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1. 发明授权

US09715175B2 Mask protection device, exposure apparatus, and method for manufacturing device 有权
公开(公告)号：US09715175B2
公开(公告)日：2017-07-25
申请号：US14405042
申请日：2012-06-15
申请人： Kazuya Ota
发明人： Kazuya Ota
IPC分类号： G03F7/20 , G03F1/66 , G02B27/00
CPC分类号： G03F7/70058 , G02B27/0006 , G03F1/66 , G03F7/70741 , G03F7/7075 , G03F7/70916 , H01L21/6773
摘要： A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an electroconductive movable contact portion provided on at least one of the inner pod and the outer pod and being capable of coming into contact with an electroconductive film of the reticle; and a leaf spring for achieving electric conduction of the contact portion to at least one of the inner pod and the outer pod. The reticle is kept in the inner pod and the inner pod is kept in the outer pod, thereby enabling stable grounding of the reticle.

2. 发明授权

US09188882B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09188882B2
公开(公告)日：2015-11-17
申请号：US13160042
申请日：2011-06-14
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/42 , G03B27/52 , G03F9/00 , G03F7/20
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译：光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

3. 发明申请

US20150321356A1 ENCLOSURE FOR A TARGET PROCESSING MACHINE 审中-公开
标题翻译：目标加工机的外壳
公开(公告)号：US20150321356A1
公开(公告)日：2015-11-12
申请号：US14705928
申请日：2015-05-06
申请人： Mapper Lithography IP B.V.
发明人： Joep Gerard Vijverberg , Laurens Vincent Plandsoen , Bas van Gelder , Guido de Boer , Michel Pieter Dansberg
IPC分类号： B25J11/00 , G03F9/00
CPC分类号： B25J11/00 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F9/7096 , H01J37/16 , H01J37/3177 , H01J2237/024 , H01J2237/166 , H01L21/6719 , H01L21/67225 , H01L21/67775
摘要： The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.
摘要翻译：本发明涉及用于封闭目标加工机器的组件。组件包括外壳和转移单元。外壳包括用于在其上布置所述目标加工机的基板，固定到所述基板的侧壁板和固定到所述侧壁板的顶壁板。此外，外壳包括在外壳的侧壁中的进入开口。转印单元包括用于相对于基板移动转印单元的一个或多个转印元件。传送单元还包括门板，其被布置成用于关闭进入开口，其中门板通过柔性联接件可移动地安装到传送单元，该柔性联接器允许门板相对于传送单元至少移动在朝向和/或远离外壳的方向上。

4. 发明申请

US20150192864A1 LITHOGRAPHIC APPARATUS 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：US20150192864A1
公开(公告)日：2015-07-09
申请号：US14661929
申请日：2015-03-18
申请人： ASML NETHERLANDS B.V.
发明人： Theodorus Marinus MODDERMAN
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/7075
摘要： A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
摘要翻译：光刻设备包括：支撑基板的第一工作台; 第二表，不被配置为支撑基板，包括用于感测来自投影系统的图案化的辐射束的特性的传感器单元，所述第二台在第一台从下方移出时在投影系统下方移动投影系统，在第一和第二表彼此独立地移动; 以及液体供应系统，用于向投影系统和基板，第一台和/或第二台之间的空间供应液体，其中第二台被配置为在液体限制结构的底部提供限制表面当第一台从投影系统下方移除时，以防止液体泄漏到光刻设备的其余部分中。

5. 发明申请

US20150131069A1 MASK PROTECTION DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE 有权
标题翻译：掩模保护装置，曝光装置和制造装置的方法
公开(公告)号：US20150131069A1
公开(公告)日：2015-05-14
申请号：US14405042
申请日：2012-06-15
申请人： Kazuya Ota
发明人： Kazuya Ota
IPC分类号： G03F7/20 , G02B27/00
CPC分类号： G03F7/70058 , G02B27/0006 , G03F1/66 , G03F7/70741 , G03F7/7075 , G03F7/70916 , H01L21/6773
摘要： A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an electroconductive movable contact portion provided on at least one of the inner pod and the outer pod and being capable of coming into contact with an electroconductive film of the reticle; and a leaf spring for achieving electric conduction of the contact portion to at least one of the inner pod and the outer pod. The reticle is kept in the inner pod and the inner pod is kept in the outer pod, thereby enabling stable grounding of the reticle.
摘要翻译：能够在其中保持掩模版的掩模版保护装置设置有能够将掩模版保持在其中的内部容器; 能够将内部容器保持在其中的外部容器; 导电可动接触部分，其设置在所述内部容器和所述外部容器中的至少一个上，并且能够与所述掩模版的导电膜接触; 以及用于将接触部分导电到内部容器和外部容器中的至少一个的板簧。将掩模版保持在内部容器中，并将内部容器保持在外部容器中，从而实现了标线的稳定接地。

6. 发明授权

US09019469B2 Exposure apparatus, exposure method, method for producing device, and optical part 有权
标题翻译：曝光装置，曝光方法，制造装置的方法和光学部件
公开(公告)号：US09019469B2
公开(公告)日：2015-04-28
申请号：US11639245
申请日：2006-12-15
申请人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
发明人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译：曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。曝光装置（EX）具有用于保持基板（P）的基板台（PT），并且具有疏液平面（30A）的板构件（30）可更换地设置在基板台（PT）上，以防止剩余液体，保持良好的曝光精度。

