专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06696108B2 Vacuum processing method 失效
标题翻译：真空加工方法
公开(公告)号：US06696108B2
公开(公告)日：2004-02-24
申请号：US10006689
申请日：2001-12-10
申请人： Hitoshi Murayama , Toshiyasu Shirasuna , Hiroaki Niino , Makoto Aoki
发明人： Hitoshi Murayama , Toshiyasu Shirasuna , Hiroaki Niino , Makoto Aoki
IPC分类号： H05H146
CPC分类号： H01J37/32082 , G03G5/08278 , H01J37/32165
摘要： A vacuum processing method comprises placing an article to be processed in a reaction container and simultaneously supplying at least two high-frequency powers having mutually different frequencies to the same high-frequency electrode to generate plasma in the reaction container by the high-frequency powers admitted into the reaction container from the high-frequency electrode so as to process the article to be processed. In the method, at least the high-frequency power having a frequency f1 and the high-frequency power having a frequency f2 are used and satisfy the following two conditions as the high-frequency powers: 250 MHz≧f1>f2≧10 MHz 0.9≧f2/f1≧0.1.
摘要翻译：真空处理方法包括将待处理物品放置在反应容器中，同时向相同的高频电极提供具有相互不同频率的至少两个高频电源，以通过高频电源在反应容器中产生等离子体从高频电极进入反应容器，以处理待处理的物品。在该方法中，至少使用具有频率f1的高频功率和具有频率f2的高频功率，并且满足以下两个条件作为高频功率：

2. 发明授权

US06677001B1 Microwave enhanced CVD method and apparatus 失效
标题翻译：微波增强CVD方法和装置
公开(公告)号：US06677001B1
公开(公告)日：2004-01-13
申请号：US08470596
申请日：1995-06-06
申请人： Takashi Inujima , Naoki Hirose , Mamoru Tashiro , Shunpei Yamazaki
发明人： Takashi Inujima , Naoki Hirose , Mamoru Tashiro , Shunpei Yamazaki
IPC分类号： H05H146
CPC分类号： C23C16/274 , C23C16/277 , C23C16/458 , C23C16/481 , H01J37/32192 , H01J37/32678
摘要： A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for chemical vapor reaction. In the new proposed resonance, the resonating space is comparatively large so that a material having a high melting point such as diamond can be deposited in the form of a thin film by this inovative method.
摘要翻译：描述了一种新的化学气相反应系统。电子可以作为独立的颗粒而不相互作用而代替ECR，混合回旋加速器共振是化学气相反应的主要兴奋原理。在新提出的共振中，谐振空间相对较大，因此通过该方法可以以薄膜的形式沉积具有高熔点的金属如金刚石的材料。

3. 发明授权

US06616988B1 Sulfur containing atomic group introduced porous article, process for introducing a sulfur containing atomic group onto the outer-inner surfaces of a porous article, and a battery separator 失效
标题翻译：含硫原子团引入多孔物品，将含硫原子团引入到多孔物品的外表面上的方法，以及电池隔板
公开(公告)号：US06616988B1
公开(公告)日：2003-09-09
申请号：US09694446
申请日：2000-10-23
申请人： Yasushi Takeuchi , Masaaki Kawabe , Hiroaki Yamazaki , Masashi Kaneko , Genya Anan , Kazuya Sato
发明人： Yasushi Takeuchi , Masaaki Kawabe , Hiroaki Yamazaki , Masashi Kaneko , Genya Anan , Kazuya Sato
IPC分类号： H05H146
CPC分类号： D06M10/06 , B29C59/12 , B29K2105/0854 , C08J7/12 , D06M10/025 , D06M11/51 , H01M2/16 , H01M2/162 , Y10S526/917 , Y10T428/24999 , Y10T428/8305
摘要： A porous article wherein a sulfur containing atomic group is introduced onto at least a part of outer-inner surfaces of the article, a ratio (S/C) of the number of sulfur atoms (S) to the number of carbon atoms (C) on the surface onto which the sulfur containing atomic group is introduced is 7×10−4 or more, a ratio (O/C) of the number of oxygen atoms (O) to the number of carbon atoms (C) on the surface onto which the sulfur containing atomic group is introduced is 0.2 or more, and the ratio (S/C) and the ratio (O/C) are determined by means of an X-ray photoelectron spectrophotometer is disclosed.
摘要翻译：将含硫原子团引入制品的外表面的至少一部分的多孔制品，硫原子数（S）与碳原子数（C）的比（S / C）在其上引入含硫原子团的表面上为7×10 -4以上，表面上的氧原子数（O）与碳原子数（C）的比（O / C）含硫的原子团为0.2以上，通过X射线光电子分光光度计测定比（S / C）和比率（O / C）。

