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1. 发明申请

WO2012084658A1 MICROWAVE POWER DELIVERY SYSTEM FOR PLASMA REACTORS 审中-公开
标题翻译：用于等离子体反应器的微波功率输送系统
公开(公告)号：WO2012084658A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072822
申请日：2011-12-14
申请人： ELEMENT SIX LIMITED , WORT, Christopher, John, Howard , BRANDON, John, Robert
发明人： WORT, Christopher, John, Howard , BRANDON, John, Robert
IPC分类号： C23C16/27 , C23C16/511 , H01J37/32 , H01P5/04 , H01P5/20
CPC分类号： H01J37/32229 , C23C16/274 , C23C16/511 , C23C16/54 , H01J37/32192 , H01J37/32256 , H01J37/32266 , H01J2237/3321 , H01P5/20 , H01P5/222
摘要： A microwave power delivery system for supplying microwave power to a plurality of microwave plasma reactors (8), the microwave power delivery system comprising: a tuner (14) configured to be coupled to a microwave source (4) and configured to match impedance of the plurality of microwave plasma reactors to that of the microwave source; and a waveguide junction (18) coupled to the tuner and configured to guide microwaves to and from the plurality of microwave plasma reactors, wherein the waveguide junction comprises four waveguide ports including a first port coupled to the tuner, second and third ports configured to be coupled to respective microwave plasma reactors, and a fourth port coupled to a microwave sink (20), wherein the waveguide junction is configured to evenly split microwave power input from the tuner through the first port between the second and third ports for providing microwave power to respective microwave plasma reactors, wherein the waveguide junction is configured to decouple the second and third ports thereby preventing any reflected microwaves from one of the microwave plasma reactors from feeding across the waveguide junction directly into another microwave plasma reactor causing an imbalance, wherein the waveguide junction is further configured to feed reflected microwaves received back through the second and third ports which are balanced in terms of magnitude and phase to the tuner such that they can be reflected by the tuner and re-used, and wherein the waveguide junction is further configured to feed excess reflected power which is not balanced through the fourth port into the microwave sink.
摘要翻译：一种用于向多个微波等离子体反应器（8）提供微波功率的微波功率输送系统，所述微波功率输送系统包括：调谐器（14），其被配置为耦合到微波源（4）并且被配置为使所述微波功率输出系统多个微波等离子体反应器; 以及波导结（18），其耦合到所述调谐器并且被配置为向所述多个微波等离子体反应器引导微波，其中所述波导结包括四个波导端口，所述波导端口包括耦合到所述调谐器的第一端口，所述第二端口和所述第三端口被配置为耦合到相应的微波等离子体反应器，以及耦合到微波吸收器（20）的第四端口，其中所述波导结被配置为将从所述调谐器输入的微波功率均匀地分开通过所述第二和第三端口之间的第一端口，以提供微波功率各个微波等离子体反应器，其中波导结被配置为使第二和第三端口去耦，从而防止来自微波等离子体反应器之一的任何反射的微波直接穿过波导结直接进入另一个引起不平衡的微波等离子体反应器，其中波导结进一步构造成供给反向收回的反射的微波 gh第二和第三端口，其在幅度和相位方面与调谐器平衡，使得它们可以被调谐器反射并重新使用，并且其中波导结还被配置为馈送不平衡的多余的反射功率第四口进入微波槽。

