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1. 发明授权

US09953852B2 Liquid processing aparatus 有权
公开(公告)号：US09953852B2
公开(公告)日：2018-04-24
申请号：US14525541
申请日：2014-10-28
申请人： TOKYO ELECTRON LIMITED
发明人： Jiro Higashijima , Yuichi Douki , Masami Akimoto , Shigehisa Inoue
IPC分类号： H01L21/67 , B08B1/04
CPC分类号： H01L21/6715 , B08B1/04 , H01L21/67051 , H01L21/6708 , Y10S134/902
摘要： A liquid processing apparatus of the present disclosure performs a liquid processing by supplying a processing liquid to a substrate that is rotating. A substrate holding unit configured to be rotatable around a vertical axis is provided with a holding surface to attract and hold a bottom surface of the substrate horizontally. A guide unit is formed integrally with the substrate holding unit, disposed around the substrate held in the substrate holding unit, and provided at a position equal to or lower than a height of a top surface of a periphery of the substrate. The guide unit includes a guide surface configured to guide the processing liquid. A rotary cup rotates integrally with the substrate holding unit, and guides the processing liquid towards the cup between the rotary cup and the guide unit.

2. 发明申请

US20180061692A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM 审中-公开
公开(公告)号：US20180061692A1
公开(公告)日：2018-03-01
申请号：US15687649
申请日：2017-08-28
申请人： Tokyo Electron Limited
发明人： Toru NISHINO , Kiyohito IIJIMA , Shigeru ISHIZAWA
IPC分类号： H01L21/67 , H01L21/677 , G05B19/418
CPC分类号： H01L21/67294 , B65G2201/0297 , G05B19/41865 , G05B19/4189 , G05B2219/31276 , G05B2219/32173 , G05B2219/32174 , G05B2219/45031 , H01L21/67069 , H01L21/67173 , H01L21/67248 , H01L21/67265 , H01L21/67276 , H01L21/67727 , H01L21/6773 , H01L21/67742 , H01L21/67745 , H01L21/67769 , H01L21/67772 , H01L21/67775 , Y02P90/28 , Y10S134/902 , Y10S414/14
摘要： A substrate processing method is provided. The substrate processing method includes placing a substrate storage container storing a substrate on a load port; automatically determining a type of the substrate stored in the placed substrate storage container; and, by referring to a storage unit that stores parameter data set related to a transport condition for each type of substrate, controlling transport of the substrate stored in the substrate storage container based on the parameter data set corresponding to the automatically determined substrate type to process the substrate.

3. 发明授权

US09887079B2 Supply apparatus and supply method for supplying fluid carbon dioxide 有权
公开(公告)号：US09887079B2
公开(公告)日：2018-02-06
申请号：US14376102
申请日：2013-01-29
申请人： ORGANO CORPORATION
发明人： Hiroshi Sugawara , Yoshinori Ono
IPC分类号： H01L21/02 , F17C7/02 , F17C7/04 , B08B7/00 , B01D5/00 , C01B32/50
CPC分类号： H01L21/02101 , B01D5/006 , B01D2256/22 , B01D2257/70 , B08B7/0021 , C01B32/50 , F17C7/02 , F17C7/04 , F25J2220/80 , F25J2220/82 , F25J2220/84 , Y02P20/123 , Y10S134/902 , Y10T137/0402 , Y10T137/794
摘要： Provided are a supply apparatus and a supply method for supplying fluid carbon dioxide that are energy-saving and efficient. The supply apparatus for supplying fluid carbon dioxide includes: a circulation system including a purifying unit that removes impurities and contaminants from the carbon dioxide, a storage unit that includes a condenser for changing gaseous carbon dioxide passed through the purifying unit into liquid carbon dioxide, a supply unit that includes a first pump for supplying the liquid carbon dioxide in the storage unit to a use point, and a return line through which excess carbon dioxide supplied from the supply unit but not used at the use point is returned to the storage unit; and a carbon dioxide introduction unit that introduces carbon dioxide, as a starting material or recovered gas, to the circulation system. The carbon dioxide introduction unit includes a second pump for increasing the pressure of the carbon dioxide and the second pump introduces the carbon dioxide to the circulation system.

