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1. 发明授权

US6128323A Reliable modular production quality narrow-band high REP rate excimer laser 有权
标题翻译：可靠的模块化生产质量窄带高REP率准分子激光器
公开(公告)号：US6128323A
公开(公告)日：2000-10-03
申请号：US157067
申请日：1998-09-18
申请人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
发明人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/225 , H03K17/80 , H03K3/57 , H01S3/08009 , H01S3/0812 , H01S3/1392 , H01S3/2251 , H01S3/2256
摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.
摘要翻译：本发明提供了一种可靠的模块化生产质量准分子激光器，其能够在2000Hz下产生10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。允许更高脉冲速率和改进的带宽性能的激光室的改进包括单个上游预分解器管和高效室。该室设计用于在较低的氟浓度下运行。在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

2. 发明授权

US5991324A Reliable. modular, production quality narrow-band KRF excimer laser 失效
标题翻译：可靠。模块化，生产质量好的窄带KRF准分子激光器
公开(公告)号：US5991324A
公开(公告)日：1999-11-23
申请号：US41474
申请日：1998-03-11
申请人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
发明人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/139 , H01S3/225 , H01S3/22
CPC分类号： G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/225 , H01S3/1392
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.
摘要翻译：一种可靠，模块化，生产质量好的窄带KrF准分子激光器，能够以1000Hz的频率产生10mJ的激光脉冲，带宽约为0.6μm或更小。本发明特别适用于集成电路的平版印刷生产中的长期全天候操作。现有技术的激光器的改进包括单个上游预分解器管和声学挡板。优选的实施例包括减少的氟浓度，阳极支撑杆形状以减小鼓风机轴承上的空气动力反作用力，改进的脉冲电源系统提供更快的脉冲上升时间，输出耦合器具有显着增加的反射率，具有CaF棱镜扩束器的线窄化模块，更准确的波长计，激光计算机控制器编程，具有新的改进的脉冲能量控制算法。

3. 发明授权

US6034978A Gas discharge laser with gas temperature control 有权
标题翻译：气体放电激光器采用气体温度控制
公开(公告)号：US6034978A
公开(公告)日：2000-03-07
申请号：US310872
申请日：1999-05-12
申请人： Richard C. Ujazdowski , Robert A. Shannon , Dmitry Berger , William N. Partlo , Tom A. Watson , Paul S. Thompson , Toshihiko Ishihara , Carl E. Tedesco, II , Donald G. Larson , Steven M. Harrington , Richard G. Morton , James H. Azzola , I. Roger Oliver , Thomas P. Duffey , Igor V. Fomenkov
发明人： Richard C. Ujazdowski , Robert A. Shannon , Dmitry Berger , William N. Partlo , Tom A. Watson , Paul S. Thompson , Toshihiko Ishihara , Carl E. Tedesco, II , Donald G. Larson , Steven M. Harrington , Richard G. Morton , James H. Azzola , I. Roger Oliver , Thomas P. Duffey , Igor V. Fomenkov
IPC分类号： H01S3/225 , G03F7/20 , H01S3/036 , H01S3/041 , H01S3/134 , H01S3/04
CPC分类号： G03F7/70025 , H01S3/134 , H01S3/036
摘要： A gas discharge laser with fast response gas temperature control to maintain laser gas temperature within desired limits during burst mode operation. Preferred embodiments include a passive temperature stabilizer having fins with surface areas exposed to flowing laser gas at least equal to the surface area of the cooling fins of a laser gas heat exchanger. Preferred embodiments utilize heating elements and coolant flow control to regulate laser gas temperatures using processors programmed to anticipate idle periods.
摘要翻译：一种具有快速响应气体温度控制的气体放电激光器，用于在脉冲串模式操作期间将激光气体温度保持在期望的限度内。优选实施例包括具有散热片的被动温度稳定器，其表面积暴露于至少等于激光气体热交换器的冷却片的表面积的流动激光气体。优选实施例利用加热元件和冷却剂流量控制来调节激光气体温度，使用编程为预期空闲周期的处理器。

