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1. 发明申请

US20180169836A1 SYSTEMS AND METHODS FOR MAKING ABRASIVE ARTICLES 审中-公开
公开(公告)号：US20180169836A1
公开(公告)日：2018-06-21
申请号：US15736188
申请日：2016-07-01
申请人： 3M INNOVATIVE PROPERTIES COMPANY
发明人： Geoffrey I. Wilson , Brian G. Koethe , Steven J. Keipert
IPC分类号： B24D11/00 , B24D18/00
CPC分类号： B24D11/003 , B05D2252/00 , B05D2401/00 , B24D18/0072
摘要： Methods of making an abrasive article. Abrasive particles are loaded to a distribution tool including a plurality of strips defining a plurality of channels. Each channel is open to a lower side of the tool. The loaded particles are distributed from the distribution tool to a major face of a backing web below the lower side. At least a majority of the particles distributed from the tool undergo an orientation sequence in which each particle first enters one of the channels. The particle then passes partially through the channel such that a first portion is beyond the lower side and in contact with the major face, and a second portion within the channel. The sequence then includes the particle remaining in simultaneous contact with one of the strips and the major face for a dwell period.

2. 发明申请

US20160176022A1 CONTROLLED-VISCOSITY CMP CASTING METHOD 有权
标题翻译：控制粘度CMP铸造方法
公开(公告)号：US20160176022A1
公开(公告)日：2016-06-23
申请号：US14576896
申请日：2014-12-19
申请人： Rohm and Haas Electronic Materials CMP Holdings, Inc. , Dow Global Technologies LLC
发明人： Bainian Qian , George C. Jacob
IPC分类号： B24D11/00 , B24B37/24 , B24D3/32
CPC分类号： B24D11/003 , B24B37/24 , B24D3/32 , C08G18/10 , C08G18/3243 , C08G18/4829 , C08G18/4841 , C08G18/4854 , C08G18/7621 , C08G2101/00 , C08J9/32 , C08J2203/22 , C08J2207/00 , C08J2375/04 , C08G18/3814 , C08G18/6685
摘要： The invention provides a method of manufacturing a polishing pad suitable for planarizing at least one of semiconductor, optical and magnetic substrates. The method obtains a liquid polyurethane material formed from an isocyanate-terminated molecule and a curative agent. The liquid polyurethane material contains 4.2 to 7.5 weight percent fluid-filled polymeric microspheres in the isocyanate-terminated molecule. The fluid-filled polymeric microspheres are a blend of preexpanded and unexpanded fluid-filled polymeric microspheres. The liquid polyurethane material contains a blend of preexpanded and unexpanded fluid-filled polymeric microspheres having a relative viscosity μ μ 0 of 1.1 to 7. Then the liquid polyurethane material solidifies into a polyurethane matrix that contains preexpanded and expanded fluid-filled polymeric microsphere for forming the polishing pad.
摘要翻译：本发明提供一种制造适于平坦化半导体，光学和磁性基板中的至少一个的抛光垫的方法。该方法得到由异氰酸酯封端的分子和固化剂形成的液态聚氨酯材料。液体聚氨酯材料在异氰酸酯封端的分子中含有4.2至7.5重量百分比的流体填充的聚合物微球。流体填充的聚合物微球体是预浸和未膨胀的流体填充的聚合物微球体的混合物。液体聚氨酯材料含有相对粘度μμ0为1.1至7的预膨胀和未膨胀流体填充的聚合物微球体的混合物。然后，液体聚氨酯材料固化成聚氨酯基质，其含有预先扩张和膨胀的流体填充的聚合物微球体，用于形成抛光垫