2. 发明申请

WO2008090512A1 ELECTRONIC FIELD EFFECT DEVICES AND METHODS FOR THEIR MANUFACTURE 审中-公开
标题翻译：电子效应器件及其制造方法
公开(公告)号：WO2008090512A1
公开(公告)日：2008-07-31
申请号：PCT/IB2008/050216
申请日：2008-01-22
申请人： ELEMENT SIX LIMITED , DONALD, Heather June , WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan , FRIEL, Ian , BALMER, Richard Stuart
发明人： WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan , FRIEL, Ian , BALMER, Richard Stuart
IPC分类号： H01L29/812 , C30B25/20 , C30B29/04 , C23C14/02 , C23C16/27 , H01L21/04 , H01L29/16 , C23C14/58
CPC分类号： C01B32/28 , C23C16/27 , C23C16/274 , C23C16/278 , C30B25/105 , C30B25/20 , C30B29/04 , G01N21/87 , G01N21/95 , G01N27/308 , G01N2201/0636 , H01J37/321 , H01J2237/08 , H01J2237/3341 , H01L21/02104 , H01L21/02376 , H01L21/02527 , H01L21/02579 , H01L21/0262 , H01L21/02634 , H01L21/041 , H01L29/045 , H01L29/1602 , H01L29/167 , H01L29/36 , Y10T428/24355
摘要： Electronic field effect devices, and methods of manufacture of these electronic field effect devices are disclosed. In particular, there is disclosed an electronic field effect device which has improved electrical properties due to the formation of a highly mobile two-dimensional charge-carrier gas in a simple structure formed from diamond in combination with polar materials.
摘要翻译：公开了电子场效应装置及这些电子场效应装置的制造方法。特别地，公开了一种电子场效应器件，其由于由金刚石与极性材料组合形成的简单结构中形成高度移动的二维电荷载体气体而具有改善的电性能。

3. 发明申请

WO2007007126A1 SINGLE CRYSTAL DIAMOND ELEMENTS HAVING CONVEX SURFACES AND METHODS OF ITS FABRICATION 审中-公开
标题翻译：具有凸面的单晶钻石元素及其制造方法
公开(公告)号：WO2007007126A1
公开(公告)日：2007-01-18
申请号：PCT/GB2006/050195
申请日：2006-07-07
申请人： ELEMENT SIX LIMITED , NELISSEN, Wilhelmus Gerarda Maria , GODFRIED, Herman Philip , HOUWMAN, Evert Pieter , KRIELE, Paulus Adrianus Cornelis , LAMERS, Johannes Cornelis , PELS, Gerrit Jan , OERLE, Bartholomeus Mathias Van , SPAAY, Paulus Gerardus Hendricus Maria , MCCLYMONT, Mark Robin , WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan
发明人： NELISSEN, Wilhelmus Gerarda Maria , GODFRIED, Herman Philip , HOUWMAN, Evert Pieter , KRIELE, Paulus Adrianus Cornelis , LAMERS, Johannes Cornelis , PELS, Gerrit Jan , OERLE, Bartholomeus Mathias Van , SPAAY, Paulus Gerardus Hendricus Maria , MCCLYMONT, Mark Robin , WORT, Christopher John Howard , SCARSBROOK, Geoffrey Alan
IPC分类号： G02B1/02
CPC分类号： G02B1/02 , B23K26/0006 , B23K26/0075 , B23K26/361 , B23K26/40 , B23K2203/50 , G02B3/00 , Y10T428/24355 , Y10T428/24479 , Y10T428/24612 , Y10T428/24628
摘要： A single crystal diamond element having a convex surface is disclosed, the convex surface including a spherical segment for which the maximum peak to valley deviation from a perfect spherical surface is less than about 5 µm. Alternatively or in addition, the RMS deviation from a perfect spherical surface may be less than about 500 nm, or the RMS roughness less than about 30 nm. A single crystal diamond element with a radius of curvature less than about 20 mm is also disclosed. In one aspect a single crystal diamond element having a conical half-angle greater than about 10° is described. The invention also provides a method for forming a rotationally symmetrical surface on a single crystal diamond element, comprising rotating the element about a first axis, applying a laser beam to the element in a direction perpendicular to the first axis, and translating the laser beam in two dimensions in a plane perpendicular to the direction of the beam. If the two-dimensional path follows the arc of a circle a spherical surface may be formed. The invention also provides improving a spherical surface on a single crystal diamond element by pressing a rapidly rotating cup onto a slowly rotating element. The element may be a lens, in particular a solid immersion lens.
摘要翻译：公开了具有凸面的单晶金刚石元件，该凸面包括与完美球面的最大峰谷偏差小于约5μm的球形段。或者或另外，与完美球形表面的RMS偏差可以小于约500nm，或RMS粗糙度小于约30nm。还公开了具有小于约20mm的曲率半径的单晶金刚石元件。在一个方面，描述了具有大于约10°的锥形半角的单晶金刚石元件。本发明还提供了一种用于在单晶金刚石元件上形成旋转对称表面的方法，包括围绕第一轴线旋转元件，在垂直于第一轴线的方向上向元件施加激光束，并将激光束在垂直于光束方向的平面内的两个尺寸。如果二维路径遵循圆弧，则可以形成球形表面。本发明还通过将快速旋转的杯按压到缓慢旋转的元件上来改善单晶金刚石元件上的球形表面。元件可以是透镜，特别是固体浸没透镜。

