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1. 发明申请

WO2012054263A3 MULTIPLE MATCHING REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：用于原位光学监测的多重匹配参考光谱
公开(公告)号：WO2012054263A3
公开(公告)日：2012-06-28
申请号：PCT/US2011055814
申请日：2011-10-11
申请人： APPLIED MATERIALS INC , ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
发明人： ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B49/12
摘要： A method of controlling polishing includes storing a plurality libraries, each library including a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, and for each measured spectrum of the sequence of spectra, finding a best matching first reference spectrum from a first library from the plurality of libraries and finding a best matching second reference spectrum from a different second library from the plurality of libraries, determining a first value associated with the best matching first reference spectrum and determining a second value from the best matching second reference spectrum, and calculating a third value from the first value and the second value to generate a sequence of calculated third values. At least one of a polishing endpoint or an adjustment for a polishing rate can be determined based on the sequence of calculated third values.
摘要翻译：控制抛光的方法包括存储多个库，每个库包括多个参考光谱，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，并且对于光谱序列的每个测量光谱，找到最佳匹配来自所述多个库中的第一库的第一参考谱，并且从所述多个库中的不同第二库找到最佳匹配的第二参考谱，确定与所述最佳匹配的第一参考谱相关联的第一值，以及确定第二值从最佳匹配的第二参考频谱中计算第三值，并且从第一值和第二值计算第三值以生成计算的第三值的序列。基于所计算的第三值的顺序，可以确定抛光终点或抛光速率的调整中的至少一个。

2. 发明申请

WO2012019044A3 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：将测量光谱匹配到用于现场光学监测的参考光谱的技术
公开(公告)号：WO2012019044A3
公开(公告)日：2012-05-18
申请号：PCT/US2011046646
申请日：2011-08-04
申请人： APPLIED MATERIALS INC , HU XIAOYUAN , WANG ZHIHONG , LEE HARRY Q , ZHU ZHIZE , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , ZHANG JIMIN , TU WEN-CHIANG
发明人： HU XIAOYUAN , WANG ZHIHONG , LEE HARRY Q , ZHU ZHIZE , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , ZHANG JIMIN , TU WEN-CHIANG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , B24B37/107 , B24B37/205 , B24B49/045 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考光谱。

3. 发明申请

WO2012015694A2 DETECTION OF LAYER CLEARING USING SPECTRAL MONITORING 审中-公开
标题翻译：光谱监测法检测分层
公开(公告)号：WO2012015694A2
公开(公告)日：2012-02-02
申请号：PCT/US2011045025
申请日：2011-07-22
申请人： APPLIED MATERIALS INC , ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
发明人： ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , G01B11/0633 , G01B11/0683 , H01L21/3212 , H01L22/12 , H01L22/26
摘要： A method of polishing includes polishing a substrate having a second layer overlying a first layer, measuring a sequence of groups of spectra of light from the substrate while the substrate is being polished, each group of the groups of spectra including spectra from different locations on the substrate, for each group, calculating a value for a dispersion parameter of the spectra in the group to generate a sequence of dispersion values, and detecting exposure of the first layer based on the sequence of dispersion values.
摘要翻译：一种抛光方法包括抛光具有覆盖第一层的第二层的衬底，在抛光衬底的同时测量来自衬底的光谱组的序列，每组光谱包括来自衬底上的不同位置的光谱衬底，对于每个组，计算该组中的光谱的色散参数的值以产生色散值序列，并且基于该色散值序列检测第一层的曝光。

