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1. 发明授权

US08873151B2 Illumination system for a microlithgraphic exposure apparatus 有权
标题翻译：微型照相曝光设备的照明系统
公开(公告)号：US08873151B2
公开(公告)日：2014-10-28
申请号：US11911904
申请日：2006-04-26
申请人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
发明人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
IPC分类号： G02B3/00 , G03F7/20 , G02B17/08 , G02B27/00
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
摘要翻译：微光刻曝光设备的照明系统包括用于将光瞳平面转换成场平面的聚光器。冷凝器具有包含多个连续透镜的透镜组。这些透镜被布置成使得由聚光器聚焦在轴上场点上的光束在透镜组的每个透镜内会聚。透镜组的至少一个透镜具有凹面。照明系统还可以包括至少部分地校正冷凝器的残余光瞳像差的场停止物镜。

2. 发明授权

US08045172B2 Method and apparatus for determining the concentration of a substance in a liquid 有权
标题翻译：用于确定液体中物质浓度的方法和装置
公开(公告)号：US08045172B2
公开(公告)日：2011-10-25
申请号：US12487912
申请日：2009-06-19
申请人： Rafael Egger
发明人： Rafael Egger
IPC分类号： G01N21/55
CPC分类号： G01N21/8483 , G01N21/314
摘要： In a method for determining the concentration of at least one substance in a liquid the liquid is applied onto a test strip containing at least one test zone, wherein an optical sensor arrangement is moved step-by-step in a first direction over the surface of the test strip while the test trip is at the same time irradiated with light of a predetermined wave length and wherein in each step the radiation reflected from the surface of the test strip is measured, and wherein in each measurement step the test strip surface is irradiated alternately with light of at least two different wave lengths and the irradiation is measured at the same time and the difference between the measurement signals obtained in each measurement step using irradiation light of different wave lengths is analyzed.
摘要翻译：在用于确定液体中至少一种物质的浓度的方法中，将液体施加到含有至少一个测试区域的测试条上，其中光学传感器装置在第一方向上逐步移动到测试条同时用预定波长的光照射，并且其中在每个步骤中测量从测试条表面反射的辐射，并且其中在每个测量步骤中辐射测试条表面交替地具有至少两个不同波长的光，并且同时测量照射，并且分析使用不同波长的照射光在每个测量步骤中获得的测量信号之间的差。

3. 发明申请

US20100117003A1 METHOD FOR THE QUANTITATIVE DETERMINATION OF THE CONCENTRATION OF FLUOROPHORES OF A SUBSTANCE IN A SAMPLE AND APPARATUS FOR CARRYING OUT THE SAME 有权
标题翻译：用于定量确定样品中物质的荧光浓度的方法及其实施方法
公开(公告)号：US20100117003A1
公开(公告)日：2010-05-13
申请号：US12616811
申请日：2009-11-12
申请人： Rafael Egger
发明人： Rafael Egger
IPC分类号： G01J1/58
CPC分类号： G01N21/278 , G01N21/6428
摘要： The invention concerns a method and an apparatus for the quantitative determination of the concentration of fluorophores of at least one substance in a sample. A constant portion of the reference light of a reference light wave length (λr) emitted by a reference light source (28) is coupled in by an optical element (REM) in the direction of a receiving element (38). A first measured value is detected which corresponds to the portion of the reference light coupled in which is incident on the receiving element (38). The sample is irradiated with the excitation light of an excitation wave length (λex) emitted by an excitation light source (26). A second measured valued is detected which corresponds to the portion of the fluorescent light of an emission wave length (λem) emitted by the sample which is incident on the receiving element (38). The ratio (Emes2/Es2) of the second measured value (Emes2) to the first measured value (Es2) is determined. The number of fluorophores in the substance of the sample within the detection zone is determined taking into account the determined ratio (Emes2/Es2).
摘要翻译：本发明涉及用于定量测定样品中至少一种物质的荧光团浓度的方法和装置。由参考光源（28）发射的参考光波长（λr）的参考光的恒定部分通过光学元件（REM）在接收元件（38）的方向上耦合。检测到与其中入射在接收元件（38）上的参考光的部分对应的第一测量值。用激发光源（26）发射的激发波长（λex）的激发光照射样品。检测第二测量值，其对应于入射在接收元件（38）上的样品发射的发射波长（λem）的荧光的部分。确定第二测量值（Emes2）与第一测量值（Es2）的比（Emes2 / Es2）。在检测区内样品物质中的荧光团数目是考虑到确定的比例（Emes2 / Es2）来确定的。

