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1. 发明授权

US08203696B2 Projection exposure apparatus with optimized adjustment possibility 有权
标题翻译：具有优化调整可能性的投影曝光装置
公开(公告)号：US08203696B2
公开(公告)日：2012-06-19
申请号：US13069551
申请日：2011-03-23
申请人： Boris Bittner , Holger Walter , Matthias Roesch
发明人： Boris Bittner , Holger Walter , Matthias Roesch
IPC分类号： G03B27/52 , G03B27/68 , G03B27/54 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70525 , G03F7/70191 , G03F7/70266 , G03F7/70308 , G03F7/705 , G03F7/70533 , G03F7/70891
摘要： A projection apparatus for microlithography for imaging an object field includes an objective, one or a plurality of manipulators for manipulating one or a plurality of optical elements of the objective, a control unit for regulating or controlling the one or the plurality of manipulators, a determining device for determining at least one or a plurality of image aberrations of the objective, a memory comprising upper bounds for one or a plurality of specifications of the objective, including upper bounds for image aberrations and/or movements for the manipulators, wherein when determining an overshooting of one of the upper bounds by one of the image aberrations and/or an overshooting of one of the upper bounds by one of the manipulator movements by regulation or control of at least one manipulator within at most 30000 ms, or 10000 ms, or 5000 ms, or 1000 ms, or 200 ms, or 20 ms, or 5 ms, or 1 ms, an undershooting of the upper bounds can be effected.
摘要翻译：用于对物场进行成像的微光刻的投影装置包括物镜，用于操纵物镜的一个或多个光学元件的一个或多个操纵器，用于调节或控制一个或多个操纵器的控制单元，用于确定所述目标的至少一个或多个图像像差的装置，包括所述物镜的一个或多个规格的上限的存储器，包括用于所述操纵器的图像像差和/或移动的上限，其中当确定或者通过调节或控制至少一个操纵器在至多30000毫秒或10000毫秒内，通过一个操纵器移动来超图像中的一个上限中的一个上限和/或一个上限的过冲，或 5000ms或1000ms，或200ms，或20ms，或5ms或1ms，可以实现上限的下冲。

2. 发明授权

US5716590A Catalytic hydrodehalogenation of halogen-containing compounds of group IV elements 失效
标题翻译：含IV族元素的含卤素化合物的催化加氢脱卤
公开(公告)号：US5716590A
公开(公告)日：1998-02-10
申请号：US352224
申请日：1994-12-08
申请人： Gerhard Roewer , Uwe Paetzold , Holger Walter
发明人： Gerhard Roewer , Uwe Paetzold , Holger Walter
IPC分类号： B01J23/10 , A62D3/37 , A62D101/22 , A62D101/49 , B01J23/28 , B01J23/36 , B01J23/40 , B01J23/755 , C01B33/04 , C01B33/08 , C07B35/06 , C07B61/00 , C07C1/26 , C07C9/04 , C07C17/23 , C07C19/03 , C07C21/18 , C07F7/12 , C01B33/02 , C07C17/25 , C07F7/14
CPC分类号： A62D3/37 , C01B33/1071 , A62D2101/22 , A62D2101/49 , Y02P20/582
摘要： Catalytic dehalogenation (or hydrodehalogenation) of halogen-containing compounds of elements of group IV of the periodic table in the presence of hydrogen is carried out using a finely-dispersed catalytically active material which comprises silicon and at least one transition metal, and which is characterized by high catalytic activity and stability. This process can be used, for example, for synthesizing compounds or alternatively for decomposing halogen-containing compounds, for instance in waste-water or waste-gas purification processes. It is also suitable for dehalogenation (hydrodehalogenation) of halogen-containing silane compounds, for instance of silicon tetrachloride or alkyl trichlorosilane compounds, and the original purity of the silanes used as starting materials is retained by the products. Tetrachlorosilane, for example, can be converted into trichlorosilane.
摘要翻译：使用包含硅和至少一种过渡金属的细分散的催化活性材料，在氢气存在下，对元素周期表IV族元素的含卤素化合物进行催化脱卤（或加氢脱卤）具有高催化活性和稳定性。该方法可用于例如合成化合物或用于分解含卤素化合物，例如在废水或废气净化方法中。也适用于含卤素硅烷化合物（例如四氯化硅或烷基三氯硅烷化合物）的脱卤（加氢脱卤），并且用作原料的硅烷的原始纯度被产品保留。例如，四氯硅烷可以转化成三氯硅烷。