3. 发明申请

US20150343595A1 SOFT POLISHING PAD FOR POLISHING A SEMICONDUCTOR SUBSTRATE 审中-公开
标题翻译：用于抛光半导体基板的软抛光垫
公开(公告)号：US20150343595A1
公开(公告)日：2015-12-03
申请号：US14823956
申请日：2015-08-11
申请人： William C. Allison , Diane Scott , Robert Kerprich , Ping Huang , Richard Frentzel
发明人： William C. Allison , Diane Scott , Robert Kerprich , Ping Huang , Richard Frentzel
IPC分类号： B24B37/24 , C08G18/32 , C08G18/76 , B24B37/26 , B24D11/00
CPC分类号： B24B37/24 , B24B37/205 , B24B37/26 , B24D11/003 , B32B3/30 , B32B5/142 , B32B5/18 , B32B7/06 , B32B7/12 , B32B25/045 , B32B25/08 , B32B27/065 , B32B27/08 , B32B27/308 , B32B27/36 , B32B2266/0278 , B32B2266/08 , B32B2307/40 , B32B2307/41 , B32B2307/412 , B32B2307/536 , B32B2307/72 , B32B2307/732 , B32B2457/00 , C08G18/3206 , C08G18/7621
摘要： Soft polishing pads for polishing semiconductor substrates are described. A soft polishing pad includes a molded homogeneous polishing body having a thermoset, closed cell polyurethane material with a hardness approximately in the range of 20 Shore D to 45 Shore D.
摘要翻译：描述了用于抛光半导体衬底的软抛光垫。软抛光垫包括具有大约在20肖氏D至45肖氏硬度范围内的硬度的热固性闭孔聚氨酯材料的模制均匀抛光体。

4. 发明申请

US20150004879A1 METHOD FOR PRODUCING LAMINATED POLISHING PAD 有权
标题翻译：生产层压抛光垫的方法
公开(公告)号：US20150004879A1
公开(公告)日：2015-01-01
申请号：US14370923
申请日：2013-01-09
申请人： TOYO TIRE & RUBBER CO., LTD.
发明人： Yoshiyuki Nakai
IPC分类号： B24D11/00 , B24B37/22
CPC分类号： B24D11/003 , B24B37/22 , B24B37/24 , B24D11/008
摘要： A method for producing a laminated polishing pad, which is free from warpage and does not cause peeling between a polishing layer and a cushion layer during polishing, includes the steps of: laminating a hot-melt adhesive sheet to a surface of a cushion layer with a base material in which a thermoplastic resin base material is provided peelably on one surface of the cushion layer, on which the thermoplastic resin base material is not provided; heating the laminated hot-melt adhesive sheet to be melted or softened; laminating a polishing layer on the melted or softened hot-melt adhesive to prepare a laminate; cutting the laminate to the size of the polishing layer to prepare a laminated polishing sheet; and peeling the thermoplastic resin base material from the laminated polishing sheet.
摘要翻译：一种层压抛光垫的制造方法，其不具有翘曲，并且在研磨时不会引起研磨层和缓冲层之间的剥离，其特征在于，包括以下工序：将热熔粘合片层压到缓冲层的表面，其中热塑性树脂基材在其上没有设置热塑性树脂基材的缓冲层的一个表面上可剥离地设置的基材; 加热待熔融或软化的层压热熔粘合片; 在熔融或软化的热熔粘合剂上层压抛光层以制备层压体; 将层压体切割成抛光层的尺寸以制备层压抛光片; 并从层压抛光片剥离热塑性树脂基材。

5. 发明申请

US20140364044A1 POLISHING PAD AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：US20140364044A1
公开(公告)日：2014-12-11
申请号：US14464985
申请日：2014-08-21
申请人： KPX CHEMICAL CO., LTD. , SAMSUNG ELECTRONICS CO., LTD.
发明人： Bong-Su AHN , Young-Jun JANG , Sang-Mok LEE , Hwi-Kuk CHUNG , Kee-Cheon SONG , Seung-Geun KIM , Jang-Won SEO , Jeong-Seon CHOO
IPC分类号： B24D3/32 , B24D11/00
CPC分类号： B24D3/32 , B24B37/24 , B24D3/34 , B24D11/003
摘要： Polishing pad and method of manufacturing the same, the method including: (a) mixing materials for forming a polishing layer; (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer including the two or more types of pores; and (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer.
摘要翻译：抛光垫及其制造方法，该方法包括：（a）混合用于形成抛光层的材料; （b）混合来自惰性气体，胶囊型发泡剂，化学发泡剂和能够控制孔尺寸的液体微量元素中的至少两种，（a）中的混合物形成两种或更多种的毛孔; （c）进行（b）中生成的混合物的凝胶化和硬化，以形成包含两种或多种类型的孔的抛光层; 以及（d）处理抛光层以便在抛光层的表面上分布通过打开两种或多种类型的孔所限定的微孔。

