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1. 发明授权

US12061422B2 Method for fast loading substrates in a flat panel tool 有权
公开(公告)号：US12061422B2
公开(公告)日：2024-08-13
申请号：US17157634
申请日：2021-01-25
申请人： Applied Materials, Inc.
发明人： Benjamin M. Johnston , Preston Fung , Sean Screws , Cheuk Ming Lee , Jae Myung Yoo
IPC分类号： G03F7/00
CPC分类号： G03F7/7075 , G03F7/707 , G03F7/70716 , G03F7/70758 , G03F7/70775 , G03F7/70791
摘要： The present disclosure generally relates to a method and apparatus for loading, processing, and unloading substrates. A processing system comprises a load/unload system coupled to a photolithography system. The load/unload system comprises a first set of tracks having a first height and a first width, and a second set of tracks having a second height and a second width different than the first height and first width. An unprocessed substrate is transferred from a lift pin loader to a chuck along the first set of tracks on a first tray while a processed substrate is transferred from the chuck to the lift pin loader along the second set of tracks on a second tray. While a first tray remains with a substrate on the chuck during processing, the load/unload system is configured to unload a processed substrate and load an unprocessed substrate on a second tray.

2. 发明公开

US20240036482A1 SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD 审中-公开
公开(公告)号：US20240036482A1
公开(公告)日：2024-02-01
申请号：US18355918
申请日：2023-07-20
申请人： Tokyo Electron Limited
发明人： Masashi TSUCHIYAMA , Taro YAMAMOTO
IPC分类号： G03F7/00
CPC分类号： G03F7/7075
摘要： A substrate treatment system includes: a wet system having a wet treatment apparatus which performs in a wet mode one of substrate treatments from a formation treatment of a resist film to a developing treatment of the resist film after exposure, and coupled to an exposure apparatus; a dry system having a dry treatment apparatus which performs in a dry mode a same kind of substrate treatment by the wet treatment apparatus; and a relay transfer system which transfers the substrate between the wet system and the dry system, wherein: when viewed from a coupling direction, the wet system is arranged such that the exposure apparatus projects from one side in a depth direction perpendicular to the coupling direction in top view; and the dry system is arranged to be adjacent to the one side of the wet system in the depth direction.

3. 发明授权

US11854846B2 System for a semiconductor fabrication facility and method for operating the same 有权
公开(公告)号：US11854846B2
公开(公告)日：2023-12-26
申请号：US17809582
申请日：2022-06-29
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
发明人： Fu-Hsien Li , Sheng-Kang Yu , Chi-Feng Tung , Hsiang Yin Shen , Guancyun Li
IPC分类号： G05B19/19 , G05B19/4061 , H01L21/67 , B66C17/26 , B66C15/00 , B66C13/16 , B66C13/18 , H01L21/677 , G03F7/00
CPC分类号： H01L21/67265 , B66C13/16 , B66C13/18 , B66C15/00 , B66C17/26 , G03F7/70033 , G03F7/7075 , G03F7/7085 , G03F7/70533 , G03F7/70741 , G03F7/70975 , G03F7/70991 , G05B19/19 , G05B19/4061 , H01L21/67259 , H01L21/67706 , H01L21/67721 , H01L21/67724 , H01L21/67733 , H01L21/67736 , G05B2219/40292 , G05B2219/45031
摘要： A system for a semiconductor fabrication facility includes a maintenance tool, a control unit, a first track, a second track, a maintenance crane movably mounted on the first track, a plurality of first sensors disposed on the first track, an OHT vehicle movably mounted on the second track, and a second sensor on the OHT vehicle. The first sensors detect a location of the maintenance crane and generate a first location data to the control unit. The second sensor generates a second location data to the control unit.

4. 发明授权

US10504760B2 System for a semiconductor fabrication facility and method for operating the same 有权
公开(公告)号：US10504760B2
公开(公告)日：2019-12-10
申请号：US15636157
申请日：2017-06-28
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
发明人： Fu-Hsien Li , Sheng-Kang Yu , Chi-Feng Tung , Hsiang Yin Shen , Guancyun Li
IPC分类号： H01L21/67 , G03F7/20 , H01L21/677 , G05B19/4061 , G05B19/19 , B66C13/18 , B66C13/16 , B66C15/00 , B66C17/26
CPC分类号： H01L21/67265 , B66C13/16 , B66C13/18 , B66C15/00 , B66C17/26 , G03F7/70033 , G03F7/7075 , G03F7/7085 , G03F7/70533 , G03F7/70741 , G03F7/70975 , G03F7/70991 , G05B19/19 , G05B19/4061 , H01L21/67259 , H01L21/67706 , H01L21/67721 , H01L21/67724 , H01L21/67733 , H01L21/67736 , G05B2219/40292 , G05B2219/45031
摘要： An apparatus for a semiconductor fabrication facility (FAB) is provided. In one embodiment, the apparatus includes a maintenance tool and a transporting tool configured to transport at least one customized. The maintenance tool includes a first track at a first horizontal plane, at least one maintenance crane movably mounted on the first track, and a plurality of first sensors on the first track. The first sensors are configured to define at least a danger zone and to detect a location of the maintenance crane. The transporting tool includes a second track at a second horizontal plane, at least one overhead hoisting transporting (OHT) vehicle movably mounted on the second track, and at least one second sensor on the OHT vehicle. The second horizontal plane is different from the first horizontal planes. The first horizontal plane and the second horizontal plane at least partially overlap each other from a plane view.