4. 发明申请

WO2003016240A3 COMPONENTS WITH BEARING OR WEAR-RESISTANT SURFACES 审中-公开
公开(公告)号：WO2003016240A3
公开(公告)日：2003-02-27
申请号：PCT/IB2002/003000
申请日：2002-08-02
申请人： ELEMENT SIX LIMITED , GILSON, David, Grant , MCCLYMONT Mark, Robin , WORT, Christopher, John, Howard
发明人： MCCLYMONT Mark, Robin , WORT, Christopher, John, Howard
IPC分类号： C04B41/87
摘要： A component comprises a silicon carbide substrate (10), a layer (14) of CVD diamond on a surface (12) of the substrate, and a smooth surface (14a) on the CVD diamond layer (14) which is a non-planar bearing or wear-resistant surface for the component.

5. 发明申请

WO2012084661A1 A MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL 审中-公开
标题翻译：用于制造合成金刚石材料的微波等离子体反应器
公开(公告)号：WO2012084661A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072825
申请日：2011-12-14
申请人： ELEMENT SIX LIMITED , COE, Steven Edward , WILMAN, Jonathan James , TWITCHEN, Daniel James , SCARSBROOK, Geoffrey Alan , BRANDON, John Robert , WORT, Christopher John Howard
发明人： COE, Steven Edward , WILMAN, Jonathan James , TWITCHEN, Daniel James , SCARSBROOK, Geoffrey Alan , BRANDON, John Robert , WORT, Christopher John Howard
IPC分类号： H01J37/32 , C30B29/04
CPC分类号： C23C16/45563 , C23C16/274 , C23C16/45504 , C23C16/45565 , C23C16/511 , C30B25/105 , C30B29/04 , H01J37/32192 , H01J37/32238 , H01J37/3244 , H01J37/32449
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber; a substrate holder disposed in the plasma chamber for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; wherein the gas flow system comprises a gas inlet nozzle array comprising a plurality of gas inlet nozzles disposed opposite the substrate holder for directing process gases towards the substrate holder, the gas inlet nozzle array comprising: at least six gas inlet nozzles disposed in a substantially parallel or divergent orientation relative to a central axis of the plasma chamber; a gas inlet nozzle number density equal to or greater than 0.1 nozzles/cm 2 , wherein the gas inlet nozzle number density is measured by projecting the nozzles onto a plane whose normal lies parallel to the central axis of the plasma chamber and measuring the gas inlet number density on said plane;and a nozzle area ratio of equal to or greater than 10, whereinthe nozzle area ratio is measured by projecting the nozzles onto a plane whose normal lies parallel to the central axis of the plasma chamber, measuring the total area of the gas inlet nozzle area on said plane, dividing by the total number of nozzles to give an area associated with each nozzle, and dividing the area associated with each nozzle by an actual area of each nozzle.
摘要翻译：一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室; 设置在等离子体室中的衬底保持器，用于支撑在使用中沉积合成金刚石材料的衬底; 用于将微波从微波发生器馈入等离子体室的微波耦合配置; 以及用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 其中所述气体流动系统包括气体入口喷嘴阵列，所述气体入口喷嘴阵列包括与所述衬底保持器相对设置的多个气体入口喷嘴，用于将工艺气体引向所述衬底保持器，所述气体入口喷嘴阵列包括：至少六个气体入口喷嘴，或相对于等离子体室的中心轴线的发散取向; 气体入口喷嘴数密度等于或大于0.1喷嘴/ cm2，其中气体入口喷嘴数密度通过将喷嘴投影到平行于等离子体室的中心轴线的平面上并测量气体入口数所述平面上的密度;以及等于或大于10的喷嘴面积比，其中喷嘴面积比通过将喷嘴投射到平行于等离子体室的中心轴线的平面上测量，测量总面积在所述平面上的气体入口喷嘴面积除以总喷嘴数量以给出与每个喷嘴相关联的区域，并且将与每个喷嘴相关联的区域除以每个喷嘴的实际面积。

