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    • 4. 发明授权
    • Sputtering system
    • 溅射系统
    • US06342139B1
    • 2002-01-29
    • US09495293
    • 2000-02-01
    • Isamu AokuraTomohiro OkumuraNaoki Suzuki
    • Isamu AokuraTomohiro OkumuraNaoki Suzuki
    • C23C1435
    • H01J37/321C23C14/358H01J37/3408
    • A sputtering system includes a vacuum chamber, a sputtering electrode provided in the vacuum chamber, a target supported on the sputtering electrode with a front surface of the target and a substrate disposed in the vacuum chamber so as to be opposed to each other. A high-frequency or DC power source supplies a high-frequency or DC power to the sputtering electrode to generate plasma on the target, and an antenna is provided for generating an electromagnetic wave and is disposed outside the vacuum chamber and near the target. An electromagnetic-wave inlet window for introducing into the vacuum chamber an electromagnetic wave generated from the antenna is provided in a wall of the vacuum chamber.
    • 溅射系统包括真空室,设置在真空室中的溅射电极,具有靶的前表面的溅射电极上支撑的靶和设置在真空室中的基板以彼此相对。 高频或直流电源向溅射电极提供高频或直流电力,以在目标上产生等离子体,并且提供用于产生电磁波的天线,并设置在真空室外部和靶附近。 在真空室的壁上设置有用于将从天线产生的电磁波引入真空室的电磁波入口窗口。
    • 9. 发明授权
    • Sputtering apparatus
    • 溅射装置
    • US06217714B1
    • 2001-04-17
    • US08672660
    • 1996-06-28
    • Munekazu NishiharaTeiichi KimuraIsamu Aokura
    • Munekazu NishiharaTeiichi KimuraIsamu Aokura
    • C23C1434
    • C23C14/352H01J37/3408
    • In a sputtering apparatus, in a vacuum chamber having a gas supply and a gas discharge functions, a substrate is set to a supporting part therefor and a target is disposed at an electrode connected with a power source within a plane opposite to the substrate, so as to form a film while holding the substrate in a fixed state to the target. The electrode is divided into three or more electrode parts, the target is divided and disposed on the three or more electrode parts within the plane, and a magnet is arranged for each divided target at a position where a line of magnetic force on a surface of the each target is generated by each magnet.
    • 在溅射装置中,在具有气体供给和气体放电功能的真空室中,将基板设定为支撑部,并且在与基板相反的平面内的与电源连接的电极上设置靶,因此 以便在将固定状态的基板保持在目标上的同时形成膜。 电极被分为三个或更多个电极部分,目标被分割并设置在平面内的三个或更多个电极部分上,并且在每个分割的靶上布置磁体, 每个目标由每个磁体产生。