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1. 发明授权

US08486965B2 Pyrrolo[2,3-b]pyridine derivative and use thereof for treatment of cancer 有权
标题翻译：吡咯并[2,3-b]吡啶衍生物及其用于治疗癌症的用途
公开(公告)号：US08486965B2
公开(公告)日：2013-07-16
申请号：US13391217
申请日：2010-08-25
申请人： Tomohiro Ohashi , Zenyu Shiokawa , Yuta Tanaka , Satoshi Sasaki
发明人： Tomohiro Ohashi , Zenyu Shiokawa , Yuta Tanaka , Satoshi Sasaki
IPC分类号： A61K31/44
CPC分类号： C07D471/04 , C07D401/12 , C07D409/12 , C07D409/14 , C07D487/04 , C07D495/04
摘要： The present invention provides a fused heterocycle derivative having a strong Smo inhibitory activity, and use thereof.Specially, the present invention relates to a compound represented by the formula wherein each symbol is as defined in the specification, or salt thereof, and a medicament containing the compound or a prodrug thereof, which is an Smo inhibitor or an agent for the prophylaxis or treatment of cancer.
摘要翻译：本发明提供具有强Smo抑制活性的稠合杂环衍生物及其应用。特别地，本发明涉及由下式表示的化合物，其中每个符号如说明书中所定义，或其盐，以及含有该化合物或其前体药物的药物，其为Smo抑制剂或预防或治疗癌症。

2. 发明申请

US20120220569A1 FUSED HETEROCYCLIC RING DERIVATIVE AND USE THEREOF 有权
标题翻译：熔融杂环衍生物及其用途
公开(公告)号：US20120220569A1
公开(公告)日：2012-08-30
申请号：US13391217
申请日：2010-08-25
申请人： Tomohiro Ohashi , Zenyu Shiokawa , Yuta Tanaka , Satoshi Sasaki
发明人： Tomohiro Ohashi , Zenyu Shiokawa , Yuta Tanaka , Satoshi Sasaki
IPC分类号： A61K31/437 , C07D495/04 , A61P35/00 , C07D487/04 , A61K31/4985 , A61K31/55 , C07D471/04 , A61K31/4365
CPC分类号： C07D471/04 , C07D401/12 , C07D409/12 , C07D409/14 , C07D487/04 , C07D495/04
摘要： The present invention provides a fused heterocycle derivative having a strong Smo inhibitory activity, and use thereof.Specially, the present invention relates to a compound represented by the formula wherein each symbol is as defined in the specification, or salt thereof, and a medicament containing the compound or a prodrug thereof, which is an Smo inhibitor or an agent for the prophylaxis or treatment of cancer.
摘要翻译：本发明提供具有强Smo抑制活性的稠合杂环衍生物及其应用。特别地，本发明涉及由下式表示的化合物，其中每个符号如说明书中所定义，或其盐，以及含有该化合物或其前体药物的药物，其为Smo抑制剂或预防或治疗癌症。

3. 发明授权

US08569177B2 Plasma processing apparatus and plasma processing method 失效
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US08569177B2
公开(公告)日：2013-10-29
申请号：US13570433
申请日：2012-08-09
申请人： Tomohiro Ohashi , Akitaka Makino , Hiroho Kitada , Muneo Furuse , Tomoyuki Tamura
发明人： Tomohiro Ohashi , Akitaka Makino , Hiroho Kitada , Muneo Furuse , Tomoyuki Tamura
IPC分类号： H01L21/302
CPC分类号： H01J37/32449
摘要： A plasma processing apparatus is provided which includes an inert gas supply route connected to a process gas supply piping which supplies a process gas into a processing chamber in a vacuum vessel, a valve which opens or closes the inert gas supply route, and an adjuster which adjusts a flow rate of the inert gas. When processing of a sample is complete, an inert gas is supplied into the process gas supply piping so that a pressure in the process gas supply piping is maintained at a pressure higher than a pressure at which a compound of the process gas and a material of an inner wall of the process gas supply piping vaporizes.
摘要翻译：提供了一种等离子体处理装置，其包括连接到处理气体供应管线的惰性气体供给路径，该处理气体供应管路将处理气体供应到真空容器中的处理室中，打开或关闭惰性气体供应路径的阀，以及调节器调节惰性气体的流量。当样品的处理完成时，将惰性气体供应到工艺气体供应管道中，使得处理气体供应管道中的压力保持在高于处理气体和化合物的压力的压力工艺气体供应管道的内壁蒸发。

