光谱序列，将光谱序列中的每个光谱与指示值等于测量每个光谱的平板旋转数，并将光谱序列存储为参考光谱。

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