4. 发明申请

US20170189945A1 APPARATUS AND METHOD FOR CONTAMINATION IDENTIFICATION 审中-公开
公开(公告)号：US20170189945A1
公开(公告)日：2017-07-06
申请号：US15400143
申请日：2017-01-06
申请人： RAVE LLC
发明人： Jeffrey E. LeClaire , Kenneth G. Roessler , David Brinkley , Alexander M. Figliolini
IPC分类号： B08B7/00 , G03F1/82 , G03F1/84
CPC分类号： B08B7/0042 , G03F1/82 , G03F1/84 , Y10S134/902
摘要： Method and apparatus for identifying a contaminant on a substrate. Identification of a contaminant removed from a substrate can be useful in identifying and eliminating or reducing the source of the contamination and tailoring the removal method to minimize the potential for substrate damage. The methods and apparatus for identification of the contaminant provide liberation of molecules of the contaminant from the surface of the substrate, accounting for different geometries and substrate materials, sample preparation, and chemical analysis of the contaminant.

5. 发明申请

US20170120282A1 COATING APPARATUS AND METHOD OF FORMING COATING LAYER USING THE SAME 审中-公开
公开(公告)号：US20170120282A1
公开(公告)日：2017-05-04
申请号：US15403974
申请日：2017-01-11
申请人： LG Display Co., Ltd.
发明人： Tae-Kyun JEONG , Kyong-Deuk JEONG , Jong-Ik PARK , Myung-Shik KIM , Hyoung-Won KIM , Dong-Ki SHIN , Jeong-Hak CHOI
IPC分类号： B05B15/02 , G03F7/16 , B05C13/00 , B05D1/02 , B05B3/12
CPC分类号： B05B15/52 , B05B3/12 , B05B15/5223 , B05B15/55 , B05B15/70 , B05C3/09 , B05C3/10 , B05C11/11 , B05C13/00 , B05D1/005 , B05D1/02 , B05D1/26 , B41J2/16547 , C03C17/002 , G03F7/16 , G11B7/266 , H01L21/67051 , Y10S134/902 , Y10S135/902
摘要： A coating apparatus includes: a nozzle having a nozzle front end configured to spray a coating solution and a head configured to store the coating solution; a movement axis configured to cause the nozzle to move back and forth in a straight line; a rotating connection member configured to connect the movement axis with the nozzle and allow the nozzle to rotate; a stage disposed under the movement axis; and a cleaning means disposed at an end of the movement axis, and having a nozzle front end insertion unit in a concave shape of the nozzle front end and a base fixing the insertion unit, wherein the nozzle is fixed in a normal direction of a surface of the stage by the movement axis, moves back and forth in an extension direction of the movement axis, and rotates with respect to the movement axis.

6. 发明授权

US09477162B2 Substrate processing method 有权
标题翻译：基板加工方法
公开(公告)号：US09477162B2
公开(公告)日：2016-10-25
申请号：US14555433
申请日：2014-11-26
申请人： SCREEN Semiconductor Solutions Co., Ltd.
发明人： Koji Kaneyama , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori , Shuichi Yasuda , Tetsuya Hamada
IPC分类号： B05D3/12 , B08B1/00 , B08B1/04 , B08B3/04 , G03F7/20 , G03F7/16 , G11B5/84 , H01L21/67 , G11B7/26
CPC分类号： G03F7/70925 , G03F7/168 , G03F7/7075 , G03F7/70916 , G03F7/70991 , G11B5/8404 , G11B7/261 , H01L21/67051 , H01L21/67225 , Y10S134/902
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.
摘要翻译：基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块，清洁/干燥处理块，以及接口块。曝光装置被布置成与基板处理装置中的界面块相邻。曝光装置通过浸渍方法使基板进行曝光处理。在清洁/干燥处理块的边缘清洁单元中，刷子抵靠旋转基板的一端，从而清洁曝光处理之前的基板的边缘。此时，校正基板被清洁的位置。

7. 发明授权

US09285674B2 Apparatus and method for indirect surface cleaning 有权
标题翻译：用于间接表面清洗的设备和方法
公开(公告)号：US09285674B2
公开(公告)日：2016-03-15
申请号：US14656206
申请日：2015-03-12
申请人： Rave, LLC
发明人： Jeffrey E. LeClaire , Kenneth G. Roessler , David Brinkley
IPC分类号： G03F1/82 , G03F1/72 , B08B7/00
CPC分类号： G03F1/82 , B08B7/0042 , G03F1/72 , Y10S134/902
摘要： A photomask includes at least one feature disposed thereon. The at least one feature has an associated design location, where a distance between a location of the at least one feature and the associated design location defines a positional error of the at least one feature. A method for improving a performance characteristic of the photomask includes directing electromagnetic radiation toward the photomask, the electromagnetic radiation having a wavelength that substantially coincides with a high absorption coefficient of the photomask; generating a thermal energy increase in the photomask through incidence of the electromagnetic radiation thereon; and decreasing the positional error as a result of the generating the thermal energy increase in the photomask.
摘要翻译：光掩模包括设置在其上的至少一个特征。所述至少一个特征具有相关联的设计位置，其中所述至少一个特征的位置与相关联的设计位置之间的距离定义所述至少一个特征的位置误差。一种用于改善光掩模的性能特性的方法包括将电磁辐射导向光掩模，电磁辐射具有基本上与光掩模的高吸收系数一致的波长; 通过其上的电磁辐射的入射而产生光掩模中的热能增加; 并且由于在光掩模中产生热能增加而导致位置误差降低。