4. 发明申请

US20100234351A1 FUSED NITROGEN-COMPRISING HETEROCYCLIC COMPOUND 审中-公开
标题翻译：熔融氮化物杂环化合物
公开(公告)号：US20100234351A1
公开(公告)日：2010-09-16
申请号：US12280228
申请日：2007-02-22
申请人： Masaki Seto , Tomohiro Ohashi
发明人： Masaki Seto , Tomohiro Ohashi
IPC分类号： A61K31/55 , C07D487/04 , A61P35/00 , A61K31/519
CPC分类号： C07D487/04
摘要： A compound of the formula: wherein ring A is a 7-membered or 8-membered nitrogen-containing ring optionally further substituted, ring B is an optionally substituted aryl group or an optionally substituted heteroaryl group, X1 is a group represented by —NR3—Y1—, —O—, —S—, —SO—, —SO2— or —CHR3— wherein R3 is a hydrogen atom or an optionally substituted aliphatic hydrocarbon group, or R3 may be bonded to the carbon atom of ring B to form an optionally substituted ring structure, and Y1 is a bond or an optionally substituted alkylene, R1 is a hydrogen atom, or an optionally substituted group bonded via a carbon atom or a sulfur atom, the formula shows a single bond or a double bond, when R2 is —R2, R2 is a hydrogen atom, or an optionally substituted group bonded via a carbon atom, a nitrogen atom, an oxygen atom or a sulfur atom, and when R2 is ═R2, R2 is an oxo group, an optionally substituted alkylidene group, or an optionally substituted imino group.
摘要翻译：下式的化合物：其中环A为任选进一步取代的7-元或8-元含氮环，环B为任选取代的芳基或任选取代的杂芳基，X 1为-NR 3 - Y 1，-O - ， - S - ， - SO - ， - SO 2 - 或-CHR 3 - ，其中R 3是氢原子或任选取代的脂族烃基，或者R 3可以键合到环B的碳原子上以形成任选取代的环结构，并且Y 1是键或任选取代的亚烷基，R 1是氢原子或经由碳原子或硫原子键合的任选取代的基团，该式表示单键或双键，当 R2是-R2，R2是氢原子或通过碳原子，氮原子，氧原子或硫原子键合的任选取代的基团，当R 2是= R 2时，R 2是氧代基，亚烷基或任选取代的亚氨基。

5. 发明授权

US06711892B2 Exhaust gas purifier for internal combustion engines 有权
标题翻译：内燃机排气净化器
公开(公告)号：US06711892B2
公开(公告)日：2004-03-30
申请号：US10276824
申请日：2002-11-18
申请人： Yasuki Tamura , Kojiro Okada , Tomohiro Ohashi , Naoto Yamada , Kazuo Koga
发明人： Yasuki Tamura , Kojiro Okada , Tomohiro Ohashi , Naoto Yamada , Kazuo Koga
IPC分类号： F01N300
CPC分类号： F02D41/029 , F01N3/0814 , F01N3/0821 , F01N3/0842 , F01N11/00 , F01N11/007 , F01N13/009 , F01N2260/14 , F01N2550/02 , F02D9/04 , F02D41/0052 , F02D41/1448 , F02D41/1454 , F02D41/1456 , F02D41/1495 , F02D2011/102 , F02D2041/147 , F02D2041/228 , F02M26/15 , Y02T10/47
摘要： An exhaust passage (20) of an internal-combustion engine (1) is provided with an exhaust emission control unit (40) capable of reducing harmful substances in exhaust gas under a given exhaust pressure condition and an exhaust sensor (22) for detecting the concentration of a specific exhaust component (H2, O2) in the exhaust gas, and a performance lowering identifying unit identifies lowering of the performance of the exhaust emission control (40) by detecting a failure to fulfill the given exhaust pressure condition in accordance with the output of the exhaust sensor.
摘要翻译：内燃机（1）的排气通路（20）设有排气排放控制单元（40），该废气排放控制单元能够在给定的排气压力条件下减少废气中的有害物质，并且排气传感器（22）排气中的特定排气成分（H2，O2）的浓度，以及降低性能的识别单元，通过检测不符合规定排气压力条件的方式来识别废气排放控制（40）的性能的降低排气传感器的输出。

