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1. 发明申请

US20190235398A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20190235398A1
公开(公告)日：2019-08-01
申请号：US16284089
申请日：2019-02-25
申请人： ASML NETHERLANDS B.V.
发明人： Jan Steven Christiaan WESTERLAKEN , Gerardus Arnoldus Hendricus Franciscus JANSSEN , Peter Paul STEIJAERT , Engelbertus Antonius Fransiscus VAN DER PASCH , Franciscus VAN DE MAST
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70608 , G03F7/70683 , G03F7/70775 , G03F7/7085 , G03F7/70908
摘要： A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

2. 发明申请

US20190212662A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20190212662A1
公开(公告)日：2019-07-11
申请号：US16354432
申请日：2019-03-15
申请人： ASML NETHERLANDS B.V
发明人： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

3. 发明申请

US20180246418A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20180246418A1
公开(公告)日：2018-08-30
申请号：US15969847
申请日：2018-05-03
申请人： ASML NETHERLANDS B.V.
发明人： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

4. 发明授权

US09989861B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US09989861B2
公开(公告)日：2018-06-05
申请号：US15823188
申请日：2017-11-27
申请人： ASML NETHERLANDS B.V.
发明人： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

5. 发明授权

US09939740B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US09939740B2
公开(公告)日：2018-04-10
申请号：US15116794
申请日：2015-01-20
申请人： ASML Netherlands B.V.
发明人： Günes Nakiboglu , Martijn Van Baren , Frank Johannes Jacobus Van Boxtel , Koen Cuypers , Jeroen Gerard Gosen , Laurentius Johannes Adrianus Van Bokhoven
IPC分类号： B60R1/06 , G03B27/52 , G03B27/58 , G03B27/62 , H02K41/02 , G03F7/20
CPC分类号： G03F7/70858 , G03F7/70358 , G03F7/70716 , G03F7/70908
摘要： A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

6. 发明授权

US09507279B2 Method of operating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product 有权
标题翻译：操作光刻设备的方法，设备制造方法以及相关的数据处理设备和计算机程序产品
公开(公告)号：US09507279B2
公开(公告)日：2016-11-29
申请号：US14069287
申请日：2013-10-31
申请人： ASML Netherlands B.V.
发明人： Emil Peter Schmitt-Weaver , Paul Frank Luehrmann , Eduardus Johannes Gerardus Boon , Daan Maurits Slotboom , Jean-Philippe Xavier Van Damme , Wolfgang Henke , Alexander Ypma , Marc Jurian Kea
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70908 , G03F7/707 , G03F7/7085 , G03F7/70916 , G03F9/70
摘要： A reticle is loaded into a lithographic apparatus. The apparatus performs measurements on the reticle, so as to calculate alignment parameters for transferring the pattern accurately to substrates. Tests are performed to detect possible contamination of the reticle or its support. Either operation proceeds with a warning, or the patterning of substrates is stopped. The test uses may use parameters of the alignment model itself, or different parameters. The integrity parameters may be compared against reference values reflecting historic measurements, so that sudden changes in a parameter are indicative of contamination. Integrity parameters may be calculated from residuals of the alignment model. In an example, height residuals are used to calculate parameters of residual wedge (Rx′) and residual roll (Ryy′). From these, integrity parameters expressed as height deviations are calculated and compared against thresholds.
摘要翻译：将掩模版加载到光刻设备中。该装置对掩模版进行测量，以便计算用于将图案精确地转印到基底上的对准参数。执行测试以检测掩模版或其支撑体的可能污染。任一操作都进行警告，或者停止基板的图案化。测试使用可以使用对齐模型本身的参数或不同的参数。可以将完整性参数与反映历史测量的参考值进行比较，使得参数中的突然变化指示污染。可以从对齐模型的残差计算完整性参数。在一个例子中，高度残差用于计算残余楔（Rx'）和残余辊（Ryy'）的参数。从这些，计算表示为高度偏差的完整性参数，并将其与阈值进行比较。

7. 发明授权

US09462667B2 Radiation source and lithographic apparatus 有权
标题翻译：辐射源和光刻设备
公开(公告)号：US09462667B2
公开(公告)日：2016-10-04
申请号：US14377586
申请日：2013-01-03
申请人： ASML Netherlands B.V.
发明人： Johan Frederik Dijksman , Ronald Johannes Hultermans , Antonius Theodorus Wilhelmus Kempen , Ramin Badie
IPC分类号： G03B27/32 , G03B27/54 , H05G2/00 , G03F7/20
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/70908 , G03F7/70916 , H05G2/005
摘要： The present invention provides methods and apparatus for facilitating the start up of a fuel droplet stream generator. During a start-up phase the fuel droplet stream generator is positioned so that the fuel droplets re emitted downwardly whereby gravity assists in the establishment of the stream. The droplets are monitored using a visualization system and once the stream is determined to have the desired characteristics the stream generator is moved to a second position of steady state use in which the droplet stream is emitted in a horizontal direction.
摘要翻译：本发明提供了一种便于启动燃料液滴流发生器的方法和装置。在起动阶段期间，燃料液滴流发生器被定位成使得燃料液滴向下发射，由此重力有助于流的建立。使用可视化系统监测液滴，并且一旦流被确定为具有期望的特性，则流发生器被移动到液晶流在水平方向上发射的稳态使用的第二位置。

