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1. 发明申请

WO2015044680A1 AN INSTRUMENT FOR POSITIONING A CUP COMPONENT OF AN ORTHOPAEDIC JOINT PROSTHESIS 审中-公开
标题翻译：用于定位正交联合检测的杯子组件的仪器
公开(公告)号：WO2015044680A1
公开(公告)日：2015-04-02
申请号：PCT/GB2014/052928
申请日：2014-09-29
申请人： DEPUY (IRELAND) , BAILEY, Andrew
发明人： BAILEY, Andrew
IPC分类号： A61F2/46 , A61F2/34
CPC分类号： A61F2/4609 , A61F2/34 , A61F2002/30484 , A61F2002/30579 , A61F2002/4623 , A61F2002/4627 , A61F2002/4628
摘要： An instrument (102) for positioning a cup component (104) of an orthopaedic joint prosthesis is described. The instrument includes an actuator (124) and a plurality of jaw members (152, 154, 156, 158) around a longitudinal axis. Each jaw member includes a mounting end (162), a gripping end (166) and a surface (174) between them. The gripping end has a transversely extending member (168) which can be received in a recess in a wall of a cup component and can displaced between a retracted position and a deployed position. The surface is inclined to the longitudinal axis of the instrument and curved in an outward direction away from the longitudinal axis. The actuator and the plurality of jaw members are capable of relative movement along the longitudinal axis of the instrument with the actuator in contact with the inclined surfaces of the jaw members so that said relative movement causes the jaw members to move between their retracted position and deployed position.
摘要翻译：描述了用于定位整形外科关节假体的杯部件（104）的器械（102）。仪器包括致动器（124）和围绕纵向轴线的多个钳口构件（152,154,156,158）。每个钳口构件包括安装端（162），夹持端（166）和它们之间的表面（174）。夹持端具有横向延伸构件（168），该构件可以容纳在杯部件的壁中的凹部中并且能够在缩回位置和展开位置之间移动。该表面相对于仪器的纵向轴线倾斜，并且沿远离纵轴的向外的方向弯曲。致动器和多个钳口构件能够沿着仪器的纵向轴线相对运动，致动器与钳口构件的倾斜表面接触，使得所述相对运动使得钳口构件在其缩回位置和部署之间移动位置。

2. 发明申请

WO2013012591A1 NEGATIVE ION CONTROL FOR DIELECTRIC ETCH 审中-公开
标题翻译：用于电介质蚀刻的负离子控制
公开(公告)号：WO2013012591A1
公开(公告)日：2013-01-24
申请号：PCT/US2012/045974
申请日：2012-07-09
申请人： LAM RESEARCH CORPORATION , MARAKHTANOV, Alexei , ABATCHEV, Mirzafer, K. , DHINDSA, Rajinder , HUDSON, Eric , BAILEY, Andrew, D.
发明人： MARAKHTANOV, Alexei , ABATCHEV, Mirzafer, K. , DHINDSA, Rajinder , HUDSON, Eric , BAILEY, Andrew, D.
IPC分类号： H05H1/46
CPC分类号： H01L21/67069 , C23C14/345 , C23C16/505 , H01J37/32091 , H01J37/32137 , H01J2237/334 , H01J2237/3343 , H01J2237/3348 , H01L21/3065 , H01L21/31116 , H01L22/20 , H05H2001/4675
摘要： Apparatus, methods, and computer programs for semiconductor processing in a capacitively-coupled plasma chamber are provided. A chamber includes a bottom radio frequency (RF) signal generator, a top RF signal generator, and an RF phase controller. The bottom RF signal generator is coupled to the bottom electrode in the chamber, and the top RF signal generator is coupled to the top electrode. Further, the bottom RF signal is set at a first phase, and the top RF signal is set at a second phase. The RF phase controller is operable to receive the bottom RF signal and operable to set the value of the second phase. Additionally, the RF phase controller is operable to track the first phase and the second phase to maintain a time difference between the maximum of the top RF signal and the minimum of the bottom RF signal at approximately a predetermined constant value, resulting in an increase of the negative ion flux to the surface of the wafer.
摘要翻译：提供了在电容耦合等离子体室中用于半导体处理的装置，方法和计算机程序。腔室包括底部射频（RF）信号发生器，顶部RF信号发生器和RF相位控制器。底部RF信号发生器耦合到室中的底部电极，并且顶部RF信号发生器耦合到顶部电极。此外，底部RF信号被设置在第一相位，并且顶部RF信号被设置在第二阶段。 RF相位控制器可操作以接收底部RF信号并且可操作以设置第二相位的值。另外，RF相位控制器可操作以跟踪第一相位和第二相位，以保持最大RF信号的最大值与底部RF信号的最小值之间的时间差大约为预定的恒定值，导致增加到晶片表面的负离子通量。

