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1. 发明申请

WO2016091303A1 MASK ARRANGEMENT FOR MASKING A SUBSTRATE IN A PROCESSING CHAMBER 审中-公开
标题翻译：用于在加工室中掩埋基材的掩模布置
公开(公告)号：WO2016091303A1
公开(公告)日：2016-06-16
申请号：PCT/EP2014/077257
申请日：2014-12-10
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , VERCESI, Tommaso , GISLON, Daniele , HEIMEL, Oliver , LOPP, Andreas , HAAS, Dieter
发明人： BANGERT, Stefan , VERCESI, Tommaso , GISLON, Daniele , HEIMEL, Oliver , LOPP, Andreas , HAAS, Dieter
IPC分类号： C23C14/04 , C23C16/04 , C23C16/458
CPC分类号： C23C14/042 , C23C16/042 , C23C16/4587
摘要： A mask arrangement (100) for masking a substrate (10) in a processing chamber is provided. The mask arrangement (100) includes a mask frame (110) having one or more frame elements (112, 114, 116, 118) and is configured to support a mask device (120), wherein the mask device (120) is connectable to the mask frame (110); and at least one actuator (130) connectable to at least one frame element (112) of the one or more frame elements (112, 114, 116, 118), wherein the at least one actuator (130) is configured to apply a force to the at least one frame element (112).
摘要翻译：提供了用于掩蔽处理室中的基板（10）的掩模布置（100）。掩模装置（100）包括具有一个或多个框架元件（112,114,116,118）的掩模框架（110），并且被配置为支撑掩模装置（120），其中所述掩模装置（120）可连接到面罩框架（110）; 以及可连接到所述一个或多个框架元件（112,114,116,118）的至少一个框架元件（112）的至少一个致动器（130），其中所述至少一个致动器（130）构造成施加力到所述至少一个框架元件（112）。

2. 发明申请

WO2017194098A1 METHODS OF OPERATING A DEPOSITION APPARATUS, AND DEPOSITION APPARATUS 审中-公开
标题翻译：操作沉积设备的方法和沉积设备
公开(公告)号：WO2017194098A1
公开(公告)日：2017-11-16
申请号：PCT/EP2016/060440
申请日：2016-05-10
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LOPP, Andreas , WURSTER, Harald , HAAS, Dieter
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LOPP, Andreas , WURSTER, Harald , HAAS, Dieter
IPC分类号： C23C14/12 , C23C14/24 , C23C14/04 , C23C16/44 , C23C16/455 , C23C14/56 , H01L51/56
摘要： A method of operating a deposition apparatus is provided. The method comprises: Deposition of an evaporated source material on a substrate (10) by guiding the evaporated source material from one or more outlets (22) of an evaporation source (20) toward the substrate (10), wherein part of the evaporated source material is blocked by and attaches to a shielding device (30) arranged between the one or more outlets (22) and the substrate (10), followed by a cleaning of the shielding device (30) by at least locally heating the shielding device (30) for releasing at least part of the attached source material from the shielding device (30). According to a further aspect, a deposition apparatus is provided that can be operated according to the described methods.
摘要翻译：提供了一种操作沉积装置的方法。该方法包括：通过将蒸发源材料从蒸发源（20）的一个或多个出口（22）引向衬底（10）而将蒸发源材料沉积在衬底（10）上，其中部分蒸发源材料被设置在一个或多个出口（22）和衬底（10）之间的防护装置（30）阻挡并附接到防护装置（30），接着通过至少局部加热防护装置（30）来清洁防护装置（30）用于从所述防护装置（30）释放至少部分所附着的源材料。根据另一方面，提供了一种可根据所述方法操作的沉积设备。

