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1. 发明授权

US08873151B2 Illumination system for a microlithgraphic exposure apparatus 有权
标题翻译：微型照相曝光设备的照明系统
公开(公告)号：US08873151B2
公开(公告)日：2014-10-28
申请号：US11911904
申请日：2006-04-26
申请人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
发明人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
IPC分类号： G02B3/00 , G03F7/20 , G02B17/08 , G02B27/00
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
摘要翻译：微光刻曝光设备的照明系统包括用于将光瞳平面转换成场平面的聚光器。冷凝器具有包含多个连续透镜的透镜组。这些透镜被布置成使得由聚光器聚焦在轴上场点上的光束在透镜组的每个透镜内会聚。透镜组的至少一个透镜具有凹面。照明系统还可以包括至少部分地校正冷凝器的残余光瞳像差的场停止物镜。

2. 发明授权

US07697211B2 Symmetrical objective having four lens groups for microlithography 有权
标题翻译：具有用于微光刻的四个透镜组的对称物镜
公开(公告)号：US07697211B2
公开(公告)日：2010-04-13
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/30
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

3. 发明申请

US20090080086A1 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 有权
标题翻译：具有四个用于微结构的镜片组的对称目标
公开(公告)号：US20090080086A1
公开(公告)日：2009-03-26
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/18 , G02B11/28 , G02B11/04
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

4. 发明申请

US20050134826A1 Projection objective for microlithography 有权
标题翻译：微光刻的投影目标
公开(公告)号：US20050134826A1
公开(公告)日：2005-06-23
申请号：US10919376
申请日：2004-08-17
申请人： Wilhelm Ulrich , Gerhard Fuerter , Michael Gerhard
发明人： Wilhelm Ulrich , Gerhard Fuerter , Michael Gerhard
IPC分类号： G02B13/14 , G02B17/08 , G02B27/28 , G03F7/20 , G03B27/72
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70225 , G03F7/70566
摘要： A projection objective for microlithography for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective has at least one polarization splitter device that is operated only once in transmission or reflection. By using this device, polarization-dependent differences in the intensity and response of the light passing through the objective, which lead to a worsening of the imaging quality of the projection objective, can largely be avoided.
摘要翻译：用于将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中的微光刻的投影物镜具有至少一个在透射或反射中仅被操作一次的偏振分离器件。通过使用该装置，可以大大避免导致通过物镜的光的强度和响应的偏振相关差异，导致投影物镜的成像质量恶化。

5. 发明申请

US20080049320A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影目标的微观算法
公开(公告)号：US20080049320A1
公开(公告)日：2008-02-28
申请号：US11849817
申请日：2007-09-04
申请人： Wilhelm Ulrich , Gerhard Fuerter , Michael Gerhard
发明人： Wilhelm Ulrich , Gerhard Fuerter , Michael Gerhard
IPC分类号： G02B27/28
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70225 , G03F7/70566
摘要： A projection objective for microlithography for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective has at least one polarization splitter device that is operated only once in transmission or reflection. By using this device, polarization-dependent differences in the intensity and response of the light passing through the objective, which lead to a worsening of the imaging quality of the projection objective, can largely be avoided.
摘要翻译：用于将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中的微光刻的投影物镜具有至少一个在透射或反射中仅被操作一次的偏振分离器件。通过使用该装置，可以大大避免导致通过物镜的光的强度和响应的偏振相关差异，导致投影物镜的成像质量恶化。

6. 发明授权

US07405808B2 Optical system, in particular illumination system, of a microlithographic projection exposure apparatus 有权
标题翻译：光学系统，特别是照明系统，微光刻投影曝光装置
公开(公告)号：US07405808B2
公开(公告)日：2008-07-29
申请号：US11014199
申请日：2004-12-16
申请人： Toralf Gruner , Michael Totzeck , Damian Fiolka , Wilhelm Ulrich , Gerhard Fuerter
发明人： Toralf Gruner , Michael Totzeck , Damian Fiolka , Wilhelm Ulrich , Gerhard Fuerter
IPC分类号： G03B27/54 , G03B27/42 , G02B5/08
CPC分类号： G03F7/70191 , G02B5/04 , G02B5/3066 , G02B27/286 , G03F7/70566
摘要： An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.
摘要翻译：微光刻投影曝光装置的光学系统，特别是照明系统包含用于折叠光束路径的至少一个平面反射表面。所述至少一个反射表面相对于所述光学系统的光轴布置，使得对于由所述至少一个反射表面偏离的轴向平行的光线，至少基本上保留了两个相互垂直的偏振方向之间的强度比。根据第二方面，至少一个反射表面被布置成使得能够实现对投射光的极化的最大影响，以便能够补偿在照明系统的其它部件中发生的偏振依赖性。

