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1. 发明授权

US06465051B1 Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling 失效
标题翻译：操作具有组合电感和电容耦合的高密度等离子体CVD反应堆的方法
公开(公告)号：US06465051B1
公开(公告)日：2002-10-15
申请号：US08751899
申请日：1996-11-18
申请人： Turgut Sahin , Fred C. Redeker , Romuald Nowak , Shijian Li , Timothy Dyer , Derek R. Witty
发明人： Turgut Sahin , Fred C. Redeker , Romuald Nowak , Shijian Li , Timothy Dyer , Derek R. Witty
IPC分类号： H05H146
CPC分类号： H01J37/32862 , C23C16/4405 , H01J37/32082
摘要： The invention is embodied in a method of cleaning a plasma reactor by creating a vacuum in the chamber while introducing an etchant gas into the chamber through the gas injection ports, and applying RF energy to a ceiling electrode in the chamber while not necessarily applying RF energy to the coil antenna, so as to strike a predominantly capacitively coupled plasma in the vacuum chamber. In another embodiment the method includes, whenever the reactor is to be operated in an inductive coupling mode, applying RF power to the reactors coil antenna while grounding the ceiling electrode, and whenever the reactor is to be operated in a capacitive coupling mode, applying RF power to the ceiling electrode, and whenever the reactor is to be cleaned, cleaning the reactor by applying RF power to the ceiling electrode and to the coil antenna while introducing an etchant gas into the vacuum chamber. In yet another embodiment the method includes performing chemical vapor deposition on a wafer by introducing a deposition precursor gas into the chamber while maintaining an inductively coupled plasma therein by applying RF power to the coil antenna while grounding the ceiling electrode, and cleaning the reactor by introducing a precursor cleaning gas into the chamber while maintaining a capacitively coupled plasma in the chamber by applying RF power to the ceiling electrode.
摘要翻译：本发明体现在一种通过在室中产生真空来清洁等离子体反应器的方法，同时通过气体注入口将蚀刻剂气体引入室中，并且将RF能量施加到室中的顶板电极，而不一定施加RF能量到线圈天线，以便在真空室中击穿主要电容耦合的等离子体。在另一个实施例中，该方法包括：每当反应器以电感耦合模式工作时，在将天线电极接地的同时向反应器线圈天线施加RF功率，并且每当反应器以电容耦合模式工作时，施加RF 电源到天花板电极，并且每当要清洁反应堆时，通过向天花板电极和线圈天线施加RF功率来清洁反应器，同时将蚀刻剂气体引入真空室。在另一个实施方案中，该方法包括通过将沉积前体气体引入室中，同时通过在将天线电极接地的同时向线圈天线施加RF功率来维持其中的电感耦合等离子体来执行化学气相沉积，并通过引入来清洁反应器前体清洗气体进入室，同时通过向天花板电极施加RF功率来在室内维持电容耦合的等离子体。

2. 发明授权

US06414834B1 Dielectric covered electrostatic chuck 有权
标题翻译：介质覆盖静电卡盘
公开(公告)号：US06414834B1
公开(公告)日：2002-07-02
申请号：US09596108
申请日：2000-06-16
申请人： Edwin C. Weldon , Kenneth S. Collins , Arik Donde , Brian Lue , Dan Maydan , Robert J. Steger , Timothy Dyer , Ananda H. Kumar , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Arnold Kholodenko , Shamouil Shamouilian , Dennis S. Grimard
发明人： Edwin C. Weldon , Kenneth S. Collins , Arik Donde , Brian Lue , Dan Maydan , Robert J. Steger , Timothy Dyer , Ananda H. Kumar , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Arnold Kholodenko , Shamouil Shamouilian , Dennis S. Grimard
IPC分类号： H02N1300
CPC分类号： H01J37/321 , C23C16/4586 , H01J2237/2001 , H01L21/6831 , H01L21/6833 , Y10T279/23
摘要： An electrostatic chuck 100 useful for holding a substrate 55 in a high density plasma, comprises an electrode 110 at least partially covered by a semiconducting dielectric 115, wherein the semiconducting dielectric 115 may have an electrical resistance of from about 5×109 &OHgr;cm to about 8×1010 &OHgr;cm.
摘要翻译：用于将衬底55保持在高密度等离子体中的静电卡盘100包括至少部分被半导体电介质115覆盖的电极110，其中半导体电介质115可具有约5×10 9欧姆到约8×10 10欧姆·厘米的电阻。

