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1. 发明申请

US20080023657A1 Extreme ultraviolet light source 有权
公开(公告)号：US20080023657A1
公开(公告)日：2008-01-31
申请号：US11880319
申请日：2007-07-20
申请人： Stephen Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
发明人： Stephen Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
IPC分类号： H01L31/18
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

2. 发明申请

US20050230645A1 Extreme ultraviolet light source 失效
公开(公告)号：US20050230645A1
公开(公告)日：2005-10-20
申请号：US11107535
申请日：2005-04-14
申请人： Stephan Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
发明人： Stephan Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
IPC分类号： G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

3. 发明申请

US20070023711A1 Discharge produced plasma EUV light source 失效
公开(公告)号：US20070023711A1
公开(公告)日：2007-02-01
申请号：US11493945
申请日：2006-07-26
申请人： Igor Fomenkov , William Partlo , Gerry Blumenstock , Nortbert Bowering , I. Oliver , Xiaojiang Pan , Rodney Simmons
发明人： Igor Fomenkov , William Partlo , Gerry Blumenstock , Nortbert Bowering , I. Oliver , Xiaojiang Pan , Rodney Simmons
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70825 , G03F7/70891 , G03F7/70908 , G03F7/70916 , G21K1/06 , G21K2201/064 , G21K2201/067 , H01S3/005 , H01S3/225 , H05G2/005 , H05H1/06
摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO2. The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.

4. 发明申请

US20060131515A1 Collector for EUV light source 有权
标题翻译： EUV光源收集器
公开(公告)号：US20060131515A1
公开(公告)日：2006-06-22
申请号：US10798740
申请日：2004-03-10
申请人： William Partlo , John Algots , Gerry Blumenstock , Norbert Bowering , Alexander Ershov , Igor Fomenkov , Xiaojiang Pan
发明人： William Partlo , John Algots , Gerry Blumenstock , Norbert Bowering , Alexander Ershov , Igor Fomenkov , Xiaojiang Pan
IPC分类号： G01J1/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
摘要翻译：公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低材料。刺激机构可以包括RF或微波感应机构。

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