4. 发明授权

US06709718B2 Porous plasma treated sheet material 失效
标题翻译：多孔等离子体处理片材
公开(公告)号：US06709718B2
公开(公告)日：2004-03-23
申请号：US09829734
申请日：2001-04-10
申请人： Jeffrey J. O'Brien
发明人： Jeffrey J. O'Brien
IPC分类号： H05H146
CPC分类号： H01J37/32082 , B29C59/14 , B29C2059/145 , B29K2105/256 , B29K2995/0092 , C08J9/36 , D06M10/025
摘要： A method is provided for surface treating a porous sheet material. The surface treatment involves contacting at least one porous surface of the film with plasma at atmospheric pressure and a plasma generating electrode frequency of greater than 1 MHz. This method provides treatment which penetrates into the pores of the sheet material.
摘要翻译：提供了一种用于表面处理多孔片材的方法。表面处理包括使膜的至少一个多孔表面与大气压下的等离子体和大于1MHz的等离子体产生电极频率接触。该方法提供渗透到片材的孔中的处理。

5. 发明授权

US06463875B1 Multiple coil antenna for inductively-coupled plasma generation systems 有权
标题翻译：用于电感耦合等离子体发生系统的多线圈天线
公开(公告)号：US06463875B1
公开(公告)日：2002-10-15
申请号：US09711935
申请日：2000-11-15
申请人： Jian J. Chen , Robert G. Veltrop , Thomas E. Wicker
发明人： Jian J. Chen , Robert G. Veltrop , Thomas E. Wicker
IPC分类号： H05H146
CPC分类号： H01J37/321
摘要： A radio frequency plasma multiple-coil antenna allows for controllable, uniform inductive coupling within a plasma reactor. According to exemplary embodiments, multiple coils are positioned on a dielectric window of a plasma chamber, and are powered by a single radio frequency generator and tuned by a single matching network. Each coil is either planar or a combination of a planar coil and a vertically stacked helical coil. The input end of each coil is connected to an input tuning capacitor and the output end is terminated to the ground through an output tuning capacitor. The location of the maximum inductive coupling of the radio frequency to the plasma is mainly determined by the output capacitor, while the input capacitor is mainly used to adjust current magnitude into each coil. By adjusting the current magnitude and the location of the maximum inductive coupling within each coil, the plasma density in different radial and azimuthal regions can be varied and controlled, and therefore, radially and azimuthally uniform plasma can be achieved.
摘要翻译：射频等离子体多线圈天线允许等离子体反应器内的可控的，均匀的电感耦合。根据示例性实施例，多个线圈位于等离子体室的电介质窗口上，并且由单个射频发生器供电并由单个匹配网络调谐。每个线圈是平面的或平面线圈和垂直堆叠的螺旋线圈的组合。每个线圈的输入端连接到输入调谐电容器，输出端通过输出调谐电容端接到地。射频对等离子体的最大感应耦合的位置主要由输出电容决定，而输入电容主要用于调整每个线圈的电流幅值。通过调整每个线圈内的最大电感耦合的电流大小和位置，可以改变和控制不同径向和方位区域中的等离子体密度，因此可以实现径向和方位均匀的等离子体。

