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1. 发明公开

US20240291219A1 OPTICAL PULSE STRETCHER, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20240291219A1
公开(公告)日：2024-08-29
申请号：US18656729
申请日：2024-05-07
申请人： Gigaphoton Inc. , Inter-University Research Institute Corporation, National Institutes of Natural Sciences
发明人： Yuki TAMARU , Taisuke MIURA , Ryo YASUHARA
IPC分类号： H01S3/00 , G02B17/02 , G02B17/06 , G02B27/28 , G02F1/01 , G02F1/09 , G03F7/00 , G03F7/20 , H01S3/225
CPC分类号： H01S3/0057 , G02B17/023 , G02B17/0663 , G02B27/288 , G02F1/0136 , G02F1/092 , G03F7/2008 , G03F7/70025 , G03F7/70041 , G03F7/70566 , H01S3/225
摘要： An optical pulse stretcher that stretches a pulse width of a pulse laser beam includes a polarizer configured to separate a component in a specific polarization direction of the pulse laser beam that has entered, a delay optical system including a plurality of mirrors through which the pulse laser beam reflected by or transmitted through the polarizer is propagated; and a first Faraday rotator that includes a first magnet and a first Faraday material and is disposed on an optical path of the delay optical system to rotate a polarization direction of the pulse laser beam.

2. 发明公开

US20240103382A1 IMAGING OPTICAL UNIT 审中-公开
公开(公告)号：US20240103382A1
公开(公告)日：2024-03-28
申请号：US18523198
申请日：2023-11-29
申请人： Carl Zeiss SMT GmbH
发明人： Hans-Jürgen Rostalski , Holger Münz , Christoph Menke
IPC分类号： G03F7/00 , G02B17/06 , G02B27/42
CPC分类号： G03F7/70591 , G02B17/0663 , G02B27/4222 , G03F7/70158 , G03F7/702 , G03F7/70233
摘要： An imaging optical unit comprises a plurality of minors for imaging an object field into an image field. The imaging optical unit has an image-side numerical aperture greater than 0.55. Each mirror is configured so that it can be measured by a testing optical unit having at least one DOE with a predetermined maximum diameter for test wavefront generation. For the complete measurement of all reflection surfaces of the minors, a maximum number of DOEs of the testing optical unit and/or a maximum number of DOE test positions of the at least one DOE of the testing optical unit comes into play, which is no more than five times the number of minors in the imaging optical unit. The result is an imaging optical unit in which a testing-optical measurement remains manageable even in the case of a design with an image-side numerical aperture which is relatively large.

3. 发明授权

US11662668B2 Lithography contamination control 有权
公开(公告)号：US11662668B2
公开(公告)日：2023-05-30
申请号：US17461744
申请日：2021-08-30
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Chieh Hsieh , Tai-Yu Chen , Cho-Ying Lin , Shang-Chieh Chien , Li-Jui Chen , Heng-Hsin Liu
IPC分类号： G03F7/20 , H05G2/00 , G02B17/06
CPC分类号： G03F7/70925 , G02B17/0663 , G03F7/70033 , G03F7/70491 , G03F7/70808 , H05G2/008
摘要： A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.

4. 发明授权

US10078223B2 Head mounted display with non-pupil forming optical path 有权
公开(公告)号：US10078223B2
公开(公告)日：2018-09-18
申请号：US14214330
申请日：2014-03-14
申请人： IMMY Inc.
发明人： Douglas Peter Magyari
IPC分类号： G09G5/00 , G02B27/01 , G02B7/00 , G02B7/04 , G02B17/06 , G02B7/182 , G02B5/10
CPC分类号： G02B27/0176 , G02B5/10 , G02B7/004 , G02B7/04 , G02B7/1822 , G02B17/0642 , G02B17/0663 , G02B27/017 , G02B27/0172 , G02B2027/0123 , G02B2027/0132 , G02B2027/015 , G02B2027/0178 , Y10T29/49464 , Y10T29/49826
摘要： A head mounted display device includes a structural frame arranged generally along a X-axis and a Y-axis for viewing along a Z-axis, the X, Y, and Z axes being mutually perpendicular. A micro-display is coupled to the structural frame, and configured to project visual content in a substantially forward direction along the Z-axis away from a user. A group of one or more optical elements with reflective optical surfaces is coupled to the structural frame and respectively positioned on a front side of the micro-display to reflectively guide a light ray bundle in a non-pupil forming optical path from the micro-display to a user's eye to provide an image to the user's eye such that the light rays of the light ray bundle entering the user's eye are essentially parallel to make the image visible to the user with varied positions of the user's pupil.