3. 发明申请

US20130176544A1 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus 有权
公开(公告)号：US20130176544A1
公开(公告)日：2013-07-11
申请号：US13784979
申请日：2013-03-05
申请人： Markus Hauf , Norman Baer , Holger Walter , Joachim Hartjes
发明人： Markus Hauf , Norman Baer , Holger Walter , Joachim Hartjes
IPC分类号： G03F7/20 , G01J5/02
CPC分类号： G03F7/70058 , G01J5/02 , G02B7/181 , G02B7/1815 , G03F7/70266 , G03F7/70891
摘要： The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.

4. 发明申请

US20090080086A1 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 有权
标题翻译：具有四个用于微结构的镜片组的对称目标
公开(公告)号：US20090080086A1
公开(公告)日：2009-03-26
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/18 , G02B11/28 , G02B11/04
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

5. 发明授权

US09081310B2 Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same 有权
标题翻译：光刻投影曝光装置的光学系统及其波前变形校正方法
公开(公告)号：US09081310B2
公开(公告)日：2015-07-14
申请号：US13604941
申请日：2012-09-06
申请人： Matthias Exler , Ulrich Loering , Toralf Gruner , Holger Walter
发明人： Matthias Exler , Ulrich Loering , Toralf Gruner , Holger Walter
IPC分类号： G03B27/54 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70891 , G03F7/70266 , G03F7/70341
摘要： An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.
摘要翻译：微光刻投影曝光装置的光学系统包括具有多个流体出口孔的波前校正装置。孔被布置成使得从出口孔流出的流体流入入射装置操作期间投射光通过该空间传播的空间。温度控制器为每个流体流量分别设定流体流的温度。确定温度分布，使得由温度分布导致的光程长度差校正波前变形。

6. 发明申请

US20130016331A1 OPTICAL SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD OF CORRECTING WAVEFRONT DEFORMATION IN SAME 有权
标题翻译：微波投影曝光装置的光学系统及其修正波形变形的方法
公开(公告)号：US20130016331A1
公开(公告)日：2013-01-17
申请号：US13604941
申请日：2012-09-06
申请人： Matthias Exler , Ulrich Loering , Toralf Gruner , Holger Walter
发明人： Matthias Exler , Ulrich Loering , Toralf Gruner , Holger Walter
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G03F7/70266 , G03F7/70341
摘要： An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.
摘要翻译：微光刻投影曝光装置的光学系统包括具有多个流体出口孔的波前校正装置。孔被布置成使得从出口孔流出的流体流入入射装置操作期间投射光通过该空间传播的空间。温度控制器为每个流体流量分别设定流体流的温度。确定温度分布，使得由温度分布导致的光程长度差校正波前变形。

7. 发明申请

US20120188524A1 PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY 有权
标题翻译：投影曝光装置优化调整可能性
公开(公告)号：US20120188524A1
公开(公告)日：2012-07-26
申请号：US13427030
申请日：2012-03-22
申请人： Boris Bittner , Holger Walter , Matthias Roesch
发明人： Boris Bittner , Holger Walter , Matthias Roesch
IPC分类号： G03B27/54 , G02B7/02
CPC分类号： G03F7/70525 , G03F7/70191 , G03F7/70266 , G03F7/70308 , G03F7/705 , G03F7/70533 , G03F7/70891
摘要： A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement of the manipulator, and a second device configured to generate a merit function based on a square of a root mean square (RMS) of at least one error and configured to minimize the merit function subordinate to the upper bound for the range of movement of the manipulator.
摘要翻译：微光刻投影物镜包括光学元件，被配置为操纵光学元件的操纵器以及被配置为控制所述操纵器的控制单元。所述控制单元包括被配置为控制所述操纵器的移动的第一装置，包括所述操纵器的移动范围的上限的存储器，以及被配置为基于均方根的平方生成优值函数的第二装置 RMS），并且被配置为使从属于机器人的移动范围的上限的优点函数最小化。