4. 发明授权

US06914919B2 Six to ten KHz, or greater gas discharge laser system 有权
标题翻译： 6〜10KHz或更大的气体放电激光系统
公开(公告)号：US06914919B2
公开(公告)日：2005-07-05
申请号：US10187336
申请日：2002-06-28
申请人： Tom A. Watson , Richard C. Ujazdowski , Alex P. Ivaschenko , Richard L. Sandstrom , Robert A. Shannon , R. Kyle Webb , Frederick A. Palenschat , Thomas Hofmann , Curtis L. Rettig , Richard M. Ness , Paul C. Melcher , Alexander I. Ershov
发明人： Tom A. Watson , Richard C. Ujazdowski , Alex P. Ivaschenko , Richard L. Sandstrom , Robert A. Shannon , R. Kyle Webb , Frederick A. Palenschat , Thomas Hofmann , Curtis L. Rettig , Richard M. Ness , Paul C. Melcher , Alexander I. Ershov
IPC分类号： H01S3/134 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23 , H01S3/10
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation. In other embodiments the gas flow between the electrodes is increased sufficiently to permit 10,000 Hz operation with a discharge region width of 3 mm. To provide these substantial increased gas flow rates, Applicants have disclosed preferred embodiments utilize tangential forms of the prior art but with improved and more powerful motors and novel bearing designs. New bearing designs include both ceramic bearings and magnetic bearings. In other embodiments, some or all of the gas circulation power is provided with a blower located outside the laser chamber. The outside blower can be located in the laser cabinet or in separate location.
摘要翻译：本发明提供一种气体放电激光系统，其能够以6,000至1000000次脉冲功率秒的重复频率在生产线容量中可靠地长期运行。优选的实施例被配置为用于集成电路光刻的光源的KrF，ArF和F 2 N 2激光器。改进包括一种改进的高压电源，其能够将磁压缩脉冲电源系统的初始电容器充电至每秒精确的目标电压6,000至10,0000次，以及用于监视脉冲能量的反馈控制以及确定脉冲 - 逐脉冲基础。公开了用于在放电间隔期间从激光电极之间的放电区域去除产生的碎屑的几种技术。在一个实施例中，放电区域的宽度从约3mm减小至约1mm，使得设计用于4000Hz操作的气体循环系统可用于10,000Hz操作。在其他实施例中，电极之间的气流充分增加，以允许10,000Hz的操作，放电区域宽度为3mm。为了提供这些显着增加的气体流速，申请人已经公开了使用现有技术的切向形式的优选实施例，但是具有改进的和更强大的电动机和新颖的轴承设计。新的轴承设计包括陶瓷轴承和磁性轴承。在其他实施例中，一些或全部气体循环动力设置有位于激光室外部的鼓风机。外部鼓风机可以位于激光柜内或分开的位置。

5. 发明授权

US06392743B1 Control technique for microlithography lasers 失效
标题翻译：微光刻激光器的控制技术
公开(公告)号：US06392743B1
公开(公告)日：2002-05-21
申请号：US09515974
申请日：2000-02-29
申请人： Paolo Zambon , Gamaralalage G. Padmabandu , Tom A. Watson , Palash P. Das
发明人： Paolo Zambon , Gamaralalage G. Padmabandu , Tom A. Watson , Palash P. Das
IPC分类号： G03B2772
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70525 , G03F7/70558 , H01S3/1022 , H01S3/1024 , H01S3/1305
摘要： A lithograph quality optimization process for controlling laser beam parameters when changing operating modes. The laser is programmed to automatically conduct an optimization procedure preferably in less than one minute to adjust laser operating parameters such as blower speed, total gas pressure and F2 partial pressure in order to optimize beam quality parameters.
摘要翻译：用于在改变工作模式时控制激光束参数的光刻胶质量优化过程。激光器被编程为优选在不到一分钟内自动进行优化程序以调整激光器操作参数，例如鼓风机速度，总气体压力和F2分压，以优化光束质量参数。

