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1. 发明授权

US07369596B2 Chamber for a high energy excimer laser source 有权
标题翻译：用于高能量准分子激光源的腔室
公开(公告)号：US07369596B2
公开(公告)日：2008-05-06
申请号：US11447502
申请日：2006-06-05
申请人： Thomas D Steiger , William N. Partlo
发明人： Thomas D Steiger , William N. Partlo
IPC分类号： H01S3/22 , H01S3/223 , H01S3/03
CPC分类号： H01S3/225 , H01S3/03 , H01S3/036 , H01S3/038
摘要： A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.
摘要翻译：公开了一种用于气体放电激光器的室，并且可以包括具有壁的室壳体，该壁具有围绕室容积的内表面和外表面，该壁还形成有孔口。对于腔室，至少一个电导体可以延伸通过孔口以将电流传递到腔体积中。构件可以设置在导体和壁之间，用于防止气体流过孔口，以允许室压力保持在容积中。腔室可以进一步包括邻近孔口设置的加压隔室，用于在壁的外表面的至少一部分上保持压力，以减小由于腔室压力而在孔口附近的壁的弯曲。

2. 发明申请

US20070280323A1 Chamber for a high energy excimer laser source 有权
标题翻译：用于高能量准分子激光源的腔室
公开(公告)号：US20070280323A1
公开(公告)日：2007-12-06
申请号：US11447502
申请日：2006-06-05
申请人： Thomas D. Steiger , William N. Partlo
发明人： Thomas D. Steiger , William N. Partlo
IPC分类号： H01S3/03 , H01S3/22 , H01S3/223
CPC分类号： H01S3/225 , H01S3/03 , H01S3/036 , H01S3/038
摘要： A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.
摘要翻译：公开了一种用于气体放电激光器的室，并且可以包括具有壁的室壳体，该壁具有围绕室容积的内表面和外表面，该壁还形成有孔口。对于腔室，至少一个电导体可以延伸通过孔口以将电流传递到腔体积中。构件可以设置在导体和壁之间，用于防止气体流过孔口，以允许室压力保持在容积中。腔室可以进一步包括邻近孔口设置的加压隔室，用于在壁的外表面的至少一部分上保持压力，以减小由于腔室压力而在孔口附近的壁的弯曲。

3. 发明授权

US4894208A System for separating radioactive NA from Al 失效
标题翻译：将放射性NA与Al分离的系统
公开(公告)号：US4894208A
公开(公告)日：1990-01-16
申请号：US219092
申请日：1988-07-14
申请人： Henry C. Griffin , Thomas D. Steiger
发明人： Henry C. Griffin , Thomas D. Steiger
IPC分类号： C22B21/06 , C22B26/10
CPC分类号： C22B21/06 , C22B26/10
摘要： A system for extracting sodium, particularly radioactive .sup.22 Na, from aluminum utilizes a monel exhaust system for exhausting sodium vapor emitted from a molten aluminum target, in a draft of helium gas. The aluminum target is heated until it is melted in a graphite support cup. The graphite support does not react with the sodium. Moreover, the graphite is understood to be permeable to the helium gas, its porosity being believed to provide the significant advantage that the graphite holder will not absorb much of the sodium vapor. The use of graphite avoids a disadvantageous monel-aluminum reaction whereby an alloy from which sodium cannot be distilled is formed. The resulting sodium vapor is precipitated in a monel exhaust tube which is subjected to temperature control. Sodium can be rinsed from the monel exhaust tube with water.
摘要翻译：用于从铝中提取钠，特别是放射性的22Na的系统利用一种蒙乃尔排气系统来排出在熔融铝靶中释放出的钠蒸气。铝靶被加热直到其在石墨支撑杯中熔化。石墨载体不与钠反应。此外，石墨被理解为对氦气是可渗透的，其孔隙度被认为提供了显着的优点，即石墨保持器不会吸收大量的钠蒸气。石墨的使用避免了不利的蒙乃铝反应，从而形成不能蒸馏钠的合金。所得的钠蒸气在经受温度控制的monel排气管中析出。钠可用水从monel排气管冲洗。

