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1. 发明申请

WO2014164363A1 TRANSDUCERS, SYSTEMS, AND MANUFACTURING TECHNIQUES FOR FOCUSED ULTRASOUND THERAPIES 审中-公开
标题翻译：用于聚焦超声治疗的传感器，系统和制造技术
公开(公告)号：WO2014164363A1
公开(公告)日：2014-10-09
申请号：PCT/US2014/022141
申请日：2014-03-07
申请人： KONA MEDICAL, INC. , ZHANG, Jimin , GERTNER, Michael
发明人： ZHANG, Jimin , GERTNER, Michael
IPC分类号： A61B5/05 , A61N7/00
CPC分类号： A61B8/4494 , A61B6/12 , A61B6/487 , A61B8/0841 , A61B8/085 , A61B8/4209 , A61B8/4245 , A61B8/4254 , A61B8/4281 , A61B8/4416 , A61B2017/00725 , A61B2018/00023 , A61B2034/2063 , A61B2090/378 , A61B2090/3937 , A61B2090/395 , A61N7/02 , A61N2007/0065 , A61N2007/0082 , A61N2007/0091 , A61N2007/0095
摘要： A system to apply ultrasound energy to a region surrounding blood flow in a blood vessel from a position outside a patient includes: a therapeutic ultrasound transducer comprising a plurality of transducer elements; and a processor configured to control the plurality of transducer elements; wherein the processor is configured to change phase inputs to the transducer elements to move a focus of the transducer at least 1 cm in a first plane which is substantially along a plane of the transducer elements of the therapeutic ultrasound transducer and at least 1 cm in a second plane orthogonal to the first plane; and wherein the processor is further configured to position the focus of the transducer in sequential positions offset from the blood flow in the blood vessel according to a pattern pre-determined by an operator of the system.
摘要翻译：将超声波能量施加到患者外部位置处的血管周围的血流周围的区域的系统包括：包括多个换能器元件的治疗性超声换能器; 以及处理器，被配置为控制所述多个换能器元件; 其中所述处理器被配置为改变到所述换能器元件的相位输入，以使所述换能器的焦点在基本上沿着所述治疗性超声换能器的换能器元件的平面的第一平面中移动至少1cm，并且在与第一平面正交的第二平面; 并且其中所述处理器还被配置为根据由所述系统的操作者预先确定的模式将所述换能器的焦点定位在与所述血管中的血流偏离的顺序位置。

2. 发明申请

WO2012054263A3 MULTIPLE MATCHING REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：用于原位光学监测的多重匹配参考光谱
公开(公告)号：WO2012054263A3
公开(公告)日：2012-06-28
申请号：PCT/US2011055814
申请日：2011-10-11
申请人： APPLIED MATERIALS INC , ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
发明人： ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B49/12
摘要： A method of controlling polishing includes storing a plurality libraries, each library including a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, and for each measured spectrum of the sequence of spectra, finding a best matching first reference spectrum from a first library from the plurality of libraries and finding a best matching second reference spectrum from a different second library from the plurality of libraries, determining a first value associated with the best matching first reference spectrum and determining a second value from the best matching second reference spectrum, and calculating a third value from the first value and the second value to generate a sequence of calculated third values. At least one of a polishing endpoint or an adjustment for a polishing rate can be determined based on the sequence of calculated third values.
摘要翻译：控制抛光的方法包括存储多个库，每个库包括多个参考光谱，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，并且对于光谱序列的每个测量光谱，找到最佳匹配来自所述多个库中的第一库的第一参考谱，并且从所述多个库中的不同第二库找到最佳匹配的第二参考谱，确定与所述最佳匹配的第一参考谱相关联的第一值，以及确定第二值从最佳匹配的第二参考频谱中计算第三值，并且从第一值和第二值计算第三值以生成计算的第三值的序列。基于所计算的第三值的顺序，可以确定抛光终点或抛光速率的调整中的至少一个。

