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1. 发明授权

US07368741B2 Extreme ultraviolet light source 失效
标题翻译：极紫外光源
公开(公告)号：US07368741B2
公开(公告)日：2008-05-06
申请号：US11107535
申请日：2005-04-14
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译：本发明提供了一种可靠，高重复率的生产线兼容高能光子源。在真空室中产生含有活性物质的非常热的等离子体。活性物质是具有期望的极紫外（EUV）范围内的发射线的原子元素。包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲，其具有足够的能量和电势，足以以超过5瓦的速率在中间焦点处产生EUV光。在由申请人带内设计的优选实施例中，中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。

2. 发明授权

US06972421B2 Extreme ultraviolet light source 失效
标题翻译：极紫外光源
公开(公告)号：US06972421B2
公开(公告)日：2005-12-06
申请号：US10409254
申请日：2003-04-08
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24 , H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译：本发明提供了一种可靠，高重复率的生产线兼容高能光子源。在真空室中产生含有活性物质的非常热的等离子体。活性物质是具有期望的极紫外（EUV）范围内的发射线的原子元素。包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲，其具有足够的能量和电势，足以以超过5瓦的速率在中间焦点处产生EUV光。在由申请人带内设计的优选实施例中，中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。

3. 发明申请

US20100176313A1 Extreme ultraviolet light source 审中-公开
标题翻译：极紫外光源
公开(公告)号：US20100176313A1
公开(公告)日：2010-07-15
申请号：US12653585
申请日：2009-12-14
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.
摘要翻译：公开了一种用于产生EUV辐射的装置，其可以包括目标材料，产生用于与靶材料相互作用的激光束的系统和一对电极。可以提供脉冲功率电路用于在所述电极之间产生放电以从所述目标材料产生EUV辐射。

4. 发明授权

US06815700B2 Plasma focus light source with improved pulse power system 失效
标题翻译：等离子聚焦光源具有改进的脉冲电源系统
公开(公告)号：US06815700B2
公开(公告)日：2004-11-09
申请号：US10189824
申请日：2002-07-03
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin
IPC分类号： H05H104
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. Special techniques are described for cooling the central electrode. In one example, water is circulated through the walls of the hollow electrode. In another example, a heat pipe cooling system is described for cooling the central electrode.
摘要翻译：本发明提供了一种高能量光子源。一对等离子体夹紧电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。脉冲电源在电压足够高的电压下提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在源或活性气体的光谱线处提供辐射。优选地，电极被同轴配置。中心电极优选是中空电极，并且活性气体从中空电极引出。这允许对光谱线源进行优化和缓冲气体的单独优化。在优选的实施例中，中心电极用高的负电脉冲脉冲，使得中心电极用作空心阴极。本发明优选的实施例公开了电容值的优化，阳极长度和形状以及优选的活性气体输送系统。优选实施例还包括脉冲功率系统，其包括充电电容器和包括脉冲变压器的磁压缩电路。描述了用于冷却中心电极的特殊技术。在一个实例中，水通过中空电极的壁循环。在另一个实例中，描述了用于冷却中心电极的热管冷却系统。

5. 发明授权

US07291853B2 Discharge produced plasma EUV light source 失效
标题翻译：放电产生等离子体EUV光源
公开(公告)号：US07291853B2
公开(公告)日：2007-11-06
申请号：US11493945
申请日：2006-07-26
申请人： Igor V. Fomenkov , William N. Partlo , Gerry M. Blumenstock , Nortbert Bowering , I. Roger Oliver , Xiaojiang Pan , Rodney D. Simmons
发明人： Igor V. Fomenkov , William N. Partlo , Gerry M. Blumenstock , Nortbert Bowering , I. Roger Oliver , Xiaojiang Pan , Rodney D. Simmons
IPC分类号： H01J65/04
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70825 , G03F7/70891 , G03F7/70908 , G03F7/70916 , G21K1/06 , G21K2201/064 , G21K2201/067 , H01S3/005 , H01S3/225 , H05G2/005 , H05H1/06
摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.
摘要翻译：公开了一种DPP EUV源，其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽，其可以包括多个曲线屏蔽构件，其具有通过与焦点对准的光通道连接的内表面和外表面，该屏蔽构件可以与它们之间的开放空间交替，并且可以具有形成圆在一个轴或旋转，另一个椭圆。源可以具有可操作地连接到收集器的温度控制机构，并且可操作地调节相应壳体部件的温度，以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角，或机械定位器壳成员。