7. 发明申请

US20140022523A1 EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART 审中-公开
标题翻译：曝光装置，曝光方法，制造装置的方法和光学部件
公开(公告)号：US20140022523A1
公开(公告)日：2014-01-23
申请号：US14035135
申请日：2013-09-24
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA , Hiroaki TAKAIWA , Shigeru HIRUKAWA , Ryuichi HOSHIKA , Hitoshi ISHIZAWA
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid. The exposure apparatus has a stage which includes a substrate holder for holding the substrate, a detachable member detachably disposed on the stage so that its upper surface contacts an immersion region, and a sensor having a light transmissive member. The detachable member, on which an opening is formed in the upper surface, is disposed on the stage so that the light transmissive member is arranged within the opening.
摘要翻译：曝光装置通过投影光学系统和液体将曝光光照射到基板上来曝光基板。曝光装置具有包括用于保持基板的基板保持件和可拆卸地设置在台架上以使其上表面接触浸没区域的可拆卸构件的台阶和具有透光构件的传感器。在上表面上形成有开口的可拆卸构件设置在平台上，使得透光构件布置在开口内。

8. 发明申请

US20130293872A1 MONITORING APPARATUS AND METHOD PARTICULARLY USEFUL IN PHOTOLITHOGRAPHICALLY PROCESSING SUBSTRATES 有权
公开(公告)号：US20130293872A1
公开(公告)日：2013-11-07
申请号：US13936795
申请日：2013-07-08
申请人： Nova Measuring Instruments Ltd.
发明人： Giora DISHON , Moshe FINAROV , Zvi NIREL , Yoel COHEN
IPC分类号： G01N21/88 , G01B11/14
CPC分类号： G03F7/70058 , G01B11/14 , G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8867 , G03F7/3028 , G03F7/70525 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70675 , G03F7/7075 , G03F7/70991 , H01L21/67155
摘要： Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

9. 发明申请

US20130177857A1 CARRIER METHOD, EXPOSURE METHOD, CARRIER SYSTEM AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：载体方法，曝光方法，载体系统和曝光装置以及装置制造方法
公开(公告)号：US20130177857A1
公开(公告)日：2013-07-11
申请号：US13727281
申请日：2012-12-26
申请人： NIKON CORPORATION
发明人： Yuichi SHIBAZAKI
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70133 , G03F7/707 , G03F7/7075
摘要： A carrier system equipped with a fine movement stage holding a mounted wafer and can move along a predetermined plane, a chuck main section which holds the wafer above a predetermined position and can move vertically, and vertical movement pins supporting the wafer held by the chuck main section on the fine movement stage from below when the fine movement stage is positioned at the predetermined position and are vertically movable. A controller drives the chuck main section and the vertical movement pins downward until a lower surface of the wafer comes into contact with the fine movement stage while maintaining a hold state by the chuck main section to the wafer and a support state by the vertical movement pins to the wafer, and when the lower surface of the wafer comes into contact with the fine movement stage, the hold state and the support state are released.
摘要翻译：一种具有保持安装晶片并能够沿预定平面移动的精细运动台的托架系统，将晶片保持在预定位置上并可垂直移动的卡盘主体部分，以及支撑由卡盘主体保持的晶片的垂直运动销当微动台位于预定位置并且是可垂直移动时，从下方的微动台上的截面。控制器将卡盘主体部分和垂直移动销向下驱动，直到晶片的下表面与微动载台接触，同时保持夹头主体对晶片的保持状态，并且通过垂直移动销并且当晶片的下表面与微动载台接触时，释放保持状态和支撑状态。

10. 发明授权

US08416382B2 Processing apparatus and device manufacturing method 有权
标题翻译：加工装置及装置的制造方法
公开(公告)号：US08416382B2
公开(公告)日：2013-04-09
申请号：US12025940
申请日：2008-02-05
申请人： Shinichi Hirano
发明人： Shinichi Hirano
IPC分类号： G03B27/52 , G03B27/32 , G06F7/00
CPC分类号： H01L21/67276 , G03F7/70525 , G03F7/7075
摘要： A processing apparatus including a processing unit configured to process an object includes a conveying unit configured to convey an object between a transfer portion provided between an external apparatus and the processing unit, and the processing unit, a controller configured to output a request signal requesting the external apparatus to convey the object to the transfer portion, and an output unit configured to output a signal indicating a start of maintenance of the processing apparatus. The controller is configured to output to the external apparatus a signal for stopping the conveyance of the object to the transfer portion, based on the signal indicating the start of maintenance output from the output unit, after outputting the request signal.
摘要翻译：一种处理装置，包括被配置为处理对象的处理单元，包括：传送单元，被配置为在设置在外部设备和处理单元之间的传送部分与处理单元之间传送对象;控制器，被配置为输出请求外部设备将物体传送到传送部分，以及输出单元，被配置为输出指示处理设备的维护开始的信号。控制器被配置为在输出请求信号之后，基于指示从输出单元输出的维护开始的信号，向外部设备输出用于停止将物体传送到传送部分的信号。

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