会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 33. 发明申请
    • DRIVING OF A MEMORY MATRIX OF RESISTANCE HYSTERESIS ELEMENTS
    • 驱动电阻滞后元件的记忆矩阵
    • WO2006095278A1
    • 2006-09-14
    • PCT/IB2006/050617
    • 2006-02-28
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.IKKINK, Teunis, J.WOERLEE, Pierre, H.VAN ACHT, Victor, M., G.LAMBERT, NicolaasMARSMAN, Albert, W.
    • IKKINK, Teunis, J.WOERLEE, Pierre, H.VAN ACHT, Victor, M., G.LAMBERT, NicolaasMARSMAN, Albert, W.
    • G11C16/02
    • G11C13/0004G11C11/5678G11C13/0028G11C2213/15G11C2213/72
    • A memory matrix (10) comprises rows and columns of cells, each cell comprising a resistance hysteresis element (24) and a threshold element (22) coupled in series between a row terminal and a column terminal of the cell (20). The resistance hysteresis element (24) has a mutually larger and smaller hysteresis thresholds of mutually opposite polarity respectively. Voltage differences are applied between the column terminals and the row terminals of cells (20) in a selected row, so as to perform read actions. These voltage differences have a read polarity so that the voltage across the cell (20) is in a direction corresponding to the larger hysteresis threshold. Voltage differences are applied between the column terminals and the row terminals of cells (20) in a selected row, so as to perform erase actions, all cells (20) of a selected row being erased collectively in the erase action. The voltage differences for erase actions have the read polarity. Furthermore voltage differences are applied between the column terminals and the row terminals of cells (20) in a selected row, so as to perform write actions. The voltage differences for the write actions have a write polarity corresponding to the smaller hysteresis threshold, for updating cells (20) that are selected dependent on write data.
    • 存储器矩阵(10)包括单元的行和列,每个单元包括串联耦合在单元(20)的行端子和列端子之间的电阻滞后元件(24)和阈值元件(22)。 电阻滞后元件(24)分别具有相互相反极性的相互较大和较小的滞后阈值。 电压差在列选择行中的单元(20)的列端子和行端子之间施加,以便执行读取动作。 这些电压差具有读取极性,使得电池(20)两端的电压处于对应于较大滞后阈值的方向。 电压差在列选择行中的单元(20)的列端子和行端子之间施加,以便执行擦除动作,所选行的所有单元(20)在擦除动作中被共同擦除。 擦除动作的电压差具有读取极性。 此外,在列端子和选定行中的单元(20)的行端子之间施加电压差,以便执行写入动作。 写入动作的电压差具有对应于较小滞后阈值的写入极性,用于更新根据写入数据选择的单元(20)。
    • 34. 发明申请
    • RADIATION-EMITTING SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SUCH A DEVICE
    • 辐射发射半导体器件及其制造方法
    • WO2004042831A2
    • 2004-05-21
    • PCT/IB2003/004881
    • 2003-10-31
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.WOERLEE, Pierre, H.'T HOOFT, Gert, W.HOLLEMAN, Jisk
    • WOERLEE, Pierre, H.'T HOOFT, Gert, W.HOLLEMAN, Jisk
    • H01L33/00
    • H01L33/34H01L27/15
    • Radiation-emitting semiconductor device and method of manufacturing such a device. The invention relates to a radiation-emitting semiconductor device (10) comprising a silicon-containing semiconductor body (1) and a substrate (2), which semiconductor body (1) comprises a lateral semiconductor diode positioned on an insulating layer (7) which separates the diode from the substrate (2). The lateral semiconductor diode comprises a first semiconductor region (3) of a first conductivity type and with a first doping concentration, a second semiconductor region (4) of the first or a second conductivity type opposite to the first conductivity type and with a second doping concentration which is lower than the first doping concentration, and a third semiconductor region (5) of the second conductivity type and with a third doping concentration which is higher than the second doping concentration, the first and the third region (3, 5) each being provided with a connection region (6, 8), and, during operation, radiation (S) being generated in the second region (4) due to recombination of charge carriers injected therein from the first and the third region (3, 5). According to the invention, the second semiconductor region (4) comprises a central part (4A) which is surrounded by a further part (4B) the bandgap of which is larger than the bandgap of the central part (4A). In this way, the radiation yield is increased in an indirect semiconductor material such as silicon in the central part (4A) as translation of the relatively long-living charge carriers towards a non-radiative recombination center is limited because of the barriers in the valence and conduction band in the further part (4B). Preferably, the bandgap in the further part (4B) is made larger in that the thickness of said part (4B) is so small that quantum size effects occur therein, while the central part (4A) has a thickness which is so large that such effects do not occur or substantially do not occur.
    • 辐射发射半导体器件及其制造方法。 本发明涉及一种包括含硅半导体主体(1)和基板(2)的辐射发射半导体器件(10),该半导体本体(1)包括位于绝缘层(7)上的横向半导体二极管 将二极管与衬底(2)分开。 横向半导体二极管包括第一导电类型和第一掺杂浓度的第一半导体区域(3),与第一导电类型相反的第一或第二导电类型的第二半导体区域(4)和第二掺杂浓度 低于第一掺杂浓度的浓度,以及第二导电类型的第三半导体区域(5)和高于第二掺杂浓度的第三掺杂浓度,第一和第三区域(3,5)各自 设置有连接区域(6,8),并且在操作期间,由于从第一和第三区域(3,5)注入的电荷载流子的复合,在第二区域(4)中产生辐射(S) 。 根据本发明,第二半导体区域(4)包括由带隙大于中心部分(4A)的带隙的另一部分(4B)包围的中心部分(4A)。 以这种方式,中间部分(4A)中的间接半导体材料(例如硅)的辐射产量增加,因为相对较长寿命的电荷载流子朝向非辐射复合中心的平移由于价态的障碍而受到限制 和另一部分(4B)中的导带。 优选地,使另一部分(4B)中的带隙变得更大,因为所述部分(4B)的厚度如此小以致其中出现量子尺寸效应,而中心部分(4A)具有如此大的厚度 效果不会发生或基本不发生。