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1. 发明授权

US4420233A Projecting apparatus 失效
标题翻译：投影仪
公开(公告)号：US4420233A
公开(公告)日：1983-12-13
申请号：US381675
申请日：1982-05-24
申请人： Mineo Nomoto , Katsuhiro Iwashita , Toru Otsubo , Susumu Aiuchi
发明人： Mineo Nomoto , Katsuhiro Iwashita , Toru Otsubo , Susumu Aiuchi
IPC分类号： G03B13/36 , G02B7/28 , G03B3/10 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30 , G03B27/34 , G03B21/28
CPC分类号： G03F7/70891 , G03B3/10 , G03F9/70
摘要： A projecting apparatus for forming an image of a mask on a wafer by a projector of a unit magnification reflection system having a concave spherical mirror and a convex spherical mirror. The distance from the projector to the mask or the upper side of a mask holder for holding the mask and the distance from the projector to the wafer are measured. An error of the image-forming position is computed from the distance measurements. At least one of the mask, the wafer and the projector is moved along the direction of projection in a manner to eliminate the error of the image-forming position computed, thus attaining automatic focus adjustment.
摘要翻译：一种用于通过具有凹球面镜和凸球面镜的单元放大反射系统的投影仪在晶片上形成掩模图像的投影设备。测量从投影仪到掩模的距离或用于保持面罩的掩模支架的上侧以及从投影仪到晶片的距离。从距离测量计算图像形成位置的误差。掩模，晶片和投影仪中的至少一个沿着投影方向移动，以消除所计算的图像形成位置的误差，从而获得自动聚焦调整。

2. 发明授权

US4675096A Continuous sputtering apparatus 失效
标题翻译：连续溅射装置
公开(公告)号：US4675096A
公开(公告)日：1987-06-23
申请号：US645671
申请日：1984-08-30
申请人： Hideki Tateishi , Tamotsu Shimizu , Susumu Aiuchi , Katsuhiro Iwashita , Hiroshi Nakamura
发明人： Hideki Tateishi , Tamotsu Shimizu , Susumu Aiuchi , Katsuhiro Iwashita , Hiroshi Nakamura
IPC分类号： B65G49/07 , C23C14/34 , C23C14/56 , H01L21/203 , C23C14/36
CPC分类号： C23C14/566 , C23C14/568
摘要： A continuous sputtering apparatus comprising a main vacuum chamber, one loading station and a plurality of process stations capable of having their pressures controlled separately. The process station includes a sub vacuum chamber capable of being in communication with the main vacuum chamber through an opening and an evacuation port. The loading station and the process stations are arranged to be spaced with equal angles. Substrate holders are provided to face the stations and are rotated by said equal angle in a time. The substrate holder opens and closes the opening of the sub vacuum chamber to serve as a gate valve.
摘要翻译：一种连续溅射装置，包括主真空室，一个装载站和能够分别控制其压力的多个处理站。处理站包括能够通过开口和排气口与主真空室连通的副真空室。装载站和处理站被布置为以相等角度间隔开。基板保持器被设置成面对车站，并且在一段时间内以相等的角度旋转。基板保持器打开和关闭副真空室的开口以用作闸阀。

3. 发明授权

US4405435A Apparatus for performing continuous treatment in vacuum 失效
标题翻译：用于在真空中进行连续处理的装置
公开(公告)号：US4405435A
公开(公告)日：1983-09-20
申请号：US296314
申请日：1981-08-26
申请人： Hideki Tateishi , Tsuneaki Kamei , Katsuo Abe , Shigeru Kobayashi , Susumu Aiuchi , Masashi Nakatsukasa , Nobuyuki Takahashi , Ryuji Sugimoto
发明人： Hideki Tateishi , Tsuneaki Kamei , Katsuo Abe , Shigeru Kobayashi , Susumu Aiuchi , Masashi Nakatsukasa , Nobuyuki Takahashi , Ryuji Sugimoto
IPC分类号： B01J3/00 , C23C14/56 , C23C15/00
CPC分类号： B01J3/006 , C23C14/566 , Y10S414/137 , Y10S414/139
摘要： An apparatus for performing continuous treatment in vacuum including an inlet chamber, a first intermediate chamber, at least one vacuum treating chamber, a second intermediate chamber and a withdrawing chamber arranged in the indicated order in a direction in which base plates are successively transferred. An opening device normally closed and opened when a base plate is transferred therethrough is mounted on a wall at the inlet of the inlet chamber, between the adjacent chambers and on a wall at the outlet side of the withdrawing chamber. A conveyor device for conveying each base plate in a horizontal direction through the opening device is mounted in each of the chambers, and an evacuating device is also mounted in each chamber. A base plate storing device for storing a plurality of base plates in a magazine is mounted in the first and second intermediate chambers. At least one vacuum treating device is mounted in the vacuum treating chamber.
摘要翻译：一种用于在真空中进行连续处理的装置，包括入口室，第一中间室，至少一个真空处理室，第二中间室和排出室，其按照依次传送基板的方向以指示的顺序排列。安装在入口室入口的壁上，在相邻的室之间和在抽出室的出口侧的壁上的壁上安装有一个通常关闭和打开底板的打开装置。用于通过打开装置沿水平方向输送每个基板的输送装置安装在每个室中，并且排气装置也安装在每个室中。在第一和第二中间室中安装有用于将多个基板存储在盒中的基板存储装置。至少一个真空处理装置安装在真空处理室中。