5. 发明申请

US20180252904A1 IMAGING OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD, AND PROJECTION EXPOSURE APPARATUS INCLUDING SUCH AN IMAGING OPTICAL UNIT 审中-公开
公开(公告)号：US20180252904A1
公开(公告)日：2018-09-06
申请号：US15966947
申请日：2018-04-30
申请人： Carl Zeiss SMT GmbH
发明人： Alexander Wolf , Hans-Juergen Rostalski
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G02B17/0642 , G02B17/0663 , G03F7/70233 , G03F7/70316
摘要： An imaging optical unit for projection lithography has a plurality of mirrors for guiding imaging light from an object field into an image field. The object field is spanned by a first, larger object field dimension and along a second, smaller object field dimension. The imaging optical unit has at least two GI mirrors and at least one NI mirror. The NI mirror is arranged between two GI mirrors in the imaging light beam path. A used reflection surface of the NI mirror has an aspect ratio between a surface dimension along a first reflection surface coordinate and a surface dimension along a second reflection coordinate parallel to the second object field dimension. The aspect ratio being less than 4.5. An imaging optical unit with reduced production costs emerges.

6. 发明申请

US20180039077A1 HEAD-UP DISPLAY AND MOVING BODY EQUIPPED WITH HEAD-UP DISPLAY 审中-公开
公开(公告)号：US20180039077A1
公开(公告)日：2018-02-08
申请号：US15728543
申请日：2017-10-10
申请人： Panasonic Intellectual Property Management Co., Ltd.
发明人： SATOSHI KUZUHARA , MASAFUMI SUEYOSHI , HIROAKI OKAYAMA , KATSUHIKO HAYASHI
IPC分类号： G02B27/01
CPC分类号： G02B27/0101 , B60K35/00 , B60R11/02 , G02B17/0663 , G02B17/0816 , G02B27/01 , G02B27/0176 , G02B27/0179 , G02B2027/011 , G02B2027/013 , G02B2027/014 , G02B2027/0145 , G02B2027/0154 , G02B2027/0185
摘要： A head-up display projects an image on a windshield to allow a viewer to visually observe a virtual image. The head-up display includes a display device, a relay optical system, and a projection optical system. The display device displays an image. The relay optical system provides the image displayed by the display device as an intermediate image. The projection optical system reflects the intermediate image provided by the relay optical system to project the intermediate image on the windshield.

7. 发明授权

US09841587B2 On-axis unobscured telescope 有权
公开(公告)号：US09841587B2
公开(公告)日：2017-12-12
申请号：US14985629
申请日：2015-12-31
申请人： RAYTHEON COMPANY
发明人： Philip Christopher Theriault
IPC分类号： G02B17/06 , G02B23/06
CPC分类号： G02B17/0631 , G02B17/0657 , G02B17/0663 , G02B23/06
摘要： Reflective optical telescopes and method of observing a scene. One example of a reflective optical telescope includes a primary mirror positioned along a linear axis extending between an entrance aperture and an image plane, configured to receive optical radiation via the entrance aperture, a secondary mirror positioned along the linear axis and configured to receive the optical radiation from the primary mirror and to reflect the optical radiation in a direction of the primary mirror, wherein the optical radiation received by the primary mirror is unobscured by the secondary mirror, a tertiary mirror positioned along the linear axis and configured to receive the optical radiation from the secondary mirror and reflect the optical radiation in a direction of the primary mirror, and a quaternary mirror positioned along the linear axis, configured to receive the optical radiation from the tertiary mirror and reflect the optical radiation to the image plane.