3. 发明申请

WO2012018449A2 DUAL PLASMA VOLUME PROCESSING APPARATUS FOR NEUTRAL/ION FLUX CONTROL 审中-公开
标题翻译：用于中性/离子流量控制的双等离子体处理装置
公开(公告)号：WO2012018449A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/041524
申请日：2011-06-22
申请人： LAM RESEARCH CORPORATION , DHINDSA, Rajinder , MARAKHATNOV, Alexei , BAILEY, Andrew, D. III
发明人： DHINDSA, Rajinder , MARAKHATNOV, Alexei , BAILEY, Andrew, D. III
IPC分类号： H01L21/205
CPC分类号： H01J37/32449 , H01J37/32091 , H01J37/32697 , H01J37/32715 , H01J37/32834 , H01L21/67069 , H01L21/67259 , H01L21/6831 , H01L22/26
摘要： A semiconductor wafer processing apparatus includes a first electrode exposed to a first plasma generation volume, a second electrode exposed to a second plasma generation volume, and a gas distribution unit disposed between the first and second plasma generation volumes. The first electrode is defined to transmit radio frequency (RF) power to the first plasma generation volume, and distribute a first plasma process gas to the first plasma generation volume. The second electrode is defined to transmit RF power to the second plasma generation volume, and hold a substrate in exposure to the second plasma generation volume. The gas distribution unit includes an arrangement of through-holes defined to fluidly connect the first plasma generation volume to the second plasma generation volume. The gas distribution unit also includes an arrangement of gas supply ports defined to distribute a second plasma process gas to the second plasma generation volume.
摘要翻译：半导体晶片处理设备包括暴露于第一等离子体产生体积的第一电极，暴露于第二等离子体产生体积的第二电极以及布置在第一和第二等离子体产生体积之间的气体分配单元。第一电极被定义为将射频（RF）功率发射到第一等离子体产生体积，并且将第一等离子体过程气体分配到第一等离子体产生体积。第二电极被限定为将RF功率传输到第二等离子体产生体积，并且保持衬底暴露于第二等离子体产生体积。气体分配单元包括被限定为将第一等离子体生成体积流体连接到第二等离子体生成体积的通孔的布置。气体分配单元还包括气体供应端口的布置，其被限定为将第二等离子体处理气体分配到第二等离子体生成体积。

4. 发明申请

WO2012018448A2 PLASMA PROCESSING CHAMBER WITH DUAL AXIAL GAS INJECTION AND EXHAUST 审中-公开
标题翻译：具有双轴向气体注射和排气的等离子体加工室
公开(公告)号：WO2012018448A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/041522
申请日：2011-06-22
申请人： LAM RESEARCH CORPORATION , DHINDSA, Rajinder , MARAKHATNOV, Alexei , BAILEY, Andrew, D. III
发明人： DHINDSA, Rajinder , MARAKHATNOV, Alexei , BAILEY, Andrew, D. III
IPC分类号： H01L21/205 , H01L21/3065
CPC分类号： H01L21/3065 , C23C16/4412 , C23C16/45565 , C23C16/45574 , C23C16/45576 , C23C16/50 , H01J37/32091 , H01J37/32449 , H01J37/32834 , H01L21/31
摘要： An electrode is exposed to a plasma generation volume and is defined to transmit radiofrequency power to the plasma generation volume, and includes an upper surface for holding a substrate in exposure to the plasma generation volume. A gas distribution unit is disposed above the plasma generation volume and in a substantially parallel orientation to the electrode. The gas distribution unit includes an arrangement of gas supply ports for directing an input flow of a plasma process gas into the plasma generation volume in a direction substantially perpendicular to the upper surface of the electrode. The gas distribution unit also includes an arrangement of through-holes that each extend through the gas distribution unit to fluidly connect the plasma generation volume to an exhaust region. Each of the through-holes directs an exhaust flow from the plasma generation volume in a direction substantially perpendicular to the upper surface of the electrode.
摘要翻译：电极暴露于等离子体产生体积，并且被定义为将射频功率传递到等离子体产生体积，并且包括用于保持衬底暴露于等离子体产生体积的上表面。气体分布单元设置在等离子体产生体积之上并且基本上平行于电极的取向。气体分配单元包括用于将等离子体处理气体的输入流在基本上垂直于电极的上表面的方向引导到等离子体产生体积中的气体供给端口的布置。气体分配单元还包括通孔的布置，其各自延伸穿过气体分配单元以将等离子体产生体积流体连接到排气区域。每个通孔在基本上垂直于电极的上表面的方向上引导来自等离子体产生体积的排气流。

