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1. 发明授权

US08304752B2 EUV light producing system and method utilizing an alignment laser 有权
标题翻译： EUV光产生系统和利用对准激光的方法
公开(公告)号：US08304752B2
公开(公告)日：2012-11-06
申请号：US12638413
申请日：2009-12-15
申请人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
发明人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
IPC分类号： G01J1/04 , G01J1/18
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译：用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

2. 发明申请

US20090161201A1 Drive laser for EUV light source 有权
标题翻译：驱动激光用于EUV光源
公开(公告)号：US20090161201A1
公开(公告)日：2009-06-25
申请号：US12004905
申请日：2007-12-20
申请人： Alexander I. Ershov , Jerzy R. Hoffman , Norbert R. Bowering , Alexander N. Bykanov
发明人： Alexander I. Ershov , Jerzy R. Hoffman , Norbert R. Bowering , Alexander N. Bykanov
IPC分类号： H01S4/00 , G02B5/22
CPC分类号： H01S3/105 , G03F7/70033 , H01S3/005 , H01S3/115 , H01S3/2232 , H01S3/225 , H01S3/2325 , H01S2301/02 , H05G2/003 , H05G2/008
摘要： A device is described herein which may comprise an oscillator having an oscillator cavity length, Lo, and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, Lcombined, where Lcombined=(N+x)*Lo, where “N” is an integer and “x” is a number between 0.4 and 0.6.
摘要翻译：本文描述了一种器件，其可以包括具有振荡器腔长度Lo并且限定振荡器路径的振荡器; 和与所述振荡器耦合的多通道光放大器以建立包括所述振荡器路径的组合光腔，所述组合腔具有长度L组合，其中L组合=（N + x）* Lo，其中“N”是整数， “x”是介于0.4和0.6之间的数字。

3. 发明申请

US20110058588A1 Drive laser for EUV light source 有权
标题翻译：驱动激光用于EUV光源
公开(公告)号：US20110058588A1
公开(公告)日：2011-03-10
申请号：US12927012
申请日：2010-11-03
申请人： Alexander I. Ershov , Igor V. Fomenkov , Norbert R. Bowering , Jerzy R. Hoffman
发明人： Alexander I. Ershov , Igor V. Fomenkov , Norbert R. Bowering , Jerzy R. Hoffman
IPC分类号： H01S3/22 , H01S3/00
CPC分类号： H01S3/105 , G03F7/70033 , H01S3/005 , H01S3/115 , H01S3/2232 , H01S3/225 , H01S3/2325 , H01S2301/02 , H05G2/003 , H05G2/008
摘要： A device is described herein which may comprise an oscillator having an oscillator cavity length, L0, and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, Lcombined, where Lcombined=(N+x)*L0, where “N” is an integer and “x” is a number between 0.4 and 0.6.
摘要翻译：本文描述了一种器件，其可以包括具有振荡器腔长度L0并且限定振荡器路径的振荡器; 和与所述振荡器耦合的多通光放大器以建立包括所述振荡器路径的组合光腔，所述组合腔具有长度L组合，其中L组合=（N + x）* L0，其中“N”是整数， “x”是介于0.4和0.6之间的数字。

4. 发明申请

US20100176313A1 Extreme ultraviolet light source 审中-公开
标题翻译：极紫外光源
公开(公告)号：US20100176313A1
公开(公告)日：2010-07-15
申请号：US12653585
申请日：2009-12-14
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.
摘要翻译：公开了一种用于产生EUV辐射的装置，其可以包括目标材料，产生用于与靶材料相互作用的激光束的系统和一对电极。可以提供脉冲功率电路用于在所述电极之间产生放电以从所述目标材料产生EUV辐射。

5. 发明授权

US07518787B2 Drive laser for EUV light source 有权
标题翻译：驱动激光用于EUV光源
公开(公告)号：US07518787B2
公开(公告)日：2009-04-14
申请号：US11452558
申请日：2006-06-14
申请人： Alexander N. Bykanov , Jerzy R. Hoffman , Igor V. Fomenkov , William N. Partlo
发明人： Alexander N. Bykanov , Jerzy R. Hoffman , Igor V. Fomenkov , William N. Partlo
IPC分类号： H01S4/00 , H01S3/22 , H01S3/223
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.
摘要翻译：公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。对于源，第一放大器可以具有以饱和能量（Es，1）和小信号增益（go，1）为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量（Es，2）和小信号增益（go，2）的增益介质，其中（go，1）>（go，2）和（Es，2）>（ Es，1）。在另一方面，激光光源的激光振荡器可以是空腔倾覆的激光振荡器，例如。模式锁定激光振荡器，q切换激光振荡器，并且还可以包括时间脉冲展开器。