3. 发明申请

WO2017194097A1 EVAPORATION SOURCE FOR DEPOSITING AN EVAPORATED MATERIAL, AND METHOD FOR DEPOSITING AN EVAPORATED MATERIAL 审中-公开
标题翻译：用于沉积蒸发材料的蒸发源以及沉积蒸发材料的方法
公开(公告)号：WO2017194097A1
公开(公告)日：2017-11-16
申请号：PCT/EP2016/060439
申请日：2016-05-10
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , WURSTER, Harald , LOPP, Andreas , HAAS, Dieter
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , WURSTER, Harald , LOPP, Andreas , HAAS, Dieter
IPC分类号： C23C14/04 , C23C14/12 , C23C14/24 , H01L51/00
CPC分类号： C23C14/24 , C23C14/04 , C23C14/042 , C23C14/12 , C23C14/243 , H01L51/001 , H01L51/50
摘要： Embodiments described herein relate to an evaporation source (20) for depositing an evaporated source material on a substrate. The evaporation source (20) comprises one or more distribution pipes (106) with a plurality of nozzles (22), wherein each nozzle of the plurality of nozzles (22) is configured for directing a plume of evaporated source material toward the substrate (10); and a shielding device (30) comprising a plurality of apertures (32), wherein at least one aperture of the plurality of apertures (32) is configured to shape the plume (318) of evaporated source material emitted from a single associated nozzle. According to a further aspect, a shielding device for an evaporation source as well as methods of depositing an evaporated source material on a substrate are described.
摘要翻译：这里描述的实施例涉及用于将蒸发的源材料沉积在基底上的蒸发源（20）。所述蒸发源（20）包括具有多个喷嘴（22）的一个或多个分配管（106），其中所述多个喷嘴（22）中的每个喷嘴被配置用于将蒸发源材料的羽流朝向所述衬底（10 ）; 以及包括多个孔（32）的防护装置（30），其中所述多个孔（32）中的至少一个孔配置成对从单个相关联的喷嘴发射的蒸发源材料的羽流（318）进行成形。根据另一方面，描述了用于蒸发源的屏蔽装置以及在基底上沉积蒸发的源材料的方法。

4. 发明申请

WO2022002349A1 NOZZLE ASSEMBLY, EVAPORATION SOURCE, DEPOSITION SYSTEM AND METHOD FOR DEPOSITING AN EVAPORATED MATERIAL ONTO A SUBSTRATE 审中-公开
公开(公告)号：WO2022002349A1
公开(公告)日：2022-01-06
申请号：PCT/EP2020/068257
申请日：2020-06-29
申请人： APPLIED MATERIALS, INC. , LOPP, Andreas , BANGERT, Stefan
发明人： LOPP, Andreas , BANGERT, Stefan
IPC分类号： C23C14/24 , C23C14/16 , C23C14/56 , H01M4/04 , H01M4/38 , C23C14/243 , C23C14/562 , C23C14/564 , C23C14/568 , H01M4/0423 , H01M4/1395 , H01M4/382
摘要： A nozzle assembly for guiding an evaporated material to a substrate is described. The nozzles assembly includes a plurality of nozzles, one or more nozzles of the plurality of nozzles include: a first nozzle section having a first end and a second end, the first nozzle section comprising a vapor outlet at the second end, and an orifice at or adjacent to the vapor outlet having an orifice diameter.

5. 发明申请

WO2015139777A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
标题翻译：有机材料蒸发源
公开(公告)号：WO2015139777A1
公开(公告)日：2015-09-24
申请号：PCT/EP2014/055744
申请日：2014-03-21
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose, Manuel , BANGERT, Stefan , LOPP, Andreas , SCHÜSSLER, Uwe
发明人： DIEGUEZ-CAMPO, Jose, Manuel , BANGERT, Stefan , LOPP, Andreas , SCHÜSSLER, Uwe
IPC分类号： C23C14/24 , C23C14/04 , C23C14/56
CPC分类号： C23C14/243 , C23C14/042 , C23C14/56 , H01L51/001 , H01L51/0011 , H01L51/56
摘要： An evaporation source array for depositing two or more organic materials on a substrate is described. The evaporation source array includes two or more evaporation crucibles, wherein the two or more evaporation crucibles are configured to evaporate the two or more organic materials, two or more distribution pipes with outlets provided along the length of the two or more distribution pipes, wherein a first distribution pipe of the two or more distribution pipes is in fluid communication with a first evaporation crucible of the two or more evaporation crucibles, two or more heat shields, which surround the first distribution pipe, a cooling shield arrangement provided at at least one side of the two or more distribution pipes, wherein the at least one side is the side at which the outlets are provided, and a cooling element provided at or in the cooling shield arrangement for active cooling of the cooling shield arrangement.
摘要翻译：描述了用于在衬底上沉积两种或更多种有机材料的蒸发源阵列。蒸发源阵列包括两个或更多个蒸发坩埚，其中两个或更多个蒸发坩埚被配置为蒸发两个或更多个有机材料，两个或更多个分配管，其具有沿着两个或更多个分配管的长度设置的出口，其中两个或更多个分配管的第一分配管与两个或更多个蒸发坩埚的第一蒸发坩埚，围绕第一分配管的两个或更多个隔热罩流体连通，设置在至少一个侧面上的冷却屏蔽装置的两个或更多个分配管，其中所述至少一个侧面是设置所述出口的一侧，以及设置在所述冷却屏蔽装置中或所述冷却屏蔽装置中的用于主动冷却所述冷却屏蔽装置的冷却元件。

