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1. 发明授权

US06391110B1 Method and apparatus for cleaning treatment 失效
标题翻译：清洁处理方法和装置
公开(公告)号：US06391110B1
公开(公告)日：2002-05-21
申请号：US09686820
申请日：2000-10-12
申请人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Tetsuya Sada , Kiyohisa Tateyama
发明人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Tetsuya Sada , Kiyohisa Tateyama
IPC分类号： B05C1100
CPC分类号： B05C11/08 , Y10S134/902
摘要： An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.
摘要翻译：提供了一种处理装置，该装置包括：用于回收在处理物体时流出或飞出的处理液的容器;清洗装置，用于通过向容器供给清洗液体来清洗容器的内壁表面;以及循环系统，用于当通过清洁装置清洁容器的内壁表面并将回收的液体供应到清洁装置时，回收从容器排出的排出液体。

2. 发明授权

US06770149B2 Method and apparatus for cleaning treatment 失效
标题翻译：清洁处理方法和装置
公开(公告)号：US06770149B2
公开(公告)日：2004-08-03
申请号：US10127756
申请日：2002-04-23
申请人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi
发明人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi
IPC分类号： B08B304
CPC分类号： B05C11/08 , Y10S134/902
摘要： A method for a cleaning treatment including a step of forming, in a coating mechanism, a coating film on a substrate provided within a cup. The method further includes dissolving, in an edge cleaning mechanism, a portion of the coating film on the substrate using a cleaning liquid, and recovering at least a portion of used cleaning liquid from the edge cleaning mechanism. The recovered cleaning liquid is stored and a level of the stored cleaning liquid is detected. The method also includes supplementing a fresh cleaning liquid to the stored cleaning liquid when a detected level of the stored cleaning liquid is lower than a predetermined level, and using a mixture of the supplemented fresh cleaning liquid and the stored cleaning liquid to clean the cup of the coating mechanism.
摘要翻译：一种清洁处理方法，包括在涂布机构中形成设置在杯内的基板上的涂膜的步骤。该方法还包括使用清洁液将边缘清洁机构中的涂膜的一部分溶解在基板上，并从边缘清洁机构回收至少一部分使用过的清洗液体。回收的清洗液被储存，并且检测出存储的清洗液的水平。该方法还包括当检测到的存储的清洁液体的水平低于预定水平时，将新鲜的清洁液体补充到所储存的清洁液体，并且使用补充的新鲜清洁液体和所储存的清洁液体的混合物来清洁涂层机理。

3. 发明授权

US06398879B1 Method and apparatus for cleaning treatment 失效
公开(公告)号：US06398879B1
公开(公告)日：2002-06-04
申请号：US09686823
申请日：2000-10-12
申请人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda
发明人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda
IPC分类号： B08B302
CPC分类号： B05C11/08 , Y10S134/902
摘要： An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.

4. 发明授权

US6159288A Method and apparatus for cleaning treatment 失效
公开(公告)号：US6159288A
公开(公告)日：2000-12-12
申请号：US935917
申请日：1997-09-23
申请人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
发明人： Fumio Satou , Mitsuhiro Sakai , Takeshi Tsukamoto , Yoichi Honda , Kiyomitsu Yamaguchi , Kimio Motoda , Yoshitaka Matsuda , Tetsuya Sada , Kiyohisa Tateyama
IPC分类号： B05C11/08 , B05C9/06 , B05C11/00
CPC分类号： B05C11/08 , Y10S134/902
摘要： An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.

5. 发明授权

US5945161A Apparatus and method for supplying process solution to surface of substrate to be processed 失效
标题翻译：将处理液供给到待处理基板的表面的装置和方法
公开(公告)号：US5945161A
公开(公告)日：1999-08-31
申请号：US993021
申请日：1997-12-18
申请人： Hiroshi Hashimoto , Kiyohisa Tateyama , Kiyomitsu Yamaguchi , Yoshitaka Matsuda , Norio Uchihira , Mitsuhiro Sakai , Fumio Satou
发明人： Hiroshi Hashimoto , Kiyohisa Tateyama , Kiyomitsu Yamaguchi , Yoshitaka Matsuda , Norio Uchihira , Mitsuhiro Sakai , Fumio Satou
IPC分类号： B05C11/08 , B05D1/00 , H01L21/00 , B05D3/12
CPC分类号： H01L21/6715 , B05C11/08 , B05D1/005
摘要： Disclosed is a processing apparatus comprising holding means, support means, process solution supply means, life means, and rotating means. A substrate to be processed is rotatably held by the holding means. An overhanging portion of the substrate extending over an edge of the holding means is supported by the support means to maintain a front surface of the substrate horizontally flat. A process solution is supplied from the process solution supply means onto the front surface of the substrate held by the holding means and supported by the support means. The substrate held by the holding means is vertically moved by the lift means relative to the support means. Further, the substrate moved upward relative to the support means is rotated by the rotating means.
摘要翻译：公开了一种处理装置，包括保持装置，支撑装置，处理液供给装置，寿命装置和旋转装置。待加工的基板被保持装置可旋转地保持。在保持装置的边缘上延伸的衬底的悬伸部分被支撑装置支撑，以使衬底的前表面水平地保持平坦。处理液从处理液供给装置供给到由保持装置保持的基板的前表面上并由支撑装置支撑。由保持装置保持的基板通过提升装置相对于支撑装置垂直移动。此外，相对于支撑装置向上移动的基板由旋转装置旋转。