3. 发明授权

US6108189A Electrostatic chuck having improved gas conduits 失效
标题翻译：静电吸盘具有改进的气体导管
公开(公告)号：US6108189A
公开(公告)日：2000-08-22
申请号：US965690
申请日：1997-11-06
申请人： Edwin C. Weldon , Kenneth S. Collins , Arik Donde , Brian Lue , Dan Maydan , Robert J. Steger , Timothy Dyer , Ananda H. Kumar , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Arnold Kholodenko , Shamouil Shamouilian , Dennis S. Grimard
发明人： Edwin C. Weldon , Kenneth S. Collins , Arik Donde , Brian Lue , Dan Maydan , Robert J. Steger , Timothy Dyer , Ananda H. Kumar , Alexander M. Veytser , Kadthala R. Narendrnath , Semyon L. Kats , Arnold Kholodenko , Shamouil Shamouilian , Dennis S. Grimard
IPC分类号： B23Q3/15 , C23C16/458 , H01L21/683 , H02N13/00
CPC分类号： H01J37/321 , C23C16/4586 , H01L21/6831 , H01L21/6833 , H01J2237/2001 , Y10T279/23
摘要： An electrostatic chuck 100 useful for holding a substrate 55 in a high density plasma, comprises a dielectric covered electrode 110 having at least one heat transfer gas flow conduit 150 therein. An electrical isolator 200 comprising dielectric material is positioned in the gas flow conduit 150 to (i) electrically isolate the gas in the conduit from the plasma or electrode 110, and (ii) allow passage of heat transfer gas through the conduit. Preferably, the dielectric material comprises a plasma-deactivating material that has a high surface area that reduces plasma formation of gas passing through the conduit 150 in a plasma process. A semiconducting dielectric member 115 useful for rapidly charging and discharging electrostatic chucks is also described.
摘要翻译：用于将衬底55保持在高密度等离子体中的静电卡盘100包括其中具有至少一个传热气体流动管道150的电介质覆盖电极110。包括电介质材料的电隔离器200定位在气流导管150中以（i）将导管中的气体与等离子体或电极110电隔离，和（ii）允许传热气体通过导管。优选地，电介质材料包括具有高表面积的等离子体钝化材料，其在等离子体工艺中减少通过导管150的气体的等离子体形成。还描述了一种用于快速充放电静电卡盘的半导体电介质部件115。

4. 发明申请

US20130328310A1 Systems and Methods for Combined Flow Control and Electricity Generation 失效
标题翻译：组合流量控制和发电系统与方法
公开(公告)号：US20130328310A1
公开(公告)日：2013-12-12
申请号：US13489708
申请日：2012-06-06
申请人： Timothy Dyer , Mark Richter , Rafael Andres Bañados Contreras , Chester L. Sandberg
发明人： Timothy Dyer , Mark Richter , Rafael Andres Bañados Contreras , Chester L. Sandberg
IPC分类号： F01D15/10
CPC分类号： F01D15/10 , F01K13/02
摘要： Systems and methods for combined flow control and electricity generation are described. Various embodiments may comprise an energy recovery device adapted to produce an electric current. At least a portion of the electric current may be used to power a pump. A control system may be adapted to adjust operating parameters of the system to stabilize or maximize the efficiency of the energy recovery device.
摘要翻译：描述了用于组合流量控制和发电的系统和方法。各种实施例可以包括适于产生电流的能量回收装置。可以使用至少一部分电流来为泵供电。控制系统可以适于调整系统的操作参数以稳定或最大化能量回收装置的效率。

