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1. 发明授权

US11747734B2 Stripping-solution machine and working method thereof 有权
公开(公告)号：US11747734B2
公开(公告)日：2023-09-05
申请号：US16754760
申请日：2019-12-24
申请人： TCL China Star Optoelectronics Technology Co., Ltd.
发明人： Tian Ou
IPC分类号： G03D5/00 , G03F7/42 , B01D29/50 , B01D29/60 , B01D29/90
CPC分类号： G03F7/422 , B01D29/50 , B01D29/60 , B01D29/90
摘要： A stripping-solution machine and working method thereof are provided. The stripping-solution machine includes: a plurality stages of chambers, which are arranged sequentially in order, wherein each stage of the chamber is correspondingly connected to a storage box; at least one filter device, wherein one end of the filter device is disposed to be connected to a storage box corresponding to a current stage chamber by a first pipe, and another end of the filter device is connected to a next stage chamber by a second pipe. Furthermore, a plurality of valve switches are at least disposed on the first pipe or the second pipe.

2. 发明授权

US10591820B2 Substrate processing apparatus and substrate processing method 有权
公开(公告)号：US10591820B2
公开(公告)日：2020-03-17
申请号：US16073881
申请日：2017-02-03
申请人： SCREEN HOLDINGS CO., LTD.
发明人： Masahiko Harumoto , Masaya Asai , Yuji Tanaka , Koji Kaneyama
IPC分类号： G03D5/00 , G03F7/30 , G03F7/004 , G03F7/20 , G03F7/16 , G03F7/32 , G03F7/38 , H01L21/027
摘要： A resist film including a metallic component and a photosensitive material is formed on a surface of a substrate, and then a peripheral portion of the resist film on the substrate is irradiated with light by an edge exposer. Subsequently, development processing is performed with a development liquid from a nozzle on the exposed portion of the resist film. Thus, the part of the resist film formed on the peripheral portion of the substrate is removed. Thereafter, exposure processing is performed on the substrate in an exposure device, so that an exposure pattern is formed on the resist film. Then, a development liquid is supplied to the exposed substrate in a development processing unit, so that development processing is performed on the resist film.

3. 发明授权

US10520819B2 Substrate treating apparatus and method of treating substrate 有权
公开(公告)号：US10520819B2
公开(公告)日：2019-12-31
申请号：US15987194
申请日：2018-05-23
申请人： Samsung Display Co. Ltd.
发明人： Taegyun Kim , Minsuk Ko , Koichi Sugitani , Yong-Hoon Yang
IPC分类号： G03D5/00 , G03F7/30 , G03F7/00 , G03F7/32 , G03F7/16
摘要： A substrate treating apparatus includes a plurality of conveying rollers arranged in a first direction which is a horizontal direction, and configured to transfer a substrate in the first direction, the substrate being disposed on a plane formed by the first direction and a second direction perpendicular to the first direction, a developer providing nozzle configured to provide a developer onto the substrate to form a developer layer on the substrate, a sensor part for recognizing a position of the substrate, and a vertical moving part configured to move each of the conveying rollers along a third direction which is downward and perpendicular to the first and second directions.

4. 发明授权

US10108111B1 Developing method, developing apparatus, and storage medium 有权
公开(公告)号：US10108111B1
公开(公告)日：2018-10-23
申请号：US15936818
申请日：2018-03-27
申请人： TOKYO ELECTRON LIMITED
发明人： Takeshi Shimoaoki , Yusaku Hashimoto , Masahiro Fukuda
IPC分类号： G03D5/00 , G03G15/10
摘要： A developing method includes: horizontally holding a substrate; disposing an opposing surface of a developer nozzle that faces a portion of a surface of the substrate, above one of central and peripheral portions of the surface; discharging a developer to form a liquid collection portion of the developer; spreading the liquid collection portion by moving the developer nozzle toward the other of the central and peripheral portions with the opposing surface brought into contact with the liquid collection portion; lifting the developer nozzle relative to the surface while stopping the discharge of the developer, and pulling up a portion of the liquid collection portion; stopping the lifting, and forming a pillar of the developer having a tapered upper end which is brought into contact with the opposing surface; and applying a shearing force to the pillar to shear the tapered upper end and separating the pillar from the opposing surface.