6. 发明授权

US06380684B1 Plasma generating apparatus and semiconductor manufacturing method 有权
标题翻译：等离子体发生装置和半导体制造方法
公开(公告)号：US06380684B1
公开(公告)日：2002-04-30
申请号：US09573253
申请日：2000-05-18
申请人： Yunlong Li , Masanobu Sato , Yoshio Tominaga , Noriyoshi Sato , Satoru Iizuka
发明人： Yunlong Li , Masanobu Sato , Yoshio Tominaga , Noriyoshi Sato , Satoru Iizuka
IPC分类号： H05H146
CPC分类号： H01J37/32082 , H01J37/3266
摘要： A plasma generating apparatus and processing method, which generate high-density plasma, even in the central portion of the plasma generating zone. The apparatus comprises rectangular electrodes, a rectangular fistulous discharge electrode which surrounds the plasma generating zone, and a vacuum chamber of rectangular cross-section. Permanent magnets surround the discharge electrode, produce predetermined magnetic lines of force with portions which extend approximately parallel to the central axis of discharge electrode. A pair of parallel plate electrodes define the extension of the plasma generating zone in the direction of the central axis of the discharge electrode. The apparatus is configured such that the magnetic lines of force passing through the central portion of the plasma generating zone do not intersect with the electrodes.
摘要翻译：即使在等离子体产生区域的中心部分也产生高密度等离子体的等离子体发生装置和处理方法。该装置包括矩形电极，围绕等离子体生成区域的矩形排出电极和矩形横截面的真空室。永磁体围绕放电电极，产生预定的磁力线，其部分大致平行于放电电极的中心轴延伸。一对平行板电极限定等离子体生成区在放电电极的中心轴线方向上的延伸。该装置被配置成使得通过等离子体产生区的中心部分的磁力线不与电极相交。

7. 发明授权

US06248250B1 RF plasma reactor with hybrid conductor and multi-radius dome ceiling 失效
标题翻译：射频等离子体反应器与混合导体和多半圆顶天花板
公开(公告)号：US06248250B1
公开(公告)日：2001-06-19
申请号：US08897436
申请日：1997-07-21
申请人： Hiroji Hanawa , Gerald Zheyao Yin , Diana Xiaobing Ma , Philip M. Saizman , Peter K. Loewenhardt , Allen Zhao
发明人： Hiroji Hanawa , Gerald Zheyao Yin , Diana Xiaobing Ma , Philip M. Saizman , Peter K. Loewenhardt , Allen Zhao
IPC分类号： H05H146
CPC分类号： H01J37/321
摘要： The present invention adheres to an optimized coil-domed geometry including a particular dome apex height range relative to the dome base and a particular wafer position range relative to the dome apex.
摘要翻译：本发明坚持优化的线圈圆顶几何形状，其包括相对于圆顶基座的特定圆顶顶点高度范围和相对于圆顶顶点的特定晶片位置范围。

8. 发明授权

US06181069B2 High frequency discharging method and apparatus, and high frequency processing apparatus 有权
标题翻译：高频放电方法和装置，以及高频处理装置
公开(公告)号：US06181069B2
公开(公告)日：2001-01-30
申请号：US09251486
申请日：1999-02-17
申请人： Junichi Tonotani , Keiji Suzuki
发明人： Junichi Tonotani , Keiji Suzuki
IPC分类号： H05H146
CPC分类号： H01J37/32082 , H05H1/46
摘要： Arranging a linear antenna in a container, and connecting a condenser to a grounding side of the linear antenna, and/or between a plurality of linear antennas, and changing capacity of the condenser, thereby changing high-frequency voltage distribution on the linear antenna and/or on the plurality of linear antennas, and controlling electrostatic coupling between the plasma and the linear antenna and/or the plurality of linear antennas.
摘要翻译：将线性天线布置在容器中，并将电容器连接到线性天线的接地侧和/或多个线性天线之间，并且改变电容器的容量，从而改变线性天线上的高频电压分布， /或在多个线性天线上，以及控制等离子体与线性天线和/或多个线性天线之间的静电耦合。

