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1. 发明授权

US08982332B2 Distance measuring device and distance measuring method 有权
标题翻译：距离测量装置和距离测量方法
公开(公告)号：US08982332B2
公开(公告)日：2015-03-17
申请号：US13518727
申请日：2011-01-28
申请人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
发明人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
IPC分类号： G01C3/08 , G01S17/36
CPC分类号： G01S17/36 , G01B9/02003 , G01B9/02007 , G01B9/02008 , G01B9/0207 , G01S7/4815 , G01S7/4911 , G01S17/42
摘要： Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
摘要翻译：公开了使用光梳的距离测量装置。为了使具有低反射率或散射面的表面的测量对象的绝对距离相差10微米，使用光学和非接触方法可以容易地测量精度为0.1mm以上，测量到被测量物体的距离的距离测量装置被配置为通过比较反射或散射的光源和多个CW激光器之间的拍频信号的相位来测量到被测量物体的距离在被照射到物体上之前，通过光源和多个CW激光器之间的拍频信号的相位的对象。

2. 发明授权

US08659761B2 Method and apparatus for measuring displacement of a sample using a wire grid polarizer to generate interference light 有权
标题翻译：用于使用线栅偏振器测量样品的位移以产生干涉光的方法和装置
公开(公告)号：US08659761B2
公开(公告)日：2014-02-25
申请号：US13302948
申请日：2011-11-22
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.
摘要翻译：在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

3. 发明授权

US08553214B2 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US08553214B2
公开(公告)日：2013-10-08
申请号：US12876709
申请日：2010-09-07
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括光源，具有偏振控制器和物镜的照明单元，用于利用从光源发射并通过偏振控制器和物镜的光照射样本;检测单元，具有用于检测由所述照明单元照射的样本的光;处理器，其处理从所述传感器输出的信号以检测所述样本上的缺陷;以及显示器，其显示从所述处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

4. 发明授权

US08275189B2 Defect inspection system 有权
标题翻译：缺陷检查系统
公开(公告)号：US08275189B2
公开(公告)日：2012-09-25
申请号：US12957018
申请日：2010-11-30
申请人： Taketo Ueno , Yasuhiro Yoshitake
发明人： Taketo Ueno , Yasuhiro Yoshitake
IPC分类号： G06K9/00 , G01R31/26 , G01N21/00 , G06F17/50
CPC分类号： G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
摘要： The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
摘要翻译：本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度设定检查条件的人员，以协助检查条件设定。在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积，并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。

5. 发明授权

US08227265B2 Method of measuring pattern shape, method of manufacturing semiconductor device, and process control system 有权
标题翻译：测量图案形状的方法，制造半导体器件的方法以及过程控制系统
公开(公告)号：US08227265B2
公开(公告)日：2012-07-24
申请号：US12823024
申请日：2010-06-24
申请人： Kana Nemoto , Shunichi Matsumoto , Yasuhiro Yoshitake
发明人： Kana Nemoto , Shunichi Matsumoto , Yasuhiro Yoshitake
IPC分类号： H01L21/66
CPC分类号： G01B11/24 , G01B2210/56 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of measuring a pattern shape of performing a shape measurement of a semiconductor pattern at a high accuracy even when a process margin is narrow with respect to miniaturization of a semiconductor device is provided. In the method of measuring a pattern shape, when a best-match calculated waveform cannot be selected, at least one parameter among shape parameters is set as a fixed value based on information obtained by another measurement apparatus that uses a measurement method independent to the pattern shape measurement, a matching of a library and a detected waveform is performed again, a best-match calculated waveform is selected, and shape information of an object pattern is obtained from the best-match calculated waveform.
摘要翻译：提供了即使当相对于半导体器件的小型化而处理裕度窄时，也可以高精度地测量执行半导体图案的形状测量的图案形状的方法。在测定图案形状的方法中，当不能选择最佳匹配计算波形时，基于使用独立于图案的测量方法的另一测量装置获得的信息，将形状参数中的至少一个参数设置为固定值形状测量，再次执行库和检测波形的匹配，选择最佳匹配计算波形，并根据最佳匹配计算波形获得目标图形的形状信息。

6. 发明授权

US08064066B2 Method and apparatus for measuring displacement of a sample to be inspected using an interference light 有权
标题翻译：使用干涉光测量被检样品的位移的方法和装置
公开(公告)号：US08064066B2
公开(公告)日：2011-11-22
申请号：US12605089
申请日：2009-10-23
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.
摘要翻译：在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