4. 发明授权

US09620920B2 High pulse repetition rate gas discharge laser 有权
公开(公告)号：US09620920B2
公开(公告)日：2017-04-11
申请号：US12590307
申请日：2009-11-05
申请人： Walter D. Gillespie , Thomas D. Steiger , Richard C. Ujazdowski , William N. Partlo
发明人： Walter D. Gillespie , Thomas D. Steiger , Richard C. Ujazdowski , William N. Partlo
IPC分类号： H01S3/22 , H01S3/036 , H01S3/038
CPC分类号： H01S3/036 , H01S3/0384
摘要： A pulsed gas discharge laser operating at an output laser pulse repetition rate of greater than 4 kHz and a method of operating same is disclosed which may comprise a high voltage electrode having a longitudinal extent; a main insulator electrically insulating the high voltage electrode from a grounded gas discharge chamber; a preionizer longitudinally extending along at least a portion of the longitudinal extent of the high voltage electrode; a preionization shim integral with the electrode extending toward the preionizer. The preionizer may be formed integrally with the main insulator. The preionization shim may substantially cover the gap between the electrode and the preionizer. The apparatus and method may comprise an aerodynamic fairing attached to the high voltage electrode to present an aerodynamically smooth surface to the gas flow.

5. 发明授权

US08855166B2 6 KHz and above gas discharge laser system 有权
标题翻译： 6KHz及以上气体放电激光系统
公开(公告)号：US08855166B2
公开(公告)日：2014-10-07
申请号：US13352127
申请日：2012-01-17
申请人： Richard C. Ujazdowski , Richard M. Ness , J. Martin Algots , Vladimir B. Fleurov , Frederick A. Palenschat , Walter D. Gillespie , Bryan G. Moosman , Thomas D. Steiger , Brett D. Smith , Thomas E. McKelvey
发明人： Richard C. Ujazdowski , Richard M. Ness , J. Martin Algots , Vladimir B. Fleurov , Frederick A. Palenschat , Walter D. Gillespie , Bryan G. Moosman , Thomas D. Steiger , Brett D. Smith , Thomas E. McKelvey
IPC分类号： H01S3/08 , H01S3/036 , H01F38/10 , H01F3/10 , H01F27/22 , H01S3/041 , H01S3/225 , H01S3/097 , H01F27/26 , H01S3/04 , H01S3/23
CPC分类号： H01S3/036 , H01F3/10 , H01F27/22 , H01F27/266 , H01F38/10 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/225 , H01S3/2308
摘要： A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.
摘要翻译：一种操作高重复率气体放电激光系统的系统和方法。该系统包括气体放电室，其具有通过气体放电激光室的操作加热的热室输出窗口，在热室窗口下游的输出激光束脉冲光束路径，包括环境温度窗口，冷却机构光束路径外壳在输出窗口和环境窗口之间。气体放电室可以包括纵向和轴向柔性接地棒，包括连接到第一室壁的第一端，连接到第二室壁的第二端，与第一室壁相对的第二室壁和形成为第一室壁的第一部分螺旋弹簧，接地棒提供机械支撑用于前置离子管。

6. 发明授权

US07633989B2 High pulse repetition rate gas discharge laser 有权
标题翻译：高脉冲重复率气体放电激光器
公开(公告)号：US07633989B2
公开(公告)日：2009-12-15
申请号：US11169203
申请日：2005-06-27
申请人： Walter D. Gillespie , Thomas D. Steiger , Richard C. Ujazdowski , William N. Partlo
发明人： Walter D. Gillespie , Thomas D. Steiger , Richard C. Ujazdowski , William N. Partlo
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/0384
摘要： A pulsed gas discharge laser operating at an output laser pulse repetition rate of greater than 4 kHz and a method of operating same is disclosed which may comprise a high voltage electrode having a longitudinal extent; a main insulator electrically insulating the high voltage electrode from a grounded gas discharge chamber; a preionizer longitudinally extending along at least a portion of the longitudinal extent of the high voltage electrode; a preionization shim integral with the electrode extending toward the preionizer. The preionizer may be formed integrally with the main insulator. The preionization shim may substantially cover the gap between the electrode and the preionizer. The apparatus and method may comprise the high voltage electrode being disposed in an electrode receiving pocket in the main insulator and formed to present an elongated discharge receiving area facing another electrode within the gas discharge chamber, an aerodynamic fairing attached to the high voltage electrode and substantially closing the gas flow disturbance pocket and presenting an aerodynamically smooth surface to the gas flow.
摘要翻译：公开了以大于4kHz的输出激光脉冲重复率操作的脉冲气体放电激光器及其操作方法，其可以包括具有纵向范围的高压电极; 将高电压电极与接地气体放电室电绝缘的主绝缘体; 前置电离器，其沿所述高压电极的所述纵向延伸部分的至少一部分纵向延伸; 与电极一体的预电离垫片朝向前置电离器延伸。前置电离器可以与主绝缘体一体地形成。预电离垫片可以基本上覆盖电极和前置离子机之间的间隙。所述装置和方法可以包括高压电极设置在主绝缘体中的电极接收凹槽中并且形成为呈现面对气体放电室内的另一电极的细长放电接收区域，附接到高压电极的空气动力学整流罩，并且基本上关闭气体流动扰动袋并向气体流动呈空气动力学平滑的表面。

