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    • 1. 发明申请
      US20050286598A1 Laser output beam wavefront splitter for bandwidth spectrum control 有权
    • Laser output beam wavefront splitter for bandwidth spectrum control
    • US20050286598A1
    • 2005-12-29
    • US10875662
    • 2004-06-23
    • Richard Sandstrom , Daniel Brown , Alexander Ershov , Igor Fomenkov , William Partlo
    • Richard Sandstrom , Daniel Brown , Alexander Ershov , Igor Fomenkov , William Partlo
    • G03F7/20 , H01S3/08 , H01S3/097 , H01S3/10 , H01S3/1055 , H01S3/13 , H01S3/22
    • H01S3/0812 , G03F7/70025 , G03F7/70575 , H01S3/08059 , H01S3/097 , H01S3/1055 , H01S3/1305
    • An apparatus and method for providing bandwidth control in a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, is disclosed which may comprise a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of the a laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the laser light pulse to return from the dispersive center wavelength selection optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each portion having one of at least two different selected center wavelengths. The tuning mechanism may comprise a temporal angle of incidence selection element defining an angle of incidence for different temporally separated portions of the pulse to return from the dispersive bandwidth selection optic a laser beam comprising a plurality of temporally separated portions of each pulse, each temporally separated portion of each pulse having one of at least two different selected center wavelengths. The tuning mechanism may comprise a plurality of spatial incidence angle selection elements each defining an angle of incidence for a spatially separated but not temporally separated portion of the laser light pulse, and a plurality of temporal angle of incidence selection elements each defining at least a first angle of incidence for at least a first temporally separated portion of each spatially separated but not temporally separated portion of the pulse and a second angle of incidence for a second temporally separated but not spatially separated portion of each spatially separated portion of the pulse.
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 5. 发明申请
      US20060091109A1 EUV collector debris management 失效
    • EUV collector debris management
    • EUV收集器碎片管理
    • US20060091109A1
    • 2006-05-04
    • US10979945
    • 2004-11-01
    • William Partlo , Richard Sandstrom , Igor Fomenkov , Alexander Ershov , William Oldham , William Marx , Oscar Hemberg
    • William Partlo , Richard Sandstrom , Igor Fomenkov , Alexander Ershov , William Oldham , William Marx , Oscar Hemberg
    • H01L21/306 , B08B6/00 , B44C1/22
    • B08B7/00
    • A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.
    • 可以包括使用EUV等离子体源材料的EUV发光机构的方法和装置，所述EUV等离子体源材料包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许从反射表面蚀刻蚀刻化合物的蒸气压。 蚀刻剂源材料可以包含卤素或卤素化合物。 蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。 该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。 还可以存在离子加速剂将离子朝向反射表面加速。 离子可以包括蚀刻剂源材料。 该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 6. 发明申请
      US20050083983A1 Relax gas discharge laser lithography light source 有权
    • Relax gas discharge laser lithography light source
    • 放气放电激光光刻光源
    • US20050083983A1
    • 2005-04-21
    • US10956784
    • 2004-10-01
    • Richard Sandstrom , William Partlo , Daniel Brown , Thomas Yager , Alexander Ershov , Robert Rafac , German Rylov
    • Richard Sandstrom , William Partlo , Daniel Brown , Thomas Yager , Alexander Ershov , Robert Rafac , German Rylov
    • B23K26/06 , B23K26/40 , G01J1/42 , G01J9/02 , G02B26/00 , G02B26/08 , G03F7/20 , H01S20060101 , H01S3/00 , H01S3/1055 , H01S3/22 , H01S3/225
    • G01J1/429 , B23K26/0622 , B23K2101/40 , G01J9/02 , G02B26/002 , G02B26/0875 , G03F7/70041 , G03F7/70575 , H01S3/005 , H01S3/0057 , H01S3/1055 , H01S3/225
    • An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
    • 公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择 用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在色散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置 脉冲光束在可变折射光学元件上。 可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。 脉冲参数测量和脉冲调制控制的其它方面包括响应来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 7. 发明申请
      US20070029511A1 High repetition rate laser produced plasma EUV light source 有权
    • High repetition rate laser produced plasma EUV light source
    • US20070029511A1
    • 2007-02-08
    • US11471258
    • 2006-06-20
    • Robert Akins , Richard Sandstrom , William Partlo , Igor Fomenkov
    • Robert Akins , Richard Sandstrom , William Partlo , Igor Fomenkov
    • G01J3/10
    • B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
    • An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 8. 发明申请
      US20050205810A1 High repetition rate laser produced plasma EUV light source 有权
    • High repetition rate laser produced plasma EUV light source
    • US20050205810A1
    • 2005-09-22
    • US10803526
    • 2004-03-17
    • Robert Akins , Richard Sandstrom , William Partlo , Igor Fomenkov , Thomas Steiger , John Algots , Norbert Bowering , Robert Jacques , Frederick Palenschat , Jun Song
    • Robert Akins , Richard Sandstrom , William Partlo , Igor Fomenkov , Thomas Steiger , John Algots , Norbert Bowering , Robert Jacques , Frederick Palenschat , Jun Song
    • G01J1/00 , G03F7/20 , H01J65/04 , H05G2/00
    • B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
    • An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 9. 发明申请
      US20060114956A1 High power high pulse repetition rate gas discharge laser system bandwidth management 审中-公开
    • High power high pulse repetition rate gas discharge laser system bandwidth management
    • US20060114956A1
    • 2006-06-01
    • US11000571
    • 2004-11-30
    • Richard Sandstrom , William Partlo , Daniel Brown , J. Martin Algots , Fedor Trintchouk
    • Richard Sandstrom , William Partlo , Daniel Brown , J. Martin Algots , Fedor Trintchouk
    • H01S3/22
    • H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
    • A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX % M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX %). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX % M and EX % independently.
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 10. 发明申请
      US20060114957A1 Line narrowing module 有权
    • Line narrowing module
    • US20060114957A1
    • 2006-06-01
    • US11000684
    • 2004-11-30
    • J. Martin Algots , Robert Bergstedt , Walter Gillespie , Vladimir Kulgeyko , William Partlo , German Rylov , Richard Sandstrom , Brian Strate , Timothy Dyer
    • J. Martin Algots , Robert Bergstedt , Walter Gillespie , Vladimir Kulgeyko , William Partlo , German Rylov , Richard Sandstrom , Brian Strate , Timothy Dyer
    • H01S3/22
    • H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
    • A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.
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