6. 发明授权

US07368741B2 Extreme ultraviolet light source 失效
标题翻译：极紫外光源
公开(公告)号：US07368741B2
公开(公告)日：2008-05-06
申请号：US11107535
申请日：2005-04-14
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译：本发明提供了一种可靠，高重复率的生产线兼容高能光子源。在真空室中产生含有活性物质的非常热的等离子体。活性物质是具有期望的极紫外（EUV）范围内的发射线的原子元素。包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲，其具有足够的能量和电势，足以以超过5瓦的速率在中间焦点处产生EUV光。在由申请人带内设计的优选实施例中，中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。

7. 发明申请

US20070291350A1 Drive laser for EUV light source 有权
标题翻译：驱动激光用于EUV光源
公开(公告)号：US20070291350A1
公开(公告)日：2007-12-20
申请号：US11452558
申请日：2006-06-14
申请人： Alexander I. Ershov , Alexander N. Bykanov , Jerzy R. Hoffman , Igor V. Fomenkov , William N. Partlo
发明人： Alexander I. Ershov , Alexander N. Bykanov , Jerzy R. Hoffman , Igor V. Fomenkov , William N. Partlo
IPC分类号： H01S3/00
CPC分类号： H01S3/2316 , H01S3/0057 , H01S3/11 , H01S3/2232 , H01S3/225 , H05G1/54 , H05G2/008
摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.
摘要翻译：公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。对于源极，第一放大器可以具有以饱和能量（E S，S 1）和小信号增益（g 1，...）为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量（E SUB，2 N）和小信号增益（g 0，o 2）的增益介质，其中（g < （o，SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB SUB >）。在另一方面，激光光源的激光振荡器可以是空腔倾覆的激光振荡器，例如。模式锁定激光振荡器，q切换激光振荡器，并且还可以包括时间脉冲展开器。

8. 发明申请

US20100327192A1 Alignment Laser 有权
标题翻译：对准激光
公开(公告)号：US20100327192A1
公开(公告)日：2010-12-30
申请号：US12638413
申请日：2009-12-15
申请人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
发明人： Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Jason Paxton , Nam-Hyong Kim , Jerzy R. Hoffman
IPC分类号： H05G2/00 , H01S3/22 , H01S3/08
CPC分类号： H01S3/2232 , G03F7/70033 , H01S3/0014 , H01S3/0407 , H01S3/041 , H01S3/086 , H01S3/2308 , H05G2/008
摘要： A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.
摘要翻译：用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

9. 发明授权

US07402825B2 LPP EUV drive laser input system 失效
标题翻译： LPP EUV驱动激光输入系统
公开(公告)号：US07402825B2
公开(公告)日：2008-07-22
申请号：US11168785
申请日：2005-06-28
申请人： Rodney D. Simmons , John W. Viatella , Jerzy R. Hoffman , R. Kyle Webb , Alexander N. Bykanov , Oleh Khodykin
发明人： Rodney D. Simmons , John W. Viatella , Jerzy R. Hoffman , R. Kyle Webb , Alexander N. Bykanov , Oleh Khodykin
IPC分类号： G21G4/00
CPC分类号： H05G2/001
摘要： A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.
摘要翻译：公开了一种激光产生的等离子体（“LPP”）极紫外（“EUV”）光源及其操作方法，其可以包括具有室壁的EUV等离子体生产室; 在室壁中的驱动激光入口窗口; 在入口窗口中间的驱动激光入口外壳和腔室内的等离子体起始位置，并且包括入口外壳远端开口; 在远端开口和入口窗之间的至少一个孔板包括至少一个驱动激光通道孔。至少一个孔板可以包括至少两个孔板，其包括限定孔板中间空间的第一孔板和第二孔板。至少一个驱动激光孔通道可以包括至少两个驱动激光孔通道。激光通道孔可以限定足够大的开口，使得驱动激光束通过而不衰减，并且足够小以基本上减少通过入口窗口方向的穿过激光通道孔的碎屑。

10. 发明授权

US07394083B2 Systems and methods for EUV light source metrology 有权
标题翻译： EUV光源计量系统和方法
公开(公告)号：US07394083B2
公开(公告)日：2008-07-01
申请号：US11177501
申请日：2005-07-08
申请人： Norbert R. Bowering , Jerzy R. Hoffman
发明人： Norbert R. Bowering , Jerzy R. Hoffman
IPC分类号： G01J1/42
CPC分类号： G03F7/7085 , B82Y10/00 , G21K2201/061
摘要： Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi2/Si multi-layer mirror.
摘要翻译：披露了EUV光源计量系统和方法。在第一方面，用于测量EUV光源功率输出的系统可以包括沿着EUV光路设置的光电子源材料，以暴露材料并产生一定量的光电子。该系统还可以包括用于检测光电子并产生指示EUV功率的输出的检测器。在另一方面，用于测量EUV光强度的系统可以包括多层反射镜，例如Mo / Si，沿着EUV光路径可弃，以暴露反射镜并在反射镜中产生光电流。电流监视器可以连接到反射镜以测量光电流并产生指示EUV功率的输出。在另一方面，离线EUV测量系统可以包括用于测量光特性和MoSi 2 / Si多层反射镜的仪器。

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