4. 发明授权

US4170418A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US4170418A
公开(公告)日：1979-10-09
申请号：US689818
申请日：1976-05-25
申请人： Susumu Aiuchi , Minoru Ikeda , Yoshio Matsumoto
发明人： Susumu Aiuchi , Minoru Ikeda , Yoshio Matsumoto
IPC分类号： G03B27/32 , G03F9/00 , G05D3/12 , H01L21/027 , H01L21/30 , G01B11/26
CPC分类号： G03F9/70
摘要： An alignment apparatus, in which a mask is overlaid on a wafer and a relative displacement between the wafer and a target pattern formed on the mask is detected to effect alignment thereof, comprises a slit frame adapted to reciprocate in a direction substantially parallel to the top surface of the mask and having a slit formed therein, an illumination optical system for illuminating the target pattern, an image formation optical system for forming the image of the target pattern onto the slit of the slit frame, a light sensing element mounted on the slit frame for detecting the target pattern image formed by the image formation optical system through the slit to convert the image into an electric signal, and a displacement detector for detecting the amount of movement of the reciprocation of the slit frame to convert the amount of movement into a position signal which the light sensing element scans, whereby the output signals from the displacement detector and the light sensing element are used to detect the relative position between the mask and the target pattern on the wafer and the mask is moved relative to the wafer such that the relative displacement amount becomes zero.
摘要翻译：其中掩模覆盖在晶片上并且在晶片和形成在掩模上的目标图案之间的相对位移被检测以对准其中的对准装置，包括适于沿基本上平行于顶部的方向往复运动的狭缝框架表面，其中形成有狭缝，用于照射目标图案的照明光学系统，用于将目标图案的图像形成在狭缝框的狭缝上的图像形成光学系统，安装在狭缝上的光感测元件框架，用于通过狭缝检测由图像形成光学系统形成的目标图案图像，以将图像转换为电信号;以及位移检测器，用于检测狭缝框架的往复运动量以将移动量转换为光感测元件扫描的位置信号，从而来自位移检测器和感光元件的输出信号 nt用于检测晶片上的掩模和目标图案之间的相对位置，并且掩模相对于晶片移动，使得相对位移量变为零。

5. 发明授权

US07020306B2 Polishing pad surface condition evaluation method and an apparatus thereof and a method of producing a semiconductor device 失效
标题翻译：抛光垫表面状态评价方法及其装置以及半导体装置的制造方法
公开(公告)号：US07020306B2
公开(公告)日：2006-03-28
申请号：US09774723
申请日：2001-02-01
申请人： Takenori Hirose , Hiroyuki Kojima , Mineo Nomoto , Susumu Aiuchi
发明人： Takenori Hirose , Hiroyuki Kojima , Mineo Nomoto , Susumu Aiuchi
IPC分类号： G06K9/00
CPC分类号： B24B37/20 , B24B49/12 , G01N21/41 , G01N21/55
摘要： The object of the present invention is to establish a technology for directly evaluating polishing pad surface conditions, to allow high-precision CMP process management, and to improve process throughput. The pad surface is illuminated with light. The intensity of reflected light or fluorescence from the illuminated area or an intensity distribution image is used directly evaluate the pad surface condition. Based on the results of this evaluation, conditioning conditions for a conditioner are optimized, thus allowing high-precision CMP processing while maintaining good pad surface conditions.
摘要翻译：本发明的目的是建立一种用于直接评估抛光垫表面状态，允许高精度CMP处理管理并提高工艺生产能力的技术。焊盘表面用光照亮。使用来自照射区域的反射光或荧光的强度或强度分布图像直接评估焊盘表面状况。根据该评价结果，对调理剂的调理条件进行优化，从而在保持良好的垫表面状态的同时进行高精度的CMP处理。