4. 发明授权

US08334522B2 Method for the quantitative determination of the concentration of fluorophores of a substance in a sample and apparatus for carrying out the same 有权
标题翻译：用于定量测定样品中物质的荧光团的浓度的方法和用于进行该物质的装置的方法
公开(公告)号：US08334522B2
公开(公告)日：2012-12-18
申请号：US12616811
申请日：2009-11-12
申请人： Rafael Egger
发明人： Rafael Egger
IPC分类号： F21V9/16 , G01J1/58 , G01T1/10 , G21H3/02 , G21K5/00 , H01J65/06 , H01J65/08
CPC分类号： G01N21/278 , G01N21/6428
摘要： The invention concerns methods and apparatuses for quantitatively determining the concentration of fluorophores of a substance in a sample. A constant portion of the reference light of a reference light wave length (λr) emitted by a reference light source is coupled in by an optical element in the direction of a receiving element. A first value corresponding to the portion of the reference light coupled in which is incident on the receiving element is detected. The sample is irradiated with the excitation light of an excitation wave length (λex) emitted by an excitation light source. A second value corresponding to the portion of the fluorescent light of an emission wave length (λem) emitted by the sample which is incident on the receiving element. The ratio of the second value to the first value is determined. The number of fluorophores in the substance is determined based on the ratio.
摘要翻译：本发明涉及用于定量测定样品中物质的荧光团浓度的方法和装置。由参考光源发射的参考光波长（λr）的参考光的恒定部分通过光学元件沿接收元件的方向耦合。检测对应于其中入射在接收元件上的参考光的部分的第一值。用激发光源发射的激发波长（λex）的激发光照射样品。对应于由入射在接收元件上的样品发射的发射波长（λem）的荧光的部分的第二值。确定第二值与第一值的比率。该物质中荧光团的数量是根据比例来确定的。

5. 发明申请

US20080192359A1 Illumination System for a Microlithgraphic Exposure Apparatus 有权
标题翻译：微照相曝光设备的照明系统
公开(公告)号：US20080192359A1
公开(公告)日：2008-08-14
申请号：US11911904
申请日：2006-04-26
申请人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Furter , Rafael Egger , Artur Hogele , Michael Raum
发明人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Furter , Rafael Egger , Artur Hogele , Michael Raum
IPC分类号： G02B27/18
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62). The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666′) that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).
摘要翻译：微光刻曝光设备（10）的照明系统（12）包括用于将光瞳平面（54）变换成场平面（62）的冷凝器（601; 602; 603; 604; 605; 606）。冷凝器具有透镜组（L 14，L 15，L 16，L 17; L 24，L 25，L 26，L 27，L 28; L 34，L 35，L 36，L 37; L 44，L 45，L 46; L 53，L 54，L 55）。这些透镜被布置为使得在轴上场点（72）上由聚光器（601; 602; 603; 604; 605）聚焦的光束（70）会聚在透镜组的每个透镜内。透镜组的至少一个透镜（L 15，L 16，L 17; L 25，L 26; L 34，L 44，L 45; L 54）具有凹面。照明系统还可以包括至少部分校正冷凝器（601; 602; 603; 604; 605; 606）的残余光瞳像差的场停止物镜（66; 666,666'）。

6. 发明申请

US20050219495A1 Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统的光束整形单元
公开(公告)号：US20050219495A1
公开(公告)日：2005-10-06
申请号：US11015312
申请日：2004-12-17
申请人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
发明人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70108 , G03F7/70183
摘要： A beam reshaping unit for an illumination system (10) of a microlithographic projection exposure apparatus comprises a first beam reshaping element (62) having a first beam reshaping surface (68) and a second beam reshaping element having a second beam reshaping surface (74) which faces the first beam reshaping surface (68). The two beam reshaping surfaces (68; 74) are rotationally symmetrical with respect to an optical axis (22) of the beam reshaping unit. At least the first beam reshaping surface (68, 74) has a concavely or convexly curved region (70, 76).
摘要翻译：用于微光刻投影曝光装置的照明系统（10）的光束整形单元包括具有第一光束重塑表面（68）的第一光束重塑元件（62）和具有第二光束重塑表面（74）的第二光束重塑元件，其面向第一光束重塑表面（68）。两个光束整形表面（68; 74）相对于光束整形单元的光轴（22）旋转对称。至少第一光束整形表面（68,74）具有凹或凸弯曲的区域（70,76）。

7. 发明申请

US20120261591A1 DEVICE AND METHOD FOR DETERMINING THE CONCENTRATION OF FLUOROPHORES IN A SAMPLE 有权
标题翻译：用于测定样品中荧光素浓度的装置和方法
公开(公告)号：US20120261591A1
公开(公告)日：2012-10-18
申请号：US13444027
申请日：2012-04-11
申请人： Rafael Egger , Jörg Zeiner
发明人： Rafael Egger , Jörg Zeiner
IPC分类号： G01N21/64
CPC分类号： G01N21/645 , G01N21/278 , G01N2201/06113 , G01N2201/062 , G01N2201/068
摘要： A device (10) and a method for analyzing a sample (16) containing fluorophores use a light source (12) emitting light (λex) onto the sample (16), and onto a fluorescence standard (14). The fluorophores of the sample (16), given an immission of light of a first wavelength (λex1), have a first excitation efficiency and, given an immission of light of a second wavelength (λex2), have a second excitation efficiency. The fluorescence standard (14), given the same immissions of light, has a third excitation efficiency and, a fourth excitation efficiency. An optical element (20) which is arranged between the light source (12) and the sample (16) and/or (12) the fluorescence standard (14) adapts, due to its optical property, a first difference between the first excitation efficiency and the second excitation efficiency and a second difference between the third excitation efficiency and the fourth excitation efficiency to each other.
摘要翻译：用于分析含有荧光团的样品（16）的装置（10）和方法使用在样品（16）上发射光（λex）的光源（12）和荧光标准品（14）。给定发射第一波长（λex1）的光的样品（16）的荧光团具有第一激发效率，并且在给出第二波长（λex2）的光的情况下，具有第二激发效率。给予相同光量的荧光标准（14）具有第三激发效率和第四激发效率。布置在光源（12）和样品（16）和/或（12）荧光标准品（14）之间的光学元件（20）由于其光学特性而适应第一激发效率第二激励效率和第三励磁效率与第四励磁效率之间的第二差。