6. 发明申请

WO2012084655A3 MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANUFACTURE 审中-公开
公开(公告)号：WO2012084655A3
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072818
申请日：2011-12-14
申请人： ELEMENT SIX LIMITED , DODGE, Carlton Nigel , INGLIS, Paul Nicolas , SCARSBROOK, Geoffrey Alan , MOLLART, Timothy Peter , PICKLES, Charles Simon James , COE, Steven Edward , DODSON, Joseph Michael , CULLEN, Alexander Lamb , BRANDON, John Robert , WORT, Christopher John Howard
发明人： DODGE, Carlton Nigel , INGLIS, Paul Nicolas , SCARSBROOK, Geoffrey Alan , MOLLART, Timothy Peter , PICKLES, Charles Simon James , COE, Steven Edward , DODSON, Joseph Michael , CULLEN, Alexander Lamb , BRANDON, John Robert , WORT, Christopher John Howard
IPC分类号： H01J37/32 , C23C16/27
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode between the base and the top plate; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate; and a substrate disposed on the supporting surface,the substrate having a growth surface on which the synthetic diamond material is to be deposited in use, wherein the substrate dimensions and location within the resonance cavity are selected to generate a localized axisymmetric E z electric field profile across the growth surface in use, the localized axisymmetric E z electric field profile comprising a substantially flat central portion bound by a ring of higher electric field, the substantially flat central portion extending over at least 60% of an area of the growth surface of the substrate and having an E z electric field variation of no more than ±10% of a central E z electric field strength, the ring of higher electric field being disposed around the central portion and having a peak E z electric field strength in a range 10% to 50% higher than the central E z electric field strength.

7. 发明申请

WO2008056336A1 DIAMOND ELECTRODE 审中-公开
标题翻译：钻石电极
公开(公告)号：WO2008056336A1
公开(公告)日：2008-05-15
申请号：PCT/IB2007/054561
申请日：2007-11-09
申请人： ELEMENT SIX LIMITED , MCKNIGHT, John, Crawford , WHITEHEAD, Andrew, John , WORT, Christopher, John, Howard , SCARSBROOK, Geoffrey, Alan , YOST III, William, Joseph
发明人： WHITEHEAD, Andrew, John , WORT, Christopher, John, Howard , SCARSBROOK, Geoffrey, Alan , YOST III, William, Joseph
IPC分类号： C02F1/461 , C02F1/467 , C25B1/13
CPC分类号： C02F1/46109 , C02F1/4672 , C02F2001/46133 , C02F2001/46142 , C02F2001/46157 , C25B1/13 , C25B11/03 , C25B11/12
摘要： An electrode comprising an electrically conducting diamond plate (4) wherein the diamond plate (4) comprises at least one elongate aperture (2) and having an aperture edge length per unit working area of the diamond plate of greater than about 4 mm/mm2. Electrolysis cells comprising such electrodes, method of treating water using such electrolysis cells and a method of production of ozone are also disclosed.
摘要翻译：一种包括导电金刚石板（4）的电极，其中所述金刚石板（4）包括至少一个细长孔（2），并且所述金刚石板的每单位工作区域的孔边长度大于约4mm / mm 2。还公开了包含这种电极的电解槽，使用这种电解槽的水处理方法和臭氧的制造方法。

