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1. 发明授权

US5633175A Process for stripping photoresist while producing liquid crystal display device 失效
标题翻译：制造液晶显示装置时剥离光刻胶的方法
公开(公告)号：US5633175A
公开(公告)日：1997-05-27
申请号：US373769
申请日：1995-01-17
申请人： Hiroshi Kikuchi , Yasushi Sano , Satoru Todoroki , Hitoshi Oka , Toshiyuki Koshita , Masato Kikuchi , Mitsuo Nakatani , Michio Tsukii
发明人： Hiroshi Kikuchi , Yasushi Sano , Satoru Todoroki , Hitoshi Oka , Toshiyuki Koshita , Masato Kikuchi , Mitsuo Nakatani , Michio Tsukii
IPC分类号： C11D7/32 , G02F1/1362 , G03F7/42 , B08B3/08 , B08B3/10 , H01L21/335
CPC分类号： C11D7/3218 , G03F7/425 , G02F1/1362 , Y10S438/951
摘要： A liquid crystal display device is produced by effecting in the course of its production steps a resist-peeling method including the steps of (a) changing the quality of a resist layer on a substrate, (b) contacting the changed resist with a liquid containing 2-amino-1-ethanol, and (c) removing the liquid containing the thus peeled resist from the surface of the etched resist, and optionally, (d) regenerating a liquid containing 2-amino-1-ethanol by distillation from the liquid used in step (c) and reusing the regenerated liquid in step (b).
摘要翻译：通过在其制造步骤中进行抗蚀剂剥离方法来制造液晶显示装置，该方法包括以下步骤：（a）改变基板上的抗蚀剂层的质量，（b）使改变的抗蚀剂与含有 2-氨基-1-乙醇，和（c）从蚀刻抗蚀剂的表面除去含有这样剥离的抗蚀剂的液体，任选地，（d）通过蒸馏从液体中再生含有2-氨基-1-乙醇的液体在步骤（c）中使用并在步骤（b）中重新使用再生液体。

2. 发明授权

US5399202A Resist-peeling liquid and process for peeling a resist using the same 失效
标题翻译：抗剥离液体及使用其的剥离抗蚀剂的方法
公开(公告)号：US5399202A
公开(公告)日：1995-03-21
申请号：US986683
申请日：1992-12-08
申请人： Hiroshi Kikuchi , Yasushi Sano , Satoru Todoroki , Hitoshi Oka , Toshiyuki Koshita , Masato Kikuchi , Mitsuo Nakatani , Michio Tsukii
发明人： Hiroshi Kikuchi , Yasushi Sano , Satoru Todoroki , Hitoshi Oka , Toshiyuki Koshita , Masato Kikuchi , Mitsuo Nakatani , Michio Tsukii
IPC分类号： C23F1/00 , C09D9/00 , C11D7/32 , G02F1/1362 , G03F7/42 , H01L21/027 , H01L21/30 , H01L21/302 , H01L21/3065 , H05K3/06 , B08B3/08 , B08B3/10
CPC分类号： C11D7/3281 , C11D7/3218 , G03F7/425 , G02F1/1362
摘要： A resist is peeled without leaving a residue after peeling, by bringing a resist-peeling liquid comprising a primary aliphatic amine of 2-6 carbon atoms into contact with the surface of an etched novolak positive photoresist, and removing the resist-peeling liquid containing the thus peeled resist from the surface of the etched resist. The used resist-peeling liquid can easily be recovered and regenerated.
摘要翻译：通过使包含2-6个碳原子的脂肪族脂族胺的抗蚀剂剥离液与蚀刻的酚醛清漆型正性光致抗蚀剂的表面接触，除去剥离后的残留物，除去含有从而从蚀刻抗蚀剂的表面剥离抗蚀剂。所使用的抗蚀剂剥离液可以容易地回收和再生。

3. 发明授权

US5272360A Thin film transistor having enhance stability in electrical characteristics 失效
标题翻译：具有增强电特性稳定性的薄膜晶体管
公开(公告)号：US5272360A
公开(公告)日：1993-12-21
申请号：US662635
申请日：1991-02-28
申请人： Satoru Todoroki , Masahiro Tanaka , Kunihiko Watanabe , Mitsuo Nakatani
发明人： Satoru Todoroki , Masahiro Tanaka , Kunihiko Watanabe , Mitsuo Nakatani
IPC分类号： C23C16/511 , G02F1/1368 , H01L21/318 , H01L21/77 , H01L21/84 , H01L29/49 , H01L27/01 , H01L27/13 , H01L29/78
CPC分类号： C23C16/511 , H01L21/3185 , H01L27/1214 , H01L29/4908 , G02F1/1368
摘要： A microwave plasma enhanced CVD method and apparatus wherein a microwave is applied, after expanded, over a greater area than the area in which a desired thin film is to be formed. With this arrangement, uniform microwave application is assured to produce uniform plasma over a wide area. This enables realization of a large size liquid crystal display.
摘要翻译：一种微波等离子体增强CVD方法和装置，其中在扩展之后，在比要形成所需薄膜的区域更大的面积上施加微波。通过这种布置，可以确保均匀的微波应用在广泛的区域上产生均匀的等离子体。这使得能够实现大尺寸液晶显示器。