4. 发明申请

WO2012019040A3 SPECTROGRAPHIC MONITORING USING INDEX TRACKING AFTER DETECTION OF LAYER CLEARING 审中-公开
标题翻译：在检测到分层后，使用索引跟踪进行光谱监测
公开(公告)号：WO2012019040A3
公开(公告)日：2012-05-10
申请号：PCT/US2011046642
申请日：2011-08-04
申请人： APPLIED MATERIALS INC , ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
发明人： ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/042 , B24B37/013 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, each reference spectrum of the plurality of reference spectra having a stored associated index value, polishing a substrate having a second layer overlying a first layer, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum to generate a sequence of best matching reference spectra, determining the associated index value for each best matching spectrum from the sequence of best matching reference spectra to generate a sequence of index values, detecting exposure of the first layer, fitting a function to a portion of the sequence of index values corresponding to spectra measured after detection of exposure of the first layer, and determining a polishing endpoint or an adjustment for a polishing rate based on the function.
摘要翻译：控制抛光的方法包括存储具有多个参考光谱的库，所述多个参考光谱中的每个参考光谱具有存储的相关索引值，抛光具有覆盖第一层的第二层的衬底，测量光谱序列对抛光期间来自衬底的光，针对光谱序列的每个测量光谱，找到最佳匹配参考光谱以生成最佳匹配参考光谱的序列，从最佳匹配参考序列中确定每个最佳匹配光谱的相关索引值光谱以生成一系列索引值，检测第一层的曝光，将功能拟合至与在检测到第一层的曝光之后测量的光谱相对应的索引值序列的一部分，以及确定抛光终点或基于功能的抛光速率。

5. 发明申请

WO2010062910A3 USING OPTICAL METROLOGY FOR FEED BACK AND FEED FORWARD PROCESS CONTROL 审中-公开
标题翻译：使用光学计量学反馈和前馈过程控制
公开(公告)号：WO2010062910A3
公开(公告)日：2010-08-12
申请号：PCT/US2009065772
申请日：2009-11-24
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , LEE HARRY Q , SWEDEK BOGUSLAW A , BENVEGNU DOMINIC J , ZHU ZHIZE , TU WEN-CHIANG
发明人： DAVID JEFFREY DRUE , LEE HARRY Q , SWEDEK BOGUSLAW A , BENVEGNU DOMINIC J , ZHU ZHIZE , TU WEN-CHIANG
IPC分类号： H01L21/304
CPC分类号： B24B37/013 , B24B49/12 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method includes polishing a substrate on a first platen using a first set of parameters, obtaining a plurality of measured spectra from at least two zones, comparing the plurality of measured spectra with a reference spectrum to evaluate the thickness of each of the at least two zones of the substrate, comparing a thickness of a first zone with a thickness of a second zone, determining whether the thickness of the first zone falls within a predetermined range of the thickness of the second zone, and if the thickness does not fall within the predetermined range, at least one of a) adjusting at least one parameter of the first set and polishing a second substrate on the first platen using the adjusted parameters, or b) adjusting at least one parameter of a second set and polishing the substrate on a second platen using the adjusted parameters.
摘要翻译：一种方法包括使用第一组参数对第一台板上的基板进行抛光，从至少两个区域获得多个测量的光谱，将多个测量的光谱与参考光谱进行比较以评估至少两个中的每一个的厚度比较第一区域的厚度与第二区域的厚度，确定第一区域的厚度是否落入第二区域的厚度的预定范围内，并且如果厚度不落入第二区域的厚度预定范围中的至少一个，a）调整第一组的至少一个参数并且使用调整后的参数抛光第一台板上的第二衬底，或者b）调整第二组的至少一个参数并抛光第二压板使用调整后的参数。