8. 发明授权

US08134687B2 Illumination system of a microlithographic exposure apparatus 有权
标题翻译：微光刻曝光设备的照明系统
公开(公告)号：US08134687B2
公开(公告)日：2012-03-13
申请号：US11660754
申请日：2005-08-23
申请人： Wolfgang Singer , Johannes Wangler , Rafael Egger , Wilhelm Ulrich
发明人： Wolfgang Singer , Johannes Wangler , Rafael Egger , Wilhelm Ulrich
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70108 , G03F7/70183
摘要： An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined with respect to the optical axis, around the optical axis. The device further includes a second mirror with a second reflective surface having a shape that is defined by rotating a curved line around the optical axis. At least one of the mirrors has a central aperture containing the optical axis. This device may form a zoom-collimator for an EUV illumination system that transforms a diverging light bundle into a collimated light bundle of variable shape and/or diameter.
摘要翻译：微光刻曝光装置的照明系统具有光轴和光束变换装置。该装置包括具有第一反射表面的第一反射镜，该第一反射表面具有围绕光轴旋转相对于光轴倾斜的直线所限定的形状。该装置还包括具有第二反射表面的第二反射镜，其具有通过围绕光轴旋转曲线而限定的形状。至少一个反射镜具有包含光轴的中心孔。该装置可以形成EUV照明系统的变焦准直器，其将发散的光束变换成可变形状和/或直径的准直光束。

9. 发明授权

US07864429B2 Optical illumination system for creating a line beam 有权
标题翻译：用于创建线束的光学照明系统
公开(公告)号：US07864429B2
公开(公告)日：2011-01-04
申请号：US12414303
申请日：2009-03-30
申请人： Holger Muenz , Alois Herkommer , Rafael Egger
发明人： Holger Muenz , Alois Herkommer , Rafael Egger
IPC分类号： G02B27/10
CPC分类号： G02B27/0927 , B23K26/0604 , B23K26/0608 , B23K26/066 , B23K26/067 , B23K26/0732 , B23K26/0738 , G02B27/0966
摘要： In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.
摘要翻译：在一个方面，本公开的特征在于一种光学系统，其被配置为从光束产生表面上的强度分布，由此光学系统包括至少第一光学元件，其将入射光束分成多个光束，其中一些光束在所述表面上的第一方向上至少部分地重叠，由此所述光学系统还包括至少第二光学元件，所述第二光学元件在所述表面上沿第二方向移位所述光束中的至少一个。

10. 发明申请

US20090323070A1 METHOD AND APPARATUS FOR DETERMINING THE CONCENTRATION OF A SUBSTANCE IN A LIQUID 有权
标题翻译：用于测定液体中物质浓度的方法和装置
公开(公告)号：US20090323070A1
公开(公告)日：2009-12-31
申请号：US12487912
申请日：2009-06-19
申请人： Rafael Egger
发明人： Rafael Egger
IPC分类号： G01N21/55
CPC分类号： G01N21/8483 , G01N21/314
摘要： In a method for determining the concentration of at least one substance in a liquid the liquid is applied onto a test strip containing at least one test zone, wherein an optical sensor arrangement is moved step-by-step in a first direction over the surface of the test strip while the test trip is at the same time irradiated with light of a predetermined wave length and wherein in each step the radiation reflected from the surface of the test strip is measured, and wherein in each measurement step the test strip surface is irradiated alternately with light of at least two different wave lengths and the irradiation is measured at the same time and the difference between the measurement signals obtained in each measurement step using irradiation light of different wave lengths is analyzed.
摘要翻译：在用于确定液体中至少一种物质的浓度的方法中，将液体施加到含有至少一个测试区域的测试条上，其中光学传感器装置在第一方向上逐步移动到测试条同时用预定波长的光照射，并且其中在每个步骤中测量从测试条表面反射的辐射，并且其中在每个测量步骤中辐射测试条表面交替地具有至少两个不同波长的光，并且同时测量照射，并且分析使用不同波长的照射光在每个测量步骤中获得的测量信号之间的差。

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