7. 发明申请

US20050152046A1 Optical system, in particular illumination system, of a microlithographic projection exposure apparatus 有权
标题翻译：光学系统，特别是照明系统，微光刻投影曝光装置
公开(公告)号：US20050152046A1
公开(公告)日：2005-07-14
申请号：US11014199
申请日：2004-12-16
申请人： Toralf Gruner , Michael Totzeck , Damian Fiolka , Wilhelm Ulrich , Gerhard Fuerter
发明人： Toralf Gruner , Michael Totzeck , Damian Fiolka , Wilhelm Ulrich , Gerhard Fuerter
IPC分类号： G02B27/00 , G02B27/28 , G03F7/20 , G02B17/00
CPC分类号： G03F7/70191 , G02B5/04 , G02B5/3066 , G02B27/286 , G03F7/70566
摘要： An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.
摘要翻译：微光刻投影曝光装置的光学系统，特别是照明系统包含用于折叠光束路径的至少一个平面反射表面。所述至少一个反射表面相对于所述光学系统的光轴布置，使得对于由所述至少一个反射表面偏离的轴向平行的光线，至少基本上保留了两个相互垂直的偏振方向之间的强度比。根据第二方面，至少一个反射表面被布置成使得能够实现对投射光的极化的最大影响，以便能够补偿在照明系统的其它部件中发生的偏振依赖性。

8. 发明授权

US07271876B2 Projection objective for microlithography 有权
标题翻译：微光刻的投影目标
公开(公告)号：US07271876B2
公开(公告)日：2007-09-18
申请号：US10919376
申请日：2004-08-17
申请人： Wilhelm Ulrich , Gerhard Fuerter , Michael Gerhard
发明人： Wilhelm Ulrich , Gerhard Fuerter , Michael Gerhard
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70225 , G03F7/70566
摘要： A projection objective for microlithography for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective has at least one polarization splitter device that is operated only once in transmission or reflection. By using this device, polarization-dependent differences in the intensity and response of the light passing through the objective, which lead to a worsening of the imaging quality of the projection objective, can largely be avoided.
摘要翻译：用于将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中的微光刻的投影物镜具有至少一个在透射或反射中仅被操作一次的偏振分离器件。通过使用该装置，可以大大避免导致通过物镜的光的强度和响应的偏振相关差异，导致投影物镜的成像质量恶化。

9. 发明授权

US08300210B2 Optical projection system 有权
标题翻译：光学投影系统
公开(公告)号：US08300210B2
公开(公告)日：2012-10-30
申请号：US11664896
申请日：2005-10-01
申请人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
发明人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
IPC分类号： G03B27/54 , G03B27/42 , G02B7/02
CPC分类号： G03F7/7015 , G02B7/00 , G02B7/008 , G02B7/021 , G02B7/028 , G02B7/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.
摘要翻译：提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。此外，第一壳体轴线与第二光轴基本共线。

10. 发明申请

US20060146384A1 Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
标题翻译：光束变换系统和包括光束变换系统的照明系统
公开(公告)号：US20060146384A1
公开(公告)日：2006-07-06
申请号：US11271976
申请日：2005-11-14
申请人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
发明人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
IPC分类号： G03H1/08
CPC分类号： G03F7/70183 , G02B5/32 , G02B27/09 , G02B27/0927 , G02B27/0944 , G02B27/095 , G02B27/0977 , G03F7/70108 , G03F7/70566
摘要： An optical beam transformation system, which can be designed to be utilized in an illuminating system of a microlithograpic projection exposure apparatus, has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include at least one transformation element causing a radial redistribution of light intensity and having at least one transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include at least one optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface. Axicon elements with axicon surfaces may be used as transformation elements.
摘要翻译：可以设计用于微光学投影曝光装置的照明系统的光束转换系统具有沿着光束转换系统的光轴布置的光学元件序列，并被设计用于转换入射光分布光束转换系统的入射表面通过光强度的径向再分布从光束转换系统的出射表面出射到出射光分布中。光学元件包括至少一个变换元件，其导致光强度的径向重新分布并且具有至少一个相对于光轴倾斜的变换表面，并且根据效率对称特性引起入射在相变表面上的光分布的偏振选择反射用于转化面。光学元件还包括至少一个光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，对由变换表面处的偏振选择反射引起的透射不均匀性进行空间依赖的补偿。具有转轴表面的Axicon元件可用作转换元件。

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