7. 发明授权

US07535948B2 Cathodes for fluorine gas discharge lasers 有权
标题翻译：氟气放电激光器的阴极
公开(公告)号：US07535948B2
公开(公告)日：2009-05-19
申请号：US11488205
申请日：2006-07-18
申请人： Thomas D. Steiger , Joshua C. Brown , Thomas P. Duffey , Walter D. Gillespie , Richard G. Morton
发明人： Thomas D. Steiger , Joshua C. Brown , Thomas P. Duffey , Walter D. Gillespie , Richard G. Morton
IPC分类号： H01S3/22 , H01S3/097
CPC分类号： H01S3/038 , H01S3/036 , H01S3/0381 , H01S3/0382 , H01S3/0385 , H01S3/0388 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： A fluorine gas discharge laser electrode for a gas discharge laser having a laser gas containing fluorine is disclosed which may comprise a copper and copper alloy cathode body having an upper curved region containing the discharge footprint for the cathode comprising copper and a lower portion comprising a copper alloy, with the facing portion of the electrode if formed in a arcuate shape extending into straight line portions on either side of the arcuate portion, the straight line portions terminating in vertical straight sides, with the boundary between the copper including at least the arcuate portion, the electrode may comprise a bonded element machined from two pieces of material the first made of copper and the second made of a copper alloy bonded together before machining. The electrode may also comprise a first and a second elongated lopsided V-shaped groove formed along substantially all of the elongated electrode body forming a discharge receiving ridge between the first and second lopsided V-shaped grooves, with a differentially faster eroding material filling the first and second lopsided V-shaped grooves. also disclosed is an electrode system in which the one electrode, e.g., the cathode bows during operation and may comprise at least one of a first and second elongated gas discharge electrode being machined to form a crown to receive the gas discharge that compensates for the bowing of at least one of the gas discharge electrodes during operation of the fluorine gas discharge laser.
摘要翻译：公开了一种用于具有含氟激光气体的气体放电激光器的氟气放电激光电极，其可包括铜和铜合金阴极体，该铜和铜合金阴极体具有包含铜的阴极的放电足迹的上部弯曲区域，以及包含铜合金，如果电极的对置部分形成为延伸到弓形部分两侧的直线部分的弓形形状，则直线部分终止于垂直的直边，铜线之间的边界至少包括弧形部分电极可以包括由铜制成的两片材料加工的接合元件，以及在加工之前由铜合金制成的第二种材料。电极还可以包括沿着基本上所有的细长电极体形成的第一和第二细长的非平面V形槽，该细长电极体在第一和第二偏斜V形槽之间形成放电接收脊，其中填充有第一和第二个不对称的V形槽。还公开了一种电极系统，其中一个电极，例如，阴极在操作期间弯曲并且可以包括被加工成形成冠部的第一和第二细长气体放电电极中的至少一个，以接收补偿弯曲的气体放电的至少一个气体放电电极在氟气放电激光器的操作期间。

8. 发明申请

US20080197297A1 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US20080197297A1
公开(公告)日：2008-08-21
申请号：US11471434
申请日：2006-06-20
申请人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
发明人： Robert P. Akins , Richard L. Sandstrom , William N. Partlo , Igor V. Fomenkov , Thomas D. Steiger , John Martin Algots , Norbert Bowering , Robert N. Jacques , Frederick Palenschat , Jun Song
IPC分类号： G01J3/10
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