5. 发明申请

US20080233403A1 Method of Making Ceramic Reactor Components and Ceramic Reactor Component Made Therefrom 审中-公开
标题翻译：制造陶瓷反应器部件和陶瓷反应器部件的方法
公开(公告)号：US20080233403A1
公开(公告)日：2008-09-25
申请号：US12026806
申请日：2008-02-06
申请人： Timothy Dyer , Ho Ouk , Louis Everett Jensen
发明人： Timothy Dyer , Ho Ouk , Louis Everett Jensen
IPC分类号： B32B3/00 , B28B11/08 , B29C59/14 , B32B18/00
CPC分类号： C04B41/53 , B28B11/0818 , C04B35/111 , C04B35/486 , C04B41/009 , C04B41/5031 , C04B41/5042 , C04B41/52 , C04B41/87 , C04B41/90 , C04B41/91 , C04B2235/604 , C04B2235/612 , C23C4/02 , C23C4/08 , C23C4/18 , C23C16/4404 , C23C28/322 , C23C28/3455 , H01J37/32431 , Y10T428/31 , C04B41/4578 , C04B41/4539 , C04B41/522 , C04B41/4527 , C04B41/5155 , C04B41/4529 , C04B41/5133 , C04B35/10 , C04B35/48
摘要： A method of improving the adhesion of processing materials on a ceramic component is described. The method includes the steps of forming a green ceramic component and texturing the surface of the green ceramic component. The as-textured component is then fired to harden the ceramic material. In an alternative embodiment of the method, a coating is applied to the surface of the as-fired ceramic component to provide a secondary adhesion layer. A ceramic component for use in an etching or deposition reactor chamber is also described. The ceramic component includes a substrate formed of a ceramic material and has a textured surface formed thereon such that the textured surface has a roughness of about 100 to 1000 μin Ra.
摘要翻译：描述了一种提高加工材料在陶瓷部件上的附着力的方法。该方法包括形成生陶瓷组分并使生陶瓷组分的表面纹理化的步骤。然后烧结该织构的组分以使陶瓷材料硬化。在该方法的替代实施例中，将涂层施加到烧制陶瓷部件的表面以提供第二粘合层。还描述了用于蚀刻或沉积反应器室的陶瓷部件。陶瓷部件包括由陶瓷材料形成并具有形成在其上的织纹表面的基底，使得纹理化表面的粗糙度为约100至1000μmol。

6. 发明申请

US20060114957A1 Line narrowing module 有权
公开(公告)号：US20060114957A1
公开(公告)日：2006-06-01
申请号：US11000684
申请日：2004-11-30
申请人： J. Martin Algots , Robert Bergstedt , Walter Gillespie , Vladimir Kulgeyko , William Partlo , German Rylov , Richard Sandstrom , Brian Strate , Timothy Dyer
发明人： J. Martin Algots , Robert Bergstedt , Walter Gillespie , Vladimir Kulgeyko , William Partlo , German Rylov , Richard Sandstrom , Brian Strate , Timothy Dyer
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.