8. 发明授权

US09354524B2 Projection exposure apparatus with optimized adjustment possibility 有权
标题翻译：具有优化调整可能性的投影曝光装置
公开(公告)号：US09354524B2
公开(公告)日：2016-05-31
申请号：US13427030
申请日：2012-03-22
申请人： Boris Bittner , Holger Walter , Matthias Roesch
发明人： Boris Bittner , Holger Walter , Matthias Roesch
IPC分类号： G03B27/52 , G03B27/68 , G03B27/54 , G03F7/20 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70525 , G03F7/70191 , G03F7/70266 , G03F7/70308 , G03F7/705 , G03F7/70533 , G03F7/70891
摘要： A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement of the manipulator, and a second device configured to generate a merit function based on a square of a root mean square (RMS) of at least one error and configured to minimize the merit function subordinate to the upper bound for the range of movement of the manipulator.
摘要翻译：微光刻投影物镜包括光学元件，被配置为操纵光学元件的操纵器以及被配置为控制所述操纵器的控制单元。所述控制单元包括被配置为控制所述操纵器的移动的第一装置，包括所述操纵器的移动范围的上限的存储器，以及被配置为基于均方根的平方生成优值函数的第二装置 RMS），并且被配置为使从属于机器人的移动范围的上限的优点函数最小化。

9. 发明申请

US20110181855A1 PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY 有权
标题翻译：投影曝光装置优化调整可能性
公开(公告)号：US20110181855A1
公开(公告)日：2011-07-28
申请号：US13069551
申请日：2011-03-23
申请人： Boris Bittner , Holger Walter , Matthias Roesch
发明人： Boris Bittner , Holger Walter , Matthias Roesch
IPC分类号： G03B27/52
CPC分类号： G03F7/70525 , G03F7/70191 , G03F7/70266 , G03F7/70308 , G03F7/705 , G03F7/70533 , G03F7/70891
摘要： A projection apparatus for microlithography for imaging an object field includes an objective, one or a plurality of manipulators for manipulating one or a plurality of optical elements of the objective, a control unit for regulating or controlling the one or the plurality of manipulators, a determining device for determining at least one or a plurality of image aberrations of the objective, a memory comprising upper bounds for one or a plurality of specifications of the objective, including upper bounds for image aberrations and/or movements for the manipulators, wherein when determining an overshooting of one of the upper bounds by one of the image aberrations and/or an overshooting of one of the upper bounds by one of the manipulator movements by regulation or control of at least one manipulator within at most 30000 ms, or 10000 ms, or 5000 ms, or 1000 ms, or 200 ms, or 20 ms, or 5 ms, or 1 ms, an undershooting of the upper bounds can be effected.
摘要翻译：用于对物场进行成像的微光刻的投影装置包括物镜，用于操纵物镜的一个或多个光学元件的一个或多个操纵器，用于调节或控制一个或多个操纵器的控制单元，用于确定所述目标的至少一个或多个图像像差的装置，包括所述物镜的一个或多个规格的上限的存储器，包括用于所述操纵器的图像像差和/或移动的上限，其中当确定或者通过调节或控制至少一个操纵器在至多30000毫秒或10000毫秒内，通过一个操纵器移动来超图像中的一个上限中的一个上限和/或一个上限的过冲，或 5000ms或1000ms，或200ms，或20ms，或5ms或1ms，可以实现上限的下冲。

10. 发明授权

US08928858B2 Projection exposure apparatus with optimized adjustment possibility 有权
公开(公告)号：US08928858B2
公开(公告)日：2015-01-06
申请号：US13427030
申请日：2012-03-22
申请人： Boris Bittner , Holger Walter , Matthias Roesch
发明人： Boris Bittner , Holger Walter , Matthias Roesch
IPC分类号： G03B27/52 , G03B27/68 , G03B27/54 , G03F7/20 , G03B27/42 , G03B27/72
摘要： A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement of the manipulator, and a second device configured to generate a merit function based on a square of a root mean square (RMS) of at least one error and configured to minimize the merit function subordinate to the upper bound for the range of movement of the manipulator.

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