专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06552771B1 Image display device and its repairing method and apparatus 有权
标题翻译：图像显示装置及其修复方法和装置
公开(公告)号：US06552771B1
公开(公告)日：2003-04-22
申请号：US09461730
申请日：1999-12-16
申请人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
发明人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
IPC分类号： G02F11336
CPC分类号： G02F1/1333 , G02F1/1309
摘要： An image display device for repairing a scratch or scratches on a surface or surfaces of a light transmitting member having an image display section such an extent that the presence of the scratch or scratches cannot be visually perceived at at least in a bright view distance in all directions, and in which device a liquid filler having a refractive index equivalent to or on the same order of that of the light transmitting member is locally filled only into an area of the scratch or scratches, and the filler is cured. By controlling an amount of the filler so that a difference in level between a surface of the light transmitting member and a surface of the filler is at least ±5.0 &mgr;m or less and that an angle defined between a surface of the filler and a surface of the light transmitting member is at least 45 degrees or less or preferably at least 10 degrees or less, it is possible to exhibit display quality to such a degree that the presence of the scratch or scratches cannot be recognized.
摘要翻译：一种图像显示装置，用于修复具有图像显示部分的光透射部件的表面或划痕上的划痕或划痕，其程度使得在至少所有的亮视距离中不能视觉地感觉划痕或划痕的存在方向，并且在该装置中，具有与透光构件的折射率相同或相同的折射率的液体填充剂局部地填充到划痕或划痕的区域中，并且填料被固化。通过控制填充剂的量使得透光构件的表面与填料的表面之间的水平差异至少为±5.0μm或更小，并且在填料的表面和表面之间限定的角度透光构件为至少45度以下，优选为10度以下，可以显示出不能识别出划痕或划痕的程度的显示质量。

2. 发明授权

US06693699B2 Image display device and its repairing method and apparatus 有权
标题翻译：图像显示装置及其修复方法和装置
公开(公告)号：US06693699B2
公开(公告)日：2004-02-17
申请号：US10234578
申请日：2002-09-06
申请人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
发明人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
IPC分类号： G02F113
CPC分类号： G02F1/1333 , G02F1/1309
摘要： A method for repairing a liquid crystal display provided with a light transmitting member having an image display section. The method includes filling a filler, which has a refractive index substantially equal to that of the light transmitting member, into a scratch or scratches formed on inside and outside surfaces of the light transmitting member so as to repair the scratch or scratches.
摘要翻译：一种修补液晶显示器的方法，该液晶显示器具有带有图像显示部分的透光部件。该方法包括将具有与透光构件的折射率基本相等的折射率的填充物填充到形成在透光构件的内表面和外表面上的划痕或划痕，以修复划痕或划痕。

3. 发明授权

US08804110B2 Fault inspection device and fault inspection method 有权
标题翻译：故障检查装置及故障检查方法
公开(公告)号：US08804110B2
公开(公告)日：2014-08-12
申请号：US13703414
申请日：2011-05-20
申请人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda , Yukihiro Shibata
发明人： Yuta Urano , Shigenobu Maruyama , Toshiyuki Nakao , Toshifumi Honda , Yukihiro Shibata
IPC分类号： G01N21/00 , G01N21/95 , G01N21/94 , G01N21/956
CPC分类号： G01N21/94 , G01N21/47 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/4711 , G01N2021/8867 , G01N2021/8874 , G01N2201/0806 , G01N2201/10
摘要： Proposed is a defect inspection method whereby: illuminating light having a substantially uniform illumination intensity distribution in one direction of a sample surface irradiated on the sample surface; multiple scattered light components, which are output in multiple independent directions, are detected among the scattered light from the sample surface and multiple corresponding scattered light detection signals are obtained; at least one of the multiple scattered light detection signals is processed and the presence of defects is determined; at least one of the multiple scattered light detection signals that correspond to each of the points determined by the processing as a defect is processed and the dimensions of the defect are determined; and the position and dimensions of the defect on the sample surface, at each of the points determined as a defect, are displayed.
摘要翻译：提出了一种缺陷检查方法，其中：照射在样品表面上的样品表面的一个方向具有基本上均匀的照明强度分布的光; 在来自样品表面的散射光中检测多个独立方向输出的多个散射光分量，并获得多个相应的散射光检测信号; 处理多个散射光检测信号中的至少一个并确定缺陷的存在; 处理与通过处理确定的每个点对应的多个散射光检测信号中的至少一个作为缺陷，并确定缺陷的尺寸; 并且显示在被确定为缺陷的每个点处的样品表面上的缺陷的位置和尺寸。