6. 发明申请

WO2020244781A1 DEPOSITION SOURCE, DEPOSITION APPARATUS AND METHOD OF DEPOSITING MATERIAL ON A SUBSTRATE 审中-公开
公开(公告)号：WO2020244781A1
公开(公告)日：2020-12-10
申请号：PCT/EP2019/064985
申请日：2019-06-07
申请人： APPLIED MATERIALS, INC. , FRANKE, Sebastian , LOPP, Andreas , MÜLLER, Andreas , BANGERT, Stefan , KELLER, Stefan , BUSCHBECK, Wolfgang
发明人： FRANKE, Sebastian , LOPP, Andreas , MÜLLER, Andreas , BANGERT, Stefan , KELLER, Stefan , BUSCHBECK, Wolfgang
IPC分类号： C23C14/24 , C23C14/34 , C23C14/56 , C23C14/35 , C23C14/54 , H01J37/34 , H01L51/52
摘要： A deposition source (100) for depositing material on a substrate (10) is described. The deposition source (100) includes a sputter source (110). Further, the deposition source (100) includes a reflector shield arrangement (120) for reflecting material provided from the sputter source towards the substrate. Further, a deposition apparatus and a method of depositing material on a substrate are described.

7. 发明申请

WO2015139776A1 EVAPORATION SOURCE FOR ORGANIC MATERIAL 审中-公开
标题翻译：有机材料蒸发源
公开(公告)号：WO2015139776A1
公开(公告)日：2015-09-24
申请号：PCT/EP2014/055741
申请日：2014-03-21
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , DIEGUEZ-CAMPO, Jose Manuel , SCHÜSSLER, Uwe , LOPP, Andreas
发明人： BANGERT, Stefan , DIEGUEZ-CAMPO, Jose Manuel , SCHÜSSLER, Uwe , LOPP, Andreas
IPC分类号： C23C14/24 , C23C14/04
CPC分类号： H01L51/56 , C23C14/042 , C23C14/243 , C23C14/26 , H01L51/001 , H01L51/0011 , H01L51/0012
摘要： An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material, a distribution pipe with one or more outlets provided along the length of the distribution pipe, wherein the distribution pipe is in fluid communication with the evaporation crucible, and wherein the distribution pipe has a cross-section perpendicular to the length of the distribution pipe, which is non-circular, and which includes: an outlet side at which the one or more outlets are provided, wherein the width of the outlet side of the cross-section is 30% or less of the maximum dimension of the cross-section.
摘要翻译：描述了有机材料的蒸发源。蒸发源包括蒸发坩埚，其中蒸发坩埚被配置为蒸发有机材料，分配管具有沿着分配管的长度设置的一个或多个出口，其中分配管与蒸发坩埚流体连通，并且其中所述分配管具有垂直于所述分配管的长度的横截面，所述分布管是非圆形的，并且包括：设置所述一个或多个出口的出口侧，其中出口侧的宽度横截面为横截面最大尺寸的30％以下。