7. 发明申请

US20110279820A1 DUV-UV BAND SPECTROSCOPIC OPTICAL SYSTEM AND SPECTROMETER USING SAME 有权
标题翻译： DUV-UV带光谱系统和使用它的光谱仪
公开(公告)号：US20110279820A1
公开(公告)日：2011-11-17
申请号：US13145942
申请日：2009-12-17
申请人： Keiko Oka , Yasuhiro Yoshitake
发明人： Keiko Oka , Yasuhiro Yoshitake
IPC分类号： G01N21/47
CPC分类号： G01B11/0625 , G01B2210/56 , G01J3/02 , G01J3/0208 , G01J3/0278 , G01J3/0297 , G01J3/10 , G01N21/9501 , G01N21/956 , G02B13/143 , G02B21/16 , G02B27/0025 , G11B5/84
摘要： Disclosed are a spectroscopic optical system and a spectrometer both enabling vertical illumination by means of an optical system using only refractive lenses and enabling wide-band color correction in the DUV-UV (190 to 400 nm) range. The spectroscopic optical system and spectrometer each comprise a light source (100), a folding mirror (110), a field stop (120), an object-side focusing lens system (130) for focusing light onto a sample, an image-side focusing lens (140) disposed on the image forming plane of the object-side focusing lens system, and a spectroscope (150) for dispersing regularly reflected light from the sample. The object-side focusing lens system (130) and the image-side focusing lens system (140) are each a spectroscopic optical system corrected with respect to color in a broad band of wavelength from 190 to 400 nm and configured from only refractive lenses enabling vertical illumination. The working distance (WD) of each lens is set shorter than a predetermined distance, and the doublet interval (D) is set longer than a predetermined distance.
摘要翻译：公开了一种分光光学系统和光谱仪，其通过仅使用折射透镜的光学系统实现垂直照明，并且能够在DUV-UV（190-400nm）范围内实现宽带色彩校正。分光光学系统和光谱仪各自包括光源（100），折叠镜（110），场停止器（120），用于将光聚焦到样本上的物体侧聚焦透镜系统（130），图像侧设置在物体侧聚焦透镜系统的图像形成平面上的聚焦透镜（140）以及用于从样品中均匀地分散反射光的分光镜（150）。物体侧聚焦透镜系统（130）和图像侧聚焦透镜系统（140）分别是相对于190至400nm的波长宽带中的颜色校正的分光光学系统，并且仅由折射透镜构成，使得能够垂直照明每个透镜的工作距离（WD）设定为短于预定距离，并且双重间隔（D）被设定为比预定距离长。

8. 发明申请

US20100182589A1 SPECTRAL DETECTION METHOD AND DEVICE, AND DEFECT INSPECTION METHOD AND APPARATUS USING THE SAME 有权
标题翻译：光谱检测方法和装置，以及缺陷检查方法和使用其的装置
公开(公告)号：US20100182589A1
公开(公告)日：2010-07-22
申请号：US12626963
申请日：2009-11-30
申请人： Takenori HIROSE , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
发明人： Takenori HIROSE , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
IPC分类号： G01J3/08 , G01J3/00
CPC分类号： G01J3/02 , G01B2210/56 , G01J3/0208 , G01J3/021 , G01J3/0229 , G01N21/95607
摘要： In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.
摘要翻译：在用于检测在测试对象的表面上均匀形成的重复图案结构的形状的光谱检测中，有利的是在短波长范围内使用宽波长范围的光。然而，实现能够在短波长区域即紫外线区域中具有宽波长范围的光的光谱检测的相对简单的光学系统是不容易的。本发明提供一种用于检测图案缺陷的检查装置。检查装置包括能够对从深紫外线到近红外线的波长范围内的光进行光谱检测的光谱检测光学系统。光谱检测光学系统包括用作半反射镜的空间部分反射镜和设置有孔径光阑的反射物镜，该孔径光阑用于限制被施加到测试对象并由被测物体反射的光的角度和方向。

9. 发明授权

US07599076B2 Method for optically detecting height of a specimen and charged particle beam apparatus using the same 有权
标题翻译：用于光学检测样品的高度的方法和使用其的带电粒子束装置的方法
公开(公告)号：US07599076B2
公开(公告)日：2009-10-06
申请号：US11591563
申请日：2006-11-02
申请人： Keiya Saito , Masahiro Watanabe , Yasuhiro Yoshitake
发明人： Keiya Saito , Masahiro Watanabe , Yasuhiro Yoshitake
IPC分类号： G01B11/28
CPC分类号： G01B11/0608 , H01J37/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/20292 , H01J2237/216 , H01J2237/2482 , H01J2237/2817
摘要： The present invention provides an optical height detection method and electron beam apparatus to which the method is applied, in which the focusing accuracy of the CD-SEM apparatus, a SEM inspection apparatus, and others is improved by reducing detection errors and improving detection accuracy so as to improve the accuracy of the optical height detection method, and throughput of a CD-SEM apparatus or others is improved by reducing the processing time of automatic focus control performed based on the detected height according to the optical height detection method. An optical detection optical system projects two-dimensional slit light to a measurement object from diagonally above it, detects the light reflected by the measurement object, converts a detected two-dimensional slit image into an electrical signal by a two-dimensional area sensor, eliminates slit parts having a large detection error from the electrical signal, and detects the height of the measurement object.
摘要翻译：本发明提供了采用该方法的光学高度检测方法和电子束装置，其中通过降低检测误差并提高检测精度来提高CD-SEM装置，SEM检查装置等的聚焦精度为了提高光学高度检测方法的精度，通过根据光学高度检测方法减少基于检测到的高度进行的自动聚焦控制的处理时间来提高CD-SEM装置等的生产量。光学检测光学系统将二维狭缝光从对角线投射到测量对象上，检测由测量对象反射的光，通过二维区域传感器将检测到的二维狭缝图像转换为电信号，消除狭缝部分具有来自电信号的大的检测误差，并且检测测量对象的高度。

10. 发明申请

US20090073443A1 Method And Equipment For Detecting Pattern Defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20090073443A1
公开(公告)日：2009-03-19
申请号：US12271348
申请日：2008-11-14
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括发射紫外线激光的光源，具有偏振光控制器和物镜的照明单元，用于利用从光源发出并通过偏振光控制器和物镜的光照射样本，检测单元，具有用于检测由照明单元照射的样本的光的传感器;处理器，处理从传感器输出的信号以检测样本上的缺陷;以及显示器，显示从处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

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