5. 发明授权

US09059224B2 System and method for treating substrate 有权
标题翻译：底物处理系统及方法
公开(公告)号：US09059224B2
公开(公告)日：2015-06-16
申请号：US13587512
申请日：2012-08-16
申请人： Dong Ho Kim , Jinyoung Choi , Jaeseung Go , Soomin Hwang
发明人： Dong Ho Kim , Jinyoung Choi , Jaeseung Go , Soomin Hwang
IPC分类号： G03B27/32 , B05C13/02 , G03D5/00 , H01L21/67 , G03F7/20
CPC分类号： H01L21/67225 , G03F7/7075 , G03F7/70991 , H01L21/67213
摘要： A method and system for treating a substrate are provided. The system includes a coating unit, a pre/post-exposure treatment unit, and a developing unit. Each of the units includes a load port and an index module. The pre/post-exposure treatment unit includes first and second modules that are arranged in different layers. The first module performs a process for coating a protective layer on the wafer before an exposure process. The second module performs a process for cleaning the wafer and a post-exposure bake process after the exposure process.
摘要翻译：提供了一种处理基板的方法和系统。该系统包括涂覆单元，曝光前/曝光后处理单元和显影单元。每个单元包括负载端口和索引模块。前/后曝光处理单元包括以不同层布置的第一和第二模块。第一模块在曝光处理之前执行在晶片上涂覆保护层的工艺。第二模块执行清洁晶片的处理和曝光处理之后的曝光后烘烤处理。

6. 发明授权

US09004788B2 Substrate processing apparatus, substrate processing method, and storage medium 有权
标题翻译：基板处理装置，基板处理方法和存储介质
公开(公告)号：US09004788B2
公开(公告)日：2015-04-14
申请号：US13862526
申请日：2013-04-15
申请人： Tokyo Electron Limited
发明人： Kenichirou Matsuyama , Tomohiro Kaneko
IPC分类号： G03D5/00 , G03F7/20 , H01L21/67 , H01L21/677
CPC分类号： G03F7/20 , H01L21/6715 , H01L21/67178 , H01L21/67276 , H01L21/67745 , H01L21/67769
摘要： A substrate processing apparatus is disclosed equipped with a transfer mechanism that transfers a substrate processed at a processing block to a carrier so that the increase of the number of transfer process is suppressed, improving the processing efficiency. The substrate processing apparatus is configured in such a way that, when a second-transfer module houses at least one substrate and a carrier that can house the at least one substrate is not placed in a carrier-placement unit, the at least one substrate is transferred to a buffer module. When the second transfer module houses at least one substrate and the carrier that can house the at least one substrate is placed in the carrier-placement unit, the at least one substrate is transferred to the carrier, regardless of whether or not a substrate is being transferred from the buffer module to the carrier.
摘要翻译：公开了一种基板处理装置，其具有将在处理块处理的基板传送到载体的转印机构，从而抑制转印处理次数的增加，提高处理效率。衬底处理装置被配置成使得当第二转移模块容纳至少一个衬底时，可以容纳至少一个衬底的载体不被放置在载体放置单元中时，所述至少一个衬底是转移到缓冲模块。当第二转移模块容纳至少一个基底并且能够容纳至少一个基底的载体被放置在载体放置单元中时，至少一个基底被转移到载体，而不管基底是否是从缓冲模块传输到载体。

7. 发明申请

US20140044429A1 Color Film Developing Apparatus 有权
标题翻译：彩色显影装置
公开(公告)号：US20140044429A1
公开(公告)日：2014-02-13
申请号：US13642543
申请日：2012-09-05
申请人： Liwei Hu
发明人： Liwei Hu
IPC分类号： G03D5/00
CPC分类号： G03D5/00 , G03F7/3064
摘要： The present invention provides a color film developing apparatus, which is used to uniformly develop photoresist on the surface of a substrate as manufacturing a liquid crystal panel, comprising a developing chamber. The developing chamber comprises a first developing chamber and a second developing chamber respectively set inclined to a horizontal plane; the inclined directions of the first developing chamber and the second developing chamber inclined to the horizontal plane are contrary to each other. The color film developing apparatus according to the present invention can avoid the secondary development of the photoresist on the inclined substrate caused by the developer flowing from top to bottom when the substrate passes the developing chamber and proceeds to develop; enhance the uniformity of the development of the substrate; improve the uniformity of the in-plane process; narrow the differences; improve the quality of the product.
摘要翻译：本发明提供了一种彩色显影装置，其用于在制造液晶面板时在基板的表面上均匀地显影光致抗蚀剂，其包括显影室。显影室包括分别设置成倾斜于水平面的第一显影室和第二显影室; 第一显影室和第二显影室相对于水平面倾斜的倾斜方向彼此相反。根据本发明的彩色显影装置可以避免当显影室通过显影室时由显影剂从顶部向底部流动而引起的倾斜基板上的光致抗蚀剂的二次显影并进行显影; 增强基材的均匀性; 提高平面过程的均匀性; 缩小差异; 提高产品质量。

