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1. 发明申请

US20190101832A1 CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE 审中-公开
公开(公告)号：US20190101832A1
公开(公告)日：2019-04-04
申请号：US16207460
申请日：2018-12-03
申请人： Carl Zeiss SMT GmbH
发明人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
IPC分类号： G03F7/20 , G02B13/14 , G02B17/08
CPC分类号： G03F7/70258 , G02B13/143 , G02B17/0856 , G02B17/0892 , G03F7/70225 , G03F7/706
摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

2. 发明申请

US20180275526A1 OPTICAL APPARATUS FOR USE IN PHOTOLITHOGRAPHY 审中-公开
公开(公告)号：US20180275526A1
公开(公告)日：2018-09-27
申请号：US15899527
申请日：2018-02-20
申请人： Yim-Bun Patrick Kwan , Erik Loopstra
发明人： Yim-Bun Patrick Kwan , Erik Loopstra
IPC分类号： G03F7/20 , G02B5/00 , G02B13/14
CPC分类号： G03F7/70258 , G02B5/005 , G02B13/143 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/709
摘要： An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

3. 发明授权

US09857571B2 Thermoplastic sheet for a heads-up display system 有权
公开(公告)号：US09857571B2
公开(公告)日：2018-01-02
申请号：US14378280
申请日：2013-02-22
申请人： SEKISUI CHEMICAL CO., LTD.
发明人： Jean Sablayrolles , Frederic Clabau , Michael Labrot
IPC分类号： G02B13/14 , B32B17/10 , C08K5/00 , G02B27/01
CPC分类号： G02B13/143 , B32B17/10036 , B32B17/10678 , B32B17/10761 , C08K5/0008 , C08K5/005 , G02B27/01 , G02B27/0101 , G02B2027/0118 , G02B2027/0194 , C08L29/14
摘要： A thermoplastic sheet for the manufacture of a transparent motor vehicle or building glazing intended for the display of information, in particular of a laminated glazing, the sheet including a compound exhibiting an absorption band in the ultraviolet region and of which the diffuse reflection spectrum as a function of the energy of the incident radiation is characterized by a V value on the reflection curve, determined by the point of intersection between the tangent (1) at the inflection point of said curve and its asymptote (2) at the higher energies, of between 3.06 and 3.65 eV.

4. 发明授权

US09766551B2 Heat actuated and projected lithography systems and methods 有权
公开(公告)号：US09766551B2
公开(公告)日：2017-09-19
申请号：US14439252
申请日：2013-10-15
申请人： NORTHWESTERN UNIVERSITY
发明人： Chad A. Mirkin , Xing Liao , Keith A. Brown , Guoliang Liu , Abrin L. Schmucker , Shu He , Wooyoung Shim , Daniel J. Eichelsdoerfer , Boris Rasin
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20 , G03F7/00 , B05D1/26 , B05D3/06 , G02B13/14 , B82Y40/00
CPC分类号： G03F7/7035 , B05D1/26 , B05D3/06 , B82Y40/00 , G02B13/143 , G03F7/0002 , G03F7/20 , G03F7/2049 , G03F7/70141 , G03F7/70325 , G03F7/70383 , G03F7/7045
摘要： In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array to selectively irradiate tips of the tip array and pattern the substrate, wherein the second pattern of radiation corresponds to a tip pattern for the second frame section; and repeating the disposing and projecting for each frame section in the set of frame sections to pattern the image.

