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1. 发明授权

US10040226B2 Methods and materials for making a monolithic porous pad cast onto a rotatable base 有权
公开(公告)号：US10040226B2
公开(公告)日：2018-08-07
申请号：US14584548
申请日：2014-12-29
申请人： ENTEGRIS, INC.
发明人： Briant Enoch Benson
IPC分类号： B29C44/12 , A46B13/00 , A46B13/02 , B08B1/04 , B24D3/32 , B24D5/10 , H01L21/02 , B29C37/00 , B29C44/00 , B29K29/00
CPC分类号： B29C44/12 , A46B13/008 , A46B13/02 , A46B2200/3086 , B08B1/04 , B24D3/32 , B24D5/10 , B29C37/0078 , B29C44/005 , B29C44/1209 , B29C44/1214 , B29K2029/04 , H01L21/02074 , H01L21/67046 , Y10S134/902 , Y10S438/906
摘要： The present invention includes methods and materials for cleaning materials, particles, or chemicals from a substrate with a brush or pad. The method comprising: engaging a surface of a rotating wafer with an outer circumferential surface of a rotating cylindrical foam roller, the cylindrical foam roller having a plurality of circumferentially and outwardly extending spaced apart nodules extending from the outer surface, each nodule defining a height extending from the outer surface of the cylindrical foam roller to a substrate engagement surface of the nodule, the substrate engagement surface of one or more of the nodules having a rounded configuration; and positioning the cylindrical foam roller on the substrate such that the one or more nodules are positioned to have only the rounded substrate engagement surface contact the substrate such that no linear surface of the one or more nodules contacts the substrate.

2. 发明申请

US20170225300A1 METHOD OF MAKING AN ABRASIVE ARTICLE AND ABRASIVE ARTICLE 审中-公开
公开(公告)号：US20170225300A1
公开(公告)日：2017-08-10
申请号：US15502942
申请日：2015-08-05
申请人： 3M INNOVATIVE PROPERTIES COMPANY
发明人： Jacob S. Beveridge , Steven J. Keipert
IPC分类号： B24D18/00 , B24D5/04 , B24D3/32
CPC分类号： B24D18/0027 , B24D3/02 , B24D3/20 , B24D3/32 , B24D5/04
摘要： A method of making an abrasive article comprises urging a malleable thermosetting melt-flowable composition through openings extending through a porous abrasive member to form an abrasive article precursor; which is heated to form the abrasive article. Multiple abrasive articles may be stacked prior to heating. Methods can be used to fabricate abrasive articles such as grinding wheels and cut-off wheels.

3. 发明授权

US09669518B2 Polishing pad and method for making the same 有权
公开(公告)号：US09669518B2
公开(公告)日：2017-06-06
申请号：US14468621
申请日：2014-08-26
申请人： San Fang Chemical Industry Co., Ltd.
发明人： Chung-Chih Feng , I-Peng Yao , Wen-Chieh Wu , Yung-Chang Hung
IPC分类号： B24D3/32 , B24D11/00 , B24B37/24
CPC分类号： B24D3/32 , B24B37/24 , B24D11/00 , B24D11/001 , B24D11/006
摘要： The present invention relates to a polishing pad and a method for making the same. The polishing pad has a grinding layer. The grinding layer includes a plurality of fibers and a main body. The fineness of the fibers is 0.001 den to 6 den. The main body is a foam and encloses the fibers. The main body has a plurality of first pores and a plurality of second pores, wherein the first pores are communicated with each other, and the second pores are independent from each other. The size of the first pores is at least 5 times greater than the size of the second pores. The hardness of the grinding layer is 30 to 90 shore D, and the compression ratio thereof is 1% to 10%.

4. 发明授权

US09662768B2 Coated abrasive article including a non-woven material 有权
公开(公告)号：US09662768B2
公开(公告)日：2017-05-30
申请号：US14562144
申请日：2014-12-05
申请人： Saint-Gobain Abrasives, Inc. , Saint-Gobain Abrasifs
发明人： Muthukrishnan Sharmila , Adiseshaiah K. Sathyanarayanaiah , Srirangapattana Narasimhaiah Srihari , Sérgio Andrade De Melo , André Volpiani
IPC分类号： B24D11/02 , B24D11/00 , B24D3/32 , B24D3/00
CPC分类号： B24D11/02 , B24D3/004 , B24D3/32 , B24D11/005
摘要： A coated abrasive article including a body having a backing including a spunlace polyester-based material and a saturant contained in the spunlace polyester-based material, the saturant including a material selected from the group of phenolic resin, acrylic, urea resin, and a combination thereof, and an abrasive layer overlying the backing including abrasive particles.