8. 发明授权

US08568043B2 Coating and developing apparatus and coating and developing method 有权
标题翻译：涂装开发设备及涂层开发方法
公开(公告)号：US08568043B2
公开(公告)日：2013-10-29
申请号：US12896957
申请日：2010-10-04
申请人： Nobuaki Matsuoka
发明人： Nobuaki Matsuoka
IPC分类号： G03D5/00 , G03F7/00 , B05C13/00 , B05C11/00
CPC分类号： G03F7/16 , G03F7/162 , G03F7/30 , G03F7/3021
摘要： Disclosed is a coating and developing apparatus including (a) a first liquid process module to sequentially perform a first liquid process by a first chemical liquid, and a second liquid process by the first chemical liquid again; (b) a buffer module to sequentially store the respective substrates which have been subjected to the first liquid process and have not yet been subjected to the second liquid process; and (c) a second liquid process module to sequentially perform a third liquid process by a second chemical liquid. In particular, the third liquid process to be performed on a first substrate of the substrate group is started before the first liquid process performed on a last substrate of the substrate group is ended, in such a manner that right after the first liquid process is performed on the last substrate, the second liquid process is to be performed on the first substrate.
摘要翻译：公开了一种涂料和显影装置，其包括：（a）第一液体处理模块，用于依次通过第一化学液体执行第一液体处理，并且再次通过第一化学液体进行第二液体处理; （b）缓冲器模块，用于顺序地存储已经经受第一液体处理并且尚未经受第二液体处理的各个基板; 和（c）第二液体处理模块，用于通过第二化学液体依次执行第三液体处理。特别地，在基板组的最后一个基板上执行的第一液体处理结束之前，在基板组的第一基板上执行的第三液体处理开始，使得在执行第一液体处理之后在最后的基板上，第二液体处理将在第一基板上进行。

9. 发明授权

US08534936B2 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US08534936B2
公开(公告)日：2013-09-17
申请号：US13178037
申请日：2011-07-07
申请人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida
发明人： Nobuaki Matsuoka , Akira Miyata , Shinichi Hayashi , Suguru Enokida
IPC分类号： G03D5/00 , G03B27/52 , B05C11/02 , B05C13/02
CPC分类号： G03F7/708 , H01L21/6715
摘要： A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks.
摘要翻译：涂覆和显影装置包括具有至少一个涂膜形成单元块堆叠和垂直堆叠的显影单元块堆叠的处理块。每个单元块堆叠包括垂直堆叠的单元块，并且每个单元块包括包含液体处理模块和加热模块的处理模块。每个单元块包括可沿着运输通道从承载块侧移动到接口块侧的运输机构，以在属于单元块的处理模块之间输送基板。分别在涂膜形成单元块和显影单元块的承载块侧设置传送单元，用于将基板传送到相关的涂膜形成或显影单元块的传送机构。第一传送机构将从载体移除的基板传送到与涂膜形成单元块相关联的转印单元之一。

10. 发明授权

US08434423B2 Substrate carrying apparatus having circumferential sidewall and substrate processing system 失效
标题翻译：具有圆周侧壁和基板处理系统的基板承载装置
公开(公告)号：US08434423B2
公开(公告)日：2013-05-07
申请号：US12698455
申请日：2010-02-02
申请人： Takayuki Toshima , Kazuo Terada
发明人： Takayuki Toshima , Kazuo Terada
IPC分类号： B05C13/00 , B05C11/00 , B05C3/00 , C23C16/00 , G03D5/00 , B08B6/00 , C23F1/00
CPC分类号： H01L21/67057 , H01L21/67034 , H01L21/67346 , H01L21/67748 , H01L21/68742
摘要： Disclosed is a substrate carrying apparatus having a simple configuration capable of inhibiting the occurrence of pattern collapse. A carrying tray of the disclosed substrate carrying apparatus includes a bottom plate for supporting the substrate and a circumferential side wall being provided around the bottom plate. An opening is formed in the bottom plate. An elevating member, to and from which the substrate is to be transferred, passes through the opening. A space is temporarily formed in a carrying tray. The elevating member within the opening passes to the outside of the carrying tray through the space. When the substrate is carried, the liquid is reservoired within the carrying tray, and the substrate is carried while the liquid remained on the upper surface of the substrate.
摘要翻译：公开了具有能够抑制图案塌陷的发生的简单结构的基板输送装置。所公开的基板承载装置的承载托盘包括用于支撑基板的底板和围绕底板设置的周向侧壁。在底板上形成开口。升降构件，要从基板转移到其上并通过该开口。暂时在搬运托盘中形成空间。开口内的升降构件通过该空间传递到搬运托盘的外部。当承载基板时，液体被储存在承载托盘内，并且在液体保留在基板的上表面上的同时承载基板。

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