6. 发明授权

US06320892B1 Energy efficient lithography laser 失效
标题翻译：节能光刻激光
公开(公告)号：US06320892B1
公开(公告)日：2001-11-20
申请号：US09420297
申请日：1999-10-18
申请人： Gamaralalage G. Padmabandu , Palash P. Das , Tom A. Watson , Paolo Zambon
发明人： Gamaralalage G. Padmabandu , Palash P. Das , Tom A. Watson , Paolo Zambon
IPC分类号： H01S3223
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： An excimer laser system with an automatic fluorine control system to permit precise control of the fluorine concentration within an F2 “sweet spot” in a gas discharge laser chamber. This is done with a computer control system which monitors laser parameters, determines &Dgr;E/&Dgr;V, the change of pulse energy with voltage, and automatically and precisely controls the fluorine concentration based on &Dgr;E/&Dgr;V without the need to actually measure the fluorine concentration. The present invention is especially useful in lithography environments in which photo resist having a wide range of sensitivity are used. The present invention permits operation of the laser at substantially maximum efficiency over a wide range of pulse energy outputs.
摘要翻译：一种具有自动氟控制系统的准分子激光系统，用于在气体放电激光室中精确控制F2“甜点”内的氟浓度。这是通过电脑控制系统进行的，该系统监视激光参数，确定DELTAE / DELTAV，脉冲能量随电压的变化，并且可以根据DELTAE / DELTAV自动精确控制氟浓度，而无需实际测量氟浓度。本发明在使用具有宽灵敏度范围的光刻胶的光刻环境中特别有用。本发明允许激光器在宽范围的脉冲能量输出上以基本最大的效率进行操作。

7. 发明授权

US5729562A Pulse power generating circuit with energy recovery 失效
标题翻译：具有能量回收的脉冲发电电路
公开(公告)号：US5729562A
公开(公告)日：1998-03-17
申请号：US739873
申请日：1996-10-31
申请人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
发明人： Daniel L. Birx , Palash P. Das , Igor V. Fomenkov , William N. Partlo , Tom A. Watson
IPC分类号： H01S3/00 , H01S3/097 , H01S3/225 , H02M9/04 , H03K3/57 , H03K17/00 , H03K17/80 , H05H1/06
CPC分类号： H05H1/06 , H01S3/097 , H03K17/80 , H03K3/57 , H01S3/225 , H03K2217/0036
摘要： A high voltage pulse power generating circuit capable of providing energy recovery is disclosed. The energy efficient pulse generating circuit source comprises a high voltage charge storing element which is periodically discharged into a compressor circuit. An energy recovery circuit coupled to the compressor circuit reverses the polarity of energy dissipated by the pulse power generating circuit and transfers the waste energy back to the power source. In a preferred embodiment, the pulse power generating circuit of the present invention utilizes an SCR switch for periodically discharging the charge storing element. This embodiment of the present invention provides pulses consistently and will not provide even a single missed pulse.
摘要翻译：公开了一种能够提供能量回收的高压脉冲发生电路。能量效率脉冲发生电路源包括周期性地排放到压缩机电路中的高电压电荷存储元件。耦合到压缩机电路的能量恢复电路反转由脉冲发电电路消耗的能量的极性，并将废能转移回电源。在优选实施例中，本发明的脉冲发生电路利用SCR开关来周期性地对电荷存储元件进行放电。本发明的该实施例一致地提供脉冲，并且甚至不会提供单个错过的脉冲。