8. 发明申请

US20160377984A1 MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：镜面，特别是微晶投影曝光装置
公开(公告)号：US20160377984A1
公开(公告)日：2016-12-29
申请号：US15264054
申请日：2016-09-13
申请人： Carl Zeiss SMT GmbH
发明人： Hartmut ENKISCH
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/702 , G02B17/0663 , G03F7/70316 , G03F7/70958 , G21K1/062
摘要： A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface, wherein the mirror has a reflectivity of at least 0.5 for electromagnetic radiation which has a prescribed working wavelength and impinges on the optically effective surface at an angle of incidence based on the respective surface normal of at least 65°, wherein the mirror has at least one layer (160, 170, 320) which comprises a compound of an element of the second period and an element of the 4d transition group, wherein the mirror has a protective layer (430, 530, 630, 730) arranged on top in the direction of the optically effective surface, wherein the material of the layer (420, 510, 620, 705) arranged in each case underneath the protective layer in the direction of the optically effective surface has a lower absorption than the material of the protective layer (430, 530, 630, 730).
摘要翻译：特别是对于微光刻投影曝光装置的反射镜具有光学有效的表面，其中反射镜对于具有规定的工作波长的电磁辐射具有至少为0.5的反射率，并以基于以下的入射角入射在光学有效表面上相应的表面法线至少为65°，其中反射镜具有至少一个层（160,170,320），其包含第二周期的元素的化合物和4d过渡基团的元素，其中该反射镜具有保护层（430,530,630,730），其布置在光学有效表面的方向上的顶部，其中所述层（420,510,620,705）的材料在每种情况下被布置在保护层下方的方向上光学有效表面具有比保护层（430,530,630,730）的材料更低的吸收。

9. 发明授权

US09442386B2 Imaging optics 有权
标题翻译：成像光学
公开(公告)号：US09442386B2
公开(公告)日：2016-09-13
申请号：US13006025
申请日：2011-01-13
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G03F7/20 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0663
摘要： An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. At least one of the mirrors has a through opening for the passage of imaging light. An arrangement of the mirrors is such that principal rays run parallel or divergently in the beam path of the imaging light between the object plane and the first downstream mirror. The imaging optics can have an entrance pupil plane that lies in the beam path of the imaging light in the range of between 5 m and 2000 m in front of the object plane. The imaging optics can have an entrance pupil plane that lies in the beam path of the imaging light in the range of between 100 mm and 5000 mm in front of the object plane. Imaging optics with improved imaging quality are provided.
摘要翻译：成像光学元件具有多个反射镜，用于将物平面中的物场映像成图像平面中的图像场。至少一个反射镜具有用于成像光通过的通孔。反射镜的布置使得主光线在物平面和第一下游反射镜之间的成像光束的光束路径中平行或分散地延伸。成像光学器件可以具有入射光瞳平面，该入射光瞳平面位于物体平面前面的5m和2000m之间的成像光束的光束路径中。成像光学器件可以具有入射光瞳平面，该入射光瞳平面位于物体平面前方的成像光束的光束路径中的介于100mm与5000mm之间的范围内。提供了具有改善成像质量的成像光学元件。

10. 发明申请

US20160259248A1 IMAGING OPTICAL SYSTEM 有权
公开(公告)号：US20160259248A1
公开(公告)日：2016-09-08
申请号：US15155356
申请日：2016-05-16
申请人： Carl Zeiss SMT GmbH
发明人： Hans-Juergen Mann
IPC分类号： G03F7/20
CPC分类号： G03F7/70233 , G02B5/09 , G02B13/08 , G02B17/0663 , G02B26/0833 , G03F7/70058 , G03F7/701 , G03F7/702 , G03F7/70216
摘要： An imaging optical system for a projection exposure system has at least one anamorphically imaging optical element. This allows a complete illumination of an image field in a first direction with a large object-side numerical aperture in this direction, without the extent of the reticle to be imaged having to be enlarged and without a reduction in the throughput of the projection exposure system occurring.

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