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1. 发明申请

WO2020025145A1 AN EVAPORATION SOURCE TO DEPOSIT EVAPORATED SOURCE MATERIALS, A METHOD OF SHIELDING EVAPORATED SOURCE MATERIALS AND A SHIELDING DEVICE FOR AN EVAPORATION SOURCE 审中-公开
公开(公告)号：WO2020025145A1
公开(公告)日：2020-02-06
申请号：PCT/EP2018/071169
申请日：2018-08-03
申请人： APPLIED MATERIALS, INC. , GEBELE, Thomas , LOPP, Andreas
发明人： GEBELE, Thomas , LOPP, Andreas
IPC分类号： C23C14/00 , C23C14/12 , C23C14/24 , C23C16/04 , C23C16/44 , H01L21/67 , H01L51/00 , C23C14/04
摘要： Embodiments described herein relate to a shielding device (200) for an evaporation source (20). The evaporation source (20) is configured to guide evaporated source material through one or more outlets (22). The shielding device (200) comprises one or more movable shielding device portions (205) configured to block evaporated source material depending on an emission angle of a plume (342) of evaporated source material from the one or more outlets (22) and configured to be replaced by a movement. A shielding device comprising one or more shielding belts (210) is disclosed. An evaporation source and a method of shielding are also disclosed.

2. 发明申请

WO2019201434A1 EVAPORATION SOURCE FOR DEPOSITION OF EVAPORATED MATERIAL ON A SUBSTRATE, DEPOSITION APPARATUS, METHOD FOR MEASURING A VAPOR PRESSURE OF EVAPORATED MATERIAL, AND METHOD FOR DETERMINING AN EVAPORATION RATE OF AN EVAPORATED MATERIAL 审中-公开
公开(公告)号：WO2019201434A1
公开(公告)日：2019-10-24
申请号：PCT/EP2018/059893
申请日：2018-04-18
申请人： APPLIED MATERIALS, INC. , GEBELE, Thomas , BUSCHBECK, Wolfgang
发明人： GEBELE, Thomas , BUSCHBECK, Wolfgang
IPC分类号： C23C14/24 , C23C14/54
摘要： An evaporation source (100) for deposition of evaporated material on a substrate is described. The evaporation source (100) including a crucible (110) for material evaporation; a distribution assembly (120) with one or more outlets (125) for providing the evaporated material to the substrate, the distribution assembly being in fluid communication with the crucible; and a measurement assembly (130). The measurement assembly includes a tube (140) connecting an interior space (121) of the distribution assembly (120) with a pressure sensor (145).

3. 发明申请

WO2015074725A1 SUBSTRATE CARRIER FOR A REDUCED TRANSMISSION OF THERMAL ENERGY 审中-公开
标题翻译：用于减少热能传输的基板载体
公开(公告)号：WO2015074725A1
公开(公告)日：2015-05-28
申请号：PCT/EP2013/074604
申请日：2013-11-25
申请人： APPLIED MATERIALS, INC. , LOPP, Andreas Ewald , KELLER, Stefan , SCHÜßLER, Uwe , BANGERT, Stefan , GEBELE, Thomas , SPATZ, Norbert
发明人： LOPP, Andreas Ewald , KELLER, Stefan , SCHÜßLER, Uwe , BANGERT, Stefan , GEBELE, Thomas , SPATZ, Norbert
IPC分类号： H01L21/673
CPC分类号： H01J37/32724 , C23C14/50 , C23C16/4581 , H01J2237/3321 , H01J2237/3323 , H01L21/67316 , H01L21/67346 , H01L31/1876 , H01L31/1896
摘要： According to the present disclosure, a semiconductor substrate handling systems and substrate carrier is provided. The substrate carrier for holding a substrate to be processed and for transporting the substrate in or through a processing area with a transport device includes a main portion for holding the substrate; a first end portion adapted to be supported by the transport device; and at least one first intermediate portion connecting the main portion with the first end portion. The at least one first intermediate portion includes one or more cut-outs adapted to reduce thermal energy transfer between the main portion and the first end portion.
摘要翻译：根据本公开，提供了半导体衬底处理系统和衬底载体。用于保持待处理的基板和用于在输送装置中或通过处理区域传送基板的基板载体包括用于保持基板的主要部分; 适于由所述运送装置支撑的第一端部; 以及将主要部分与第一端部连接起来的至少一个第一中间部分。所述至少一个第一中间部分包括一个或多个切口，其适于减小主体部分和第一端部部分之间的热能传递。

