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1. 发明授权

US08873151B2 Illumination system for a microlithgraphic exposure apparatus 有权
标题翻译：微型照相曝光设备的照明系统
公开(公告)号：US08873151B2
公开(公告)日：2014-10-28
申请号：US11911904
申请日：2006-04-26
申请人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
发明人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
IPC分类号： G02B3/00 , G03F7/20 , G02B17/08 , G02B27/00
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
摘要翻译：微光刻曝光设备的照明系统包括用于将光瞳平面转换成场平面的聚光器。冷凝器具有包含多个连续透镜的透镜组。这些透镜被布置成使得由聚光器聚焦在轴上场点上的光束在透镜组的每个透镜内会聚。透镜组的至少一个透镜具有凹面。照明系统还可以包括至少部分地校正冷凝器的残余光瞳像差的场停止物镜。

2. 发明申请

US20080192359A1 Illumination System for a Microlithgraphic Exposure Apparatus 有权
标题翻译：微照相曝光设备的照明系统
公开(公告)号：US20080192359A1
公开(公告)日：2008-08-14
申请号：US11911904
申请日：2006-04-26
申请人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Furter , Rafael Egger , Artur Hogele , Michael Raum
发明人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Furter , Rafael Egger , Artur Hogele , Michael Raum
IPC分类号： G02B27/18
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62). The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666′) that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).
摘要翻译：微光刻曝光设备（10）的照明系统（12）包括用于将光瞳平面（54）变换成场平面（62）的冷凝器（601; 602; 603; 604; 605; 606）。冷凝器具有透镜组（L 14，L 15，L 16，L 17; L 24，L 25，L 26，L 27，L 28; L 34，L 35，L 36，L 37; L 44，L 45，L 46; L 53，L 54，L 55）。这些透镜被布置为使得在轴上场点（72）上由聚光器（601; 602; 603; 604; 605）聚焦的光束（70）会聚在透镜组的每个透镜内。透镜组的至少一个透镜（L 15，L 16，L 17; L 25，L 26; L 34，L 44，L 45; L 54）具有凹面。照明系统还可以包括至少部分校正冷凝器（601; 602; 603; 604; 605; 606）的残余光瞳像差的场停止物镜（66; 666,666'）。

3. 发明授权

US07697211B2 Symmetrical objective having four lens groups for microlithography 有权
标题翻译：具有用于微光刻的四个透镜组的对称物镜
公开(公告)号：US07697211B2
公开(公告)日：2010-04-13
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/30
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

4. 发明申请

US20090080086A1 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 有权
标题翻译：具有四个用于微结构的镜片组的对称目标
公开(公告)号：US20090080086A1
公开(公告)日：2009-03-26
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/18 , G02B11/28 , G02B11/04
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

5. 发明申请

US20070013882A1 Method of manufacturing projection objectives and set of projection objectives manufactured by that method 审中-公开
标题翻译：通过该方法制造投影物镜和投影物镜组的方法
公开(公告)号：US20070013882A1
公开(公告)日：2007-01-18
申请号：US11447996
申请日：2006-06-07
申请人： Aurelian Dodoc , Wilhelm Ulrich , Heiko Feldmann
发明人： Aurelian Dodoc , Wilhelm Ulrich , Heiko Feldmann
IPC分类号： G03B21/00
CPC分类号： G02B27/0012 , G03B21/006 , G03F7/70225 , G03F7/70233 , G03F7/70241 , G03F7/705
摘要： In a method of manufacturing projection objectives including defining an initial design for a projection objective and optimizing the design using a merit function, a set of related projection objectives including a first projection objective and at least one second projection objective is defined. Further, a plurality of merit function components, each of which reflects a particular quality parameter, is defined. One of these merit function components defines a common module requirement requiring that the first projection objective and the second projection objective each include at least one common optical module that is constructed to be substantially identical for the first and the second projection objective. The method results in a set of projection objectives having at least one common optical module. Employing the method in the manufacturing of complex projection objectives, such as projection objectives for microlithography, facilitates the manufacturing process and allows substantial cost savings.
摘要翻译：在制造投影物镜的方法中，包括定义投影物镜的初始设计并使用优值函数优化设计，定义了包括第一投影物镜和至少一个第二投影物镜的一组相关投影物镜。此外，定义了反映特定质量参数的多个优点函数分量。这些优点功能部件中的一个定义了共同的模块要求，其要求第一投影物镜和第二投影物镜每个包括至少一个共同的光学模块，其被构造为对于第一和第二投影物镜基本相同。该方法产生一组具有至少一个公共光学模块的投影物镜。采用该方法制造复杂的投影物镜，例如用于微光刻的投影物镜，便于制造过程，并且可以节省大量成本。