4. 发明授权

US08638429B2 Defect inspecting method and defect inspecting apparatus 失效
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US08638429B2
公开(公告)日：2014-01-28
申请号：US13146428
申请日：2009-12-15
申请人： Toshiyuki Nakao , Shigenobu Maruyama , Akira Hamamatsu , Yuta Urano
发明人： Toshiyuki Nakao , Shigenobu Maruyama , Akira Hamamatsu , Yuta Urano
IPC分类号： G01N21/00 , G01J4/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8809 , G01N2021/8848 , H01L22/12
摘要： Provided are a defect inspecting method and a defect inspecting apparatus, wherein defect detecting sensitivity is improved and also haze measurement is performed using polarization detection, while suppressing damages to samples. The defect inspecting apparatus is provided with a light source which oscillates to a sample a laser beam having a wavelength band wherein a small energy is absorbed, and two independent detecting optical systems, i.e., a defect detecting optical system which detects defect scattered light generated by a defect, by radiating the laser beams oscillated by the light source, and a haze detecting optical system which detects roughness scattered light generated due to roughness of the wafer surface. Polarization detection is independently performed with respect to the scattered light detected by the two detecting optical systems, and based on the two different detection signals, defect determination and haze measurement are performed.
摘要翻译：提供了一种缺陷检查方法和缺陷检查装置，其中提高了缺陷检测灵敏度，并且在抑制对样本的损害的同时使用偏振检测进行雾度测量。缺陷检查装置具有向样品振荡的光源，其具有吸收小能量的波长带的激光束，以及两个独立的检测光学系统，即检测由通过照射由光源振荡的激光束的缺陷，以及检测由于晶片表面的粗糙度而产生的粗糙度散射光的雾度检测光学系统。相对于由两个检测光学系统检测的散射光独立地进行极化检测，并且基于两个不同的检测信号，执行缺陷确定和雾度测量。

5. 发明授权

US08310665B2 Inspecting method and inspecting apparatus for substrate surface 有权
标题翻译：基板表面检查方法及检查装置
公开(公告)号：US08310665B2
公开(公告)日：2012-11-13
申请号：US13404749
申请日：2012-02-24
申请人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
发明人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
IPC分类号： G01N21/00
CPC分类号： G01B11/303 , G01N21/47 , G01N21/94 , G01N21/9501
摘要： An inspecting method and apparatus for inspecting a substrate surface includes application of a light to the substrate surface, detection of scattered light or reflected light from the substrate surface due to the applied light at a plurality of positions to obtain a plurality of electrical signals, extraction of a signal in a mutually different frequency band from each of the plurality of electrical signals, and calculation of a value regarding a state of film of the substrate through an arithmetical operation process of a plurality of extracted signals in the frequency bands.
摘要翻译：用于检查基板表面的检查方法和装置包括：由于在多个位置处施加的光，向基板表面施加光，检测散射光或来自基板表面的反射光，以获得多个电信号，提取在与所述多个电信号中的每一个相互不同的频带中的信号的信号，以及通过所述频带中的多个提取的信号的算术运算处理来计算关于所述衬底的膜的状态的值。

6. 发明申请

US20110228537A1 Adjustable Beam Size Illumination Optical Apparatus and Beam Size Adjusting Method 审中-公开
标题翻译：可调节光束尺寸照明光学装置和光束尺寸调整方法
公开(公告)号：US20110228537A1
公开(公告)日：2011-09-22
申请号：US13049089
申请日：2011-03-16
申请人： Keiko YOSHIMIZU , Hiroshi Aoyama , Shigenobu Maruyama , Yasuhiro Yoshitake
发明人： Keiko YOSHIMIZU , Hiroshi Aoyama , Shigenobu Maruyama , Yasuhiro Yoshitake
IPC分类号： F21V5/04
CPC分类号： G02B27/0955
摘要： An adjustable beam size illumination optical apparatus includes a beam size adjusting optical system which includes groups of cylindrical array lenses disposed correspondingly to the long and short axis directions respectively and having variable intervals among the lenses, and a group of cylindrical telescope lenses disposed correspondingly to one of the long and short axis directions and having variable intervals among the lenses, and adjusts parallel light from a light source in size in accordance with the two axis directions orthogonal to each other. The lens interval of one of the cylindrical array lens groups and the cylindrical telescope lens group is changed to adjust a beam size on a projection surface in accordance with the long axis direction or the short axis direction. Thus, it is possible to adjust the beam size in accordance with the long axis direction and the short axis direction individually, and it is possible to make irradiation with the beam with uniform intensity.
摘要翻译：可调光束尺寸照明光学装置包括光束尺寸调整光学系统，该光束尺寸调整光学系统包括分别对应于长轴和短轴方向设置的圆柱形阵列透镜组，并且在透镜之间具有可变的间隔，以及一组圆柱形望远镜，其对应于一个并且在透镜中具有可变的间隔，并且根据彼此正交的两个轴方向来调整来自光源的尺寸的平行光。根据长轴方向或短轴方向，改变圆柱形阵列透镜组和圆柱形望远镜透镜组中的一个的透镜间隔，以调整投影表面上的光束尺寸。因此，可以分别根据长轴方向和短轴方向调整光束尺寸，并且可以以均匀的强度对光束进行照射。