6. 发明申请

US20130053997A1 VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD 有权
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20130053997A1
公开(公告)日：2013-02-28
申请号：US13236818
申请日：2011-09-20
申请人： Tomohiro Ohashi , Akitaka Makino , Hiroho Kitada , Hideki Kihara
发明人： Tomohiro Ohashi , Akitaka Makino , Hiroho Kitada , Hideki Kihara
IPC分类号： B25J9/10 , B25J13/08
CPC分类号： H01L21/68 , H01L21/67742 , Y10S901/03 , Y10S901/46
摘要： A vacuum processing apparatus includes a robot connected to a vacuum container to carry a wafer on one of its two arms to or from a processing chamber; a unit to detect an amount of deviation of the wafer from a predetermined wafer mounting position on the arm that may occur when the robot carries the wafer into or out of the processing chamber; and an adjusting device to adjust the operation of the robot based on the detected amount of deviation. The adjusting device adjusts the robot operation based on the result of a teaching operation performed in advance. After being subjected to the initial teaching operation, the robot again undergoes a second teaching operation according to the information on the amount of wafer position deviation that is detected by moving the wafer in a predetermined transfer pattern, before the wafer processing is performed.
摘要翻译：真空处理装置包括连接到真空容器以将其两个臂中的一个上的晶片携带到处理室或从处理室移动的机器人; 用于检测当机器人将晶片进入或离开处理室时可能发生的晶片与在臂上的预定晶片安装位置的偏移量的单元; 以及基于检测到的偏差量来调整机器人的操作的调整装置。调整装置根据预先执行的教学动作的结果调整机器人的动作。在进行初始教导操作之后，根据关于在执行晶片处理之前通过以预定的传送图案移动晶片来检测的晶片位置偏差量的信息，机器人再次进行第二示教操作。

7. 发明授权

US08532818B2 Vacuum chamber 失效
标题翻译：真空室
公开(公告)号：US08532818B2
公开(公告)日：2013-09-10
申请号：US12712861
申请日：2010-02-25
申请人： Tomohiro Ohashi , Tsutomu Nakamura , Hidenobu Tanimura , Michiaki Kobayashi
发明人： Tomohiro Ohashi , Tsutomu Nakamura , Hidenobu Tanimura , Michiaki Kobayashi
IPC分类号： G06F7/00
CPC分类号： H01L21/67766 , H01L21/67778
摘要： A vacuum chamber includes: a vacuum vessel arranged at the backward side, where a wafer of a processing subject is processed inside an internal processing chamber; a transfer chamber arranged at the forward side, where said wafer is transferred at the inside thereof under atmospheric pressure; a cassette stage arranged at the forward of this transfer chamber, where a cassette storing said wafer is mounted; a lock chamber connected with said transfer chamber at the backward of said transfer chamber; a robot arranged inside said transfer chamber, where said wafer is transferred between said cassette and said lock chamber; and an aligning machine for making position of said wafer fit with the predetermined position, wherein the wafer is transferred to said lock chamber, after performing alignment of said wafer on said aligning machine, in the case where displacement amount of position of this wafer is larger than the predetermined value.
摘要翻译：真空室包括：设置在后方的真空容器，处理对象的晶片在内部处理室内处理; 传送室，其布置在前侧，其中所述晶片在其大气压下在其内部传送; 设置在该传送室前方的盒级，其中安装有存储所述晶片的盒; 在所述传送室的后方与所述传送室连接的锁定室; 布置在所述传送室内部的机器，其中所述晶片在所述盒和所述锁定室之间传送; 以及用于使所述晶片的位置与所述预定位置配合的对准机，其中在所述晶片位于所述对准机器的位置的位移量较大的情况下，在将所述晶片对准所述对准机器之后，将所述晶片转移到所述锁定室超过预定值。

