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    • 3. 发明授权
    • Relax gas discharge laser lithography light source
    • 放气放电激光光刻光源
    • US07088758B2
    • 2006-08-08
    • US10956784
    • 2004-10-01
    • Richard L. SandstromWilliam N. PartloDaniel J. W. BrownThomas A. YagerAlexander I. ErshovRobert J. RafacGerman E. Rylov
    • Richard L. SandstromWilliam N. PartloDaniel J. W. BrownThomas A. YagerAlexander I. ErshovRobert J. RafacGerman E. Rylov
    • H01S3/22
    • G01J1/429B23K26/0622B23K2101/40G01J9/02G02B26/002G02B26/0875G03F7/70041G03F7/70575H01S3/005H01S3/0057H01S3/1055H01S3/225
    • An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.
    • 公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法,产生包括选定脉冲重复频率的激光输出光脉冲的光束,其可以包括:色散中心波长选择光学选择 用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构,用于在色散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件,所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置 脉冲光束在可变折射光学元件上。 可变折射光学元件可以包括:限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。 脉冲参数测量和脉冲调制控制的其它方面包括响应来自利用工具的信号,例如涉及具有不同中心波长光谱的适当剂量控制。
    • 7. 发明申请
    • CHEMICAL VAPOR DEPOSITION GRAPHENE FOAM ELECTRODES FOR PSEUDO-CAPACITORS
    • 化学蒸气沉积石墨电极用于PSEUDO-CAPACITORS
    • US20130021718A1
    • 2013-01-24
    • US13519569
    • 2011-04-20
    • Thomas A. Yager
    • Thomas A. Yager
    • H01G9/042H01G13/00H01G9/058H01G9/048H01G9/00H01G9/155
    • H01G11/36B82Y30/00B82Y40/00C01B32/186C01P2004/30C01P2006/12H01G11/24H01G11/46H01G11/86Y02E60/13
    • Technologies are generally described for a porous graphene electrode material is described herein that may incorporate a three-dimensional open-cell graphene structure fabricated via chemical vapor deposition onto a metal foam. After the graphene is deposited, the metal foam may be dissolved, leaving a three-dimensional open-cell graphene structure that may include single or few layer graphene. Pseudo-capacitive materials, such as RuO2, Fe3O4, or MnO2, may be deposited within the pores of the a three-dimensional open-cell graphene structure to form the porous graphene electrode material. The porous graphene electrode material may have a specific capacitance comparable to chemically modified graphene (CMG) electrodes. The porous graphene electrode material may also have a conductivity greater than CMG electrodes of equivalent surface area. Use of the porous graphene electrode material in capacitors may result in siginificant improvements in specific power compared to CMG based capacitors.
    • 一般描述了一种多孔石墨烯电极材料的技术,这里描述了可以将通过化学气相沉积制造的三维开孔石墨烯结构结合到金属泡沫上。 在沉积石墨烯之后,可以溶解金属泡沫,留下可以包括单层或几层石墨烯的三维开孔石墨烯结构。 伪电容材料,例如RuO 2,Fe 3 O 4或MnO 2可以沉积在三维开孔电池石墨烯结构的孔内,以形成多孔石墨烯电极材料。 多孔石墨烯电极材料可以具有与化学改性石墨烯(CMG)电极相当的比电容。 多孔石墨烯电极材料也可以具有大于等效表面积的CMG电极的导电率。 与基于CMG的电容器相比,在电容器中使用多孔石墨烯电极材料可能导致比功率的显着改善。