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    • 4. 发明授权
    • Method of an apparatus for programming an integrated fuse element to high resistance in low voltage technology
    • 用于在低电压技术中将集成熔丝元件编程为高电阻的装置的方法
    • US06420217B1
    • 2002-07-16
    • US09632375
    • 2000-08-03
    • Alexander KalnitskyPavel PoplevineAlbert Bergemont
    • Alexander KalnitskyPavel PoplevineAlbert Bergemont
    • H01L2182
    • H01L23/5256H01L27/101H01L2924/0002H01L2924/00
    • An integrated fuse element is capable of being programmed to high resistance in low voltage process technology. The fuse includes a stack of an undoped polysilicon layer and a silicide layer. A voltage applied across the stack is increases until a first agglomeration event occurs, whereby a discontinuity is formed in the silicide layer. The current is further increased to cause a second agglomeration event whereby the size of the discontinuity is increased. Each agglomeration event increases the resistance of the fuse. An extended-drain MOS transistor, capable of sustaining high voltage, is connected in series with the fuse for programming the fuse. The transistor includes: a well region in a substrate, the well region forming the drain of the transistor; an insulating trench in the well; and a polysilicon gate extending over a portion of the substrate, a portion of the well and a portion of the trench, wherein upon reverse-biasing the junction between the well and the substrate a depletion region is formed which encompasses at least the entire portion of the surface region of the well over which the polysilicon extends.
    • 集成的熔丝元件能够被编程为低电压工艺技术中的高电阻。 熔丝包括未掺杂的多晶硅层和硅化物层的堆叠。 施加在堆叠上的电压增加直到发生第一附聚事件,由此在硅化物层中形成不连续性。 电流进一步增加以引起第二聚集事件,从而增加不连续性的大小。 每个附聚事件会增加保险丝的电阻。 能够保持高电压的延伸漏极MOS晶体管与保险丝串联连接,以对熔丝进行编程。 晶体管包括:衬底中的阱区,形成晶体管的漏极的阱区; 井中的绝缘沟槽; 以及在所述衬底的一部分上延伸的多晶硅栅极,所述阱的一部分和所述沟槽的一部分,其中在反向偏置所述阱和所述衬底之间的结点时,形成耗尽区,所述耗尽区至少包括 多晶硅延伸的阱的表面区域。
    • 8. 发明授权
    • All-NMOS 4-transistor non-volatile memory cell
    • 全NMOS 4晶体管非易失性存储单元
    • US08363469B1
    • 2013-01-29
    • US12698318
    • 2010-02-02
    • Pavel PoplevineUmer KhanHengyang (James) LinAndrew J. Franklin
    • Pavel PoplevineUmer KhanHengyang (James) LinAndrew J. Franklin
    • G11C11/34G11C16/04
    • H01L27/115
    • A non-volatile memory cell includes NMOS programming, read, erase, and control transistors having gate electrodes connected to a storage node. The erase and control transistors have interconnected source, drain, and bulk electrodes. The cell is programmed by setting source, drain, bulk, and gate electrodes of all transistors to a positive voltage. An inhibiting voltage is applied to source, drain, and bulk electrodes of the read transistor, while setting source and drain electrodes of the programming transistor to the positive voltage and the bulk electrode of the programming transistor to the positive voltage or the inhibiting voltage. Source, drain, and bulk electrodes of the control transistor are then ramped to a negative control voltage while ramping source, drain, and bulk electrodes of the erase transistor to a negative erase voltage and then back to the positive voltage. Source, drain. bulk, and gate electrodes of the programming, erase, and control transistors are then returned to the positive voltage, while setting the source, drain, and bulk electrodes of the read transistor to the inhibiting voltage.
    • 非易失性存储单元包括具有连接到存储节点的栅极的NMOS编程,读取,擦除和控制晶体管。 擦除和控制晶体管具有互连的源极,漏极和体电极。 通过将所有晶体管的源极,漏极,体积和栅极电极设置为正电压来对单元进行编程。 在将编程晶体管的源极和漏极电极设置为正电压和编程晶体管的体电极至正电压或抑制电压的同时,将读取晶体管的源极,漏极和体电极施加抑制电压。 然后,控制晶体管的源极,漏极和体电极斜坡到负的控制电压,同时将擦除晶体管的源极,漏极和体电极斜缓到负的擦除电压,然后返回到正的电压。 来源,流失。 然后将编程,擦除和控制晶体管的体积和栅电极返回到正电压,同时将读取晶体管的源极,漏极和体电极设置为抑制电压。
    • 9. 发明授权
    • 5-transistor non-volatile memory cell
    • 5晶体管非易失性存储单元
    • US08284600B1
    • 2012-10-09
    • US12702061
    • 2010-02-08
    • Pavel PoplevineErnes HoUmer KhanHengyang James Lin
    • Pavel PoplevineErnes HoUmer KhanHengyang James Lin
    • G11C11/34
    • G11C16/0441
    • A non-volatile memory (NVM) cell comprises an NMOS control transistor having commonly-connected source, drain and bulk region electrodes and a gate electrode connected to a storage node; a PMOS erase transistor having commonly-connected source, drain and bulk region electrodes and a gate electrode connected to the storage node; an NMOS data transistor having source, drain and bulk region electrodes and a gate electrode connected to the storage node, the bulk region electrode being connected to a common bulk node; the first NMOS pass gate transistor having a source electrode connected to the drain electrode of the NMOS data transistor, a drain electrode, a bulk region electrode connected to the common bulk node, and a gate electrode; and a second NMOS pass gate transistor having a drain electrode connected to the source electrode of the NMOS data transistor, a source electrode, a bulk region electrode connected to the common bulk node, and a gate electrode.
    • 非易失性存储器(NVM)单元包括具有共同连接的源极,漏极和体区电极的NMOS控制晶体管和连接到存储节点的栅电极; 具有共连接的源极,漏极和体区电极的PMOS擦除晶体管和连接到存储节点的栅电极; 具有源极,漏极和体区电极的NMOS数据晶体管和连接到存储节点的栅极,所述体区电极连接到公共体节点; 所述第一NMOS栅极晶体管具有连接到所述NMOS数据晶体管的漏电极的源电极,漏电极,连接到所述公共体节点的体区电极和栅电极; 以及第二NMOS栅极晶体管,其具有连接到NMOS数据晶体管的源电极的漏电极,源电极,连接到公共体节点的体区电极和栅电极。