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1. 发明授权

US09126303B2 Method for production of a laminate polishing pad 有权
标题翻译：层压抛光垫的制造方法
公开(公告)号：US09126303B2
公开(公告)日：2015-09-08
申请号：US12065253
申请日：2006-08-25
申请人： Junji Hirose , Masato Doura
发明人： Junji Hirose , Masato Doura
IPC分类号： B24B37/20 , B24D18/00 , B29C44/32 , C08G18/12 , C08G18/48 , C08G18/72 , C08G18/75 , C08G18/76 , C08G101/00
CPC分类号： B24B37/20 , B24D18/00 , B29C44/321 , B29C44/326 , B29C44/332 , C08G18/12 , C08G18/4854 , C08G18/724 , C08G18/758 , C08G18/7621 , C08G2101/0025 , C08G18/3814
摘要： Disclosed is a method for production of a laminate polishing pad which comprises a reduced number of steps and is excellent in productivity rate, and which causes no detachment between a polishing layer and a cushion layer and can prevent the groove clogging caused by a slurry or the like. Also disclosed is a laminate polishing pad produced by the method. A method for production of a laminate polishing pad, comprising the steps of: preparing a cell-dispersed urethane composition by a mechanical frothing process; ejecting the cell-dispersed urethane composition onto a cushion layer continuously while feeding the cushion layer; curing the cell-dispersed urethane composition while controlling the thickness of the composition evenly to form a polishing layer made of a polyurethane foam, thereby producing a long laminate sheet; and cutting the long laminate sheet.
摘要翻译：公开了一种生产层压抛光垫的方法，该方法包括步骤减少并且生产率优异，并且不会在抛光层和缓冲层之间发生分离，并且可以防止由浆料引起的槽堵塞或喜欢。还公开了通过该方法制造的层压抛光垫。一种层压抛光垫的制造方法，包括以下步骤：通过机械起泡法制备细胞分散的聚氨酯组合物; 在缓冲层供给的同时连续地将细胞分散的氨基甲酸酯组合物喷射到缓冲层上; 固化细胞分散的聚氨酯组合物，同时均匀地控制组合物的厚度，以形成由聚氨酯泡沫制成的抛光层，从而生产长层压片; 并切割长层压板。

2. 发明申请

US20130340351A1 METHOD FOR MANUFACTURING POLISHING PAD 有权
公开(公告)号：US20130340351A1
公开(公告)日：2013-12-26
申请号：US13918341
申请日：2013-06-14
申请人： Takeshi FUKUDA , Tsuguo WATANABE , Junji HIROSE , Kenji NAKAMURA , Masato DOURA
发明人： Takeshi FUKUDA , Tsuguo WATANABE , Junji HIROSE , Kenji NAKAMURA , Masato DOURA
IPC分类号： B24D11/00
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

3. 发明授权

US08602846B2 Polishing pad and a method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US08602846B2
公开(公告)日：2013-12-10
申请号：US13552346
申请日：2012-07-18
申请人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
发明人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
IPC分类号： B24B1/00
CPC分类号： B24B37/24 , B24D3/26 , B24D11/001
摘要： A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm. The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.
摘要翻译：抛光层和基材层之间具有优异的耐久性和粘附性的抛光垫包括布置在基材层上的抛光层，其中抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至 300个妈妈聚氨酯泡沫包括异氰酸酯组分和含活性氢的化合物作为起始原料组分，并且含活性氢的化合物包括30至85重量％的具有2-4个官能团的高分子量多元醇和羟基值为20〜100mg KOH / g。

4. 发明授权

US08398794B2 Method for manufacturing polishing pad 有权
公开(公告)号：US08398794B2
公开(公告)日：2013-03-19
申请号：US13294811
申请日：2011-11-11
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C39/14 , B29C44/20 , B29C44/32
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