8. 发明授权

US5913554A Intake system construction for internal combustion engine and manufacturing process of intake passage section of internal combustion engine 失效
标题翻译：内燃机进气系统结构和内燃机进气通道段的制造工艺
公开(公告)号：US5913554A
公开(公告)日：1999-06-22
申请号：US14082
申请日：1998-01-27
申请人： Hideyuki Oda , Takashi Kawabe , Nobuaki Murakami , Katsunori Ueda , Satoshi Yoshikawa , Kenji Goto , Tomohiro Ohashi , Eiichi Hiruma , Jyun Takemura , Shigeo Yamamoto , Kazuyoshi Nakane
发明人： Hideyuki Oda , Takashi Kawabe , Nobuaki Murakami , Katsunori Ueda , Satoshi Yoshikawa , Kenji Goto , Tomohiro Ohashi , Eiichi Hiruma , Jyun Takemura , Shigeo Yamamoto , Kazuyoshi Nakane
IPC分类号： F02B1/04 , F02B3/06 , F02B17/00 , F02B23/10 , F02B31/08 , F02B75/12 , F02F1/24 , F02F1/42 , F01L13/00 , F02B31/04
CPC分类号： F02F1/4235 , F02B17/005 , F02B23/104 , F02B31/085 , F02F1/4214 , F02B1/04 , F02B2023/107 , F02B2023/108 , F02B2075/125 , F02B2275/48 , F02B3/06 , F02F2001/241 , F02F2001/245 , Y02T10/123 , Y02T10/125 , Y02T10/146 , Y10T29/49298 , Y10T29/493
摘要： An intake system construction according to the present invention for an internal combustion engine is provided with a combustion chamber formed with upper and lower extremities thereof defined by a cylinder head and a piston, an intake open end arranged for being opened or closed by an intake valve, an exhaust open end arranged for being opened or closed by an exhaust valve, an intake port formed extending upwardly from the intake open end so that a vertical swirl of inducted air is formed in the combustion chamber, and an exhaust port for discharging combustion gas from the combustion chamber. The intake port is formed wider in one of halves thereof located adjacent a reference plane, which contains a central axis of a cylinder, than in the other half thereof located remote from the reference plane. The intake port is provided at a lower extremity thereof in the one half thereof with a raised portion for guiding an inducted air flow in the intake port toward an inner peripheral surface of a side wall of the cylinder.
摘要翻译：根据本发明的用于内燃机的进气系统结构设置有燃烧室，其形成有由气缸盖和活塞限定的上端和下端，进气开口端被设置成由进气阀打开或关闭排气开口端，其设置成由排气阀打开或关闭;进气口，其从所述进气开口端向上延伸，使得在所述燃烧室中形成感应空气的垂直涡流;以及排气口，用于排出燃烧气体从燃烧室。所述进气口在位于相对于包含气缸的中心轴线的参考平面的一半中形成为比位于远离所述参考平面的另一半中更宽。进气口在其一半的下端处设置有用于将进气口中的吸入空气流引导到气缸的侧壁的内周面的凸起部。