6. 发明授权

US06552771B1 Image display device and its repairing method and apparatus 有权
标题翻译：图像显示装置及其修复方法和装置
公开(公告)号：US06552771B1
公开(公告)日：2003-04-22
申请号：US09461730
申请日：1999-12-16
申请人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
发明人： Takashi Inoue , Shigenobu Maruyama , Toshio Asano , Susumu Aiuchi , Takeo Sawaguchi , Rokuro Watanabe
IPC分类号： G02F11336
CPC分类号： G02F1/1333 , G02F1/1309
摘要： An image display device for repairing a scratch or scratches on a surface or surfaces of a light transmitting member having an image display section such an extent that the presence of the scratch or scratches cannot be visually perceived at at least in a bright view distance in all directions, and in which device a liquid filler having a refractive index equivalent to or on the same order of that of the light transmitting member is locally filled only into an area of the scratch or scratches, and the filler is cured. By controlling an amount of the filler so that a difference in level between a surface of the light transmitting member and a surface of the filler is at least ±5.0 &mgr;m or less and that an angle defined between a surface of the filler and a surface of the light transmitting member is at least 45 degrees or less or preferably at least 10 degrees or less, it is possible to exhibit display quality to such a degree that the presence of the scratch or scratches cannot be recognized.
摘要翻译：一种图像显示装置，用于修复具有图像显示部分的光透射部件的表面或划痕上的划痕或划痕，其程度使得在至少所有的亮视距离中不能视觉地感觉划痕或划痕的存在方向，并且在该装置中，具有与透光构件的折射率相同或相同的折射率的液体填充剂局部地填充到划痕或划痕的区域中，并且填料被固化。通过控制填充剂的量使得透光构件的表面与填料的表面之间的水平差异至少为±5.0μm或更小，并且在填料的表面和表面之间限定的角度透光构件为至少45度以下，优选为10度以下，可以显示出不能识别出划痕或划痕的程度的显示质量。

7. 发明授权

US4744660A Apparatus for measuring difference in shallow level 失效
标题翻译：用于测量浅层差异的装置
公开(公告)号：US4744660A
公开(公告)日：1988-05-17
申请号：US850683
申请日：1986-04-11
申请人： Minori Noguchi , Toru Otsubo , Susumu Aiuchi
发明人： Minori Noguchi , Toru Otsubo , Susumu Aiuchi
IPC分类号： G01B11/22 , G01B9/02
CPC分类号： G01B11/22
摘要： An apparatus for measuring a difference in level in a sample comprises a light source section which provides illumination light of a variable-wavelength. The illumination light is irradiated onto the sample. A group of filters is provided for shielding diffraction light rays of O-order or other than O-order of the light reflected from the sample. The intensity of interference light of the light rays not shielded by the filter group is detected by a light detector which in turn converts it into an electric signal. An arithmetic operation unit receives the electric signal while the wavelength of the illumination light from the light source section is continuously varied. In the arithmetic unit, wavelengths at which the electric signal or detected light intensity takes extreme values are determined, and the level difference in the sample is determined on the basis of those wavelengths.
摘要翻译：用于测量样品中的电平差的装置包括提供可变波长的照明光的光源部分。将照明光照射到样品上。提供了一组滤光器，用于屏蔽从样品反射的光的O级或O级的衍射光线。不被滤光器组屏蔽的光线的干涉光的强度由光检测器检测，光检测器又将其转换为电信号。算术运算单元接收电信号，同时来自光源部分的照明光的波长连续变化。在算术单元中，确定电信号或检测光强取极值的波长，并根据这些波长确定样本中的电平差。

8. 发明授权

US4721553A Method and apparatus for microwave assisting sputtering 失效
标题翻译：微波辅助溅射的方法和装置
公开(公告)号：US4721553A
公开(公告)日：1988-01-26
申请号：US769505
申请日：1985-08-23
申请人： Hiroshi Saito , Yasumichi Suzuki , Shuuzoo Sano , Tamotsu Shimizu , Susumu Aiuchi
发明人： Hiroshi Saito , Yasumichi Suzuki , Shuuzoo Sano , Tamotsu Shimizu , Susumu Aiuchi
IPC分类号： H01L21/203 , C23C14/35 , H01J37/34 , C23C14/34
CPC分类号： C23C14/357 , H01J37/3405
摘要： Disclosed herein are apparatuses of several types for forming a film at an increased rate that is necessary for putting the microwave assisting sputtering into practice on an industrial scale. The feature resides in that a plasma is maintained uniformly on the whole surface of target composed of a material to be sputtered. This makes it possible to avoid the target from being thermally destroyed by the increased energy of sputtering. Further, in order to prevent damage on a substrate on which the film is to be sputtered by plasma for sputtering, consideration is given to the arrangement of magnetic devices in order to form the film by positively introducing the plasma onto the substrate on which the film is to be formed and, at the same time, effecting the sputtering. There are further disclosed an apparatus in which the plasma is generated by microwaves at a position close to the target to effectively utilize the energy of microwaves for the sputtering, and a cathode structure on which a conical target is placed by taking into consideration the fact that the sputtered particles emitted from the target travel in compliance with the cosine law.
摘要翻译：本文公开了用于以工业规模将微波辅助溅射实际需要的以增加的速率形成膜的几种类型的装置。特征在于，等离子体被均匀地保持在由要溅射的材料组成的靶的整个表面上。这使得可以避免由于溅射的能量的增加而使靶被热破坏。此外，为了防止溅射等离子体溅射膜的基板上的损伤，考虑到磁性器件的布置，以便通过将等离子体正向地引入到基板上形成膜，其中膜并且同时进行溅射。还公开了一种装置，其中等离子体是通过微波在靠近目标的位置产生的，以有效地利用微波的能量进行溅射，而阴极结构通过考虑以下事实放置圆锥形目标：从目标行程发射的溅射颗粒符合余弦定律。