9. 发明授权

US06818259B1 Porous article with surface functionality and method for preparing same 失效
标题翻译：具有表面功能的多孔制品及其制备方法
公开(公告)号：US06818259B1
公开(公告)日：2004-11-16
申请号：US09166457
申请日：1998-11-23
申请人： Steven L. Koontz
发明人： Steven L. Koontz
IPC分类号： H05H146
CPC分类号： B01D67/009 , A61L27/28 , A61L33/0076 , A61L33/0094 , B01D15/08 , B01D39/1692 , B01D67/0093 , B01J20/261 , B01J20/28033 , B01J20/28069 , B01J20/28078 , B01J20/286 , B01J20/3085 , B01J20/321 , B01J20/3217 , B01J20/3248 , B01J20/3268 , B01J20/3272 , B01J37/14 , B01J2219/0894 , B01J2220/54 , B29C59/14 , B29K2023/00 , B29K2105/04 , B29K2105/041 , B29L2031/755 , C08J9/36 , C08J2205/05 , C12N5/0068 , C12N2533/30 , C12P21/00 , G01N30/482 , G01N33/54306 , G01N33/54393 , G01N33/545 , G01N2030/525 , G01N2030/528
摘要： Porous organic articles having no surface functionality may be treated by remote plasma discharge to thereby introduce functionality to the surface of the article. The functionality is introduced throughout the article's surface, including the exterior surface and the surfaces of the pores. Little or no degradation of the porous organic article occurs as a result of the functionalization. Amino, hydroxyl, carbonyl and carboxyl groups may be introduced to the article. In this way, an essentially inert hydrophobic porous article, made from, for example, polyethylene, can have its surface modified so that the surface becomes hydrophilic. The remote plasma discharge process causes essentially no change in the bulk properties of the organic article. The remote plasma discharge process is preferably conducted so that no photons, and particularly no ultraviolet radiation, is transmitted from the plasma glow to the porous article. The surface-functionalized article may be used, for example, as a solid support in organic synthesis or in the chromatographic purification of organic or biochemicals
摘要翻译：可以通过远程等离子体放电来处理没有表面官能团的多孔有机制品，从而将功能性引入制品的表面。在整个制品的表面上引入了功能，包括外表面和孔的表面。作为官能化的结果，发生多孔有机物的很少或没有劣化。可以将氨基，羟基，羰基和羧基引入制品中。以这种方式，由例如聚乙烯制成的基本上惰性的疏水性多孔体可以使其表面改性，使得表面变得亲水。远程等离子体放电过程基本上不引起有机制品的体积性质的变化。优选进行远程等离子体放电处理，使得不会将光子，特别是没有紫外线辐射从等离子体辉光传输到多孔制品。表面官能化制品可用于例如有机合成中的固体载体或有机或生物化学品的色谱纯化

10. 发明授权

US06720037B2 Plasma processing method and apparatus 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US06720037B2
公开(公告)日：2004-04-13
申请号：US09949616
申请日：2001-09-12
申请人： Yukito Aota , Masahiro Kanai
发明人： Yukito Aota , Masahiro Kanai
IPC分类号： H05H146
CPC分类号： H01J37/32532 , C23C16/515
摘要： In a plasma processing method, on a back side of a cathode electrode is provided at least one conductor plate d.c. potentially insulated from the cathode electrode and an opposing electrode, and the cathode electrode and the conductor plate are enclosed with a shielding wall such that a ratio of an inter-electrode coupling capacitance provided by the cathode electrode and the opposing electrode to a coupling capacitance provided by the cathode electrode and a bottom surface of the shielding wall on the back side of the conductor plate is not less than a predetermined value. Thereby, a high-quality, high-speed plasma processing is realized.
摘要翻译：在等离子体处理方法中，在阴极电极的背面设置有至少一个导体板d.c. 可能与阴极电极和对置电极绝缘，并且阴极电极和导体板被屏蔽壁包围，使得由阴极电极和相对电极提供的电极间耦合电容与提供的耦合电容的比率通过阴极电极和导体板背侧的屏蔽壁的底面不小于预定值。由此，实现了高质量的高速等离子体处理。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式