6. 发明申请

WO2008070736A8 DETERMINING COPPER CONCENTRATION IN SPECTRA 审中-公开
标题翻译：确定光谱中的铜浓度
公开(公告)号：WO2008070736A8
公开(公告)日：2008-08-07
申请号：PCT/US2007086535
申请日：2007-12-05
申请人： APPLIED MATERIALS INC , BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , ZHANG JIMIN , LEE HARRY Q
发明人： BENVEGNU DOMINIC J , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A , ZHANG JIMIN , LEE HARRY Q
IPC分类号： G01N21/55 , G01B11/06 , G01N21/84
CPC分类号： G01B11/0683 , G01N21/55
摘要： Methods of subtracting the contribution of anon-dielectric, e.g., copper, to spectra obtained from a substrate during chemical mechanical polishing are described A method of optically determining the amount of area on a substrate that includes a non-dielectric material by making use of a broad band reflectance spectrum of the surface and in particular to determining the concentration of metal such as copper coverage on the surface of a substrate as the substrate is polished. The method is directed to reliably determining the endpoint via the spectral interference pattern resulting from reflections from dielectric regions when adjacent regions of the substrate are covered by metal which reflects strongly over the whole wavelength range considered and which tend to mask the reflectance spectrum from the adjacent dielectric regions.
摘要翻译：在化学机械抛光期间减去非电介质（例如铜）对从衬底获得的光谱的贡献的方法描述了一种通过利用以下方法光学确定包括非介电材料的衬底上的面积的量的方法：特别是确定衬底抛光后的衬底表面上金属的浓度，例如铜的覆盖范围。该方法旨在通过由介电区域的反射产生的光谱干涉图形可靠地确定端点，当基板的相邻区域被金属覆盖时，该金属在所考虑的整个波长范围内强烈反射，并且倾向于掩盖相邻的反射光谱电介质区域。

7. 发明申请

WO2011146213A3 ENDPOINT CONTROL OF MULTIPLE SUBSTRATES WITH MULTIPLE ZONES ON THE SAME PLATEN IN CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：在化学机械抛光中在同一板上具有多个区域的多个基板的端点控制
公开(公告)号：WO2011146213A3
公开(公告)日：2012-02-23
申请号：PCT/US2011034212
申请日：2011-04-27
申请人： APPLIED MATERIALS INC , LEE HARRY Q , ZHANG JIMIN , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A
发明人： LEE HARRY Q , ZHANG JIMIN , DAVID JEFFREY DRUE , SWEDEK BOGUSLAW A
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042
摘要： A plurality of substrates are polished simultaneously on the same polishing pad. A sequence of spectra is measured from each zone of each substrate, and for each measured spectrum in the sequence of spectra for each zone of each substrate, a best matching reference spectrum is determined from a library of reference spectra. For each zone of each substrate, a linear function is fit to a sequence of index values associated with the best matching reference spectra. For at least one zone, a projected time at which the zone will reach a target index value is determined based on the linear function, and the polishing parameter for at least one zone on at least one substrate is adjusted such that the at least one zone of the at least one substrate has closer to the target index at the projected time than without such adjustment.
摘要翻译：多个基板在同一抛光垫上同时被抛光。从每个底物的每个区域测量光谱序列，并且对于每个底物的每个区域的光谱序列中的每个测量的光谱，从参考光谱库确定最佳匹配的参考光谱。对于每个衬底的每个区域，线性函数适合于与最佳匹配参考光谱相关联的索引值序列。对于至少一个区域，基于线性函数确定区域将达到目标指标值的预计时间，并且调整至少一个基底上的至少一个区域的抛光参数，使得至少一个区域的至少一个基板在投影时间比没有这种调整更接近于目标指标。

8. 发明申请

WO2011139524A3 AUTOMATIC GENERATION OF REFERENCE SPECTRA FOR OPTICAL MONITORING 审中-公开
标题翻译：用于光学监测的参考光谱自动生成
公开(公告)号：WO2011139524A3
公开(公告)日：2012-03-08
申请号：PCT/US2011032650
申请日：2011-04-15
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , LEE HARRY Q , QIAN JUN , ZHANG JIMIN
发明人： DAVID JEFFREY DRUE , LEE HARRY Q , QIAN JUN , ZHANG JIMIN
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/042 , B24B37/005 , B24B49/12 , H01L22/12 , H01L22/26
摘要： A computer-implemented method of generating reference spectra includes polishing a first substrate in a polishing apparatus having a rotatable platen, measuring a sequence of spectra from the substrate during polishing with an in-situ monitoring system, associating each spectrum in the sequence of spectra with a index value equal to a number of platen rotations at which the each spectrum was measured, and storing the sequence of spectra as reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括在具有可旋转压板的抛光设备中抛光第一衬底，在用原位监测系统抛光期间测量来自衬底的光谱序列，将光谱序列中的每个光谱与指示值等于测量每个光谱的平板旋转数，并将光谱序列存储为参考光谱。