3. 发明申请

WO2011146213A3 ENDPOINT CONTROL OF MULTIPLE SUBSTRATES WITH MULTIPLE ZONES ON THE SAME PLATEN IN CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：在化学机械抛光中在同一板上具有多个区域的多个基板的端点控制
公开(公告)号：WO2011146213A3
公开(公告)日：2012-02-23
申请号：PCT/US2011034212
申请日：2011-04-27
申请人： APPLIED MATERIALS INC , LEE HARRY Q , ZHANG JIMIN , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A
发明人： LEE HARRY Q , ZHANG JIMIN , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042
摘要： A plurality of substrates are polished simultaneously on the same polishing pad. A sequence of spectra is measured from each zone of each substrate, and for each measured spectrum in the sequence of spectra for each zone of each substrate, a best matching reference spectrum is determined from a library of reference spectra. For each zone of each substrate, a linear function is fit to a sequence of index values associated with the best matching reference spectra. For at least one zone, a projected time at which the zone will reach a target index value is determined based on the linear function, and the polishing parameter for at least one zone on at least one substrate is adjusted such that the at least one zone of the at least one substrate has closer to the target index at the projected time than without such adjustment.
摘要翻译：多个基板在同一抛光垫上同时被抛光。从每个底物的每个区域测量光谱序列，并且对于每个底物的每个区域的光谱序列中的每个测量的光谱，从参考光谱库确定最佳匹配的参考光谱。对于每个衬底的每个区域，线性函数适合于与最佳匹配参考光谱相关联的索引值序列。对于至少一个区域，基于线性函数确定区域将达到目标指标值的预计时间，并且调整至少一个基底上的至少一个区域的抛光参数，使得至少一个区域的至少一个基板在投影时间比没有这种调整更接近于目标指标。

4. 发明申请

WO2012019044A2 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：将测量的光谱与现场光学监测参考光谱进行匹配的技术
公开(公告)号：WO2012019044A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/046646
申请日：2011-08-04
申请人： APPLIED MATERIALS, INC. , HU, Xiaoyuan , WANG, Zhihong , LEE, Harry Q. , ZHU, Zhize , DAVID, Jeffrey Drue , BENVEGNU, Dominic J. , ZHANG, Jimin , TU, Wen-Chiang
发明人： HU, Xiaoyuan , WANG, Zhihong , LEE, Harry Q. , ZHU, Zhize , DAVID, Jeffrey Drue , BENVEGNU, Dominic J. , ZHANG, Jimin , TU, Wen-Chiang
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B24B37/107 , B24B37/205 , B24B49/045 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用不同于平方差平方和的匹配技术来找到最佳匹配参考谱以产生最佳匹配参考谱的序列，以及基于最佳匹配序列来确定抛光终点或抛光速率的调整中的至少一个参考光谱。寻找最佳匹配参考光谱可以包括执行测量光谱与来自库的多个参考光谱中的两个或更多个中的每一个的互相关，并选择与测量光谱具有最大相关性的参考光谱作为最佳匹配参考谱。

5. 发明申请

WO2007143161A3 USE OF PROTEINS AND PEPTIDES OF THE TGF-BETA SUPERFAMILY FOR PURIFICATION AND THERAPEUTIC METHODS 审中-公开
标题翻译：蛋白质和TGF-β超级蛋白的肽用于纯化和治疗方法的使用
公开(公告)号：WO2007143161A3
公开(公告)日：2008-05-29
申请号：PCT/US2007013053
申请日：2007-06-01
申请人： WYETH CORP , LU ZHIJIAN , LIU WEI , ZHANG JIMIN , YAWORSKY PAUL JOHN , BROWN CHRISTOPHER TODD , OLLAND STEPHANE H , SHEN EMILY SHENG-MING
发明人： LU ZHIJIAN , LIU WEI , ZHANG JIMIN , YAWORSKY PAUL JOHN , BROWN CHRISTOPHER TODD , OLLAND STEPHANE H , SHEN EMILY SHENG-MING
IPC分类号： C07K1/22 , A61K38/18 , C07K14/495 , C07K14/51 , C07K17/02 , G01N33/543
CPC分类号： G01N33/6872 , C07K1/22 , C07K14/495 , C07K14/51 , C07K17/02 , G01N2333/525
摘要： Members of the TGF- ß superfamily and peptide fragments based on member proteins are employed to purify solutions containing member proteins or as therapeutics.
摘要翻译：使用基于成员蛋白的TGF-β超家族和肽片段的成员来纯化含有成员蛋白质的溶液或作为治疗剂。

6. 发明申请

WO2008005951A3 POLISHING PAD WITH WINDOW HAVING MULTIPLE PORTIONS 审中-公开
公开(公告)号：WO2008005951A3
公开(公告)日：2008-01-10
申请号：PCT/US2007/072690
申请日：2007-07-02
申请人： APPLIED MATERIALS, INC. , BENVEGNU, Dominic , SWEDEK, Boguslaw , ZHANG, Jimin
发明人： BENVEGNU, Dominic , SWEDEK, Boguslaw , ZHANG, Jimin
IPC分类号： B24B49/12
摘要： A polishing pad has an opaque polishing layer with an aperture therethrough and a polishing surface, and a solid light-transmissive window in the aperture. The solid light-transmissive window includes an outer portion secured to the polishing layer and an inner portion secured to the outer portion. The outer portion has a upper surface recessed relative to the polishing surface, whereas the inner portion has an upper surface that is substantially co-planar with the polishing surface.