8. 发明申请

WO2006075238A3 COATED SPEAKER DOME 审中-公开
标题翻译：涂层扬声器
公开(公告)号：WO2006075238A3
公开(公告)日：2006-09-28
申请号：PCT/IB2006000049
申请日：2006-01-12
申请人： ELEMENT SIX LTD , KEMP MARK , PERKINS NEIL , PICKLES CHARLES SIMON JAMES , WORT CHRISTOPHER JOHN HOWARD , SCARSBROOK GEOFFREY ALAN
发明人： PERKINS NEIL , PICKLES CHARLES SIMON JAMES , WORT CHRISTOPHER JOHN HOWARD , SCARSBROOK GEOFFREY ALAN
IPC分类号： H04R7/12
CPC分类号： H04R7/127 , Y10T428/12431
摘要： A rigid three-dimensional component such as a speaker dome is formed of diamond, preferably fabricated to net shape by CVD diamond synthesis, and includes a coating on one or more major surfaces thereof. The coating is designed to enhance the performance and/or to alter the appearance of the component. In particular, the coating is designed to act as a damping medium and/or provide aesthetic qualities to the component.
摘要翻译：诸如扬声器圆顶的刚性三维部件由金刚石形成，优选通过CVD金刚石合成制成网状，并且在其一个或多个主表面上包括涂层。该涂层被设计成增强部件的性能和/或改变部件的外观。特别地，涂层被设计成用作阻尼介质和/或提供元件的美学品质。

9. 发明申请

WO2005010245A1 METHOD OF MANUFACTURING DIAMOND SUBSTRATES 审中-公开
标题翻译：制造金刚石基板的方法
公开(公告)号：WO2005010245A1
公开(公告)日：2005-02-03
申请号：PCT/IB2004/002391
申请日：2004-07-26
申请人： ELEMENT SIX LIMITED , KEMP, Mark , WORT, Christopher, John, Howard , TWITCHEN, Daniel, James , SCARSBROOK, Geoffrey, Alan
发明人： WORT, Christopher, John, Howard , TWITCHEN, Daniel, James , SCARSBROOK, Geoffrey, Alan
IPC分类号： C30B33/00
CPC分类号： C30B33/06 , C30B29/04 , C30B33/00
摘要： A tiled array of diamond plates, which is suitable for wafer scale processing, for example, in the manufacture of electronic or other device structures on the diamond plates. The diamond plates are fixed to a support layer, preferably a polycrystalline diamond support layer, in a substantially planar arrangement such that at least one of the major surfaces of the respective fixed diamond plates defines a fabrication surface that is exposed for further processing. The support layer may be a backing layer, in which case only one of the major faces of the diamond substrate is exposed for further processing, or may extend between respective diamond substrates such that both major surfaces are exposed for further processing.
摘要翻译：金刚石板的平铺阵列，其适用于晶片尺寸加工，例如在金刚石板上制造电子或其它器件结构。金刚石板以基本上平面的布置固定到支撑层，优选多晶金刚石支撑层，使得相应固定金刚石板的至少一个主表面限定暴露以进一步处理的制造表面。支撑层可以是背衬层，在这种情况下，金刚石衬底的仅仅一个主面被暴露以进一步处理，或者可以在相应的金刚石衬底之间延伸，使得两个主表面被暴露以用于进一步处理。

10. 发明申请

WO2004034466A2 HEAT SPREADER 审中-公开
标题翻译：散热器
公开(公告)号：WO2004034466A2
公开(公告)日：2004-04-22
申请号：PCT/IB2003/004420
申请日：2003-10-08
申请人： ELEMENT SIX LIMITED , KEMP, Mark , WORT, Christopher, John, Howard , PICKLES, Charles, Simon, James
发明人： WORT, Christopher, John, Howard , PICKLES, Charles, Simon, James
IPC分类号： H01L23/373
CPC分类号： H01L23/3732 , C23C16/00 , H01L2924/0002 , H01L2924/3011 , Y10T428/30 , H01L2924/00
摘要： A heat spreader for an electronic device has a layer of CVD diamond, which is continuous and without uncontrolled pits or holes, grown onto a diamond loaded material. The diamond loaded material comprises a mass of diamond particles in a matrix and has a surface with exposed diamond particles on which the layer of CVD diamond is grown. The layer of CVD diamond is bonded to the exposed diamond particles of the diamond loaded material at least in part by epitaxy.
摘要翻译：用于电子器件的散热器具有一层CVD金刚石，该CVD金刚石是连续的，并且没有不受控制的凹坑或孔，生长在钻石加载材料上。钻石加载材料包括基体中的大量钻石颗粒，并且具有暴露的金刚石颗粒的表面，CVD金刚石层在所述表面上生长。 CVD金刚石层至少部分地通过外延键合到钻石加载材料的暴露的金刚石颗粒上。

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