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1. 发明授权

US5239182A Wafer conveyor apparatus and method for detecting inclination of wafer inside cassette 失效
标题翻译：晶片输送装置及其检测方法
公开(公告)号：US5239182A
公开(公告)日：1993-08-24
申请号：US868874
申请日：1992-04-16
申请人： Kiyohisa Tateyama , Yasuhiro Sakamoto
发明人： Kiyohisa Tateyama , Yasuhiro Sakamoto
IPC分类号： G01B11/26 , G01B21/22 , G01V8/12 , H01L21/00 , H01L21/67 , H01L21/677
CPC分类号： H01L21/67265 , H01L21/67796 , Y10S414/137
摘要： A wafer conveyor apparatus which moves a wafer moving device which moves wafers housed in a wafer cassette and performs conveyance the wafers, comprises a first arm provided with a light emitting device, a second arm provided with a light receiving device that detects light emitted from the light emitting device, and a wafer detector that has a judgment device for judging the presence or absence or a housing status of a wafer inside a wafer cassette on the basis of the output information of the light receiving device. In addition, the first arm provided to a conveyor platform and having the light emitting device provided at its distal end and the second arm provided to the conveyor platform and having the light receiving device provided at its distal end, are moved and positioned above and below an outside of an outer peripheral side of the wafer, and the first arm and the second arm are moved in a direction of the thickness of the wafer, light is irradiated from the light emitting device and the light is detected by the light receiving device to measure an apparent thickness of the wafer. Then, the apparent thickness of the wafer as obtained by measurement is compared with an actual thickness of the wafer and an inclination of a housed wafer is detected, and depending upon a detected inclination of the wafer, the wafer is either moved, the housing of the wafer corrected, or alarm processing is performed.
摘要翻译：移动晶片移动装置的晶片传送装置，其移动容纳在晶片盒中的晶片并执行晶片的输送，包括设置有发光装置的第一臂，设置有光接收装置的第二臂，该光接收装置检测从发光装置和晶片检测器，其具有根据光接收装置的输出信息判断晶片盒内的晶片的存在或不存在状态的判断装置。此外，提供给输送机平台并且设置在其远端处的发光装置的第一臂和设置在输送机平台上并且具有设置在其远端处的光接收装置的第二臂被移动并定位在上方和下方晶片的外周侧的外侧，第一臂和第二臂沿晶片的厚度方向移动，从发光器件照射光，并且光被光接收装置检测到测量晶片的表观厚度。然后，将通过测量获得的晶片的表观厚度与晶片的实际厚度进行比较，并且检测到所容纳的晶片的倾斜度，并且根据检测到的晶片的倾斜，晶片被移动，壳体进行晶片校正或报警处理。

2. 发明授权

US5626675A Resist processing apparatus, substrate processing apparatus and method of transferring a processed article 失效
标题翻译：抗蚀剂处理装置，基板处理装置以及转印加工品的方法
公开(公告)号：US5626675A
公开(公告)日：1997-05-06
申请号：US340758
申请日：1994-11-16
申请人： Yasuhiro Sakamoto , Masami Akimoto , Kiyohisa Tateyama , Shinzi Kitamura
发明人： Yasuhiro Sakamoto , Masami Akimoto , Kiyohisa Tateyama , Shinzi Kitamura
IPC分类号： H01L21/683 , H01L21/687 , B05C13/00
CPC分类号： H01L21/6715 , H01L21/6838 , H01L21/68707 , Y10S134/902 , Y10S414/135
摘要： A substrate processing apparatus has an article transferring unit for transferring articles, and an arm assembly is provided on the transferring unit. Each arm of the arm assembly is provided with pawls for contacting and supporting undersurface portions of the peripheral side wall of each of the articles, and one or more sucking portions are provided on the upper surface of the arm and are disposed above the corresponding pawl or pawls. The pawls, or the sucking portion or sucking portions are selected for every process, and supporting or holding of each of the articles and the required transfer of each of the articles are performed. The transfer can be performed by changing the operating range of each of the arms without replacing the arms. Taking each of the articles in and out of the processing units are carried out smoothly and a series of processes are achieve efficiently.
摘要翻译：基板处理设备具有用于传送物品的物品传送单元，并且在传送单元上设置有臂组件。臂组件的每个臂设置有用于接触和支撑每个制品的周边侧壁的下表面部分的棘爪，并且在臂的上表面上设置一个或多个抽吸部分，并且设置在相应的棘爪或爪子为每个处理选择爪或抽吸部或抽吸部，并且执行每个物品的支撑或保持以及每个物品的所需转移。可以通过改变每个臂的操作范围而不更换臂来执行转移。将每个物品进出处理单元顺利进行，并且有效地实现一系列处理。