4. 发明申请

WO2020164686A1 METHOD FOR CLEANING A VACUUM SYSTEM, METHOD FOR VACUUM PROCESSING OF A SUBSTRATE, AND APPARATUS FOR VACUUM PROCESSING A SUBSTRATE 审中-公开
公开(公告)号：WO2020164686A1
公开(公告)日：2020-08-20
申请号：PCT/EP2019/053413
申请日：2019-02-12
申请人： APPLIED MATERIALS, INC. , RADEK, Manuel , GEBELE, Thomas , BUSCHBECK, Wolfgang
发明人： RADEK, Manuel , GEBELE, Thomas , BUSCHBECK, Wolfgang
IPC分类号： B08B7/00 , B08B9/00 , B08B7/04 , C23C16/44 , C23C14/12
摘要： A method for cleaning a vacuum chamber, particularly a vacuum chamber used in the manufacture of OLED devices, is described, The method includes igniting a UV source within the vacuum chamber; and adjusting a pressure in the vacuum chamber to a vacuum condition providing a mixture of ozone and active radicals from a process gas in the vacuum chamber.

5. 发明申请

WO2020151810A1 DEPOSITION APPARATUS AND METHOD OF OPERATING A DEPOSITION APPARATUS 审中-公开
公开(公告)号：WO2020151810A1
公开(公告)日：2020-07-30
申请号：PCT/EP2019/051463
申请日：2019-01-22
申请人： APPLIED MATERIALS, INC. , MADHU, N S , BIRADAR, Prashant Kasirayagoud , LINDENBERG, Ralph , GEBELE, Thomas
发明人： MADHU, N S , BIRADAR, Prashant Kasirayagoud , LINDENBERG, Ralph , GEBELE, Thomas
IPC分类号： H01J37/32 , C23C14/35 , H01J37/34
摘要： A deposition apparatus is described. The deposition apparatus includes a vacuum chamber (101), a deposition source (120) including at least one sputter source (121) within the vacuum chamber for coating a substrate on a first side of the deposition source, and a shielding arrangement (130) arranged on a second side of the deposition source. The shielding arrangement includes a plurality of shielding units which partially overlap and define gas flow paths (132) therebetween. The shielding arrangement may include front shielding units (135) and back shielding units (136) which are alternately arranged.

6. 发明申请

WO2016184487A1 LOAD LOCK CHAMBER, VACUUM PROCESSING SYSTEM WITH LOAD LOCK CHAMBER AND METHOD FOR EVACUATING A LOAD LOCK CHAMBER 审中-公开
标题翻译：负载锁定室，带有锁定室的真空加工系统和用于装载锁定室的方法
公开(公告)号：WO2016184487A1
公开(公告)日：2016-11-24
申请号：PCT/EP2015/060806
申请日：2015-05-15
申请人： APPLIED MATERIALS, INC. , GEBELE, Thomas , KLEIN, Wolfgang , LINDENBERG, Ralph
发明人： GEBELE, Thomas , KLEIN, Wolfgang , LINDENBERG, Ralph
IPC分类号： H01L21/67
CPC分类号： H01L21/67201
摘要： A load lock chamber (100) for a vacuum processing system (500) is described. The load lock chamber includes load lock walls surrounding a load lock chamber volume, wherein the load lock walls include a first load lock wall (101) and a second load lock wall (102), wherein the second load lock wall (102) is arranged opposite to the first load lock wall (101). The load lock chamber further includes at least one first vacuum suction outlet (110) and at least one second vacuum suction outlet (111) for evacuating the load lock chamber (100); wherein the at least one first vacuum suction outlet (110) is located at the first load lock wall (101) and the at least one second vacuum suction outlet (111) is located at the second load lock wall (102). Further, a vacuum processing system and a method for evacuating a load lock chamber are described.
摘要翻译：描述了一种用于真空处理系统（500）的装载锁定室（100）。负载锁定室包括围绕负载锁定室容积的负载锁定壁，其中负载锁定壁包括第一负载锁定壁（101）和第二负载锁定壁（102），其中第二负载锁定壁（102）被布置与第一负载锁定壁（101）相对。所述装载锁定室还包括至少一个第一真空抽吸出口（110）和至少一个用于抽空所述负载锁定室（100）的第二真空抽吸出口（111）。其中所述至少一个第一真空抽吸出口（110）位于所述第一负载锁定壁（101）处，并且所述至少一个第二真空抽吸出口（111）位于所述第二负载锁定壁（102）处。此外，描述了真空处理系统和用于排空负载锁定室的方法。