6. 发明授权

US08709114B2 Method of manufacturing chemical mechanical polishing layers 有权
标题翻译：制造化学机械抛光层的方法
公开(公告)号：US08709114B2
公开(公告)日：2014-04-29
申请号：US13427383
申请日：2012-03-22
申请人： Brian T. Cantrell , Kathleen McHugh , James T. Murnane , George H. McClain , Durron A. Hutt , Robert A. Brady , Christopher A. Young , Jeffrey Borcherdt Miller
发明人： Brian T. Cantrell , Kathleen McHugh , James T. Murnane , George H. McClain , Durron A. Hutt , Robert A. Brady , Christopher A. Young , Jeffrey Borcherdt Miller
IPC分类号： B24D3/00 , B24D11/00 , B24D18/00 , C09K3/14
CPC分类号： B24D11/003 , B24B37/20 , B24D18/0009
摘要： A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.
摘要翻译：提供了一种制造用于化学机械抛光垫的抛光层的方法，其中多个抛光层由滤饼衍生而成，其中形成的滤饼中的密度缺陷的形成和所形成的抛光层的表面粗糙度最小化。

7. 发明授权

US08691364B2 Laminate, and polishing material and grinding material using the same, and method for producing the laminate 失效
标题翻译：层压材料，使用其的研磨材料和研磨材料以及层压体的制造方法
公开(公告)号：US08691364B2
公开(公告)日：2014-04-08
申请号：US12445210
申请日：2007-10-12
申请人： Masataka Hasegawa , Kazuo Tsugawa , Masatou Ishihara , Yoshinori Koga
发明人： Masataka Hasegawa , Kazuo Tsugawa , Masatou Ishihara , Yoshinori Koga
IPC分类号： B24D3/00
CPC分类号： B24D11/003 , B24B9/16 , B24D18/00 , C23C16/0254 , C23C16/26 , C23C30/00 , Y10T428/24372 , Y10T428/30
摘要： The invention provides a laminate capable of polishing and grinding the surface of a material having a high hardness such as diamond, sapphire or hard carbon film, rapidly and in a simplified manner with high planarity and high accuracy, utilizing the high adhesiveness to substrates, the hardness and the surface planarity that a carbon film has, but using neither diamond abrasive grains nor alkali slurry. The laminate comprises a substrate and a carbon layer provided on the substrate, wherein the carbon layer comprises a diamond fine grain provided on the substrate and crushed by impact given thereto, a formation/growth inhibiting material that inhibits the formation of an impurity inhibiting the growth of a carbon grain and/or inhibits the growth of a carbon grain, and a carbon grain, and an amount (amount per unit volume) of the formation/growth inhibiting material decreases from a lower layer toward an upper layer on the substrate side. Preferably, the formation/growth inhibiting material is an SiO2 material or an Al2O3 material, and optionally an adhesiveness-reinforcing layer comprising titanium or a titanium alloy or the like may be provided between the substrate and the carbon layer.
摘要翻译：本发明提供了一种能够以高平坦度和高精度快速且简单地抛光和研磨具有高硬度的材料的表面的层压体，利用对基材的高粘附性，硬度和碳膜具有的表面平面度，但不使用金刚石磨粒或碱浆。层压体包括基材和设置在基材上的碳层，其中碳层包括设置在基材上的金刚石细晶粒并通过冲击赋予其破碎，抑制形成抑制生长的杂质的形成/生长抑制材料的碳粒子和/或抑制碳粒的生长和碳粒子，并且，生成/生长抑制材料的量（每单位体积的量）从基材侧的下层向上层减少。优选地，形成/生长抑制材料是SiO 2材料或Al 2 O 3材料，并且可以在基材和碳层之间设置任选的包含钛或钛合金等的粘合性增强层。