7. 发明申请

WO2007047993A2 SYSTEM AND METHODS FOR SEALING A VASCULAR OPENING 审中-公开
标题翻译：用于密封血管开放的系统和方法
公开(公告)号：WO2007047993A2
公开(公告)日：2007-04-26
申请号：PCT/US2006/041163
申请日：2006-10-19
申请人： THERUS CORPORATION , SILVERSTEIN, Fred , EMERY, Charles , KOOK, John , PEDERSON, Robert , SEKINS, K. Michael , ZHAO, Xiao , KULESA, Larry , LAHMAN, Robyn , AUGUSTINE, Larry , PEROZEK, David, M. , ZHANG, Jimin , GISSEL BERG, Margo , ANDERSON, Thomas
发明人： EMERY, Charles , KOOK, John , PEDERSON, Robert , SEKINS, K. Michael , ZHAO, Xiao , KULESA, Larry , LAHMAN, Robyn , AUGUSTINE, Larry , PEROZEK, David, M. , ZHANG, Jimin , GISSEL BERG, Margo , ANDERSON, Thomas
IPC分类号： A61B17/00 , A61M25/10 , A61N7/02 , A61B19/00
CPC分类号： A61B8/0833 , A61B5/026 , A61B8/0841 , A61B8/12 , A61B8/4405 , A61B8/445 , A61B17/0057 , A61B18/02 , A61B34/25 , A61B50/13 , A61B2017/00557 , A61B2017/00637 , A61B2017/00641 , A61B2090/372 , A61B2090/3784 , A61B2090/3929 , A61B2090/3958 , A61B2090/397 , A61F2/82 , A61M25/10 , A61N7/02
摘要： Systems and methods for sealing a vascular opening such as an arteriotomy formed during a femoral artery catheterization procedure are described. Included are methods for locating the arteriotomy, aligning the therapeutic applicator to the arteriotomy, transiently occluding the blood vessel, and a station keeping procedure for maintaining alignment. Locating the arteriotomy and aligning the applicator may be performed using a targeting catheter having one or more targeting aids, such as an inflatable balloon or sensor (e.g., Doppler or temperature sensor), and an ultrasonic beacon. Station keeping may be performed using overlapping ultrasound signals that are sent to a target tissue site and the echo detected. An algorithm is described for detecting tissue movement relative to the applicator based on comparison of the echo with a previously stored echo.
摘要翻译：描述了用于密封血管开口的系统和方法，例如在股动脉导管插入术过程中形成的动脉切开术。包括用于定位动脉切开术的方法，将治疗施用器对准动脉切开术，瞬时闭塞血管，以及用于维持对准的站保持程序。定位动脉切开术并对准施用器可以使用具有一个或多个靶向辅助物的靶向导管（例如可充气球囊或传感器（例如，多普勒或温度传感器））和超声波信标进行。可以使用发送到目标组织部位并检测到回波的重叠超声信号来执行站保持。描述了一种用于基于回波与先前存储的回波的比较来检测相对于施用器的组织运动的算法。

8. 发明申请

WO2006019804A2 COMPOSITIONS AND METHODS OF PURIFYING MYELIN-ASSOCIATED GLYCOPROTEIN (MAG) 审中-公开
标题翻译：纯化与髓鞘相关的糖蛋白（MAG）的组合物和方法
公开(公告)号：WO2006019804A2
公开(公告)日：2006-02-23
申请号：PCT/US2005/024830
申请日：2005-07-13
申请人： WYETH , YAN, Gouying , XIE, Yuhong , PAULSEN, Janet, E. , ZHANG, Jimin , ROOKEY, Dionna , BATES, Brian , LU, Zhijian , MARK, Robert , CAMPOS, Susie, J.
发明人： YAN, Gouying , XIE, Yuhong , PAULSEN, Janet, E. , ZHANG, Jimin , ROOKEY, Dionna , BATES, Brian , LU, Zhijian , MARK, Robert , CAMPOS, Susie, J.
CPC分类号： C07K14/70503 , C07K14/4713 , C07K2319/21
摘要： The present invention provides compositions and methods useful for purifying recombinant myelin-associated glycoprotein (MAG) and fragments thereof. In particular, the invention provides a one-step purification method for MAG and MAG fragments. Novel forms of human recombinant MAG protein are also disclosed in addition to methods of reliably producing and storing stable recombinant MAG proteins.
摘要翻译：本发明提供了用于纯化重组髓磷脂相关糖蛋白（MAG）及其片段的组合物和方法。特别地，本发明提供了用于MAG和MAG片段的一步纯化方法。除了稳定产生和储存稳定的重组MAG蛋白的方法外，还公开了新的人重组MAG蛋白形式。