5. 发明申请

US20100317263A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20100317263A1
公开(公告)日：2010-12-16
申请号：US12864819
申请日：2009-02-26
申请人： Junji Hirose , Takeshi Fukuda
发明人： Junji Hirose , Takeshi Fukuda
IPC分类号： B24B1/00 , B24B7/20
CPC分类号： B24B37/24 , C08G18/3206 , C08G18/4018 , C08G18/4277 , C08G18/4854 , C08G18/6607 , C08G18/6611 , C08G18/664 , C08G18/6644 , C08G18/6677 , C08G18/797 , C08G2101/00 , C08L83/00 , Y10T428/24273 , Y10T428/249975 , Y10T428/249978 , Y10T428/249979 , Y10T428/31551
摘要： A method for manufacturing a polishing pad that has high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, continuously discharging the cell-dispersed urethane composition onto part of the face material or the belt conveyor where the light-transmitting region is not placed; placing another face material or belt conveyor on the discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing region including a polyurethane foam, so that a polishing sheet is prepared; applying a coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the coating composition to form water-impermeable film; and cutting the polishing sheet.
摘要翻译：制造具有高水平的光学检测精度并且防止在抛光区域和透光区域之间引起浆料泄漏的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 将光透射区域放置在面材或带式输送机上的预定位置处，将细胞分散的聚氨酯组合物连续排出到未放置透光区域的面材或带式输送机的一部分上; 将另一种面材或带式输送机放置在排出的细胞分散的聚氨酯组合物上; 固化细胞分散的聚氨酯组合物以形成包括聚氨酯泡沫的抛光区域，从而制备抛光片; 将包含脂族和/或脂环族多异氰酸酯的涂料组合物施加到抛光片的一侧并固化涂料组合物以形成不透水膜; 并切割抛光片。

6. 发明申请

US20100162631A1 PROCESS FOR MANUFACTURING POLISHING PAD 有权
标题翻译：制造抛光垫的工艺
公开(公告)号：US20100162631A1
公开(公告)日：2010-07-01
申请号：US12601725
申请日：2008-05-15
申请人： Akinori Sato , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Masato Doura
发明人： Akinori Sato , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Masato Doura
IPC分类号： B24D3/32 , B24D11/00
CPC分类号： B24D18/00 , B24B37/205 , Y10T428/24322 , Y10T428/24331 , Y10T428/24364
摘要： A method for manufacturing a polishing pad that has a high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed; placing another face material or belt conveyor on the discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing region including a polyurethane foam, so that a polishing sheet is prepared; applying a coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the coating composition to form a water-impermeable film; and cutting the polishing sheet.
摘要翻译：一种制造具有高水平的光学检测精度并且防止从抛光区域和透光区域之间的浆料泄漏的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在面材料或带式输送机上的预定位置放置透光区域，将细胞分散的聚氨酯组合物连续排出到未放置透光区域的面材或带式输送机的一部分上; 将另一种面材或带式输送机放置在排出的细胞分散的聚氨酯组合物上; 固化细胞分散的聚氨酯组合物以形成包括聚氨酯泡沫的抛光区域，从而制备抛光片; 将包含脂族和/或脂环族多异氰酸酯的涂料组合物施用到抛光片的一侧并固化涂料组合物以形成不透水膜; 并切割抛光片。

7. 发明申请

US20090137188A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20090137188A1
公开(公告)日：2009-05-28
申请号：US12294391
申请日：2007-05-15
申请人： Takeshi Fukuda , Junji Hirose , Yoshiyuki Nakai , Tsuyoshi Kimura
发明人： Takeshi Fukuda , Junji Hirose , Yoshiyuki Nakai , Tsuyoshi Kimura
IPC分类号： B24B49/04 , B24B49/12 , B24D11/00
CPC分类号： B24B37/205
摘要： A polishing pad provides excellent optical detection accuracy properties over a broad wavelength range (particularly at the short-wavelength side). A method for manufacturing a semiconductor device includes a process of polishing the surface of a semiconductor wafer with this polishing pad. The polishing pad has a polishing layer containing a polishing region and a light-transmitting region, wherein the light-transmitting region includes a polyurethane resin having an aromatic ring density of 2 wt % or less, and the light transmittance of the light-transmitting region is 30% or more in the overall range of wavelengths of 300 to 400 nm.
摘要翻译：抛光垫在宽波长范围（特别是在短波长侧）提供优异的光学检测精度特性。半导体器件的制造方法包括利用该研磨垫对半导体晶片的表面进行研磨的工序。抛光垫具有包含抛光区域和透光区域的抛光层，其中透光区域包括芳族环密度为2重量％以下的聚氨酯树脂，透光区域的透光率在波长为300〜400nm的整个范围内为30％以上。