8. 发明申请

US20150114561A1 LIQUID PROCESSING APPARATUS 有权
标题翻译：液体加工设备
公开(公告)号：US20150114561A1
公开(公告)日：2015-04-30
申请号：US14525541
申请日：2014-10-28
申请人： TOKYO ELECTRON LIMITED
发明人： Jiro HIGASHIJIMA , Yuichi DOUKI , Masami AKIMOTO , Shigehisa INOUE
IPC分类号： H01L21/67
CPC分类号： H01L21/6715 , B08B1/04 , H01L21/67051 , H01L21/6708 , Y10S134/902
摘要： A liquid processing apparatus of the present disclosure performs a liquid processing by supplying a processing liquid to a substrate that is rotating. A substrate holding unit configured to be rotatable around a vertical axis is provided with a holding surface to attract and hold a bottom surface of the substrate horizontally. A guide unit is formed integrally with the substrate holding unit, disposed around the substrate held in the substrate holding unit, and provided at a position equal to or lower than a height of a top surface of a periphery of the substrate. The guide unit includes a guide surface configured to guide the processing liquid. A rotary cup rotates integrally with the substrate holding unit, and guides the processing liquid towards the cup between the rotary cup and the guide unit.
摘要翻译：本公开的液体处理装置通过向正在旋转的基板供给处理液来进行液体处理。被配置为能够围绕垂直轴线旋转的基板保持单元设置有保持表面，以水平地吸引并保持基板的底面。引导单元与基板保持单元一体形成，设置在保持在基板保持单元中的基板周围，并且设置在等于或低于基板的周边的顶表面的高度的位置。引导单元包括构造成引导处理液体的引导表面。旋转杯与基板保持单元一体地旋转，并且将处理液朝向旋转杯和引导单元之间的杯引导。

9. 发明授权

US08951359B2 Liquid processing apparatus, liquid processing method and computer-readable storage medium storing liquid processing program 有权
标题翻译：液体处理装置，液体处理方法和存储液体处理程序的计算机可读存储介质
公开(公告)号：US08951359B2
公开(公告)日：2015-02-10
申请号：US13106972
申请日：2011-05-13
申请人： Takao Inada , Naoyuki Okamura , Hidetsugu Yano , Yosuke Hachiya
发明人： Takao Inada , Naoyuki Okamura , Hidetsugu Yano , Yosuke Hachiya
IPC分类号： B08B7/00 , B08B7/04 , B08B3/00 , H01L21/67
CPC分类号： H01L21/67028 , H01L21/67017 , H01L21/67051 , Y10S134/902
摘要： There is provided a liquid processing method for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The liquid processing method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution.
摘要翻译：提供了一种液体处理方法，其通过使用处理溶液在基板的前表面上进行液体处理，然后通过使用温度低于基板的温度的冲洗溶液在基板的前表面上进行冲洗处理处理方案。液体处理方法包括在液体处理和漂洗过程之间进行中间处理，用于将衬底的前表面的温度调节到高于冲洗溶液的温度并低于处理溶液的温度的温度。

10. 发明授权

US08900400B2 Proximity head having a fluid resistor 有权
标题翻译：接近头具有流体电阻
公开(公告)号：US08900400B2
公开(公告)日：2014-12-02
申请号：US13661969
申请日：2012-10-26
申请人： Lam Research Corporation
发明人： Arnold Kholodenko , Cheng-Yu (Sean) Lin , Russell Martin
IPC分类号： H01L21/67 , B08B3/00
CPC分类号： H01L21/67051 , Y10S134/902 , Y10T29/49826
摘要： A proximity head defined by a body having a length. The body includes a main bore defined therein and extending along the length. A resistor bore is defined in the body and extends along the length. The resistor bore defined below the main bore. A first plurality of bores defined between the main bore and the resistor bore and a second plurality of bores defined between the resistor bore and an exterior surface of the body. The exterior surface of the body defining a proximity surface of the proximity head.
摘要翻译：由具有长度的主体限定的邻近头。主体包括限定在其中并沿着长度延伸的主孔。电阻孔定义在主体中并沿着长度延伸。电阻孔位于主孔下方。限定在主孔和电阻器孔之间的第一多个孔和限定在电阻器孔和主体的外表面之间的第二多个孔。主体的外表面限定了邻近头部的接近表面。

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