7. 发明申请

US20060097162A1 Apparatus and method for determining surface profiles using a scanning probe microscope 有权
标题翻译：使用扫描探针显微镜确定表面轮廓的装置和方法
公开(公告)号：US20060097162A1
公开(公告)日：2006-05-11
申请号：US11251795
申请日：2005-10-18
申请人： Shigenobu Maruyama , Mineo Nomoto , Toru Kurenuma , Yuichi Kunitomo , Yukio Kembo
发明人： Shigenobu Maruyama , Mineo Nomoto , Toru Kurenuma , Yuichi Kunitomo , Yukio Kembo
IPC分类号： G21K7/00
CPC分类号： G01Q10/04
摘要： A scanning probe microscope for measuring a surface profile of a sample by bringing a probe into close proximity to or contact with the surface of the sample and scanning the sample surface includes: a sample stage movable in at least one axis direction; the probe which is brought into close proximity to or contact with the surface of the sample mounted on the sample stage and scans the sample surface; a probe-driving unit for moving the probe three-dimensionally; a probe deflection detector for detecting a deflection of the probe; and an observation optical system which has an objective lens and observes the probe disposed on substantially the optical axis of the objective lens, and the sample. The probe-driving unit is disposed with three sets of paired drive sources arranged essentially with symmetry with respect to the optical axis of the objective lens.
摘要翻译：一种扫描探针显微镜，用于通过使探针靠近或接触样品的表面并扫描样品表面来测量样品的表面轮廓，包括：可在至少一个轴向移动的样品台; 该探头与安装在样品台上的样品的表面紧密接触或接触并扫描样品表面; 用于三维移动探头的探针驱动单元; 用于检测探针偏转的探针偏转检测器; 以及观察光学系统，其具有物镜并观察设置在物镜的基本光轴上的探针和样品。探针驱动单元设置有三组成对的驱动源，其基本上相对于物镜的光轴对称布置。

8. 发明授权

US08144337B2 Inspecting method and inspecting apparatus for substrate surface 有权
标题翻译：基板表面检查方法及检查装置
公开(公告)号：US08144337B2
公开(公告)日：2012-03-27
申请号：US12470505
申请日：2009-05-22
申请人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
发明人： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
IPC分类号： G01B11/30
CPC分类号： G01B11/303 , G01N21/47 , G01N21/94 , G01N21/9501
摘要： To inspect a substrate such as a semiconductor substrate for surface roughness at high precision.The surface roughness of the substrate is measured in each frequency band of the surface roughness by applying a light to the substrate surface and detecting a scattered light or reflected light at a plurality of azimuth or elevation angles.
摘要翻译：以高精度检查用于表面粗糙度的半导体基板等基板。通过向基板表面施加光并以多个方位角或仰角检测散射光或反射光，测量表面粗糙度的每个频带中的基板的表面粗糙度。

9. 发明授权

US5883437A Method and apparatus for inspection and correction of wiring of electronic circuit and for manufacture thereof 失效
标题翻译：电子电路接线检查和校正方法及装置及其制造方法
公开(公告)号：US5883437A
公开(公告)日：1999-03-16
申请号：US580531
申请日：1995-12-28
申请人： Shigenobu Maruyama , Mikio Hongo , Satoru Todoroki , Masaaki Okunaka , Hideo Matsuzaki , Takanori Ninomiya , Kazushi Yoshimura , Fumikazu Ito
发明人： Shigenobu Maruyama , Mikio Hongo , Satoru Todoroki , Masaaki Okunaka , Hideo Matsuzaki , Takanori Ninomiya , Kazushi Yoshimura , Fumikazu Ito
IPC分类号： G02F1/1362 , H01L21/48 , H01L23/48 , H01L29/40 , H01L29/52
CPC分类号： G02F1/136286 , H01L21/485 , G02F2001/136254 , H01L2924/0002
摘要： A method and apparatus for inspecting wirings of an electronic circuit substrate to detect a defect in the wiring and for enabling correction thereof. The inspection method and apparatus include electrostatically coupling at least one electrode to a wiring pattern, applying a time varying voltage between the electrode and wiring pattern at different locations so as to detect a current flow and determine a defect by a variation in the detected current flow at the different locations and a portion of the defect. A defect in the form of a disconnected or half-disconnected point of the wiring may be corrected by supplying a solution of a metal complex to the disconnected or half-disconnected point, heating the solution and end point areas of the disconnected or half-disconnected point by laser light and precipitating a metal thin film establishing a connection of the wiring.
摘要翻译：一种用于检查电子电路基板的布线以检测布线中的缺陷并使其能够进行校正的方法和装置。检查方法和装置包括将至少一个电极静电耦合到布线图案，在不同位置在电极和布线图案之间施加时变电压，以便检测电流，并通过检测电流的变化来确定缺陷在不同的位置和缺陷的一部分。可以通过将金属复合物的溶液提供给断开或半断开的点来加热接头的断开或半断开点的形式的缺陷，加热解决方案和终点区域的断开或半断开通过激光点并沉淀建立连线的金属薄膜。