3. 发明授权

US06969572B2 Developing method and apparatus 失效
标题翻译：开发方法和装置
公开(公告)号：US06969572B2
公开(公告)日：2005-11-29
申请号：US10706091
申请日：2003-11-13
申请人： Kiyohisa Tateyama , Masafumi Nomura , Taketora Shinogi
发明人： Kiyohisa Tateyama , Masafumi Nomura , Taketora Shinogi
IPC分类号： G03F7/26 , G03D3/06 , G03F7/30 , H01L21/00 , H01L21/027 , G03D5/04 , G03D5/06 , G03F7/32
CPC分类号： G03D3/065 , G03D3/06 , G03F7/30 , G03F7/3071 , H01L21/6715 , H01L21/67253
摘要： In this developing method and apparatus, a concentration measuring unit 222 picks part of developing fluid in a blending tank 186 to measure the resist concentration by an absorption photometry and feeds the detected resist concentration to a control unit 240. The control unit 240 controls respective valves 210, 212, 216 of a TMAH concentrate solution 200, a solvent pipe 204 and a drain pipe 208 in a manner that the developing fluid in the blending tank 186 has a TMAH concentration corresponding to a measured resist-concentration value to accomplish a constant developing rate, performing component control of the developing fluid. The developing fluid transferred from the blending tank 186 to a supply tank 188 is fed to a developer nozzle DN in a developing section 126 through a developer pipe 224 owing to the drive of a pump 228. Accordingly, even if the developing fluid is reused in the developing process in multiple times, it is possible to make sure of the uniformity in development.
摘要翻译：在该显影方法和装置中，浓度测量单元222拾取混合罐186中的显影液的一部分，通过吸收测光法测量抗蚀剂浓度，并将检测到的抗蚀剂浓度供给到控制单元240。控制单元240以这样的方式控制TMAH浓缩液200，溶剂管204和排水管208的各个阀210,212,216，使得混合罐186中的显影流体具有对应于测量的抗蚀剂层的TMAH浓度，浓度值以实现恒定的显影速率，进行显影液的成分控制。通过泵228的驱动，从混合罐186向供给罐188输送的显影液通过显影剂管道224被供给到显影部分126中的显影剂喷嘴DN。因此，即使显影液在显影过程中重复使用多次，也可以确保显影的均匀性。

4. 发明授权

US06207231B1 Coating film forming method and coating apparatus 失效
标题翻译：涂膜成型方法和涂布装置
公开(公告)号：US06207231B1
公开(公告)日：2001-03-27
申请号：US09066603
申请日：1998-04-27
申请人： Kiyohisa Tateyama
发明人： Kiyohisa Tateyama
IPC分类号： B05D312
CPC分类号： H01L21/6715 , B05C11/08 , B05D1/005 , B05D3/10 , G03F7/162
摘要： In forming a resist film by supplying a resist liquid onto a surface of an LCD substrate loaded in a rotation cup, a coating liquid is coated on the surface of the substrate by spraying the resist liquid onto the surface thereof while not rotating the substrate to thus form the coating film on the overall surface of the substrate, then the substrate is sealed into the rotation cup by closing the processing vessel by a lid member, and then a film thickness of the coating film is regulated by rotating the rotation cup and the substrate.
摘要翻译：在通过将抗蚀剂液体供给到装载在旋转杯中的LCD基板的表面上来形成抗蚀剂膜时，通过将抗蚀剂液体喷涂到其表面上而在基板的表面上涂覆涂布液体，同时不旋转基板在基板的整个表面上形成涂膜，然后通过盖构件封闭处理容器将基板密封到旋转杯中，然后通过旋转旋转杯和基板来调节涂膜的膜厚度。

5. 发明授权

US6159288A Method and apparatus for cleaning treatment 失效
公开(公告)号：US6159288A
公开(公告)日：2000-12-12
申请号：US935917
申请日：1997-09-23
申请人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
发明人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
IPC分类号： B05C11/08 , B05C9/06 , B05C11/00
CPC分类号： B05C11/08 , Y10S134/902
摘要： An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.