6. 发明授权

US06586757B2 Plasma focus light source with active and buffer gas control 失效
公开(公告)号：US06586757B2
公开(公告)日：2003-07-01
申请号：US09875719
申请日：2001-06-06
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx late of , Richard L. Sandstrom , John E. Rauch
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx late of , Richard L. Sandstrom , John E. Rauch
IPC分类号： H01J3520
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70908 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater. Gas flows in the vacuum chamber are controlled to assure desired concentration of active gas in the discharge region and to minimize active gas concentration in the beam path downstream of the pinch region. In a preferred embodiment, active gas is injected downstream of the pinch region and exhausted axially through the center of the anode. In another preferred embodiment a laser beam generates metal vapor at a location close to but downstream of the pinch region and the vapor is exhausted axially through the anode.

7. 发明授权

US06566668B2 Plasma focus light source with tandem ellipsoidal mirror units 有权
公开(公告)号：US06566668B2
公开(公告)日：2003-05-20
申请号：US09875721
申请日：2001-06-06
申请人： John E. Rauch , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx , Richard L. Sandstrom , Stephan T. Melnychuk
发明人： John E. Rauch , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx , Richard L. Sandstrom , Stephan T. Melnychuk
IPC分类号： H05H104
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.

8. 发明授权

US06757316B2 Four KHz gas discharge laser 有权
标题翻译：四KHz气体放电激光器
公开(公告)号：US06757316B2
公开(公告)日：2004-06-29
申请号：US09854097
申请日：2001-05-11
申请人： Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
发明人： Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
IPC分类号： H01S322
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

9. 发明授权

US06882674B2 Four KHz gas discharge laser system 有权
标题翻译：四KHz气体放电激光系统
公开(公告)号：US06882674B2
公开(公告)日：2005-04-19
申请号：US10036676
申请日：2001-12-21
申请人： Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
发明人： Christian J. Wittak , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov , Thomas D. Steiger , Jerome A. Emilo , Clay C. Titus , Alex P. Ivaschenko , Paolo Zambon , Gamaralalage G. Padmabandu , Mark S. Branham , Sunjay Phatak , Raymond F. Cybulski
IPC分类号： H01S3/097 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/23 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70933 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/041 , H01S3/0975 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

10. 发明授权

US06566667B1 Plasma focus light source with improved pulse power system 失效
标题翻译：等离子聚焦光源具有改进的脉冲电源系统
公开(公告)号：US06566667B1
公开(公告)日：2003-05-20
申请号：US09690084
申请日：2000-10-16
申请人： William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Daniel L. Birx
发明人： William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Daniel L. Birx
IPC分类号： H05H134
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially with the anode on the axis. The anode is preferably hollow and the active gas is introduced through the anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. A heat pipe cooling system is described for cooling the central anode.
摘要翻译：高能光子源。一对等离子体夹紧电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。脉冲电源在电压足够高的电压下提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在源或活性气体的光谱线处提供辐射。优选地，电极与轴上的阳极同轴地配置。阳极优选是中空的，并且活性气体通过阳极引入。这允许对光谱线源进行优化和缓冲气体的单独优化。本发明优选的实施例公开了电容值的优化，阳极长度和形状以及优选的活性气体输送系统。优选实施例还包括脉冲功率系统，其包括充电电容器和包括脉冲变压器的磁压缩电路。描述了用于冷却中央阳极的热管冷却系统。

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