5. 发明授权

US09715175B2 Mask protection device, exposure apparatus, and method for manufacturing device 有权
公开(公告)号：US09715175B2
公开(公告)日：2017-07-25
申请号：US14405042
申请日：2012-06-15
申请人： Kazuya Ota
发明人： Kazuya Ota
IPC分类号： G03F7/20 , G03F1/66 , G02B27/00
CPC分类号： G03F7/70058 , G02B27/0006 , G03F1/66 , G03F7/70741 , G03F7/7075 , G03F7/70916 , H01L21/6773
摘要： A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an electroconductive movable contact portion provided on at least one of the inner pod and the outer pod and being capable of coming into contact with an electroconductive film of the reticle; and a leaf spring for achieving electric conduction of the contact portion to at least one of the inner pod and the outer pod. The reticle is kept in the inner pod and the inner pod is kept in the outer pod, thereby enabling stable grounding of the reticle.

6. 发明授权

US09188882B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09188882B2
公开(公告)日：2015-11-17
申请号：US13160042
申请日：2011-06-14
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/42 , G03B27/52 , G03F9/00 , G03F7/20
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译：光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

7. 发明申请

US20150321356A1 ENCLOSURE FOR A TARGET PROCESSING MACHINE 审中-公开
标题翻译：目标加工机的外壳
公开(公告)号：US20150321356A1
公开(公告)日：2015-11-12
申请号：US14705928
申请日：2015-05-06
申请人： Mapper Lithography IP B.V.
发明人： Joep Gerard Vijverberg , Laurens Vincent Plandsoen , Bas van Gelder , Guido de Boer , Michel Pieter Dansberg
IPC分类号： B25J11/00 , G03F9/00
CPC分类号： B25J11/00 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F9/7096 , H01J37/16 , H01J37/3177 , H01J2237/024 , H01J2237/166 , H01L21/6719 , H01L21/67225 , H01L21/67775
摘要： The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.
摘要翻译：本发明涉及用于封闭目标加工机器的组件。组件包括外壳和转移单元。外壳包括用于在其上布置所述目标加工机的基板，固定到所述基板的侧壁板和固定到所述侧壁板的顶壁板。此外，外壳包括在外壳的侧壁中的进入开口。转印单元包括用于相对于基板移动转印单元的一个或多个转印元件。传送单元还包括门板，其被布置成用于关闭进入开口，其中门板通过柔性联接件可移动地安装到传送单元，该柔性联接器允许门板相对于传送单元至少移动在朝向和/或远离外壳的方向上。

8. 发明申请

US20150192864A1 LITHOGRAPHIC APPARATUS 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：US20150192864A1
公开(公告)日：2015-07-09
申请号：US14661929
申请日：2015-03-18
申请人： ASML NETHERLANDS B.V.
发明人： Theodorus Marinus MODDERMAN
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/7075
摘要： A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.
摘要翻译：光刻设备包括：支撑基板的第一工作台; 第二表，不被配置为支撑基板，包括用于感测来自投影系统的图案化的辐射束的特性的传感器单元，所述第二台在第一台从下方移出时在投影系统下方移动投影系统，在第一和第二表彼此独立地移动; 以及液体供应系统，用于向投影系统和基板，第一台和/或第二台之间的空间供应液体，其中第二台被配置为在液体限制结构的底部提供限制表面当第一台从投影系统下方移除时，以防止液体泄漏到光刻设备的其余部分中。

9. 发明申请

US20150131069A1 MASK PROTECTION DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE 有权
标题翻译：掩模保护装置，曝光装置和制造装置的方法
公开(公告)号：US20150131069A1
公开(公告)日：2015-05-14
申请号：US14405042
申请日：2012-06-15
申请人： Kazuya Ota
发明人： Kazuya Ota
IPC分类号： G03F7/20 , G02B27/00
CPC分类号： G03F7/70058 , G02B27/0006 , G03F1/66 , G03F7/70741 , G03F7/7075 , G03F7/70916 , H01L21/6773
摘要： A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an electroconductive movable contact portion provided on at least one of the inner pod and the outer pod and being capable of coming into contact with an electroconductive film of the reticle; and a leaf spring for achieving electric conduction of the contact portion to at least one of the inner pod and the outer pod. The reticle is kept in the inner pod and the inner pod is kept in the outer pod, thereby enabling stable grounding of the reticle.
摘要翻译：能够在其中保持掩模版的掩模版保护装置设置有能够将掩模版保持在其中的内部容器; 能够将内部容器保持在其中的外部容器; 导电可动接触部分，其设置在所述内部容器和所述外部容器中的至少一个上，并且能够与所述掩模版的导电膜接触; 以及用于将接触部分导电到内部容器和外部容器中的至少一个的板簧。将掩模版保持在内部容器中，并将内部容器保持在外部容器中，从而实现了标线的稳定接地。

10. 发明授权

US09019469B2 Exposure apparatus, exposure method, method for producing device, and optical part 有权
标题翻译：曝光装置，曝光方法，制造装置的方法和光学部件
公开(公告)号：US09019469B2
公开(公告)日：2015-04-28
申请号：US11639245
申请日：2006-12-15
申请人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
发明人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译：曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。曝光装置（EX）具有用于保持基板（P）的基板台（PT），并且具有疏液平面（30A）的板构件（30）可更换地设置在基板台（PT）上，以防止剩余液体，保持良好的曝光精度。

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