7. 发明申请

WO2012037984A1 GAS SEPARATION DEVICE AND METHOD OF OPERATING THEREOF 审中-公开
标题翻译：气体分离装置及其操作方法
公开(公告)号：WO2012037984A1
公开(公告)日：2012-03-29
申请号：PCT/EP2010/064183
申请日：2010-09-24
申请人： APPLIED MATERIALS, INC. , KÖNIG, Michael , RICK, Alfred , PERATA, Michael , GEBELE, Thomas
发明人： KÖNIG, Michael , RICK, Alfred , PERATA, Michael , GEBELE, Thomas
IPC分类号： F16K51/02
CPC分类号： F16K51/02 , F16K1/20 , F16K3/02 , F16K5/04 , H01L21/67017
摘要： A gas separation device for separating processing regions (1, 2), wherein the processing regions are in fluid communication with each other by an opening in wall (203), is described. The gas separation device includes at least one adjustable flow resistance control unit (201) configured for adjusting the gas flow resistance between the processing regions, wherein the at least one adjustable flow resistance control unit includes at least one further opening (291).
摘要翻译：一种用于分离处理区域（1,2）的气体分离装置，其中处理区域通过壁（203）中的开口彼此流体连通。所述气体分离装置包括至少一个可调整流量阻力控制单元（201），其配置用于调节所述处理区域之间的气体流动阻力，其中所述至少一个可调节流阻控制单元包括至少一个另外的开口（291）。

8. 发明申请

WO2006102913A1 VORRICHTUNG UND VERFAHREN ZUM BESCHICHTEN VON SUBSTRATEN 审中-公开
标题翻译： DEVICE AND METHOD FOR涂层基布
公开(公告)号：WO2006102913A1
公开(公告)日：2006-10-05
申请号：PCT/EP2005/003363
申请日：2005-03-31
申请人： APPLIED FILMS GMBH & CO. KG , GEBELE, Thomas , GERTMANN, Reiner , GRIMM, Helmut , HACKER, Volker , HEGEMANN, Thomas , HELLE, Franz-Josef , HENRICH, Jürgen , KAMPMANN, Lutz , KREMPEL-HESSE, Jörg , MICHAEL, Klaus , SAUER, Peter , STOLLEY, Tobias , SOMMER, Elisabeth , ZMELTY, Anton
发明人： GEBELE, Thomas , GERTMANN, Reiner , GRIMM, Helmut , HACKER, Volker , HEGEMANN, Thomas , HELLE, Franz-Josef , HENRICH, Jürgen , KAMPMANN, Lutz , KREMPEL-HESSE, Jörg , MICHAEL, Klaus , SAUER, Peter , STOLLEY, Tobias , SOMMER, Elisabeth , ZMELTY, Anton
IPC分类号： C23C14/56 , B05D7/24
CPC分类号： B05D1/60 , B05D1/002 , B05D3/067 , B05D3/068 , B05D7/02 , C23C14/568
摘要： Die Erfindung betrifft eine Vorrichtung und ein Verfahren zum Beschichten von Substraten, insbesondere von Flaschen aus Kunststoff. Die Substrate (2, 5) werden dabei von Atmosphäre über ein spezielles Schleusensystem (2) in Vakuum eingeführt und dort beschichtet. Es können mehrere Schichten aufgetragen werden, mindestens wird jedoch eine Schicht aufgetragen. Nach der Beschichtung werden die Substrate über dasselbe Schleusensystem wieder an die Atmosphäre verbracht. Das Schleusensystem weist ein Schleusenrad (3) auf, das auf seinem Umfang Ausnehmungen für die Aufnahme von Substraten besitzt. Zwischen den einzelnen Ausnehmungen befinden sich Dichtungsschienen, die eine Abdichtung gegenüber Vakuumkammern ermöglichen.
摘要翻译：本发明涉及一种装置和用于涂覆基材，特别是塑料瓶的方法。基板（2,5）是由此从大气压约一个特定的锁系统（2）被引入到真空并涂覆在那里。可以应用多个层，和至少一个层被施加。使用相同的锁系统涂布基材后带回到大气中。的锁系统，包括：具有在其周边上的凹部为底物的摄取的锁轮（3）。被密封导轨，其允许针对各个凹槽之间的真空腔室的密封。