6. 发明授权

US6090205A Apparatus for processing substrate 失效
标题翻译：基板处理装置
公开(公告)号：US6090205A
公开(公告)日：2000-07-18
申请号：US152340
申请日：1998-09-14
申请人： Mitsuhiro Sakai , Kiyohisa Tateyama
发明人： Mitsuhiro Sakai , Kiyohisa Tateyama
IPC分类号： B05C11/08 , G03F7/30 , G03F7/40 , B05C13/02
CPC分类号： G03F7/40 , G03F7/3021 , B05C11/08
摘要： A method of processing a substrate having the steps of placing a substrate for forming an LCD on a support, mounting a cover on the substrate in such a manner that a clearance is formed from at least either surface of the substrate placed on the support, introducing developer or pure water into the clearance, bringing the developer or pure water into contact with at least either surface of the substrate, processing the substrate with the developer or pure water, removing the cover from the substrate, and discharging the substrate from the support.
摘要翻译：一种处理基板的方法，该方法具有以下步骤：将用于形成LCD的基板放置在支撑体上，将盖安装在基板上，使得从放置在支撑体上的基板的至少任一表面形成间隙，显影剂或纯水进入间隙，使显影剂或纯水与基材的至少任一表面接触，用显影剂或纯水处理基材，从基材上除去盖子，并从载体上排出基材。

7. 发明授权

US6013317A Coating apparatus and method therefor 失效
标题翻译：涂布装置及其方法
公开(公告)号：US6013317A
公开(公告)日：2000-01-11
申请号：US40267
申请日：1998-03-16
申请人： Kimio Motoda , Kiyohisa Tateyama
发明人： Kimio Motoda , Kiyohisa Tateyama
IPC分类号： B05C5/00 , B05C11/08 , B05D1/40 , B08B3/00 , B08B9/00 , G03F7/16 , H01L21/00 , H01L21/027 , B05D3/12
CPC分类号： H01L21/6715 , B05C11/08 , B08B3/00 , B08B9/00 , G03F7/162 , Y10S134/902
摘要： A coating apparatus comprises a rotary container rotatable about a rotational axis as the center, a rotary rest table, located in the rotary container to be movable vertically and rotatable about the rotational axis as the center, for supporting a target substrate thereon, coating solution supply pipe for applying a coating solution to the target substrate, cleaning solution supply pipe for spraying a cleaning solution to an inner surface of the rotary container, a seal member provided between the rotary rest table and the bottom wall of the rotary container and capable of sealing a gap between the rotary rest table and the bottom wall of the rotary container, and connecting mechanism for connecting the rotary container and the rotary rest table so as to rotate together. The cleaning solution supply pipe projects from a through hole formed in the upper portion of the rotary container to be coaxial with the rotational axis, and the coating solution supply pipe projects from the through hole of the rotary container to be coaxial with the rotational axis.
摘要翻译：一种涂覆装置，包括以围绕作为中心的旋转轴线可旋转的旋转容器，旋转托架，位于旋转容器中，以可旋转轴线为中心垂直移动并可旋转，用于将目标基板支撑在其上，用于将涂布溶液施加到目标基板的管道，用于将清洗溶液喷射到旋转容器的内表面的清洁溶液供给管，设置在旋转托架和旋转容器的底壁之间并且能够密封的清洁溶液供给管旋转托架和旋转容器的底壁之间的间隙，以及用于连接旋转容器和旋转托架一起旋转的连接机构。清洗液供给管从形成在旋转容器的上部的贯通孔突出成与旋转轴线同轴，涂布液供给管从旋转容器的贯通孔突出成与旋转轴线同轴。

8. 发明授权

US5762708A Coating apparatus therefor 失效
标题翻译：涂装设备
公开(公告)号：US5762708A
公开(公告)日：1998-06-09
申请号：US525342
申请日：1995-09-07
申请人： Kimio Motoda , Kiyohisa Tateyama
发明人： Kimio Motoda , Kiyohisa Tateyama
IPC分类号： B05C5/00 , B05C11/08 , B05D1/40 , B08B3/00 , B08B9/00 , G03F7/16 , H01L21/00 , H01L21/027 , B05C11/02
CPC分类号： H01L21/6715 , B05C11/08 , B08B3/00 , B08B9/00 , G03F7/162 , Y10S134/902
摘要： A coating apparatus comprises a rotary container rotatable about a rotational axis as the center, a rotary rest table, located in the rotary container to be movable vertically and rotatable about the rotational axis as the center, for supporting a target substrate thereon, coating solution supply pipe for applying a coating solution to the target substrate, cleaning solution supply pipe for spraying a cleaning solution to an inner surface of the rotary container, a seal member provided between the rotary rest table and the bottom wall of the rotary container and capable of sealing a gap between the rotary rest table and the bottom wall of the rotary container, and connecting mechanism for connecting the rotary container and the rotary rest table so as to rotate together. The cleaning solution supply pipe projects from a through hole formed in the upper portion of the rotary container to be coaxial with the rotational axis, and the coating solution supply pipe projects from the through hole of the rotary container to be coaxial with the rotational axis.
摘要翻译：一种涂覆装置，包括以围绕作为中心的旋转轴线可旋转的旋转容器，旋转托架，位于旋转容器中，以可旋转轴线为中心垂直移动并可旋转，用于将目标基板支撑在其上，用于将涂布溶液施加到目标基板的管道，用于将清洗溶液喷射到旋转容器的内表面的清洁溶液供给管，设置在旋转托架和旋转容器的底壁之间并且能够密封的清洁溶液供给管旋转托架和旋转容器的底壁之间的间隙，以及用于连接旋转容器和旋转托架一起旋转的连接机构。清洗液供给管从形成在旋转容器的上部的贯通孔突出成与旋转轴线同轴，涂布液供给管从旋转容器的贯通孔突出成与旋转轴线同轴。