9. 发明申请

WO2011139575A3 ENDPOINT METHOD USING PEAK LOCATION OF MODIFIED SPECTRA 审中-公开
标题翻译：使用修改光谱的峰位置的端点方法
公开(公告)号：WO2011139575A3
公开(公告)日：2012-02-23
申请号：PCT/US2011033320
申请日：2011-04-20
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , SIN GARRETT HO , LEE HARRY Q , BENVEGNU DOMINIC J
发明人： DAVID JEFFREY DRUE , SIN GARRETT HO , LEE HARRY Q , BENVEGNU DOMINIC J
IPC分类号： H01L21/304
CPC分类号： B24B37/013 , H01L22/12 , H01L22/26
摘要： A method of optically monitoring a substrate during polishing includes receiving an identification of a selected spectral feature and a characteristic of the selected spectral feature to monitor during polishing, measuring a first spectrum from the substrate during polishing, the first spectrum measured within an initial time following initiation of polishing, measuring a sequence of second spectra from the substrate during polishing, the sequence of second spectra measured after the initial time, for each second spectrum in the sequence of second spectra, removing the first spectrum from the second spectrum to generate a sequence of modified third spectra, determining a value of a characteristic of the selected spectral feature for each third spectrum in the sequence of third spectra to generate a sequence of values for the characteristic, and determining a polishing endpoint or an adjustment for a polishing rate based on the sequence of values.
摘要翻译：在抛光期间光学监测基底的方法包括接收所选择的光谱特征的标识和所选择的光谱特征的特征以在抛光期间监测，在抛光期间测量来自基底的第一光谱，在初始时间之后测量的第一光谱开始抛光，在抛光期间测量来自衬底的第二光谱序列，在初始时间之后测量的第二光谱序列，对于第二光谱序列中的每个第二光谱，从第二光谱去除第一光谱以产生序列修改的第三光谱，确定在第三光谱序列中的每个第三光谱的所选光谱特征的特征值，以产生该特征值的序列，以及基于以下步骤确定抛光终点或抛光速率的调整：值序列。

10. 发明申请

WO2010028180A3 ADJUSTING POLISHING RATES BY USING SPECTROGRAPHIC MONITORING OF A SUBSTRATE DURING PROCESSING 审中-公开
标题翻译：利用加工过程中基体的光谱监测来调整抛光速率
公开(公告)号：WO2010028180A3
公开(公告)日：2010-05-20
申请号：PCT/US2009055935
申请日：2009-09-03
申请人： APPLIED MATERIALS INC , DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , LEE HARRY Q , SWEDEK BOGUSLAW A
发明人： DAVID JEFFREY DRUE , BENVEGNU DOMINIC J , LEE HARRY Q , SWEDEK BOGUSLAW A
IPC分类号： H01L21/304
CPC分类号： B24B37/005 , B24B37/013 , B24B49/12 , H01L21/302
摘要： A computer implemented method includes receiving a sequence of current spectra of reflected light from a substrate; comparing each current spectrum from the sequence of current spectra to a plurality of reference spectra from a reference spectra library to generate a sequence of best match reference spectra; determining a goodness of fit for the sequence of best match reference spectra; and determining at least one of whether to adjust a polishing rate or an adjustment for the polishing rate, based on the goodness of fit.
摘要翻译：一种计算机实现的方法包括：接收来自衬底的反射光的当前光谱的序列; 将来自当前光谱序列的每个当前光谱与来自参考光谱库的多个参考光谱进行比较以生成最佳匹配参考光谱的序列; 确定最佳匹配参考光谱序列的拟合度; 并基于拟合度来确定是调整抛光速率还是调整抛光速率中的至少一个。

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