8. 发明授权

US09341942B2 Vacuum chamber assembly for supporting a workpiece 有权
标题翻译：用于支撑工件的真空室组件
公开(公告)号：US09341942B2
公开(公告)日：2016-05-17
申请号：US13818567
申请日：2011-08-23
申请人： Fardad Hashemi , Douglas C. Watson , Lorri L. Watson
发明人： Fardad Hashemi , Douglas C. Watson
IPC分类号： G03F7/20 , G03F1/64 , G03F1/66 , H01L21/67 , G03B27/64
CPC分类号： G03F1/64 , G03B27/64 , G03F1/66 , G03F7/70841 , G03F7/70908 , H01L21/6719
摘要： A chamber assembly (26) for providing a sealed chamber (40) adjacent to a workpiece (28) to counteract the influence of gravity on the workpiece (28) includes a chamber housing (244), and a seal assembly (33) that expands and/or contracts to better seal against the workpiece (28). Further, the chamber assembly (26) can include one or more transducer assemblies (34) that expand or contract to quickly respond to leaks or injections of fluid in chamber assembly (26) to maintain a constant and stable chamber pressure in the chamber assembly (26). Moreover, the chamber assembly (26) can utilize a pressure source (35) that directs a lager amount of fluid (374) through a fluid passageway (368) to accurately maintain the pressure within the chamber assembly (26).
摘要翻译：用于提供与工件（28）相邻的密封腔（40）以抵抗重力对工件（28）的影响的室组件（26）包括腔室壳体（244）和膨胀的密封组件（33）和/或收缩以更好地密封工件（28）。此外，腔室组件（26）可以包括一个或多个换能器组件（34），其膨胀或收缩以快速响应腔室组件（26）中的流体的泄漏或喷射，以保持腔室组件中恒定且稳定的腔室压力（ 26）。此外，腔室组件（26）可以利用压力源（35），该压力源将较大量的流体（374）引导通过流体通道（368）以精确地保持腔室组件（26）内的压力。

9. 发明申请

US20160070180A1 APPARATUS FOR PROTECTING EXTREME ULTRA VIOLET MASK AND EXTREME ULTRA VIOLET EXPOSURE APPARATUS INCLUDING THE SAME 有权
标题翻译：用于保护超极紫外线掩膜和极度超紫外线曝光装置的装置
公开(公告)号：US20160070180A1
公开(公告)日：2016-03-10
申请号：US14692919
申请日：2015-04-22
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Myung-soo HWANG , Joo-on PARK , Chang-min PARK
IPC分类号： G03F7/20
CPC分类号： G03F7/70983 , G03F1/14 , G03F1/142 , G03F1/62 , G03F1/66 , G03F7/70733 , G03F7/708 , G03F7/70808 , G03F7/70908
摘要： An apparatus for protecting an extreme ultra violet (EUV) mask includes an EUV pellicle that allows EUV light to be radiated through the EUV pellicle onto the EUV mask, the EUV pellicle having a size corresponding to a size of a slit limiting the EUV light to a predetermined portion of the EUV mask, a flexible blocking film at opposite sides of the EUV pellicle in a first direction, the first direction being a scan direction of an exposure apparatus, and a roller unit including a first roller and a second roller, a first portion of the flexible blocking film being wound around the first roller at a first side of the EUV pellicle, and a second portion of the flexible blocking film being wound around the second roller at a second side of the EUV pellicle.
摘要翻译：用于保护极端紫外线（EUV）掩模的装置包括EUV防护薄膜，其允许EUV光通过EUV防护薄膜辐射到EUV掩模上，EUV防护薄膜的尺寸对应于限制EUV光的狭缝的尺寸 EUV掩模的预定部分，在第一方向上的EUV防护薄膜的相对侧处的柔性阻挡膜，第一方向是曝光装置的扫描方向，以及包括第一辊和第二辊的辊单元，所述柔性阻挡膜的第一部分在所述EUV防护薄膜组件的第一侧围绕所述第一辊缠绕，并且所述柔性阻挡膜的第二部分围绕所述第二辊缠绕在所述EUV防护薄膜的第二侧。

10. 发明申请

US20160033860A1 Lithographic Apparatus 审中-公开
标题翻译：平版印刷设备
公开(公告)号：US20160033860A1
公开(公告)日：2016-02-04
申请号：US14775249
申请日：2014-03-04
申请人： ASML NETHERLANDS B.V.
发明人： James Norman WILEY , Juan Diego ARIAS ESPINOZA , Derk Servatius Gertruda BROUNS , Laurentius Cornelius DE WINTER , Florian Didier Albin DHALLUIN , Pedro Julian RIZO DIAGO , Luigi SCACCABAROZZI
IPC分类号： G03F1/64
CPC分类号： G03F1/64 , G03F1/62 , G03F7/70908 , G03F7/70983
摘要： The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.
摘要翻译：本发明涉及用于屏蔽用于EUV光刻的掩模版的装置。该装置包括防护薄膜组件和至少一个与防护薄膜组件连通的致动器，所述致动器构造成在使用中诱导防护薄膜相对于掩模版的运动。

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