4. 发明授权

US5243259A Microwave plasma processing apparatus 失效
标题翻译：微波等离子体处理装置
公开(公告)号：US5243259A
公开(公告)日：1993-09-07
申请号：US798901
申请日：1991-11-27
申请人： Junji Sato , Kazuo Suzuki , Shunichi Hirose , Takuya Fukuda , Satoru Todoroki
发明人： Junji Sato , Kazuo Suzuki , Shunichi Hirose , Takuya Fukuda , Satoru Todoroki
IPC分类号： H01L21/302 , H01J37/32 , H01L21/205 , H01L21/3065
CPC分类号： H01J37/32834 , H01J37/32192 , H01J37/32458 , H01J37/32678
摘要： The present invention relates to a microwave plasma processing apparatus for processing such as thin film formation, etching, sputtering, and plasma oxidation, etc., on a surface of a processing object by utilizing a high density plasma generated by electron cyclotron resonance. A vacuum vessel of the apparatus, in which a microwave transmitted by a microwave guide is utilized for converting gas supplied to the vacuum vessel to plasma for the plasma processing of the processing object placed in the vacuum vessel, is formed in, such manner that the interior space of the vacuum vessel extends beyond the outer periphery of magnetic field generating coils, and the extended portion of the vessel is provided with a gas outlet for connection with an evacuation apparatus to evacuate the interior of the vacuum vessel to a desired vacuum degree. Accordingly, preferable evacuating characteristics can be obtained even in a case when a large amount of the reaction gas is supplied to the vacuum vessel in order to process a large size processing object, because the vacuum vessel in which the processing object is placed can be connected with the evacuation apparatus through a space and the same effect as if the evacuation apparatus is directly connected with the vacuum vessel is realized.
摘要翻译：微波等离子体处理装置技术领域本发明涉及利用电子回旋共振产生的高密度等离子体，在加工对象的表面上进行薄膜形成，蚀刻，溅射，等离子体氧化等处理的微波等离子体处理装置。该装置的真空容器用微波导流器传输的微波用于将供给真空容器的气体转化为等离子体，用于放置在真空容器中的处理物体的等离子体处理，使得真空容器的内部空间延伸超过磁场产生线圈的外周，并且容器的延伸部分设置有气体出口，用于与排气装置连接以将真空容器的内部抽空至期望的真空度。因此，即使在将大量的反应气体供给到真空容器中以处理大型加工对象的情况下也可以获得优选的排气特性，因为可以连接处理对象物的真空容器通过空间排出装置，实现与抽真空装置直接与真空容器连接的效果相同的效果。

5. 发明授权

US5883437A Method and apparatus for inspection and correction of wiring of electronic circuit and for manufacture thereof 失效
标题翻译：电子电路接线检查和校正方法及装置及其制造方法
公开(公告)号：US5883437A
公开(公告)日：1999-03-16
申请号：US580531
申请日：1995-12-28
申请人： Shigenobu Maruyama , Mikio Hongo , Satoru Todoroki , Masaaki Okunaka , Hideo Matsuzaki , Takanori Ninomiya , Kazushi Yoshimura , Fumikazu Ito
发明人： Shigenobu Maruyama , Mikio Hongo , Satoru Todoroki , Masaaki Okunaka , Hideo Matsuzaki , Takanori Ninomiya , Kazushi Yoshimura , Fumikazu Ito
IPC分类号： G02F1/1362 , H01L21/48 , H01L23/48 , H01L29/40 , H01L29/52
CPC分类号： G02F1/136286 , H01L21/485 , G02F2001/136254 , H01L2924/0002
摘要： A method and apparatus for inspecting wirings of an electronic circuit substrate to detect a defect in the wiring and for enabling correction thereof. The inspection method and apparatus include electrostatically coupling at least one electrode to a wiring pattern, applying a time varying voltage between the electrode and wiring pattern at different locations so as to detect a current flow and determine a defect by a variation in the detected current flow at the different locations and a portion of the defect. A defect in the form of a disconnected or half-disconnected point of the wiring may be corrected by supplying a solution of a metal complex to the disconnected or half-disconnected point, heating the solution and end point areas of the disconnected or half-disconnected point by laser light and precipitating a metal thin film establishing a connection of the wiring.
摘要翻译：一种用于检查电子电路基板的布线以检测布线中的缺陷并使其能够进行校正的方法和装置。检查方法和装置包括将至少一个电极静电耦合到布线图案，在不同位置在电极和布线图案之间施加时变电压，以便检测电流，并通过检测电流的变化来确定缺陷在不同的位置和缺陷的一部分。可以通过将金属复合物的溶液提供给断开或半断开的点来加热接头的断开或半断开点的形式的缺陷，加热解决方案和终点区域的断开或半断开通过激光点并沉淀建立连线的金属薄膜。

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