5. 发明申请

US20150231758A1 METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING LAYERS 有权
标题翻译：制造化学机械抛光层的方法
公开(公告)号：US20150231758A1
公开(公告)日：2015-08-20
申请号：US14184286
申请日：2014-02-19
申请人： Rohm and Haas Electronic Materials CMP Holdings, Inc.
发明人： George McClain , Alan Saikin , David Kolesar , Aaron Sarafinas , Robert L. Post
IPC分类号： B24B37/24 , B24D3/32 , B24D18/00
CPC分类号： B24B37/24 , B24D3/32 , B24D18/0009
摘要： A method of making a polishing layer for polishing a substrate selected from at least one of a magnetic substrate, an optical substrate and a semiconductor substrate is provided, comprising: providing a liquid prepolymer material; providing a plurality of hollow microspheres; exposing the plurality of hollow microspheres to a carbon dioxide atmosphere for an exposure period to form a plurality of treated hollow microspheres; combining the liquid prepolymer material with the plurality of treated hollow microspheres to form a curable mixture; allowing the curable mixture to undergo a reaction to form a cured material, wherein the reaction is allowed to begin ≦24 hours after the formation of the plurality of treated hollow microspheres; and, deriving at least one polishing layer from the cured material; wherein the at least one polishing layer has a polishing surface adapted for polishing the substrate.
摘要翻译：提供了制造用于抛光选自磁性基板，光学基板和半导体基板中的至少一个的基板的抛光层的方法，包括：提供液体预聚物材料; 提供多个中空微球; 将多个中空微球暴露于二氧化碳气氛中曝光期以形成多个经处理的中空微球; 将液体预聚物材料与多个经处理的中空微球组合以形成可固化混合物; 允许可固化混合物经历反应以形成固化材料，其中允许反应在形成多个处理的中空微球后24小时开始; 并从所述固化材料得到至少一个抛光层; 其中所述至少一个抛光层具有适于抛光所述基底的抛光表面。

6. 发明申请

US20150174735A1 HIGH POROSITY ABRASIVE ARTICLES AND METHODS OF MANUFACTURING SAME 审中-公开
公开(公告)号：US20150174735A1
公开(公告)日：2015-06-25
申请号：US14634075
申请日：2015-02-27
申请人： SAINT-GOBAIN ABRASIVES, INC. , SAINT-GOBAIN ABRASIFS
发明人： Rachana Upadhyay , Richard W. J. Hall
IPC分类号： B24D3/32 , B24D18/00
CPC分类号： B24D3/32 , B24B37/245 , B24D3/26 , B24D11/00 , B24D18/00 , B24D18/0027
摘要： An abrasive article includes a polymer matrix and abrasive grains dispersed in the polymer matrix, wherein the abrasive article has a void volume of at least 50%. The polymer matrix is polymerized from a monomer including at least one double bond.

7. 发明申请

US20150158148A1 Coated Abrasive Article Including a Non-Woven Material 有权
标题翻译：包括非织造材料的涂层磨料制品
公开(公告)号：US20150158148A1
公开(公告)日：2015-06-11
申请号：US14562144
申请日：2014-12-05
申请人： Saint-Gobain Abrasives, Inc. , Saint-Gobain Abrasifs
发明人： Muthukrishnan SHARMILA , Adiseshaiah K. SATHYANARAYANAIAH , Srirangapattana Narasimhaiah SRIHARI , Sérgio Andrade DE MELO , André VOLPIANI
IPC分类号： B24D11/02 , B24D11/00
CPC分类号： B24D11/02 , B24D3/004 , B24D3/32 , B24D11/005
摘要： A coated abrasive article including a body having a backing including a spunlace polyester-based material and a saturant contained in the spunlace polyester-based material, the saturant including a material selected from the group of phenolic resin, acrylic, urea resin, and a combination thereof, and an abrasive layer overlying the backing including abrasive particles.
摘要翻译：一种涂覆的磨料制品，其包括具有背衬的本体，所述背衬包括在所述水刺聚酯基材料中所含的水刺聚酯基材料和饱和剂，所述饱和剂包括选自酚醛树脂，丙烯酸，脲醛树脂和组合的材料以及覆盖在包括磨料颗粒的背衬上的研磨层。