6. 发明申请

US20080151211A1 MULTIPLE-USE PROJECTION SYSTEM 审中-公开
标题翻译：多用途投影系统
公开(公告)号：US20080151211A1
公开(公告)日：2008-06-26
申请号：US11951746
申请日：2007-12-06
申请人： Winfried Kaiser , Wilhelm Ulrich , Heiko Feldmann , Aurelian Dodoc
发明人： Winfried Kaiser , Wilhelm Ulrich , Heiko Feldmann , Aurelian Dodoc
IPC分类号： G03B27/72
CPC分类号： G03F7/70341 , G03F7/70066 , G03F7/7025
摘要： Projection exposure methods and systems for exposing substrates are disclosed. The methods and systems feature projection objectives capable of multiple exposure configurations having different image side numerical apertures and different image field sizes.
摘要翻译：公开了用于曝光衬底的投影曝光方法和系统。该方法和系统具有能够具有不同图像侧数值孔径和不同图像场尺寸的多种曝光配置的投影物镜。

7. 发明申请

US20080037112A1 Projection objective and projection exposure apparatus including the same 有权
标题翻译：投影物镜与投影曝光装置相同
公开(公告)号：US20080037112A1
公开(公告)日：2008-02-14
申请号：US11727013
申请日：2007-03-23
申请人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
发明人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
IPC分类号： G02B27/18 , G02B17/08
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译：用于投影光刻的减少投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物体场以降低放大倍率|β来布置在投影物镜的图像表面中的有效图像场中 | <1。光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。光学元件包括具有最大透镜直径D max max的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。对于COMP = D最大 /（Y'。（NA / n'）^{2），条件COMP <15.8成立。优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。}

8. 发明授权

US07965453B2 Projection objective and projection exposure apparatus including the same 有权
标题翻译：投影物镜与投影曝光装置相同
公开(公告)号：US07965453B2
公开(公告)日：2011-06-21
申请号：US12651829
申请日：2010-01-04
申请人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
发明人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
IPC分类号： G02B13/14 , G02B17/08
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译：用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。

9. 发明授权

US07738188B2 Projection objective and projection exposure apparatus including the same 有权
标题翻译：投影物镜与投影曝光装置相同
公开(公告)号：US07738188B2
公开(公告)日：2010-06-15
申请号：US11727013
申请日：2007-03-23
申请人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
发明人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
IPC分类号： G02B13/14 , G02B17/08
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译：用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。

10. 发明授权

US09182578B2 Imaging optical system and illumination optical system 有权
标题翻译：成像光学系统和照明光学系统
公开(公告)号：US09182578B2
公开(公告)日：2015-11-10
申请号：US13326516
申请日：2011-12-15
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
IPC分类号： G03B27/42 , G02B17/06 , G02B27/09 , G03F7/20
CPC分类号： G02B17/0663 , G02B27/0905 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.
摘要翻译：成像光学系统具有多个反射镜，其将物平面中的对象场成像到图像平面中的图像场。至少一个反射镜的反射面构成为不能用旋转对称的功能描述的自由表面。物体场的纵横比大于1.物体场的最小和最大横向尺寸的比可以小于0.9。

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