5. 发明申请

US20160377846A1 PROJECTION LENS SYSTEM 审中-公开
标题翻译：投影镜头系统
公开(公告)号：US20160377846A1
公开(公告)日：2016-12-29
申请号：US14750569
申请日：2015-06-25
申请人： Young Optics Inc.
发明人： Ching-Lung LAI , Yi-Hua LIN , Wei-Hao HUANG
IPC分类号： G02B13/18 , G02B27/00 , G02B9/64 , G02B13/14 , G02B13/16
CPC分类号： G02B13/16 , G02B13/04 , G02B13/143
摘要： A projection lens system includes, in order from a magnified side to a reduced side, a first lens group of positive refractive power and a second lens group of positive refractive power. The second lens group includes at least one cemented lens and at least one aspheric surface. During focusing, the first lens group remains stationary, and the second lens group is movable in a direction of an optical axis.
摘要翻译：投影透镜系统从放大侧到减数侧依次包括正屈光力的第一透镜组和正屈光力的第二透镜组。第二透镜组包括至少一个胶合透镜和至少一个非球面表面。在聚焦期间，第一透镜组保持静止，并且第二透镜组可在光轴的方向上移动。

6. 发明授权

US09513559B2 High numerical aperture objective lens system 有权
标题翻译：高数值孔径物镜系统
公开(公告)号：US09513559B2
公开(公告)日：2016-12-06
申请号：US14819335
申请日：2015-08-05
申请人： ASML Holding N.V.
发明人： Lev Ryzhikov
IPC分类号： G03B27/54 , G03F7/20 , G02B13/14 , G01N21/95 , G01N21/88 , G02B21/02
CPC分类号： G01N21/474 , G01N21/8806 , G01N21/9501 , G01N2201/0638 , G02B9/64 , G02B13/143 , G02B13/16 , G02B13/18 , G02B21/02 , G02B27/0025 , G03F7/70 , G03F7/70058
摘要： An objective lens system having a high numerical aperture, a large working distance, and low optical aberrations over a wide spectral band of wavelengths is disclosed. The objective lens system includes a first lens group, a second lens group, and a third lens group. The first lens group includes first and second positive meniscus lenses that are positioned at a distance from each other along an optical axis of the objective lens system. The distance may be dependent on a focal length of the objective lens system. The second lens group includes first and second meniscus lenses and a bi-convex lens. The third lens group includes a bi-concave lens and a doublet lens.
摘要翻译：公开了一种具有高数值孔径，大工作距离以及宽波段波长频带下的低光学像差的物镜系统。物镜系统包括第一透镜组，第二透镜组和第三透镜组。第一透镜组包括沿着物镜系统的光轴相互间隔一定距离的第一和第二正弯月透镜。距离可以取决于物镜系统的焦距。第二透镜组包括第一和第二弯月透镜和双凸透镜。第三透镜组包括双凹透镜和双透镜。

7. 发明授权

US09036152B2 Method and apparatus for determining the absorption in a blank 有权
标题翻译：用于确定空白中的吸收的方法和装置
公开(公告)号：US09036152B2
公开(公告)日：2015-05-19
申请号：US14150552
申请日：2014-01-08
申请人： CARL ZEISS SMT GmbH
发明人： Eric Eva
IPC分类号： G01N21/00 , G01N21/17 , G01M11/02 , G02B13/14
CPC分类号： G01N21/17 , G01M11/0257 , G01M11/0285 , G01N21/171 , G02B13/143
摘要： A method for determining the absorption of a blank (2) for producing an optical element (3), including: radiating a heating light ray (8) through the blank (2) for the purpose of heating the blank (2), and determining the absorption in the blank (2) by measuring at least one property of a measurement light ray (10) influenced by the heating of the blank (2). In the method, either the heating light ray (8) and the measurement light ray (10) or the heating light ray and a further heating light ray are oriented to enter into the blank (2) through a first polished surface (2a) or a second polished surface (2b), situated opposite the first surface, and meet one another exclusively in the interior of the blank (2), preferably in a volume (12) used for the production of the optical element (3). An associated measuring apparatus (1), optical element (3), and optical arrangement are also disclosed.
摘要翻译：一种用于确定用于制造光学元件（3）的坯料（2）的吸收的方法，包括：为了加热坯料（2），通过坯料（2）辐射加热光线（8），以及确定通过测量受到坯料（2）的加热影响的测量光线（10）的至少一个性质，在坯料（2）中的吸收。在该方法中，加热光线（8）和测量光线（10）或加热光线和另外的加热光线被定向成通过第一抛光表面（2a）进入坯料（2）或第二抛光表面（2b），其位于与第一表面相对的位置处，并且优选在用于制造光学元件（3）的体积（12）内彼此相遇。还公开了相关联的测量装置（1），光学元件（3）和光学装置。