8. 发明申请

US20080305720A1 Method for Production of a Laminate Polishing Pad 有权
标题翻译：层压抛光垫的生产方法
公开(公告)号：US20080305720A1
公开(公告)日：2008-12-11
申请号：US12065253
申请日：2006-08-25
申请人： Junji Hirose , Masato Doura
发明人： Junji Hirose , Masato Doura
IPC分类号： B24B1/00 , B24D11/00
CPC分类号： B24B37/20 , B24D18/00 , B29C44/321 , B29C44/326 , B29C44/332 , C08G18/12 , C08G18/4854 , C08G18/724 , C08G18/758 , C08G18/7621 , C08G2101/0025 , C08G18/3814
摘要： Disclosed is a method for production of a laminate polishing pad which comprises a reduced number of steps and is excellent in productivity rate, and which causes no detachment between a polishing layer and a cushion layer and can prevent the groove clogging caused by a slurry or the like. Also disclosed is a laminate polishing pad produced by the method. A method for production of a laminate polishing pad, comprising the steps of: preparing a cell-dispersed urethane composition by a mechanical frothing process; ejecting the cell-dispersed urethane composition onto a cushion layer continuously while feeding the cushion layer; curing the cell-dispersed urethane composition while controlling the thickness of the composition evenly to form a polishing layer made of a polyurethane foam, thereby producing a long laminate sheet; and cutting the long laminate sheet.
摘要翻译：公开了一种生产层压抛光垫的方法，该方法包括步骤减少并且生产率优异，并且不会在抛光层和缓冲层之间发生分离，并且可以防止由浆料引起的槽堵塞或喜欢。还公开了通过该方法制造的层压抛光垫。一种层压抛光垫的制造方法，包括以下步骤：通过机械起泡法制备细胞分散的聚氨酯组合物; 在缓冲层供给的同时连续地将细胞分散的氨基甲酸酯组合物喷射到缓冲层上; 固化细胞分散的聚氨酯组合物，同时均匀地控制组合物的厚度，以形成由聚氨酯泡沫制成的抛光层，从而生产长层压片; 并切割长层压板。

9. 发明授权

US09050707B2 Method for manufacturing polishing pad 有权
标题翻译：抛光垫的制造方法
公开(公告)号：US09050707B2
公开(公告)日：2015-06-09
申请号：US13918341
申请日：2013-06-14
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C44/24 , B29C44/32 , B24B37/22 , B24B37/24 , B24B37/26 , B24D11/00 , B29C44/30 , B24B37/20 , B24D3/32 , B24D18/00 , B29C44/56 , C08J9/30
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.
摘要翻译：可以通过少量制造步骤制造抛光垫的方法，抛光层和缓冲层之间的高生产率和无剥离的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在将表面材料供给的同时，将细胞分散的尿烷组合物连续排出到面材上; 在细胞分散的氨基甲酸酯组合物上层压另一种面材; 固化细胞分散的聚氨酯组合物，同时控制其厚度均匀，从而形成包括聚氨酯泡沫的抛光层; 将平行于表面的抛光层切割成两片，使得同时形成各自包括抛光层和面材的两个长抛光层; 并切割长抛光层以产生抛光垫。

10. 发明授权

US08500932B2 Method for manufacturing polishing pad 有权
公开(公告)号：US08500932B2
公开(公告)日：2013-08-06
申请号：US13294835
申请日：2011-11-11
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C39/18 , B32B37/15
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

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