9. 发明授权

US4615620A Apparatus for measuring the depth of fine engraved patterns 失效
标题翻译：用于测量精细雕刻图案深度的装置
公开(公告)号：US4615620A
公开(公告)日：1986-10-07
申请号：US685550
申请日：1984-12-24
申请人： Minori Noguchi , Toru Otsubo , Susumu Aiuchi
发明人： Minori Noguchi , Toru Otsubo , Susumu Aiuchi
IPC分类号： G01B11/22
CPC分类号： G01B11/22
摘要： An apparatus for measuring in a non-contact manner the depth of pits and grooves formed by etching in periodic patterns on the surface of a substrate. The measurement is based on the detection of the intensity of a diffraction ray excluding that of the 0th order through the irradiation of a light beam with variable wave length to the sample. Whereas, the conventional measuring system is sensitive to a diffraction ray of the 0th order, i.e., the major component of the reflected light, that hampers the detection of a higher order diffraction ray carrying information of the depth.
摘要翻译：一种用于以非接触方式测量在衬底的表面上以周期性图案蚀刻形成的凹坑和凹槽的深度的装置。该测量基于通过对样品照射具有可变波长的光束而不考虑第0级的衍射强度的检测。而传统的测量系统对第0级的衍射光线（即反射光的主要分量）敏感，这阻碍了检测到承载深度信息的较高阶衍射光线。

10. 发明授权

US4610770A Method and apparatus for sputtering 失效
标题翻译：溅射的方法和装置
公开(公告)号：US4610770A
公开(公告)日：1986-09-09
申请号：US686005
申请日：1984-12-24
申请人： Hiroshi Saito , Hideki Tateishi , Shigeru Kobayashi , Susumu Aiuchi , Yasumichi Suzuki , Masao Sakata , Hideaki Shimamura , Tsuneaki Kamei
发明人： Hiroshi Saito , Hideki Tateishi , Shigeru Kobayashi , Susumu Aiuchi , Yasumichi Suzuki , Masao Sakata , Hideaki Shimamura , Tsuneaki Kamei
IPC分类号： C23C14/36 , C23C14/34 , C23C14/35 , C23C14/46 , H01J37/34 , H01L21/203 , H01L21/31
CPC分类号： H01J37/32192 , C23C14/34 , C23C14/46 , H01J37/3266 , H01J37/34
摘要： A pair of magnets for producing a mirror magnetic field are disposed outside of an electrode structure carrying a target. Microwaves from a microwave source are introduced toward and into a space defined by the mirror magnetic field for generating high-density plasma. While maintaining this high-density plasma over a wide area of the surface of the target, an electric field substantially perpendicular to the surface of the target is applied for sputtering of the target material. The optimized conditions for plasma generation can be selected when the high-density plasma formed outside of a processing chamber is guided to migrate toward an area above the target in the processing chamber. Capability of sputtering of the material from the entire surface of the target increases the rate of film deposition on a substrate and improves the target utilization rate (the quantity of the material deposited on the substrate/the usable area of the target).
摘要翻译：用于产生镜面磁场的一对磁体设置在承载目标的电极结构的外侧。来自微波源的微波被引入并由用于产生高密度等离子体的反射镜磁场限定的空间中。当在靶的表面的较宽区域上保持这种高密度等离子体时，施加基本上垂直于靶的表面的电场，以溅射目标材料。当在处理室外部形成的高密度等离子体被引导以朝向处理室内的目标区域迁移时，可以选择等离子体产生的优化条件。从靶的整个表面溅射材料的能力增加了基板上的膜沉积速率，并提高了目标利用率（沉积在基板上的材料的量/目标的可用面积）。

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