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1. 发明授权

US07859748B2 Microlithographic reduction projection catadioptric objective 有权
标题翻译：微光刻折射反射折射目标
公开(公告)号：US07859748B2
公开(公告)日：2010-12-28
申请号：US11686157
申请日：2007-03-14
申请人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
发明人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
摘要翻译：光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体放大倍率的第一光学组和比具有多个透镜的第一光学组更多的图像的第二基本上折射的光学组。第二光学组具有用于提供图像缩小的负总体放大倍率。第一光学组为第二光学组提供补偿像差校正。目标形成数值孔径至少基本为0.65，优选大于0.70，或更优选大于0.75的图像。

2. 发明授权

US07518789B2 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system 有权
标题翻译：宽带深紫外/真空紫外线反射折射成像系统
公开(公告)号：US07518789B2
公开(公告)日：2009-04-14
申请号：US10959022
申请日：2004-10-04
申请人： David R. Shafer , Yung-Ho Chuang , J. Joseph Armstrong
发明人： David R. Shafer , Yung-Ho Chuang , J. Joseph Armstrong
IPC分类号： G02B13/14 , G03B27/54
CPC分类号： G03F7/70225 , G02B17/08 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B17/0896 , G02B21/04 , G02B21/16 , G03F1/84 , G03F7/70275 , G03F7/70483 , G03F7/70616 , G03F7/7065
摘要： A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately. The objective designs presented have the optical axis of the Mangin mirror image relay at ninety degrees to the optical axis defined by the focusing lenses, or an in-line or straight objective having one ninety degree bend of light rays.
摘要翻译：提供了用于检查样品的设计，例如光掩模，用于不想要的颗粒和诸如图案缺陷的特征。该系统不提供中心遮蔽，用于打开和傅立叶滤波的外部光瞳，以及相对放松的制造公差，并且适用于波长低于365nm的宽带亮场和激光暗场成像和检查。在许多情况下，所使用的透镜可以使用单一材料来制造或制造。公开了物镜设计的多个实施例，全部包括至少一个小折叠镜和Mangin镜。系统离轴实现，使得返回的第二图像从第一图像横向移位，使得横向分离允许分别对每个图像进行光学接收和操纵。所提出的目标设计具有与由聚焦透镜限定的光轴90度的Mangin镜像继电器的光轴，或具有一个九十度光线弯曲的直列或直线物镜。

3. 发明申请

US20090080086A1 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 有权
标题翻译：具有四个用于微结构的镜片组的对称目标
公开(公告)号：US20090080086A1
公开(公告)日：2009-03-26
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/18 , G02B11/28 , G02B11/04
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

4. 发明授权

US07450312B2 Optical projection lens system 失效
标题翻译：光学投影镜头系统
公开(公告)号：US07450312B2
公开(公告)日：2008-11-11
申请号：US11175092
申请日：2005-07-05
申请人： David R. Shafer , Wilhelm Ulrich
发明人： David R. Shafer , Wilhelm Ulrich
IPC分类号： G02B3/00
CPC分类号： G02B13/143 , G02B13/24 , G03F7/70241
摘要： An optical projection lens system for microlithography includes in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group. At least one lens of the projection lens system which is arranged in front of the waist includes an aspherical surface.
摘要翻译：用于微光刻的光学投影透镜系统包括传播辐射的方向：具有正屈光力的第一透镜组，具有负屈光力的第二透镜组和具有最小传播辐射直径的腰部（缩小部分），以及另外具有正屈光力的透镜装置，其跟随第二透镜组。布置在腰部前方的投影透镜系统的至少一个透镜包括非球面。

5. 发明授权

US07245438B2 Broad band objective having improved lateral color performance 有权
公开(公告)号：US07245438B2
公开(公告)日：2007-07-17
申请号：US11245591
申请日：2005-10-05
申请人： Yung-Ho Chuang , David R. Shafer , J. Joseph Armstrong
发明人： Yung-Ho Chuang , David R. Shafer , J. Joseph Armstrong
IPC分类号： G02B3/00
CPC分类号： G02B27/0025 , G01N21/8806 , G02B21/02
摘要： A system and method for inspection is disclosed. The design generally employs as many as four design principles, including employing at least one lens from a relatively low dispersion glass, at least one additional lens from an additional material different from the relatively low dispersion glass, generally matching the relatively low dispersion properties of the relatively low dispersion glass. The design also may include at least one further lens from a further material different from and exhibiting a significantly different dispersion power from the relatively low dispersion glass and the additional material. Finally, the design may include lenses positioned to insert a significant amount of color within the objective, a gap, and additional lenses, the gap and additional lenses serving to cancel the color inserted.

