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1. 发明公开

US20230213767A1 Eye Glow Suppression in Waveguide Based Displays 审中-公开
公开(公告)号：US20230213767A1
公开(公告)日：2023-07-06
申请号：US17999662
申请日：2021-05-26
申请人： DigiLens Inc.
发明人： Alastair John Grant , Milan Momcilo Popovich , Nicholas Sherwood , Roger Allen Conley Smith , Michiel Koen Callens , Nima Shams
IPC分类号： G02B27/01 , F21V8/00 , G02B27/00
CPC分类号： G02B27/0172 , G02B6/005 , G02B27/0043
摘要： Methods and apparatus for eye-glow suppression in waveguide systems is disclosed herein. Some embodiments of the methods and the apparatus include a waveguide based display including a waveguide including an in-coupling optical element and an out-coupling optical element, where the in-coupling optical element is configured to in-couple image containing light and the out-coupling optical element is configured to out-couple the image counting light towards a user, where the waveguide comprises an outer surface and an inner surface opposite to the outer surface, and wherein the inner surface is closer to the user than the outer surface; and a partially light blocking layer above the outer surface of the waveguide opposite to the user, where the partially light blocking layer is configured to keep eye glow light from entering the environment outside the outer surface of the waveguide.

2. 发明申请

US20190187568A1 LITHOGRAPHY APPARATUS, A METHOD OF MANUFACTURING A DEVICE AND A CONTROL PROGRAM 审中-公开
公开(公告)号：US20190187568A1
公开(公告)日：2019-06-20
申请号：US16269745
申请日：2019-02-07
申请人： ASML Netherlands B.V.
发明人： Norbertus Josephus Martinus VAN DEN NIEUWELAAR , Victor Manuel BLANCO CARBALLO , Casper Roderik DE GROOT , Rolf Hendrikus Jacobus CUSTERS , David Merritt PHILLIPS , Frederik Antonius VAN DER ZANDEN , Pieter Lein Joseph GUNTER , Erik Henricus Egidius Catharina EUMMELEN , Yuri Johannes Gabriël VAN DE VIJVER , Bert Dirk SCHOLTEN , Marijn WOUTERS , Ronald Frank KOX , Jorge Alberto VIEYRA SALAS
IPC分类号： G03F7/20 , G02B27/00
CPC分类号： G03F7/70341 , G02B27/0043 , G03F7/2043 , G03F7/70358 , G03F7/70725 , G03F7/70858 , G03F7/70925
摘要： An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

3. 发明申请

US20170315449A1 EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFLUENCE OF TEMPERATURE VARIATION 审中-公开
公开(公告)号：US20170315449A1
公开(公告)日：2017-11-02
申请号：US15650533
申请日：2017-07-14
申请人： Carl Zeiss SMT GmbH , ASML Netherlands B.V.
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , G02B5/08 , G02B7/18 , G02B27/00 , G21K1/06 , G02B3/00 , G02B17/06 , G03B27/54 , B82Y10/00
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

4. 发明申请

US20160195818A1 EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFLUENCE OF TEMPERATURE VARIATION 审中-公开
标题翻译：具有降低温度变化影响的反射元件的EUV曝光装置
公开(公告)号：US20160195818A1
公开(公告)日：2016-07-07
申请号：US15070872
申请日：2016-03-15
申请人： Carl Zeiss SMT GmbH , ASML Netherlands B.V.
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , G02B7/18 , G02B5/08
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
摘要翻译：具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件均包括主体和反射表面，用于在掩模版上投影到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多超过6K。

5. 发明授权

US09304400B2 Illumination system for EUV microlithography 有权
标题翻译： EUV微光刻照明系统
公开(公告)号：US09304400B2
公开(公告)日：2016-04-05
申请号：US13038453
申请日：2011-03-02
申请人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
发明人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
IPC分类号： G03B27/54 , G03F7/20 , G02B17/06 , G02B27/00
CPC分类号： G03F7/70083 , G02B17/0605 , G02B17/0647 , G02B27/0043 , G03F7/70033 , G03F7/70075
摘要： An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.
摘要翻译：用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。照明系统的照明光学器件用于将来自光源的照明光引导到物场。照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。其结果是改善了物场照明的均匀性的照明系统。

6. 发明申请

US20130141707A1 EUV Exposure Apparatus 有权
标题翻译： EUV曝光装置
公开(公告)号：US20130141707A1
公开(公告)日：2013-06-06
申请号：US13754720
申请日：2013-01-30
申请人： Carl Zeiss SMT GmbH , ASML Netherlands B.V.
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03B27/54 , G02B5/08 , G02B3/00
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
摘要翻译：具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件均包括主体和反射表面，用于在掩模版上投影到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多超过6K。