5. 发明申请

WO2011026127A3 A LOCAL PLASMA CONFINEMENT AND PRESSURE CONTROL ARRANGEMENT AND METHODS THEREOF 审中-公开
标题翻译：本地等离子体制约和压力控制装置及其方法
公开(公告)号：WO2011026127A3
公开(公告)日：2011-06-03
申请号：PCT/US2010047376
申请日：2010-08-31
申请人： LAM RES CORP , DHINDSA RAJINDER , KELLOG MIKE , KADKODYAN BABAK , BAILEY ANDREW
发明人： DHINDSA RAJINDER , KELLOG MIKE , KADKODYAN BABAK , BAILEY ANDREW
IPC分类号： H05H1/46 , C23C16/50 , H01L21/3065
CPC分类号： H01J37/32642 , H01J37/32623
摘要： An arrangement for performing pressure control within a processing chamber substrate processing is provided. The arrangement includes a peripheral ring configured at least for surrounding a confined chamber volume that is configured for sustaining a plasma for etching the substrate during substrate processing. The peripheral ring includes a plurality of slots that is configured at least for exhausting processed byproduct gas from the confined chamber volume during substrate processing. The arrangement also includes a conductive control ring that is positioned next to the peripheral ring and is configured to include plurality of slots. The pressure control is achieved by moving the conductive control ring relative to the peripheral ring such that a first slot on the peripheral ring and a second slot on the conductive control ring are offset with respect to one another in a range of zero offset to full offset.
摘要翻译：提供了一种用于在处理室衬底处理中执行压力控制的装置。该装置包括至少围绕限制室容积配置的外围环，该限定室容积被配置为在衬底处理期间维持用于刻蚀衬底的等离子体。周边环包括多个狭槽，其被构造成至少在衬底处理期间从受限腔体积中排出经处理的副产物气体。该布置还包括导电控制环，该导电控制环位于外围环旁边并且被配置为包括多个狭槽。通过相对于外围环移动导电控制环来实现压力控制，使得外围环上的第一槽和导电控制环上的第二槽相对于彼此在零偏移到全偏移的范围内彼此偏移。

6. 发明申请

WO2010117969A3 MODULATED MULTI-FREQUENCY PROCESSING METHOD 审中-公开
标题翻译：调制多频处理方法
公开(公告)号：WO2010117969A3
公开(公告)日：2011-01-13
申请号：PCT/US2010030019
申请日：2010-04-06
申请人： LAM RES CORP , MARAKHTANOV ALEXEI , HUDSON ERIC , DHINDSA RAJINDER , BAILEY ANDREW
发明人： MARAKHTANOV ALEXEI , HUDSON ERIC , DHINDSA RAJINDER , BAILEY ANDREW
IPC分类号： H01L21/3065 , H05H1/24 , H05H1/36
CPC分类号： H01L21/3065 , H01J37/32009 , H01J37/32137 , H01J37/32146 , H01J2237/334 , H01J2237/3348
摘要： A method is provided for operating a processing system having a space therein arranged to receive a gas and an electromagnetic field generating portion operable to generate an electromagnetic field within the space. The method includes providing a gas into the space, and operating the electromagnetic field generating portion with a driving potential to generate an electromagnetic field within the space to transform at least a portion of the gas into plasma. The driving potential as a function of time is based on a first potential function portion and a second potential function portion. The first potential function portion comprises a first continuous periodic portion having a first amplitude and a first frequency. The second potential function portion comprises a second periodic portion having an maximum amplitude portion, and minimum amplitude portion and a duty cycle. The maximum amplitude portion is a higher amplitude than the minimum amplitude portion. The duty cycle is the ratio of a duration of the maximum amplitude portion to the sum of the duration of the maximum amplitude portion and the duration of the minimum amplitude portion. The second periodic portion additionally has a second frequency during the maximum amplitude portion. An amplitude modulation of the second periodic portion is phase locked to the first continuous periodic portion.
摘要翻译：提供了一种操作处理系统的方法，该处理系统具有布置成接收气体的空间和可操作以在该空间内产生电磁场的电磁场产生部分。所述方法包括向所述空间提供气体，以及利用驱动电位操作所述电磁场产生部分，以在所述空间内产生电磁场，以将所述气体的至少一部分转化为等离子体。作为时间的函数的驱动电位基于第一潜在功能部分和第二电位功能部分。第一潜在功能部分包括具有第一幅度和第一频率的第一连续周期部分。第二电位功能部分包括具有最大振幅部分和最小振幅部分和占空比的第二周期部分。最大幅度部分比最小振幅部分的幅度更大。占空比是最大幅度部分的持续时间与最大振幅部分的持续时间和最小振幅部分的持续时间之和的比率。第二周期部分在最大振幅部分期间另外具有第二频率。第二周期部分的幅度调制被锁相到第一连续周期部分。