6. 发明授权

US06995930B2 Catadioptric projection objective with geometric beam splitting 有权
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US06995930B2
公开(公告)日：2006-02-07
申请号：US10734623
申请日：2003-12-15
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学器件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

7. 发明授权

US06956694B2 Broad spectrum ultraviolet inspection systems employing catadioptric imaging 失效
标题翻译：使用反射折射成像的广谱紫外检测系统
公开(公告)号：US06956694B2
公开(公告)日：2005-10-18
申请号：US10005732
申请日：2001-11-06
申请人： David R. Shafer , Yung-Ho Chuang , Bin-Ming B. Tsai
发明人： David R. Shafer , Yung-Ho Chuang , Bin-Ming B. Tsai
IPC分类号： G01N21/33 , G02B13/14 , G02B17/08 , G02B21/16 , G03C5/16 , G03F1/84 , G03F3/00 , G03F7/20 , H04N5/225 , G03B27/42
CPC分类号： G03F7/70225 , G02B13/143 , G02B17/0808 , G02B17/0856 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70216 , G03F7/70275 , G03F7/70616 , G03F7/7065
摘要： An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 μm), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ. greater than 0.7) and a large flat field (with a size on the order of 0.5 mm). The broad band color correction allows a wide range of possible UV imaging applications at multiple wavelengths.
摘要翻译：紫外线（UV）反折射成像系统具有对延伸到深紫外（短至约0.16μm）的波长的初级和残留，纵向和横向色差的广谱校正，包括具有多个透镜元件的聚焦透镜组，提供对所选波长带上的像差的两个像差和色度变化的高水平校正，由具有至少两种不同折射材料的透镜元件形成的场透镜组，例如二氧化硅和氟化物玻璃，以及包括提供系统的大部分聚焦功能的凹面反射表面以及与聚焦透镜组组合提供原色校正的厚透镜。场透镜组位于由聚焦透镜组提供的中间图像附近，并且用于校正残余色差。该系统的特征在于高数值孔径（典型值大于0.7）和大平坦场（尺寸约为0.5毫米）。宽带色彩校正允许在多个波长下的广泛范围的可能的UV成像应用。

8. 发明授权

US06930837B2 Optical projection lens system 失效
标题翻译：光学投影镜头系统
公开(公告)号：US06930837B2
公开(公告)日：2005-08-16
申请号：US10833840
申请日：2004-04-27
申请人： David R. Shafer , Wilhelm Ulrich
发明人： David R. Shafer , Wilhelm Ulrich
IPC分类号： G02B3/00 , G02B9/00 , G02B13/14 , G02B13/18 , G02B13/24 , G03F7/20 , H01L21/027
CPC分类号： G02B13/143 , G02B13/24 , G03F7/70241
摘要： An optical projection lens system for microlithography comprising in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group, wherein at least one lens of the projection lens system which is arranged in front of the waist comprises an aspherical surface.
摘要翻译：一种用于微光刻的光学投影透镜系统，包括在传播辐射的方向上：具有正折光力的第一透镜组，具有负屈光力的第二透镜组，并且包括具有最小传播辐射直径的腰部（缩小部分），以及具有正屈光力的另外的透镜装置，其跟随第二透镜组，其中布置在腰部前方的投影透镜系统的至少一个透镜包括非球面。

9. 发明授权

US06791761B2 Optical projection lens system 失效
公开(公告)号：US06791761B2
公开(公告)日：2004-09-14
申请号：US10393593
申请日：2003-03-20
申请人： David R. Shafer , Wilhelm Ulrich
发明人： David R. Shafer , Wilhelm Ulrich
IPC分类号： G02B300
CPC分类号： G02B13/143 , G02B13/24 , G03F7/70241
摘要： An optical projection lens system for microlithography comprising in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group, wherein at least one lens of the projection lens system which is arranged in front of the waist comprises an aspherical surface.

10. 发明授权

US06636350B2 Microlithographic reduction projection catadioptric objective 失效
标题翻译：微光刻折射反射折射目标
公开(公告)号：US06636350B2
公开(公告)日：2003-10-21
申请号：US09761562
申请日：2001-01-16
申请人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
发明人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
摘要翻译：光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体放大倍率的第一光学组和比具有多个透镜的第一光学组更多的图像的第二基本上折射的光学组。第二光学组具有用于提供图像缩小的负总体放大倍率。第一光学组为第二光学组提供补偿像差校正。目标形成数值孔径至少基本为0.65，优选大于0.70，或更优选大于0.75的图像。

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