8. 发明申请

WO2017054890A1 VARIABLE SHAPER SHIELD FOR EVAPORATORS AND METHOD FOR DEPOSITING AN EVAPORATED SOURCE MATERIAL ON A SUBSTRATE 审中-公开
标题翻译：用于蒸发器的可变形状防护罩和在基底上沉积蒸发源材料的方法
公开(公告)号：WO2017054890A1
公开(公告)日：2017-04-06
申请号：PCT/EP2015/072865
申请日：2015-10-02
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LANDGRAF, Heike , LOPP, Andreas
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LANDGRAF, Heike , LOPP, Andreas
IPC分类号： C23C14/24 , C23C14/04 , H01L51/00
CPC分类号： C23C14/24 , C23C14/042 , C23C14/044 , H01L51/0011
摘要： A shielding device (320) for an evaporation source configured to guide evaporated source material through a plurality of outlets distributed along a length direction of the evaporation source. The shielding device including three or more spaced-apart shaper shield segments (325) configured for blocking evaporated source material (312) depending on the emission angle of the plume of evaporated source material from the plurality of outlets in a plane parallel to the length direction of the evaporation source.
摘要翻译：一种用于蒸发源的屏蔽装置（320），其构造成将蒸发的源材料引导通过沿蒸发源的长度方向分布的多个出口。所述屏蔽装置包括三个或更多个间隔开的成形器屏蔽段（325），其构造成用于根据来自多个出口的蒸发源材料的羽流在与长度方向平行的平面中的发射角来阻挡蒸发的源材料（312）的蒸发源。

9. 发明申请

WO2019007515A1 APPARATUS AND METHOD FOR HOLDING A SUBSTRATE 审中-公开
公开(公告)号：WO2019007515A1
公开(公告)日：2019-01-10
申请号：PCT/EP2017/066979
申请日：2017-07-06
申请人： APPLIED MATERIALS, INC. , SCHULTHEIS, Michael Rainer , LOPP, Andreas , BUSCHBECK, Wolfgang , HENRICH, Jürgen , BANGERT, Stefan
发明人： SCHULTHEIS, Michael Rainer , LOPP, Andreas , BUSCHBECK, Wolfgang , HENRICH, Jürgen , BANGERT, Stefan
IPC分类号： C23C14/04 , H01L21/683
摘要： The present disclosure provides an apparatus (100) for holding a substrate (10) or a mask in a vacuum deposition process. The apparatus (100) includes one or more first electrodes and one or more second electrodes connectable to a first power assembly (230) and one or more third electrodes arranged between the one or more first electrodes and the one or more second electrodes and connectable to a second power assembly (240).

10. 发明申请

WO2017121491A1 EVAPORATION SOURCE, APPARATUS AND METHOD FOR DEPOSITING ORGANIC MATERIAL 审中-公开
标题翻译：用于沉积有机材料的蒸发源，装置和方法
公开(公告)号：WO2017121491A1
公开(公告)日：2017-07-20
申请号：PCT/EP2016/050824
申请日：2016-01-15
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , LOPP, Andreas
发明人： BANGERT, Stefan , LOPP, Andreas
IPC分类号： C23C14/04 , C23C14/24
CPC分类号： C23C14/042 , C23C14/24 , C23C14/243
摘要： An evaporation source (100) for depositing a source material on a substrate (10) is described. The evaporation source includes an evaporation crucible (104), wherein the evaporation crucible is configured to evaporate the source material; a distribution unit (130) with one or more outlets (212), wherein the distribution unit is in fluid communication with the evaporation crucible, and wherein the one or more outlets are configured for providing the source material to the substrate in a deposition direction (101); a first cooling shield arrangement (201) provided including one or more openings (221); a heated shield arrangement (202) provided at a distance from the first cooling shield arrangement (201), wherein the heated shield arrangement (202) includes one or more apertures (222). The first cooling shield arrangement (201)is arranged between the distribution unit (130) and the heated shield arrangement (202) and the evaporation source (100) is configured to define a path for the source material in the deposition direction (101) from the one or more outlets (212) through the one or more openings (221) and the one or more apertures (222) to the substrate.
摘要翻译：描述用于在衬底（10）上沉积源材料的蒸发源（100）。蒸发源包括蒸发坩埚（104），其中蒸发坩埚配置为蒸发源材料; 具有一个或多个出口（212）的分配单元（130），其中所述分配单元与所述蒸发坩埚流体连通，并且其中所述一个或多个出口被配置用于沿着沉积方向将所述源材料提供给所述衬底 101）; 提供包括一个或多个开口（221）的第一冷却屏蔽装置（201）; 加热的屏蔽装置（202），其设置在与第一冷却屏蔽装置（201）相距一段距离处，其中加热的屏蔽装置（202）包括一个或多个孔（222）。第一冷却屏蔽装置（201）布置在分配单元（130）和加热的屏蔽装置（202）之间，并且蒸发源（100）被配置成限定来自沉积方向（101）的源材料的路径所述一个或多个出口（212）穿过所述一个或多个开口（221）并且所述一个或多个孔（222）通向所述衬底。

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