8. 发明申请

US20150077839A1 Lens Unit 审中-公开
标题翻译：镜头单元
公开(公告)号：US20150077839A1
公开(公告)日：2015-03-19
申请号：US14394001
申请日：2013-04-10
申请人： KONICA MINOLTA, INC.
发明人： Takahiro Mizukane , Keiji Arai , Shuhei Hayakawa
IPC分类号： G02B13/14 , G02B13/00
CPC分类号： G02B13/143 , C03B11/082 , C03B2215/414 , G02B5/003 , G02B5/005 , G02B7/022 , G02B13/0015 , G02B13/0085
摘要： The purpose of the present invention is to provide a lens unit which can create an effective light shield despite the simple process by which the lens unit is produced. A non-transmissive filler (BD) is filled and solidified in the gap between the outer periphery of a light shielding member (SH1) and the outer peripheries of a first lens (L1) and a second lens (L2).
摘要翻译：本发明的目的是提供一种透镜单元，其可以产生有效的光屏蔽，尽管制造透镜单元的简单过程。在透光性填充剂（BD）被遮光部件（SH1）的外周与第一透镜（L1）和第二透镜（L2）的外周之间的间隙填充固化。

9. 发明授权

US08970964B2 Projection objective lens system 有权
标题翻译：投影物镜系统
公开(公告)号：US08970964B2
公开(公告)日：2015-03-03
申请号：US13991080
申请日：2011-11-25
申请人： Lirong Zhu
发明人： Lirong Zhu
IPC分类号： G02B3/00 , G02B13/18 , G02B13/24 , G03F7/20 , G02B13/14
CPC分类号： G02B13/18 , G02B13/143 , G02B13/24 , G03F7/70241
摘要： A projection objective lens system includes from an object plane to an image plane: a first lens group (S1) with a positive refractive power; a second lens group (S2) with a negative refractive power; a third lens group (S3) with a positive refractive power; a fourth lens group (S4) with a negative refractive power; and a fifth lens group (S5) with a positive refractive power being divided into two sub-lens groups. An aperture stop (AS) is provided between the two sub-lens groups. The following conditions are met: 0.12
摘要翻译：投影物镜系统包括从物平面到像平面的方法：具有正折射光焦度的第一透镜组（S1）具有负屈光力的第二透镜组（S2）; 具有正屈光力的第三透镜组（S3）; 具有负屈光力的第四透镜组（S4）和具有正折光力的第五透镜组（S5）被分成两个子透镜组。在两个子透镜组之间设置孔径光阑（AS）。满足以下条件：0.12 <| L / f | <0.4，＆Dgr; R / R <1％，其中f是系统的有效焦距，L是物体与像平面之间的距离，＆Dgr ; R表示边缘场束束的孔径光阑处的半径与中心场束束之间的差，R表示中心场束束的孔径光阑处的半径。

10. 发明申请

US20140132941A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING THE SAME 有权
标题翻译：成像光学系统和投影曝光系统，包括它们
公开(公告)号：US20140132941A1
公开(公告)日：2014-05-15
申请号：US14075313
申请日：2013-11-08
申请人： Carl Zeiss SMT GmbH
发明人： Hans-Juergen Mann , Wilheim Ulrich , Stephan Muellender , Hartmut Enkisch
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译：成像光学系统具有多个反射镜。这些图像将物体平面中的对象场映射成图像平面中的图像场。在成像光学系统中，成像光的最大入射角）与反射镜的反射面和成像光学系统的像侧数值孔径之比小于33.8°。这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长小于10nm。

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