9. 发明授权

US5421056A Spin chuck and treatment apparatus using same 失效
标题翻译：旋转卡盘和处理设备使用相同
公开(公告)号：US5421056A
公开(公告)日：1995-06-06
申请号：US229675
申请日：1994-04-19
申请人： Kiyohisa Tateyama , Michiaki Matsushita
发明人： Kiyohisa Tateyama , Michiaki Matsushita
IPC分类号： B05C11/08 , B08B11/02 , G03F7/16 , G03F7/30 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/304 , H01L21/306 , H01L21/683
CPC分类号： H01L21/67028 , B08B11/02 , Y10S134/902 , Y10T279/18
摘要： A cleaning apparatus for cleaning a semiconductor wafer comprises a spin chuck having a turn table. A gas supplying passage is formed in a shaft for supporting the turn table to supply a protecting gas to the rear surface of the wafer. A conical movable member, arranged to cover an end off the shaft, is movable upward and downward in accordance with the flow off the protecting gas supplied thereto. Inner ends of three reciprocating arms, supported by the turn table and extending in radial directions, abut against an outer surface of the movable member and biased by springs. Fixed pins are arranged on the turn table at positions which divide the circumference of the turn table into three equal parts, along the edge of the wafer. Three swingable levers are arranged such that one is provided between two adjacent fixed pins. One end of each swingable lever is connected to the outer end of each reciprocating arm and the other end of the lever has a pin brought into contact with the edge of the wafer. When the protecting gas is supplied, the movable member is moved upward to a working position, and the reciprocating arms are pressed by the movable member and moved outward. As a result, the swingable levers are moved so as to bring their pins into contact with the edge of the wafer, thereby clamping the wafer among the pins.
摘要翻译：用于清洁半导体晶片的清洁装置包括具有转台的旋转卡盘。气体供给通道形成在用于支撑转台的轴中，以将保护气体供应到晶片的后表面。根据从其供应的保护气体的流动，可将上述端部从该轴上覆盖的圆锥形可移动部件向上和向下移动。由转台支撑并在径向方向上延伸的三个往复臂的内端部抵靠可动件的外表面并被弹簧偏压。固定销布置在转台上，沿着晶圆的边缘将转台的圆周分成三个相等的部分。三个可摆动的杆被布置成使得一个设置在两个相邻的固定销之间。每个可摆动杆的一端连接到每个往复臂的外端，并且杆的另一端具有与晶片的边缘接触的销。当提供保护气体时，可动件向上移动到工作位置，并且往复臂由可动件按压并向外移动。结果，摆动杆被移动以使它们的销与晶片的边缘接触，从而将晶片夹在销中。

10. 发明授权

US5339128A Resist processing method 失效
标题翻译：抗蚀加工方法
公开(公告)号：US5339128A
公开(公告)日：1994-08-16
申请号：US31464
申请日：1993-03-15
申请人： Kiyohisa Tateyama , Masami Akimoto , Mitsuru Ushijima
发明人： Kiyohisa Tateyama , Masami Akimoto , Mitsuru Ushijima
IPC分类号： B29C31/00 , G03F7/16 , G03F7/20 , G03F7/26 , G03F7/30 , H01L21/00 , H01L21/677 , G03D5/00
CPC分类号： G03F7/7075 , B29C31/00 , G03F7/16 , G03F7/26 , G03F7/3021 , H01L21/67173 , H01L21/67178 , H01L21/67742 , Y10S134/902 , Y10S414/136
摘要： A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.
摘要翻译：本发明的抗蚀剂处理系统包括至少两个用于输送晶片的机器人，机器人可以移动的通道，沿着通道布置的多个处理单元和用于临时保持待处理的晶片的等待单元。等待单元布置在通道旁边和处理单元之间，并且其包括分隔在其中的多个隔室。

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