9. 发明授权

US08897906B2 Wafer processing based on sensor detection and system learning 有权
标题翻译：基于传感器检测和系统学习的晶片处理
公开(公告)号：US08897906B2
公开(公告)日：2014-11-25
申请号：US13236818
申请日：2011-09-20
申请人： Tomohiro Ohashi , Akitaka Makino , Hiroho Kitada , Hideki Kihara
发明人： Tomohiro Ohashi , Akitaka Makino , Hiroho Kitada , Hideki Kihara
IPC分类号： H01L21/68 , H01L21/677
CPC分类号： H01L21/68 , H01L21/67742 , Y10S901/03 , Y10S901/46
摘要： A vacuum processing apparatus includes a robot connected to a vacuum container to carry a wafer on one of its two arms to or from a processing chamber; a unit to detect an amount of deviation of the wafer from a predetermined wafer mounting position on the arm that may occur when the robot carries the wafer into or out of the processing chamber; and an adjusting device to adjust the operation of the robot based on the detected amount of deviation. The adjusting device adjusts the robot operation based on the result of a teaching operation performed in advance. After being subjected to the initial teaching operation, the robot again undergoes a second teaching operation according to the information on the amount of wafer position deviation that is detected by moving the wafer in a predetermined transfer pattern, before the wafer processing is performed.
摘要翻译：真空处理装置包括连接到真空容器以将其两个臂中的一个上的晶片携带到处理室或从处理室移动的机器人; 用于检测当机器人将晶片进入或离开处理室时可能发生的晶片与在臂上的预定晶片安装位置的偏移量的单元; 以及基于检测到的偏差量来调整机器人的操作的调整装置。调整装置根据预先执行的教学动作的结果调整机器人的动作。在进行初始教导操作之后，根据关于在执行晶片处理之前通过以预定的传送图案移动晶片来检测的晶片位置偏差量的信息，机器人再次进行第二示教操作。

10. 发明申请

US20100004238A1 FUSED HETEROCYCLIC COMPOUND 审中-公开
标题翻译：熔融杂环化合物
公开(公告)号：US20100004238A1
公开(公告)日：2010-01-07
申请号：US12518596
申请日：2007-12-11
申请人： Tomoyasu Ishikawa , Hiroshi Banno , Youichi Kawakita , Tomohiro Ohashi , Osamu Kurasawa
发明人： Tomoyasu Ishikawa , Hiroshi Banno , Youichi Kawakita , Tomohiro Ohashi , Osamu Kurasawa
IPC分类号： A61K31/5377 , C07D487/04 , A61K31/519 , A61K31/4985
CPC分类号： C07D487/04
摘要： The present invention provides a fused heterocyclic compound having a tyrosine kinase inhibitory action, which is represented by the formula: wherein R1 is a hydrogen atom, a halogen atom, or an optionally substituted group bonded via a carbon atom, a nitrogen atom or an oxygen atom; R2 is a hydrogen atom, or an optionally substituted group bonded via a carbon atom or a sulfur atom, or R1 and R2, or R2 and R3 are optionally bonded to each other to form an optionally substituted ring structure; R3 is a hydrogen atom or an optionally substituted aliphatic hydrocarbon group, or R3 is optionally bonded to the carbon atom on ring A to form an optionally substituted ring structure; ring A is an optionally substituted benzene ring; and ring B is (i) an optionally substituted fused ring, or (ii) a pyridine ring having optionally substituted carbamoyl (the pyridine ring is optionally further substituted).
摘要翻译：本发明提供具有酪氨酸激酶抑制作用的稠合杂环化合物，其由下式表示：其中R1是氢原子，卤原子或经由碳原子，氮原子或氧键键合的任意取代的基团原子; R2是氢原子，或通过碳原子或硫原子键合的任选取代的基团，或者R 1和R 2，或R 2和R 3相互结合形成任选取代的环结构; R3是氢原子或任选取代的脂族烃基，或R3任选地键合到环A上的碳原子上以形成任选取代的环结构; 环A是任选取代的苯环; 和环B是（i）任选取代的稠合环，或（ii）具有任选取代的氨基甲酰基的吡啶环（吡啶环任选进一步被取代）。

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