9. 发明申请

WO2004042111A3 LOCK ARRANGEMENT FOR A SUBSTRATE COATING INSTALLATION 审中-公开
标题翻译：锁定装置在基板涂装线
公开(公告)号：WO2004042111A3
公开(公告)日：2005-01-27
申请号：PCT/DE0303548
申请日：2003-10-24
申请人： APPLIED FILMS GMBH & CO KG , GEBELE THOMAS , GERTMANN REINER , STOLLEY TOBIAS , HELLE FRANZ-JOSEF
发明人： GEBELE THOMAS , GERTMANN REINER , STOLLEY TOBIAS , HELLE FRANZ-JOSEF
IPC分类号： C23C14/56 , C23C28/00 , C23C30/00 , C23C14/35
CPC分类号： C23C14/0015 , C23C14/566 , C23C30/00 , Y02T50/67 , Y10T428/1352
摘要： The invention relates to a lock arrangement for a substrate coating installation, by which means two chambers having different pressures are interconnected. Said two chambers are separated by a gas separation wall. Specific channels are laid through said gas separation wall, the inner contours of the channels being adapted to the outer contours of substrates which are transported from one chamber into the other chamber. The distance between the channels and the substrates, e.g. bottles, is equal to approximately between 1 and 15 mm in the region of the largest diameter of the substrates.
摘要翻译：本发明涉及一种用于在衬底涂敷装置的锁定组件，具有两个空间，其中不同的压力为准，被接合在一起。两个腔室是在这种情况下通过一个气体分离壁（31）隔开。由于这种气体分离壁特殊通道（46，51）被放置，其内的衬底的外轮廓（48，49）的轮廓适合于的空间中的其他房间进行运输。这些信道和基片，Z之间的间距。例如，瓶，为约1至15毫米的基片的最大直径的区域中。

10. 发明申请

WO2021004619A1 VACUUM PROCESSING SYSTEM AND METHOD OF OPERATING A VACUUM PROCESSING SYSTEM 审中-公开
公开(公告)号：WO2021004619A1
公开(公告)日：2021-01-14
申请号：PCT/EP2019/068269
申请日：2019-07-08
申请人： APPLIED MATERIALS, INC. , GEBELE, Thomas , ZANG, Sebastian Gunther , HENRICH, Jürgen
发明人： GEBELE, Thomas , ZANG, Sebastian Gunther , HENRICH, Jürgen
IPC分类号： F04B37/08 , F04B37/14 , F04B41/06
摘要： A vacuum system for volume pumping a plurality of vacuum areas is described. The vacuum system includes a first vacuum manifold extending along the plurality of vacuum areas and a second vacuum manifold extending along the plurality of vacuum areas. A first plurality of valves connecting the first vacuum manifold to the plurality of vacuum areas is provided, each valve of the first plurality of valves corresponding to a vacuum area of the plurality of vacuum areas. A second plurality of valves connecting the second vacuum manifold to the plurality of vacuum areas is provided, each valve of the second plurality of valves corresponding to the vacuum area of the plurality of vacuum areas. The vacuum system further includes a first pump stack assembly including one or more first pump stacks connected to the first vacuum manifold with a first connection pipe via a first connection valve and a second pump stack assembly including one or more second pump stacks connected to a second vacuum manifold with the second connection pipe via a second connection valve.

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