8. 发明授权

US5748656A Laser having improved beam quality and reduced operating cost 失效
标题翻译：激光器具有改善的光束质量和降低的操作成本
公开(公告)号：US5748656A
公开(公告)日：1998-05-05
申请号：US583302
申请日：1996-01-05
申请人： Tom A. Watson , William N. Partlo , Donald G. Larson , Igor V. Fomenkov , Anthony J. de Ruyter , Palash P. Das
发明人： Tom A. Watson , William N. Partlo , Donald G. Larson , Igor V. Fomenkov , Anthony J. de Ruyter , Palash P. Das
IPC分类号： H01S3/03 , H01S3/036 , H01S3/04 , H01S3/041 , H01S3/225 , H01S3/045
CPC分类号： H01S3/036 , H01S3/04 , H01S3/041 , F28D2021/0077 , H01S3/225
摘要： Disclosed is a laser useful in, e.g., photolithography or medical surgery. In one embodiment, the laser comprises a discharge chamber and heat-generating electronics that are enclosed in a baffled enclosure that requires less cooling air to reliably cool the components in the enclosure than previous unbaffled enclosures. A method of reducing the amount of conditioned air is also provided. In a further embodiment, the laser has a heat-exchange system that acts quickly in response to changes in laser gas temperature by adjusting a flow-proportioning valve regulating water flow through a heat exchanger, thereby providing a continuously variable rate of heat exchange through the heat exchanger to maintain the lasing gas temperature constant. Methods of providing a laser beam and of improving the uniformity of a laser beam are disclosed, as are photolithography methods utilizing a laser and method of this invention.
摘要翻译：公开了一种可用于例如光刻或医疗手术中的激光。在一个实施例中，激光器包括放电室和发热电子器件，其封闭在挡板外壳中，其需要较少的冷却空气以可靠地冷却外壳中的部件比先前的未封闭的外壳。还提供了减少调节空气量的方法。在另一个实施例中，激光器具有热交换系统，其响应于激光气体温度的变化而快速作用，通过调节调节通过热交换器的水流的流量比例阀，由此通过所述热交换系统提供连续可变的热交换速率热交换器保持激光温度恒定。公开了提供激光束并提高激光束的均匀性的方法，以及利用激光的光刻方法和本发明的方法。

9. 发明授权

US06240117B1 Fluorine control system with fluorine monitor 有权
标题翻译：氟监控系统
公开(公告)号：US06240117B1
公开(公告)日：2001-05-29
申请号：US09191446
申请日：1998-11-12
申请人： Mengxiong Gong , Tom A. Watson , Palash P. Das , Richard L. Sandstrom , Thomas P. Duffey
发明人： Mengxiong Gong , Tom A. Watson , Palash P. Das , Richard L. Sandstrom , Thomas P. Duffey
IPC分类号： H01S3223
CPC分类号： G03F7/70558 , G03F7/70575 , H01S3/036 , H01S3/225
摘要： An excimer laser system with a real time fluorine monitor and an automatic fluorine control system to permit precise control of the fluorine concentration within the laser chamber. Cleaned laser gas is extracted from the laser chamber and directed through an F2 sample cell prior to returning to the chamber through one of the chamber window housings. A UV light beam is directed through the F2 sample cell and the amount of absorption of the light is measured. In preferred embodiments the absorption is measured by detecting with a photo detector the amount of light which passes through the cell. The photo detector provides a feedback signal which is used by a laser controller to automatically control fluorine concentration in the chamber to within desired ranges. In another preferred embodiment an acoustic detector detects acoustic signals resulting from absorbed light pulses. This invention provides a substantially real time measurement of fluorine concentration.
摘要翻译：具有实时氟监测器和自动氟控制系统的准分子激光系统，以允许精确控制激光室内的氟浓度。清洁的激光气体在通过其中一个室窗外壳返回到室之前从激光室中提取并引导通过F2样品池。 UV光束被引导通过F2样品池，并测量光的吸收量。在优选实施例中，通过用光电检测器检测穿过电池的光量来测量吸收。光电检测器提供反馈信号，该信号由激光控制器用于将腔室中的氟浓度自动控制在所需范围内。在另一优选实施例中，声检测器检测由吸收的光脉冲产生的声信号。本发明提供氟浓度的实质实时测量。

10. 发明授权

US07346093B2 DUV light source optical element improvements 有权
标题翻译： DUV光源光学元件改进
公开(公告)号：US07346093B2
公开(公告)日：2008-03-18
申请号：US10808157
申请日：2004-03-23
申请人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
发明人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
IPC分类号： H01S3/08 , H01S3/22
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座从柔性的安装框架开始，挠曲臂将挠性件附接到安装框架。该装置可以包括具有细长杆的挠曲力机构。力机构可以预应力挠曲。镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。光栅可以使用电磁感应元件或磁敏元件进行主动调谐。可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

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