9. 发明申请

WO2014018027A1 TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：化学机械抛光温度控制
公开(公告)号：WO2014018027A1
公开(公告)日：2014-01-30
申请号：PCT/US2012/048050
申请日：2012-07-25
申请人： APPLIED MATERIALS, INC. , XU, Kun , ZHANG, Jimin , MAI, David H. , JEW, Stephen , SHEN, Shih-Haur Walters , WANG, Zhihong , OSTERHELD, Thomas H. , TU, Wen-Chiang , LAM, Gary Ka Ho , KITAJIMA, Tomohiko
发明人： XU, Kun , ZHANG, Jimin , MAI, David H. , JEW, Stephen , SHEN, Shih-Haur Walters , WANG, Zhihong , OSTERHELD, Thomas H. , TU, Wen-Chiang , LAM, Gary Ka Ho , KITAJIMA, Tomohiko
IPC分类号： H01L21/304
CPC分类号： B24B37/015 , H01L21/3212
摘要： Methods for chemical mechanical polishing (CMP) of semiconductor substrates, and more particularly to temperature control during such chemical mechanical polishing are provided. In one aspect, the method comprises polishing the substrate with a polishing surface during a polishing process to remove a portion of the conductive material, repeatedly monitoring a temperature of the polishing surface during the polishing process, and exposing the polishing surface to a rate quench process in response to the monitored temperature so as to achieve a target value for the monitored temperature during the polishing process.
摘要翻译：提供半导体衬底的化学机械抛光（CMP）的方法，更具体地说，涉及这种化学机械抛光时的温度控制。一方面，该方法包括在抛光过程中用抛光表面抛光衬底以去除一部分导电材料，在抛光过程中重复地监测抛光表面的温度，并将抛光表面暴露于速率骤冷过程响应于所监测的温度，以便在抛光过程中达到监测温度的目标值。

10. 发明申请

WO2012030475A4 ENDPOINT CONTROL OF MULTIPLE SUBSTRATES OF VARYING THICKNESS ON THE SAME PLATEN IN CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：化学机械抛光相同板上变化厚度的多个基板的端点控制
公开(公告)号：WO2012030475A4
公开(公告)日：2012-08-16
申请号：PCT/US2011046660
申请日：2011-08-04
申请人： APPLIED MATERIALS INC , DUBOUST ALAIN , JEW STEPHEN , MAI DAVID H , TRAN HUYEN , TU WEN-CHIANG , SHEN SHIH-HAUR , ZHANG JIMIN , CARLSSON INGEMAR , SWEDEK BOGUSLAW A , WANG ZHIHONG
发明人： DUBOUST ALAIN , JEW STEPHEN , MAI DAVID H , TRAN HUYEN , TU WEN-CHIANG , SHEN SHIH-HAUR , ZHANG JIMIN , CARLSSON INGEMAR , SWEDEK BOGUSLAW A , WANG ZHIHONG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B65B1/366 , G06F17/5086 , H01L21/30625 , H01L22/12 , H01L22/20 , H01L22/26
摘要： A difference between a first expected required polish time for a first substrate and a second expected required polish time for a second substrate is determined using a first prepolish thickness and a second pre-polish thickness measured at an in-line metrology station. A duration of an initial period is determined based on the difference between the first expected required polish time and the second expected required polish time. For the initial period at a beginning of a polishing operation, no pressure is applied to whichever of the first substrate and the second substrate has a lesser expected required polish time while simultaneously pressure is applied to whichever of the first substrate and the second substrate has a greater expected required polish time. After the initial period, pressure is applied to both the first substrate and the second substrate.
摘要翻译：第一衬底的第一预期所需抛光时间与第二衬底的第二预期所需抛光时间之间的差异是使用在线计量站测量的第一预稀释厚度和第二预抛光厚度来确定的。基于第一预期所需抛光时间和第二预期所需抛光时间之间的差异来确定初始周期的持续时间。在抛光操作开始时的初始阶段，对于第一基板和第二基板中的任一个具有较少的预期需要的抛光时间，同时对第一基板和第二基板中的哪一个施加压力，则不施加压力更大的预期需要的抛光时间。在初始周期之后，对第一基板和第二基板施加压力。

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