7. 发明申请

US20050009452A1 ORBITING INDEXABLE BELT POLISHING STATION FOR CHEMICAL MECHANICAL POLISHING 失效
标题翻译：用于化学机械抛光的可索引的皮带抛光站
公开(公告)号：US20050009452A1
公开(公告)日：2005-01-13
申请号：US10711229
申请日：2004-09-02
申请人： Saket Chadda , Timothy Dyer , Clinton Fruitman
发明人： Saket Chadda , Timothy Dyer , Clinton Fruitman
IPC分类号： B24B21/04 , B24B37/10 , B24B1/00
CPC分类号： B24B37/105 , B24B21/04
摘要： An apparatus for planarizing a workpiece has a web with a face which is positioned adjacent the workpiece during planarization. At least one tension assembly is configured to maintain tension of the web. An orbiting assembly is configured to orbit the web relative to the workpiece. The apparatus for planarizing a workpiece may include first and second polishing surfaces where the first polishing surface has a substantially horizontal web with a face which is positioned adjacent the workpiece during the planarization process. The apparatus may also have a rotatable carousel and at least two workpiece carriers suspended from the carousel. Each of the carriers is configured to carry a workpiece and press the workpiece against one of the polishing surfaces while causing relative motion between the workpiece and the polishing surface. An apparatus for planarizing a workpiece which includes a plurality of polishing stations is also disclosed. At least one of the polishing stations has a web with a first face which is positioned adjacent the workpiece during planarization . The apparatus also includes an orbiting assembly configured to orbit the web relative to the workpiece.
摘要翻译：用于平坦化工件的装置具有在平坦化期间具有与工件相邻定位的面的腹板。至少一个张力组件被配置成保持卷材的张力。轨道组件被配置为相对于工件来绕轨道轨道。用于平坦化工件的设备可以包括第一和第二抛光表面，其中第一抛光表面具有基本上水平的腹板，其中在平坦化过程期间邻近工件定位面。该装置还可以具有可旋转的转盘和至少两个从转盘中悬挂的工件载体。每个载体构造成承载工件并将工件压靠在抛光表面之一上，同时引起工件和抛光表面之间的相对运动。还公开了一种用于平坦化包括多个抛光站的工件的设备。抛光站中的至少一个具有在平坦化期间具有与工件相邻定位的第一面的腹板。该装置还包括构造成相对于工件使幅材轨道运动的轨道组件。

8. 发明授权

US5720818A Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck 失效
公开(公告)号：US5720818A
公开(公告)日：1998-02-24
申请号：US639596
申请日：1996-04-26
申请人： Arik Donde , Dan Maydan , Robert J. Steger , Edwin C. Weldon , Brian Lue , Timothy Dyer
发明人： Arik Donde , Dan Maydan , Robert J. Steger , Edwin C. Weldon , Brian Lue , Timothy Dyer
IPC分类号： B23Q3/15 , C23C16/458 , H01L21/683 , C23C16/00
CPC分类号： H01J37/321 , C23C16/4586 , H01L21/6831 , H01L21/6833 , H01J2237/2001 , Y10T29/49002 , Y10T29/49826 , Y10T29/49885
摘要： The present invention discloses a two basic structures (including multiple variations within one of the basic structures) and methods for fabrication of the structures which facilitate the flow of cooling gas or other heat transfer fluid to the surface of an electrostatic chuck. The basic structures address both the problem of breakdown of a heat transfer gas in an RF plasma environment and the problem of arcing between a semiconductor substrate and the conductive pedestal portion of the electrostatic chuck in such an RF plasma environment.

9. 发明申请

US20080023657A1 Extreme ultraviolet light source 有权
公开(公告)号：US20080023657A1
公开(公告)日：2008-01-31
申请号：US11880319
申请日：2007-07-20
申请人： Stephen Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
发明人： Stephen Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
IPC分类号： H01L31/18
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

10. 发明申请

US20050226301A1 Gas discharge laser chamber improvements 有权
公开(公告)号：US20050226301A1
公开(公告)日：2005-10-13
申请号：US10815387
申请日：2004-03-31
申请人： William Partlo , Yoshiho Amada , James Carmichael , Timothy Dyer , Walter Gillespie , Bryan Moosman , Richard Morton , Curtis Rettig , Brian Strate , Thomas Steiger , Fedor Trintchouk , Richard Ujazdowski
发明人： William Partlo , Yoshiho Amada , James Carmichael , Timothy Dyer , Walter Gillespie , Bryan Moosman , Richard Morton , Curtis Rettig , Brian Strate , Thomas Steiger , Fedor Trintchouk , Richard Ujazdowski
IPC分类号： H01S3/03 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/22 , H01S3/225
CPC分类号： H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要： A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial jitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

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