8. 发明申请

US20140030962A1 ABRASIVE FILM FABRICATION METHOD AND ABRASIVE FILM 有权
标题翻译：磨料薄膜生产方法和磨料薄膜
公开(公告)号：US20140030962A1
公开(公告)日：2014-01-30
申请号：US13950066
申请日：2013-07-24
申请人： EBARA CORPORATION
发明人： Yu ISHII , Hiroyuki KAWASAKI , Masayuki NAKANISHI , Kenya ITO
IPC分类号： B24D11/00
CPC分类号： B24D11/003 , B05D5/02 , B24D11/00 , B24D11/001
摘要： A method for fabricating an abrasive firm includes preparing a base film, coating the base film with a first paint which contains no abrasive grain but contains a binder resin, and drying the paint to form a first layer. The method further includes coating the first layer with a second paint which contains the abrasive grains and the binder resin, and drying the paint to form a second layer. The method further includes heating the first layer and the second layer for imidization.
摘要翻译：制造磨料制品的方法包括制备基膜，用不含磨粒但含有粘合剂树脂的第一涂料涂覆基膜，并干燥涂料以形成第一层。该方法还包括用含有磨料颗粒和粘合剂树脂的第二种涂料涂覆第一层，并干燥涂料以形成第二层。该方法还包括加热第一层和第二层以进行酰亚胺化。

9. 发明申请

US20130247477A1 Method Of Manufacturing Chemical Mechanical Polishing Layers Having a Window 有权
标题翻译：具有窗口的化学机械抛光层的制造方法
公开(公告)号：US20130247477A1
公开(公告)日：2013-09-26
申请号：US13427408
申请日：2012-03-22
申请人： Brian T. Cantrell , Kathleen McHugh , James T. Murnane , George H. McClain , Durron A. Hutt , Robert A. Brady , Christopher A. Young , Jeffrey Borcherdt Miller
发明人： Brian T. Cantrell , Kathleen McHugh , James T. Murnane , George H. McClain , Durron A. Hutt , Robert A. Brady , Christopher A. Young , Jeffrey Borcherdt Miller
IPC分类号： B24D11/00
CPC分类号： B24D11/003 , B24B37/20 , B24D18/0009
摘要： A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.
摘要翻译：提供了一种制造具有用于化学机械抛光垫的窗口的抛光层的方法，其中具有整体窗口的多个抛光层从饼块获得，其中饼形中的密度缺陷的形成和表面粗糙度形成的抛光层最小化。

10. 发明申请

US20130247476A1 Method Of Manufacturing Chemical Mechanical Polishing Layers 有权
标题翻译：化学机械抛光层的制造方法
公开(公告)号：US20130247476A1
公开(公告)日：2013-09-26
申请号：US13427383
申请日：2012-03-22
申请人： Brian T. Cantrell , Kathleen McHugh , James T. Murnane , George H. McClain , Durron A. Hutt , Robert A. Brady , Christopher A. Young , Jeffrey Borcherdt Miller
发明人： Brian T. Cantrell , Kathleen McHugh , James T. Murnane , George H. McClain , Durron A. Hutt , Robert A. Brady , Christopher A. Young , Jeffrey Borcherdt Miller
IPC分类号： B24D11/00
CPC分类号： B24D11/003 , B24B37/20 , B24D18/0009
摘要： A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers are derived from a cake, wherein the formation of density defects in the cake and the surface roughness of the polishing layers formed are minimized.
摘要翻译：提供了一种制造用于化学机械抛光垫的抛光层的方法，其中多个抛光层由滤饼衍生而成，其中形成的滤饼中的密度缺陷的形成和所形成的抛光层的表面粗糙度最小化。

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