10. 发明授权

US5832595A Method of modifying conductive lines of an electronic circuit board and its apparatus 失效
标题翻译：修改电子电路板导线及其装置的方法
公开(公告)号：US5832595A
公开(公告)日：1998-11-10
申请号：US260382
申请日：1994-06-14
申请人： Shigenobu Maruyama , Mikio Hongo , Haruhisa Sakamoto , Tateoki Miyauchi , Ryohei Satoh , Kiyoshi Matsui , Shinichi Kazui , Kaoru Katayama , Hiroshi Fukuda
发明人： Shigenobu Maruyama , Mikio Hongo , Haruhisa Sakamoto , Tateoki Miyauchi , Ryohei Satoh , Kiyoshi Matsui , Shinichi Kazui , Kaoru Katayama , Hiroshi Fukuda
IPC分类号： H01L23/538 , H01L21/48 , H01L23/12 , H05K1/09 , H05K3/00 , H05K3/02 , H05K3/10 , H05K3/22
CPC分类号： H01L21/485 , H05K3/225 , H05K1/095 , H05K2203/0769 , H05K2203/0783 , H05K2203/107 , H05K2203/108 , H05K2203/121 , H05K2203/173 , H05K2203/175 , H05K3/0017 , H05K3/027 , H05K3/102 , Y10T29/49124 , Y10T29/49718 , Y10T29/49732
摘要： A method of modifying an electronic circuit board by performing disconnection or connection of conductive lines at a specified or an arbitrary position of the conductive lines of the electronic circuit board thereby changing an electric circuit and of completely modifying an open pattern defect of the conductive lines or an insulator layer, and its device, wherein a first energy beam is irradiated to portions of repair terminals 9 and 9' which are intended to connect or disconnect, of conductive lines 5 and 5' in the electronic circuit board thereby removing a protection layer, making windows and exposing the terminals 9 and 9' for connection; a second energy beam is irradiated thereby disconnecting the repair terminals 9 and 9', or a metal piece for connecting is supplied to between the repair terminals 9 and 9' and applying an energy thereto thereby electrically connecting them; and the disconnected or connected windowed portion is locally coated with the insulator layer thereby modifying the conductive lines of the electronic circuit board. Further, windows 311 or 311' is formed in an insulating protection layer 310 on a conductive line connecting portion 308 formed in a couple or a conductive line disconnecting portion 309, a conductive line of the conductive line disconnecting portion is disconnected or a liquid material 312 for connecting conductive lines is supplied to the conductive line connecting portion 308, a metal layer 313 is precipitated by heating the liquid material 312 thereby connecting the conductive line connecting portion 308, and the window 311 or 311' is coated with an organic insulator layer.
摘要翻译：通过在电子电路板的导线的指定或任意位置执行导线的断开或连接来改变电子电路板的方法，从而改变电路并完全改变导电线的开路图案缺陷，或绝缘体层及其装置，其中第一能量束照射到旨在连接或断开电子电路板中的导线5和5'的修复端子9和9'的部分，从而去除保护层，制造窗户并露出端子9和9'用于连接; 照射第二能量束，从而断开维修端子9和9'，或者用于连接的金属片供应到修理端子9和9'之间并向其施加能量，从而电连接它们; 并且断开或连接的窗口部分局部地涂覆有绝缘体层，从而修改电子电路板的导线。此外，窗311或311'形成在形成在耦合或导线断路部分309中的导线连接部分308上的绝缘保护层310中，导线断开部分的导线被断开或液体材料312 用于连接导线的导线被提供给导线连接部分308，金属层313通过加热液体材料312而沉淀，从而连接导线连接部分308，并且窗311或311'被涂覆有机绝缘体层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式