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1. 发明申请

WO2009137279A3 DYNAMIC ALIGNMENT OF WAFERS USING COMPENSATION VALUES OBTAINED THROUGH A SERIES OF WAFER MOVEMENTS 审中-公开
标题翻译：使用通过一系列波浪运动获得的补偿值的波形的动态对齐
公开(公告)号：WO2009137279A3
公开(公告)日：2010-02-04
申请号：PCT/US2009041730
申请日：2009-04-24
申请人： LAM RES CORP , WONG SCOTT , LIN JEFFREY , BAILEY ANDREW D III , CHEN JACK , MOORING BENJAMIN W , HUANG CHUNG HO
发明人： WONG SCOTT , LIN JEFFREY , BAILEY ANDREW D III , CHEN JACK , MOORING BENJAMIN W , HUANG CHUNG HO
IPC分类号： H01L21/68
CPC分类号： H01L21/68
摘要： Methods and systems to optimize wafer placement repeatability in semiconductor manufacturing equipment using a controlled series of wafer movements are provided. In one embodiment, a preliminary station calibration is performed to teach a robot position for each station interfaced to facets of a vacuum transfer module used in semiconductor manufacturing. The method also calibrates the system to obtain compensation parameters that take into account the station where the wafer is to be placed, position of sensors in each facet, and offsets derived from performing extend and retract operations of a robot arm. In another embodiment where the robot includes two arms, the method calibrates the system to compensate for differences derived from using one arm or the other. During manufacturing, the wafers are placed in the different stations using the compensation parameters.
摘要翻译：提供了使用受控系列的晶片移动来优化半导体制造设备中的晶片布置重复性的方法和系统。在一个实施例中，执行初步站校准以教导与用于半导体制造中的真空传递模块的面连接的每个站的机器人位置。该方法还校准系统以获得考虑要放置晶片的工位的位置的补偿参数，每个面中的传感器的位置以及执行机器人臂的延伸和缩回操作导出的偏移。在机器人包括两个臂的另一实施例中，该方法校准系统以补偿从使用一个臂或另一个臂导出的差异。在制造期间，使用补偿参数将晶片放置在不同的台中。

2. 发明申请

WO2005001893A3 ARCHITECTURE FOR GENERAL PURPOSE PROGRAMMABLE SEMICONDUCTOR PROCESSING SYSTEM AND METHODS THEREFOR 审中-公开
标题翻译：一般用途可编程半导体处理系统的结构及其方法
公开(公告)号：WO2005001893A3
公开(公告)日：2006-07-27
申请号：PCT/US2004016414
申请日：2004-05-24
申请人： LAM RES CORP , PATRICK ROGER , WONG VINCENT , HUANG CHUNG HO
发明人： PATRICK ROGER , WONG VINCENT , HUANG CHUNG HO
IPC分类号： G06F19/00 , H01L20060101
CPC分类号： G05B19/418 , G05B2219/32128 , G05B2219/35262 , G05B2219/45031 , H01L21/67276 , Y02P90/02 , Y02P90/86
摘要： A process for creating macros is shown, according to one embodiment of the invention. Initially, a library of macro procedures (102) is created for use in a semi-conductor processing system. For example, in a plasma processing system, this library can consist of tool health checks such as daily and weekly preventative maintenance (PM) qualifications, wet clean and recovery, hardware start-up qualification, chamber matching, and troubleshooting. This library may then be uploaded to the software control program (106) of a semi-conductor processing system. In one embodiment, the semi-conductor processing system comprises a macro engine 108 that interprets macro procedures. In another embodiment, the semi-conductor processing system comprises a macro engine (108) that executes macro procedures. Each of these macro procedures can then be performed in proper sequence by macro engine (108). During operation, the semi-conductor processing system, in turn, examines its state and compares the result to established specifications, or requests that the operator input information. Macro engine 108 may further compare tool data with macro specifications, and may generate and locally store (110) an electronic summary report, a tool performance tracking report, and/or raw data log format. In one embodiment, each report may be in a web-based output format, such as XML or HTML.
摘要翻译：根据本发明的一个实施例，示出了用于创建宏的过程。最初，创建一个用于半导体处理系统的宏程序库（102）。例如，在等离子体处理系统中，该库可以包括工具健康检查，例如每日和每周预防性维护（PM）资格，湿式清洁和恢复，硬件启动资格，室匹配和故障排除。然后可以将该库上传到半导体处理系统的软件控制程序（106）。在一个实施例中，半导体处理系统包括解释宏程序的宏引擎108。在另一个实施例中，半导体处理系统包括执行宏程序的宏引擎（108）。然后可以通过宏引擎（108）以适当的顺序执行这些宏程序中的每一个。在运行过程中，半导体处理系统反过来检查其状态，并将结果与已建立的规格进行比较，或要求操作员输入信息。宏引擎108可以进一步将工具数据与宏规范进行比较，并且可以生成并本地存储（110）电子总结报告，工具性能跟踪报告和/或原始数据日志格式。在一个实施例中，每个报告可以是基于web的输出格式，例如XML或HTML。

3. 发明申请

WO2011003117A3 ARRANGEMENT FOR IDENTIFYING UNCONTROLLED EVENTS AT THE PROCESS MODULE LEVEL AND METHODS THEREOF 审中-公开
标题翻译：用于识别过程模块级未受控事件的安排及其方法
公开(公告)号：WO2011003117A3
公开(公告)日：2011-04-28
申请号：PCT/US2010042933
申请日：2010-07-22
申请人： LAM RES CORP , HUANG CHUNG HO , VENUGOPAL VIJAYAKUMAR C , LAM CONNIE , PODLESNIK DRAGAN
发明人： HUANG CHUNG HO , VENUGOPAL VIJAYAKUMAR C , LAM CONNIE , PODLESNIK DRAGAN
IPC分类号： H01L21/00
CPC分类号： G06F9/5027 , G05B19/4184 , G05B2219/31202 , G05B2219/31293 , G05B2219/31318 , G05B2219/31481 , G05B2219/32209 , G05B2219/45031 , G06F11/2035 , G06F11/2043 , Y02P90/14 , Y02P90/18
摘要： A process-level troubleshooting architecture (PLTA) configured to facilitate substrate processing in a plasma processing system is provided. The architecture includes a process module controller. The architecture also includes a plurality of sensors, wherein each sensor of the plurality of sensors communicates with the process module controller to collect sensed data about one or more process parameters. The architecture further includes a process-module-level analysis server, wherein the process-module-level analysis server communicates directly with the plurality of sensors and the process module controller. The process-module-level analysis server is configured for receiving data, wherein the data include at least one of the sensed data from the plurality of sensors and process module and chamber data from the process module controller. The process-module-level analysis server is also configured for analyzing the data and sending interdiction data directly to the process module controller when a problem is identified during the substrate processing.
摘要翻译：提供了配置为促进等离子体处理系统中的衬底处理的处理级故障排除体系结构（PLTA）。该架构包括一个过程模块控制器。该架构还包括多个传感器，其中多个传感器中的每个传感器与处理模块控制器通信以收集关于一个或多个处理参数的感测数据。该体系结构还包括过程模块级分析服务器，其中过程模块级分析服务器直接与多个传感器和过程模块控制器通信。处理模块级分析服务器被配置用于接收数据，其中该数据包括来自多个传感器和处理模块的感测数据和来自处理模块控制器的腔室数据中的至少一个。过程模块级分析服务器还被配置用于在衬底处理期间识别问题时分析数据并将阻断数据直接发送到过程模块控制器。

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