6. 发明授权

US6062240A Treatment device 失效
标题翻译：治疗装置
公开(公告)号：US6062240A
公开(公告)日：2000-05-16
申请号：US35902
申请日：1998-03-06
申请人： Tetsuya Sada , Norio Uchihira , Mitsuhiro Sakai , Kiyomitsu Yamaguchi
发明人： Tetsuya Sada , Norio Uchihira , Mitsuhiro Sakai , Kiyomitsu Yamaguchi
IPC分类号： B05C11/08 , G03F7/16 , H01L21/00 , H01L21/687 , B08B3/02
CPC分类号： H01L21/6715 , B05C11/08 , G03F7/162 , H01L21/67051 , H01L21/68714 , Y10S134/902
摘要： A treatment device comprising a holding method for holding a substrate such as an LCD substrate; and a treatment solution supply method for supplying a treatment solution on a surface of the substrate wherein the holding method has a substrate-placing portion on which the substrate is disposed, the substrate-placing is made of a synthetic resinous material. Since the holding method has a substrate-placing portion which is made of a synthetic resinous material, the electric charge amount of the substrate can be reduced to prevent various static electricity caused troubles such as the electrostatic destruction of the device formed on the substrate. Further, a discharge noise trouble due to discharge phenomenon from the substrate to a transporting method can be prevented. Further, it is possible to reduce the electric charge amount of the holding method and destaticize the holding method by supplying a destaticizing fluid such as ionized pure water or ionized gas towards above or below the holding method. Thus, it is possible to prevent various static-electricity caused troubles such as the electrostatic destruction of the device formed in the device from occurring and further, possible to prevent noise troubles from occurring because the generation degree of the discharge which occurs between the substrate and the transport method can be reduced further. The electric charge amount of the substrate can be reduced by making the thickness (distance) of the substrate-placing portion formed of a dielectric thick (long).
摘要翻译：一种处理装置，包括用于保持诸如LCD基板的基板的保持方法; 以及一种处理溶液供应方法，用于在基板的表面上提供处理溶液，其中保持方法具有其上设置有基板的基板放置部分，基板放置由合成树脂材料制成。由于保持方法具有由合成树脂材料制成的基板放置部分，所以可以减少基板的电荷量，以防止各种静电引起诸如形成在基板上的装置的静电破坏的麻烦。此外，可以防止由于从基板到输送方法的放电现象引起的放电噪声问题。此外，通过向静电保持方法的上方或下方供给诸如电离纯化水或离子化气体的去静电液体，可以减少保持方法的电荷量并使其保持静电。因此，可以防止各种静电引起的故障，例如装置中形成的装置的静电破坏的发生，并且进一步可以防止由于在基板和基板之间发生的放电的产生程度而发生噪声问题可以进一步降低运输方式。通过使电介质厚（长）形成的基板载置部的厚度（距离）可以减小基板的电荷量。

7. 发明授权

US06238511B1 Method and apparatus for processing substrate 有权
标题翻译：处理基板的方法和装置
公开(公告)号：US06238511B1
公开(公告)日：2001-05-29
申请号：US09140327
申请日：1998-08-26
申请人： Tetsuya Sada , Tetsu Kawasaki , Mitsuhiro Sakai , Takeshi Tsukamoto
发明人： Tetsuya Sada , Tetsu Kawasaki , Mitsuhiro Sakai , Takeshi Tsukamoto
IPC分类号： B32B3500
CPC分类号： B32B38/10 , B05D3/007 , B05D3/107 , G03F7/422 , H01L21/31133 , Y10S156/922 , Y10T156/11 , Y10T156/1116
摘要： A method of processing a substrate for removing a coating film from a substrate by dissolving the coating film with a solvent, comprising the steps of (a) supplying a solvent independently to each of peripheral portions of an upper surface side and a lower surface side of the substrate, and (b) supplying the solvent to the peripheral portion of the lower surface side of the substrate in an amount lower than the solvent supplied to the peripheral portion of the lower surface side in the step (a) or lower than that supplied to the peripheral portion of the upper surface side in this step (b), or terminating a supply of the solvent.
摘要翻译：一种通过用溶剂溶解涂膜来处理从基板除去涂膜的基板的方法，该方法包括以下步骤：（a）独立地向溶液的上表面侧和下表面侧的周边部分供给溶剂所述基板，和（b）在所述工序（a）中将所述溶剂供给到所述基板的下表面侧的周边部分的量低于供给到所述下表面侧的周边部分的溶剂，或低于供给的在该步骤（b）中的上表面侧的周边部分，或者终止溶剂的供给。