7. 发明申请

WO2010117969A2 MODULATED MULTI-FREQUENCY PROCESSING METHOD 审中-公开
标题翻译：调制多频处理方法
公开(公告)号：WO2010117969A2
公开(公告)日：2010-10-14
申请号：PCT/US2010/030019
申请日：2010-04-06
申请人： LAM RESEARCH CORPORATION , MARAKHTANOV, Alexei , HUDSON, Eric , DHINDSA, Rajinder , BAILEY, Andrew
发明人： MARAKHTANOV, Alexei , HUDSON, Eric , DHINDSA, Rajinder , BAILEY, Andrew
IPC分类号： H01L21/3065 , H05H1/24 , H05H1/36
CPC分类号： H01L21/3065 , H01J37/32009 , H01J37/32137 , H01J37/32146 , H01J2237/334 , H01J2237/3348
摘要： A method is provided for operating a processing system having a space therein arranged to receive a gas and an electromagnetic field generating portion operable to generate an electromagnetic field within the space. The method includes providing a gas into the space, and operating the electromagnetic field generating portion with a driving potential to generate an electromagnetic field within the space to transform at least a portion of the gas into plasma. The driving potential as a function of time is based on a first potential function portion and a second potential function portion. The first potential function portion comprises a first continuous periodic portion having a first amplitude and a first frequency. The second potential function portion comprises a second periodic portion having an maximum amplitude portion, and minimum amplitude portion and a duty cycle. The maximum amplitude portion is a higher amplitude than the minimum amplitude portion. The duty cycle is the ratio of a duration of the maximum amplitude portion to the sum of the duration of the maximum amplitude portion and the duration of the minimum amplitude portion. The second periodic portion additionally has a second frequency during the maximum amplitude portion. An amplitude modulation of the second periodic portion is phase locked to the first continuous periodic portion.
摘要翻译：提供了一种操作处理系统的方法，该处理系统具有布置成接收气体的空间和可操作以在该空间内产生电磁场的电磁场产生部分。所述方法包括向所述空间提供气体，以及利用驱动电位操作所述电磁场产生部分，以在所述空间内产生电磁场，以将所述气体的至少一部分转化为等离子体。作为时间的函数的驱动电位基于第一潜在功能部分和第二电位功能部分。第一潜在功能部分包括具有第一幅度和第一频率的第一连续周期部分。第二电位功能部分包括具有最大振幅部分和最小振幅部分和占空比的第二周期部分。最大幅度部分比最小振幅部分的幅度更大。占空比是最大幅度部分的持续时间与最大振幅部分的持续时间和最小振幅部分的持续时间之和的比率。第二周期部分在最大振幅部分期间另外具有第二频率。第二周期部分的幅度调制被锁相到第一连续周期部分。

8. 发明申请

WO2009098448A8 COMPOUNDS 审中-公开
标题翻译：化合物
公开(公告)号：WO2009098448A8
公开(公告)日：2010-08-26
申请号：PCT/GB2009000298
申请日：2009-02-04
申请人： ASTRAZENECA AB , PULMAGEN THERAPEUTICS SYNERGY , ALCARAZ LILIAN , BAILEY ANDREW , BULL RICHARD JAMES , JOHNSON TIMOTHY , KINDON NICHOLAS DAVID , LISTER ANDREW STUART , ROBBINS ANDREW JAMES , STOCKS MICHAEL JOHN , TEOBALD BARRY JOHN
发明人： ALCARAZ LILIAN , BAILEY ANDREW , BULL RICHARD JAMES , JOHNSON TIMOTHY , KINDON NICHOLAS DAVID , LISTER ANDREW STUART , ROBBINS ANDREW JAMES , STOCKS MICHAEL JOHN , TEOBALD BARRY JOHN
IPC分类号： C07D498/10 , A61K31/357 , A61P11/06 , A61P11/08
CPC分类号： C07D498/10
摘要： Diazaspiro [5.5] undecane derivatives and related compounds as muscarinic-receptor antagonists and beta-adrenoceptor agonists for the treatment of pulmonary disorders.
摘要翻译：二氮杂螺[5.5]十一烷衍生物和相关化合物作为毒蕈碱受体拮抗剂和β-肾上腺素受体激动剂治疗肺功能障碍。

