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1. 发明申请

US20120108149A1 METHOD FOR MANUFACTURING POLISHING PAD 有权
标题翻译：制造抛光垫的方法
公开(公告)号：US20120108149A1
公开(公告)日：2012-05-03
申请号：US13294811
申请日：2011-11-11
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B24B1/00 , B24D18/00 , B24D11/00
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.
摘要翻译：可以通过少量制造步骤制造抛光垫的方法，抛光层和缓冲层之间的高生产率和无剥离的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在将表面材料供给的同时，将细胞分散的尿烷组合物连续排出到面材上; 在细胞分散的氨基甲酸酯组合物上层压另一种面材; 固化细胞分散的聚氨酯组合物，同时控制其厚度均匀，从而形成包括聚氨酯泡沫的抛光层; 将平行于表面的抛光层切割成两片，使得同时形成各自包括抛光层和面材的两个长抛光层; 并切割长抛光层以产生抛光垫。

2. 发明申请

US20090093202A1 METHOD FOR MANUFACTURING POLISHING PAD 审中-公开
标题翻译：制造抛光垫的方法
公开(公告)号：US20090093202A1
公开(公告)日：2009-04-09
申请号：US12297862
申请日：2007-04-19
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B24D11/00
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.
摘要翻译：可以通过少量制造步骤制造抛光垫的方法，抛光层和缓冲层之间的高生产率和无剥离的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在将表面材料供给的同时，将细胞分散的尿烷组合物连续排出到面材上; 在细胞分散的氨基甲酸酯组合物上层压另一种面材; 固化细胞分散的聚氨酯组合物，同时控制其厚度均匀，从而形成包括聚氨酯泡沫的抛光层; 将平行于表面的抛光层切割成两片，使得同时形成各自包括抛光层和面材的两个长抛光层; 并切割长抛光层以产生抛光垫。

3. 发明授权

US08398794B2 Method for manufacturing polishing pad 有权
公开(公告)号：US08398794B2
公开(公告)日：2013-03-19
申请号：US13294811
申请日：2011-11-11
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C39/14 , B29C44/20 , B29C44/32
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

4. 发明授权

US09050707B2 Method for manufacturing polishing pad 有权
标题翻译：抛光垫的制造方法
公开(公告)号：US09050707B2
公开(公告)日：2015-06-09
申请号：US13918341
申请日：2013-06-14
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C44/24 , B29C44/32 , B24B37/22 , B24B37/24 , B24B37/26 , B24D11/00 , B29C44/30 , B24B37/20 , B24D3/32 , B24D18/00 , B29C44/56 , C08J9/30
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.
摘要翻译：可以通过少量制造步骤制造抛光垫的方法，抛光层和缓冲层之间的高生产率和无剥离的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在将表面材料供给的同时，将细胞分散的尿烷组合物连续排出到面材上; 在细胞分散的氨基甲酸酯组合物上层压另一种面材; 固化细胞分散的聚氨酯组合物，同时控制其厚度均匀，从而形成包括聚氨酯泡沫的抛光层; 将平行于表面的抛光层切割成两片，使得同时形成各自包括抛光层和面材的两个长抛光层; 并切割长抛光层以产生抛光垫。

5. 发明授权

US08500932B2 Method for manufacturing polishing pad 有权
公开(公告)号：US08500932B2
公开(公告)日：2013-08-06
申请号：US13294835
申请日：2011-11-11
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C39/18 , B32B37/15
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

6. 发明申请

US20120108065A1 METHOD FOR MANUFACTURING POLISHING PAD 有权
公开(公告)号：US20120108065A1
公开(公告)日：2012-05-03
申请号：US13294835
申请日：2011-11-11
申请人： Takeshi FUKUDA , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi FUKUDA , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： H01L21/302 , B24D18/00 , B24D11/00
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