8. 发明授权

US06261007B1 Substrate process method and substrate process apparatus 失效
标题翻译：基板工艺方法和基板工艺装置
公开(公告)号：US06261007B1
公开(公告)日：2001-07-17
申请号：US09362860
申请日：1999-07-29
申请人： Hideyuki Takamori , Kiyohisa Tateyama , Kengo Mizosaki , Noriyuki Anai , Mitsuhiro Sakai , Shinobu Tanaka , Yoichi Honda , Yuji Shimomura
发明人： Hideyuki Takamori , Kiyohisa Tateyama , Kengo Mizosaki , Noriyuki Anai , Mitsuhiro Sakai , Shinobu Tanaka , Yoichi Honda , Yuji Shimomura
IPC分类号： G03D500
CPC分类号： H01L21/6715 , G03F7/168 , H01L21/67034
摘要： Just after resist solution is coated on a substrate, it is dried substantially in a non-heating state. In reality, inertia gas or the like is blown from a shower head to the substrate. Thus, the resist solution coated on the substrate is dried. Consequently, transfer marks that cause the film thickness of resist film to be unequal and the line width of a circuit pattern to fluctuate can be prevented.
摘要翻译：刚刚将抗蚀剂溶液涂覆在基材上之后，其基本处于非加热状态。实际上，惯性气体等从喷头吹送到基板。因此，涂布在基板上的抗蚀剂溶液被干燥。因此，可以防止导致抗蚀剂膜的膜厚度不均匀的转印标记和电路图案的线宽波动。

9. 发明授权

US06443641B2 Substrate process method and substrate process apparatus 失效
标题翻译：基板工艺方法和基板工艺装置
公开(公告)号：US06443641B2
公开(公告)日：2002-09-03
申请号：US09874259
申请日：2001-06-06
申请人： Hideyuki Takamori , Kiyohisa Tateyama , Kengo Mizosaki , Noriyuki Anai , Mitsuhiro Sakai , Shinobu Tanaka , Yoichi Honda , Yuji Shimomura
发明人： Hideyuki Takamori , Kiyohisa Tateyama , Kengo Mizosaki , Noriyuki Anai , Mitsuhiro Sakai , Shinobu Tanaka , Yoichi Honda , Yuji Shimomura
IPC分类号： G03D500
CPC分类号： H01L21/6715 , G03F7/168 , H01L21/67034
摘要： Just after resist solution is coated on a substrate, it is dried substantially in a non-heating state. In reality, inertia gas or the like is blown from a shower head to the substrate. Thus, the resist solution coated on the substrate is dried. Consequently, transfer marks that cause the film thickness of resist film to be unequal and the line width of a circuit pattern to fluctuate can be prevented.
摘要翻译：刚刚将抗蚀剂溶液涂覆在基材上之后，其基本处于非加热状态。实际上，惯性气体等从喷头吹送到基板。因此，涂布在基板上的抗蚀剂溶液被干燥。因此，可以防止导致抗蚀剂膜的膜厚度不均匀的转印标记和电路图案的线宽波动。

10. 发明授权

US06203218B1 Substrate processing apparatus and substrate processing method 失效
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US06203218B1
公开(公告)日：2001-03-20
申请号：US09362963
申请日：1999-07-30
申请人： Tsutae Omori , Mitsuhiro Sakai , Shinobu Tanaka
发明人： Tsutae Omori , Mitsuhiro Sakai , Shinobu Tanaka
IPC分类号： G03D500
CPC分类号： G03F7/30 , Y10T156/1928
摘要： When an edge processing head is scanned in one direction, the discharge of a rinse solution from a rinse solution discharge nozzle at the front in a carrying direction is stopped, a developing solution is discharged from a developing solution discharge nozzle, and a rinse solution is discharged from a rinse solution discharge nozzle at the rear in the carrying direction. Specifically, with a developing solution being discharged to a glass substrate, the discharge of a rinse solution immediately follows the discharge of the developing solution. Thus, the edge processing of the substrate can be performed with minimal increases in the number of processes and in installation.
摘要翻译：当在一个方向上扫描边缘处理头时，停止在前方从冲洗液排出喷嘴沿输送方向排出冲洗溶液，将显影液从显影液排出喷嘴排出，冲洗溶液为从后方的冲洗液排出喷嘴在运送方向排出。具体地说，将显影溶液排出到玻璃基板上，冲洗液的排出立即在显影液的排出之后。因此，可以以最少的加工次数和安装次数来进行基板的边缘加工。

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