7. 发明授权

US08345224B2 Methods and devices for driving micromirrors 有权
标题翻译：用于驱动微镜的方法和装置
公开(公告)号：US08345224B2
公开(公告)日：2013-01-01
申请号：US13038734
申请日：2011-03-02
申请人： Jan Horn , Christian Kempter
发明人： Jan Horn , Christian Kempter
IPC分类号： G03B27/54 , G03B27/32 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70116 , G02B26/0841 , G02B27/0043 , G03B27/72 , G03F7/70075 , G03F7/702 , G03F7/70525
摘要： A micromirror of a micromirror array in an illumination system of a microlithographic projection exposure apparatus can be tilted through a respective tilt angle about two tilt axes. The micromirror is assigned three actuators which can respectively be driven by control signals in order to tilt the micromirror about the two tilt axes. Two control variables are specified, each of which is assigned to one tilt axis and which are both assigned to unperturbed tilt angles. For any desired combinations of the two control variables, as a function of the two control variables, one of the three actuators is selected and its control signal is set to a constant value, in particular zero. The control signals are determined so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables.
摘要翻译：在微光刻投影曝光装置的照明系统中的微镜阵列的微反射镜可以通过围绕两个倾斜轴的相应倾斜角度倾斜。微镜分配有三个致动器，它们可以分别由控制信号驱动，以便围绕两个倾斜轴倾斜微镜。指定了两个控制变量，每个控制变量分配给一个倾斜轴，并分配给不受干扰的倾斜角。对于两个控制变量的任何期望的组合，作为两个控制变量的函数，选择三个致动器中的一个，并且其控制信号被设置为恒定值，特别是零。确定控制信号，使得当控制信号被施加到另外两个致动器时，微反射镜采用不受扰动的倾斜角度作为两个控制变量的函数。

8. 发明申请

US20110285979A1 PROJECTION OBJECTIVE WITH DIAPHRAGMS 有权
标题翻译：投影目标与石墨片
公开(公告)号：US20110285979A1
公开(公告)日：2011-11-24
申请号：US13107011
申请日：2011-05-13
申请人： Nils Dieckmann , Alexander Wolf , Christian Holland , Ulrich Loering , Franz Sorg
发明人： Nils Dieckmann , Alexander Wolf , Christian Holland , Ulrich Loering , Franz Sorg
IPC分类号： G03B27/72 , G02B17/08 , G02B27/18
CPC分类号： G03F7/70941 , G02B27/0043
摘要： A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element. Each of the false light diaphragms is fashioned in such a way that the false light diaphragm screens at least a part of the edge region against radiation running outside the imaging beam path.
摘要翻译：用于将布置在投影物镜的物平面中的物体成像为位于投影物镜的像平面中的物体的图像的投影物镜具有多个透明光学元件和用于将光学元件保持在规定位置的保持装置投影物镜的成像光束路径。每个光学元件具有位于成像光束路径中的光学有用区域和位于光学有用区域外部的边缘区域。分配给光学元件的保持装置的至少一个保持元件作用在接触区域的边缘区域。至少一个光学元件被分配有具有布置在光学元件的正上游的假光膜的膜片装置和直接布置在光学元件的下游的第二假光膜。每个假光隔膜以这样的方式形成，使得假光隔膜将至少一部分边缘区域屏蔽到抵抗在成像光束路径外部运行的辐射。

9. 发明申请

US20100208327A1 Pattern generator 有权
标题翻译：模式生成器
公开(公告)号：US20100208327A1
公开(公告)日：2010-08-19
申请号：US12662675
申请日：2010-04-28
申请人： Torbjorn Sandstrom
发明人： Torbjorn Sandstrom
IPC分类号： G02B26/00 , G03B27/42
CPC分类号： G03F7/70725 , B23K26/032 , B23K26/064 , B23K26/0648 , B41J2/465 , G02B26/0833 , G02B26/0841 , G02B27/0043 , G02B27/4205 , G03F7/2022 , G03F7/70041 , G03F7/70283 , G03F7/70291 , G03F7/704 , G03F7/70475 , G09G3/2007 , G09G3/346 , H04N1/195 , H04N5/7458 , H04N2201/0414
摘要： The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.
摘要翻译：本发明涉及一种用于在对辐射敏感的工件上形成图案的装置，例如光掩模，显示面板或微光学装置。该装置可以包括用于发出闪光的源，具有适于被辐射照射的调制元件（像素）的空间调制器以及在工件上产生调制器的图像的投影系统。它还可以包括接收要写入的模式的数字描述的电子数据处理和传送系统，将模式转换成调制器信号，以及将信号馈送到调制器。可以提供电子控制系统来控制触发信号以补偿光源中的闪光到闪光时间抖动。

10. 发明申请

US20080204686A1 Mask Structure for Manufacturing an Integrated Circuit by Photolithographic Patterning 审中-公开
标题翻译：通过光刻图案制造集成电路的掩模结构
公开(公告)号：US20080204686A1
公开(公告)日：2008-08-28
申请号：US12037795
申请日：2008-02-26
申请人： Wolfgang Henke , Mario Hennig , Rainer Pforr
发明人： Wolfgang Henke , Mario Hennig , Rainer Pforr
IPC分类号： G03B27/42 , G03F1/14 , G03F7/26
CPC分类号： G02B27/4261 , G02B27/0043 , G02B27/28 , G02B27/4216 , G02B27/4222 , G03F1/32
摘要： Photolithography using polarized light is disclosed. For example, a method includes transmitting the light through a mask having a first area with a first class of patterns and a second area with a second class of patterns thereby generating a virtual image. The virtual image is exposed into a resist layer. The polarization of the light passing the first area is modified while the light passing the mask.
摘要翻译：公开了使用偏振光的光刻技术。例如，一种方法包括通过具有第一类图案的第一区域的掩模和具有第二类图案的第二区域来传输光，从而生成虚像。虚拟图像被曝光到抗蚀剂层中。通过第一区域的光的偏振改变，同时通过掩模。

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