8. 发明授权

US09050707B2 Method for manufacturing polishing pad 有权
标题翻译：抛光垫的制造方法
公开(公告)号：US09050707B2
公开(公告)日：2015-06-09
申请号：US13918341
申请日：2013-06-14
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C44/24 , B29C44/32 , B24B37/22 , B24B37/24 , B24B37/26 , B24D11/00 , B29C44/30 , B24B37/20 , B24D3/32 , B24D18/00 , B29C44/56 , C08J9/30
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.
摘要翻译：可以通过少量制造步骤制造抛光垫的方法，抛光层和缓冲层之间的高生产率和无剥离的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在将表面材料供给的同时，将细胞分散的尿烷组合物连续排出到面材上; 在细胞分散的氨基甲酸酯组合物上层压另一种面材; 固化细胞分散的聚氨酯组合物，同时控制其厚度均匀，从而形成包括聚氨酯泡沫的抛光层; 将平行于表面的抛光层切割成两片，使得同时形成各自包括抛光层和面材的两个长抛光层; 并切割长抛光层以产生抛光垫。

9. 发明授权

US08986407B2 High porosity abrasive articles and methods of manufacturing same 有权
标题翻译：高孔隙度磨料制品及其制造方法
公开(公告)号：US08986407B2
公开(公告)日：2015-03-24
申请号：US12372549
申请日：2009-02-17
申请人： Rachana Upadhyay , Richard W. J. Hall
发明人： Rachana Upadhyay , Richard W. J. Hall
IPC分类号： C09K3/14 , B24D11/00 , B24D3/26 , B24B37/24 , B24D18/00
CPC分类号： B24D3/32 , B24B37/245 , B24D3/26 , B24D11/00 , B24D18/00 , B24D18/0027
摘要： An abrasive article includes a polymer matrix and abrasive grains dispersed in the polymer matrix, wherein the abrasive article has a void volume of at least 50%. The polymer matrix is polymerized from a monomer including at least one double bond.
摘要翻译：磨料制品包括分散在聚合物基质中的聚合物基体和磨料颗粒，其中磨料制品具有至少50％的空隙体积。聚合物基体由包含至少一个双键的单体聚合。

10. 发明授权

US08920571B2 Method and materials for making a monolithic porous pad cast onto a rotatable base 有权
标题翻译：用于制造整体式多孔垫的方法和材料，铸造在可旋转的基座上
公开(公告)号：US08920571B2
公开(公告)日：2014-12-30
申请号：US14029471
申请日：2013-09-17
申请人： Entegris, Inc.
发明人： Briant Enoch Benson
IPC分类号： B08B1/04 , H01L21/02 , A46B13/02 , B24D5/10 , B24D3/32 , A46B13/00
CPC分类号： B29C44/12 , A46B13/008 , A46B13/02 , A46B2200/3086 , B08B1/04 , B24D3/32 , B24D5/10 , B29C37/0078 , B29C44/005 , B29C44/1209 , B29C44/1214 , B29K2029/04 , H01L21/02074 , Y10S134/902 , Y10S438/906
摘要： The present invention includes methods and materials for cleaning materials, particles, or chemicals from a substrate with a brush or pad. The method comprising: engaging a surface of a rotating wafer with an outer circumferential surface of a rotating cylindrical foam roller, the cylindrical foam roller having a plurality of circumferentially and outwardly extending spaced apart nodules extending from the outer surface, each nodule defining a height extending from the outer surface of the cylindrical foam roller to a substrate engagement surface of the nodule, the substrate engagement surface of one or more of the nodules having a rounded configuration; and positioning the cylindrical foam roller on the substrate such that the one or more nodules are positioned to have only the rounded substrate engagement surface contact the substrate such that no linear surface of the one or more nodules contacts the substrate.
摘要翻译：本发明包括从具有刷子或垫的衬底清洁材料，颗粒或化学品的方法和材料。该方法包括：将旋转晶片的表面与旋转圆柱形发泡辊的外圆周表面接合，所述圆柱形泡沫辊具有从外表面延伸的多个周向和向外延伸的间隔开的结节，每个结节限定高度延伸从圆柱形发泡辊的外表面到结节的基底接合表面，一个或多个结节的基底接合表面具有圆形构型; 以及将所述圆柱形泡沫辊定位在所述基底上，使得所述一个或多个结节被定位成仅具有圆形基底接合表面接触所述基底，使得所述一个或多个结节的线性表面不接触所述基底。

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