9. 发明申请

WO2009137279A3 DYNAMIC ALIGNMENT OF WAFERS USING COMPENSATION VALUES OBTAINED THROUGH A SERIES OF WAFER MOVEMENTS 审中-公开
标题翻译：使用通过一系列波浪运动获得的补偿值的波形的动态对齐
公开(公告)号：WO2009137279A3
公开(公告)日：2010-02-04
申请号：PCT/US2009041730
申请日：2009-04-24
申请人： LAM RES CORP , WONG SCOTT , LIN JEFFREY , BAILEY ANDREW D III , CHEN JACK , MOORING BENJAMIN W , HUANG CHUNG HO
发明人： WONG SCOTT , LIN JEFFREY , BAILEY ANDREW D III , CHEN JACK , MOORING BENJAMIN W , HUANG CHUNG HO
IPC分类号： H01L21/68
CPC分类号： H01L21/68
摘要： Methods and systems to optimize wafer placement repeatability in semiconductor manufacturing equipment using a controlled series of wafer movements are provided. In one embodiment, a preliminary station calibration is performed to teach a robot position for each station interfaced to facets of a vacuum transfer module used in semiconductor manufacturing. The method also calibrates the system to obtain compensation parameters that take into account the station where the wafer is to be placed, position of sensors in each facet, and offsets derived from performing extend and retract operations of a robot arm. In another embodiment where the robot includes two arms, the method calibrates the system to compensate for differences derived from using one arm or the other. During manufacturing, the wafers are placed in the different stations using the compensation parameters.
摘要翻译：提供了使用受控系列的晶片移动来优化半导体制造设备中的晶片布置重复性的方法和系统。在一个实施例中，执行初步站校准以教导与用于半导体制造中的真空传递模块的面连接的每个站的机器人位置。该方法还校准系统以获得考虑要放置晶片的工位的位置的补偿参数，每个面中的传感器的位置以及执行机器人臂的延伸和缩回操作导出的偏移。在机器人包括两个臂的另一实施例中，该方法校准系统以补偿从使用一个臂或另一个臂导出的差异。在制造期间，使用补偿参数将晶片放置在不同的台中。

10. 发明申请

WO2008042581B1 OFFSET CORRECTION METHODS AND ARRANGEMENT FOR POSITIONING AND INSPECTING SUBSTRATES 审中-公开
标题翻译：偏移校正方法和布置定位和检查基板
公开(公告)号：WO2008042581B1
公开(公告)日：2008-12-11
申请号：PCT/US2007078578
申请日：2007-09-14
申请人： LAM RES CORP , CHEN JACK , BAILEY ANDREW D III , MOORING BEN , CAIN STEPHEN J
发明人： CHEN JACK , BAILEY ANDREW D III , MOORING BEN , CAIN STEPHEN J
IPC分类号： G03B15/00 , B08B7/00 , B41B17/00 , G01B11/00 , G01B11/02 , G01N21/00 , G01R31/26 , G03B15/02 , G03B15/03
CPC分类号： H01L21/681 , H01L21/67259 , H01L21/67288
摘要： A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.
摘要翻译：提供了一种用于捕获基板的图像的斜面检查模块。模块包括旋转马达，其连接到基板卡盘并且构造成旋转基板卡盘，从而允许基板旋转。该模块还包括照相机和光学外壳，其附接到相机并且被配置为旋转，使得光能够被引向基板。照相机从照相机安装座安装，照相机安装件被配置为使照相机能够在180度平面上旋转，允许照相机拍摄基板的俯视图，底视图和侧视图中的至少一个的图像。该模块还包括背光布置，其被配置为向基板提供照明，从而使得相机能够捕获显示基板和背景之间的对比度的图像。

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