7. 发明授权

US08348724B2 Polishing pad manufacturing method 有权
标题翻译：抛光垫制造方法
公开(公告)号：US08348724B2
公开(公告)日：2013-01-08
申请号：US12600201
申请日：2008-05-09
申请人： Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
发明人： Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
IPC分类号： B24B1/00
CPC分类号： B24B37/205
摘要： A method for manufacturing a polishing pad prevents slurry leaks and provides a pad that can be used to provide high optical detection accuracy. The method for manufacturing a polishing pad includes forming a groove for injecting a light-transmitting region forming material on the back surface of a polishing layer; injecting the light-transmitting region forming material into the groove and curing the material to form a light-transmitting region; and buffing the front surface of the polishing layer to expose the light-transmitting region on the front surface.
摘要翻译：抛光垫的制造方法防止浆料泄漏并提供可用于提供高光学检测精度的垫。抛光垫的制造方法包括在抛光层的背面上形成用于注入透光性区域形成材料的槽，将所述透光区域形成材料注入所述凹槽中并固化所述材料以形成透光区域; 并抛光抛光层的前表面以暴露前表面上的透光区域。

8. 发明授权

US08314029B2 Process for producing polyurethane foam 有权
标题翻译：生产聚氨酯泡沫的方法
公开(公告)号：US08314029B2
公开(公告)日：2012-11-20
申请号：US12593174
申请日：2008-02-29
申请人： Junji Hirose , Takeshi Fukuda , Masato Doura , Akinori Sato , Kenji Nakamura
发明人： Junji Hirose , Takeshi Fukuda , Masato Doura , Akinori Sato , Kenji Nakamura
IPC分类号： H01L21/302
CPC分类号： B24B37/24 , B24D3/32 , B24D18/00 , C08J9/30 , C08J2375/04
摘要： A method for manufacturing a polishing pad containing substantially spherical cells and having high thickness accuracy includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition from a single discharge port to a substantially central portion in the width direction of a face material A, while feeding the face material A; laminating a face material B on the cell-dispersed urethane composition; then uniformly adjusting the thickness of the cell-dispersed urethane composition by thickness adjusting means; curing the cell-dispersed urethane composition with the thickness adjusted in the preceding step without applying any additional load to the composition so that a polishing sheet including a polyurethane foam is formed; and cutting the polishing sheet.
摘要翻译：一种用于制造包含基本上球形的电池并且具有高厚度精度的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在单面排出口向面材A的宽度方向的大致中央部连续排出细胞分散型尿烷组合物，同时供给面材A; 将面料B层压在细胞分散的聚氨酯组合物上; 然后通过厚度调节装置均匀地调节细胞分散的聚氨酯组合物的厚度; 固化在前述步骤中调节的厚度的细胞分散的聚氨酯组合物，而不对组合物施加任何额外的负荷，使得形成包括聚氨酯泡沫的抛光片; 并切割抛光片。

9. 发明申请

US20100221984A1 POLISHING PAD MANUFACTURING METHOD 有权
标题翻译：抛光垫制造方法
公开(公告)号：US20100221984A1
公开(公告)日：2010-09-02
申请号：US12600201
申请日：2008-05-09
申请人： Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
发明人： Masato Doura , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Akinori Sato
IPC分类号： B24B1/00 , B24D11/00 , B24B37/00
CPC分类号： B24B37/205
摘要： A method for manufacturing a polishing pad prevents slurry leaks and provides a pad that can be used to provide high optical detection accuracy. The method for manufacturing a polishing pad includes forming a groove for injecting a light-transmitting region forming material on the back surface of a polishing layer; injecting the light-transmitting region forming material into the groove and curing the material to form a light-transmitting region; and buffing the front surface of the polishing layer to expose the light-transmitting region on the front surface.
摘要翻译：抛光垫的制造方法防止浆料泄漏并提供可用于提供高光学检测精度的垫。抛光垫的制造方法包括在抛光层的背面上形成用于注入透光性区域形成材料的槽，将所述透光区域形成材料注入所述凹槽中并固化所述材料以形成透光区域; 并抛光抛光层的前表面以暴露前表面上的透光区域。

10. 发明授权

US08602846B2 Polishing pad and a method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US08602846B2
公开(公告)日：2013-12-10
申请号：US13552346
申请日：2012-07-18
申请人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
发明人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
IPC分类号： B24B1/00
CPC分类号： B24B37/24 , B24D3/26 , B24D11/001
摘要： A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm. The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.
摘要翻译：抛光层和基材层之间具有优异的耐久性和粘附性的抛光垫包括布置在基材层上的抛光层，其中抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至 300个妈妈聚氨酯泡沫包括异氰酸酯组分和含活性氢的化合物作为起始原料组分，并且含活性氢的化合物包括30至85重量％的具有2-4个官能团的高分子量多元醇和羟基值为20〜100mg KOH / g。

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