9. 发明授权

US07301980B2 Halogen gas discharge laser electrodes 有权
标题翻译：卤素气体放电激光电极
公开(公告)号：US07301980B2
公开(公告)日：2007-11-27
申请号：US10877737
申请日：2004-06-25
申请人： Thomas D. Steiger , Richard C. Ujazdowski , Timothy S. Dyer , Thomas P. Duffey , Walter D. Gillespie , Bryan G. Moosman , Richard G. Morton , Brian D. Strate
发明人： Thomas D. Steiger , Richard C. Ujazdowski , Timothy S. Dyer , Thomas P. Duffey , Walter D. Gillespie , Bryan G. Moosman , Richard G. Morton , Brian D. Strate
IPC分类号： H01S3/097
CPC分类号： H01S3/225 , H01S3/0381 , H01S3/0385 , H01S3/0388 , H01S3/0971 , H01S3/09713
摘要： A gas discharge laser includes a laser chamber containing a halogen laser gas, two electrode elements defining a cathode and an anode, each having a discharge receiving region defining two longitudinal edges and having a region width defining a width of an electric discharge between the electrode elements in the laser gas. The anode comprising a first anode portion comprising a first anode material defining a first anode material erosion rate, located entirely within the discharge receiving region, a pair of second anode portions comprising a second anode material defining a second anode material erosion rate, respectively located on each side of the first anode portion and at least partially within the discharge receiving region; an electrode center base portion integral with the first anode portion; and wherein each of the respective pair of second anode portions is mechanically bonded to the center base portion.
摘要翻译：气体放电激光器包括含有卤素激光气体的激光室，限定阴极和阳极的两个电极元件，每个具有限定两个纵向边缘的放电接收区域，并且具有限定电极元件之间的放电宽度的区域宽度在激光气体中。阳极包括第一阳极部分，其包括限定第一阳极材料侵蚀速率的第一阳极材料，其完全位于放电接收区域内;一对第二阳极部分，包括限定第二阳极材料侵蚀速率的第二阳极材料，分别位于所述第一阳极部分的每一侧并且至少部分地在所述放电接收区域内; 与所述第一阳极部分成一体的电极中心基部; 并且其中相应的一对第二阳极部分中的每一个机械地结合到中心基部。

10. 发明授权

US07006547B2 Very high repetition rate narrow band gas discharge laser system 失效
公开(公告)号：US07006547B2
公开(公告)日：2006-02-28
申请号：US10815386
申请日：2004-03-31
申请人： Thomas D. Steiger , Edward P. Holtaway , Bryan Moosman , Rajasekhar M. Rao
发明人： Thomas D. Steiger , Edward P. Holtaway , Bryan Moosman , Rajasekhar M. Rao
IPC分类号： H01S3/22
CPC分类号： H01S3/038 , H01S3/0057 , H01S3/07 , H01S3/097 , H01S3/09702 , H01S3/104 , H01S3/1305 , H01S3/2333
摘要： A method and apparatus for producing a very high repetition rate gas discharge laser system in a MOPA configuration is disclosed which may comprise a master oscillator gas discharge layer system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate; at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate, which may be positioned in series with respect to the oscillator laser output light pulse beam. The apparatus and method may further comprise a beam delivery unit connected to the laser light output of the power amplification laser system. The apparatus and method may be a very high repetition rate gas discharge laser system in a MOPO configuration. The apparatus and method may comprise a compression head comprising a compression head charge storage device being charged at x times per second; a gas discharge chamber comprising at least two sets of paired gas discharge electrodes; at least two magnetically saturable switches, respectively connected between the compression head charge storage device and one of the at least two sets of paired electrodes and comprising first and second opposite biasing windings having a first biasing current for the first biasing winding and a second biasing current for the second biasing winding and comprising a switching circuit to switch the biasing current from the first biasing current to the second biasing current such that only one of the at least two switches receives the first biasing current at a repetition rate equal to x divided by the number of the at least two sets of paired electrodes while the remainder of the at least two magnetically saturable switches receives the second biasing current. The apparatus and method may be utilized as a lithography tool or for producing laser produced plasma EUV light.

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