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1. 发明授权

US06240117B1 Fluorine control system with fluorine monitor 有权
标题翻译：氟监控系统
公开(公告)号：US06240117B1
公开(公告)日：2001-05-29
申请号：US09191446
申请日：1998-11-12
申请人： Mengxiong Gong , Tom A. Watson , Palash P. Das , Richard L. Sandstrom , Thomas P. Duffey
发明人： Mengxiong Gong , Tom A. Watson , Palash P. Das , Richard L. Sandstrom , Thomas P. Duffey
IPC分类号： H01S3223
CPC分类号： G03F7/70558 , G03F7/70575 , H01S3/036 , H01S3/225
摘要： An excimer laser system with a real time fluorine monitor and an automatic fluorine control system to permit precise control of the fluorine concentration within the laser chamber. Cleaned laser gas is extracted from the laser chamber and directed through an F2 sample cell prior to returning to the chamber through one of the chamber window housings. A UV light beam is directed through the F2 sample cell and the amount of absorption of the light is measured. In preferred embodiments the absorption is measured by detecting with a photo detector the amount of light which passes through the cell. The photo detector provides a feedback signal which is used by a laser controller to automatically control fluorine concentration in the chamber to within desired ranges. In another preferred embodiment an acoustic detector detects acoustic signals resulting from absorbed light pulses. This invention provides a substantially real time measurement of fluorine concentration.
摘要翻译：具有实时氟监测器和自动氟控制系统的准分子激光系统，以允许精确控制激光室内的氟浓度。清洁的激光气体在通过其中一个室窗外壳返回到室之前从激光室中提取并引导通过F2样品池。 UV光束被引导通过F2样品池，并测量光的吸收量。在优选实施例中，通过用光电检测器检测穿过电池的光量来测量吸收。光电检测器提供反馈信号，该信号由激光控制器用于将腔室中的氟浓度自动控制在所需范围内。在另一优选实施例中，声检测器检测由吸收的光脉冲产生的声信号。本发明提供氟浓度的实质实时测量。

2. 发明授权

US6128323A Reliable modular production quality narrow-band high REP rate excimer laser 有权
标题翻译：可靠的模块化生产质量窄带高REP率准分子激光器
公开(公告)号：US6128323A
公开(公告)日：2000-10-03
申请号：US157067
申请日：1998-09-18
申请人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
发明人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/225 , H03K17/80 , H03K3/57 , H01S3/08009 , H01S3/0812 , H01S3/1392 , H01S3/2251 , H01S3/2256
摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.
摘要翻译：本发明提供了一种可靠的模块化生产质量准分子激光器，其能够在2000Hz下产生10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。允许更高脉冲速率和改进的带宽性能的激光室的改进包括单个上游预分解器管和高效室。该室设计用于在较低的氟浓度下运行。在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

3. 发明授权

US6018537A Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser 有权
标题翻译：可靠，模块化，生产质量窄带高倍率F2激光
公开(公告)号：US6018537A
公开(公告)日：2000-01-25
申请号：US273446
申请日：1999-03-19
申请人： Thomas Hofmann , Jean-Marc Hueber , Palash P. Das , Toshihiko Ishihara , Thomas P. Duffey , John T. Melchior , Herve A. Besaucele , Richard G. Morton , Richard M. Ness , Peter C. Newman , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom
发明人： Thomas Hofmann , Jean-Marc Hueber , Palash P. Das , Toshihiko Ishihara , Thomas P. Duffey , John T. Melchior , Herve A. Besaucele , Richard G. Morton , Richard M. Ness , Peter C. Newman , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom
IPC分类号： G01J9/00 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/0971 , H01S3/134 , H01S3/223 , H01S3/225 , H01S3/10
CPC分类号： G03F7/70025 , G01J9/00 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/134 , H01S3/223 , H01S3/225 , H01S3/08009 , H01S3/09713 , H01S3/2251 , H01S3/2256
摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.
摘要翻译：本发明提供了可产生1000Hz至2000Hz或更大范围内的10mJ激光脉冲的可靠的模块化生产质量准分子激光器。可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

4. 再颁专利

USRE38054E1 Reliable, modular, production quality narrow-band high rep rate F2 laser 失效
标题翻译：可靠，模块化，生产质量窄带高倍率F2激光
公开(公告)号：USRE38054E1
公开(公告)日：2003-04-01
申请号：US09801383
申请日：2001-03-07
申请人： Thomas Hofmann , Jean-Marc Hueber , Palash P. Das , Toshihiko Ishihara , Thomas P. Duffey , John T. Melchior , Herve A. Besaucele , Richard G. Morton , Richard M. Ness , Peter C. Newman , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom
发明人： Thomas Hofmann , Jean-Marc Hueber , Palash P. Das , Toshihiko Ishihara , Thomas P. Duffey , John T. Melchior , Herve A. Besaucele , Richard G. Morton , Richard M. Ness , Peter C. Newman , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom
IPC分类号： H01S310
CPC分类号： C23C14/225 , C23C14/0694 , C23C14/16 , C23C14/24 , G01J9/00 , G02B1/105 , G02B5/1852 , G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/1392 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H03K3/57 , H03K17/80
摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses in the range of 1000 Hz to 2000 Hz or greater. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved communication module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.
摘要翻译：本发明提供了可产生1000Hz至2000Hz或更大范围内的10mJ激光脉冲的可靠的模块化生产质量准分子激光器。可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。这些改进包括具有用于精确调整电压的电压降低电路的增加容量的高压电源，改进的通信模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

5. 发明授权

US06370174B1 Injection seeded F2 lithography laser 失效
标题翻译：注入种子F2光刻激光
公开(公告)号：US06370174B1
公开(公告)日：2002-04-09
申请号：US09459165
申请日：1999-12-10
申请人： Eckehard D. Onkels , Palash P. Das , Thomas P. Duffey , Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo
发明人： Eckehard D. Onkels , Palash P. Das , Thomas P. Duffey , Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo
IPC分类号： H01S300
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70483 , G03F7/70575 , H01S3/036 , H01S3/225 , H01S3/2308 , H01S3/2333 , H01S3/2366
摘要： A tunable injection seeded very narrow band F2 lithography laser. The laser combines modular design features of prior art long life releasable lithography lasers with special F2 line narrowing and tuning techniques applied to a seed beam operated in a first gain medium which beam is used to stimulate narrow band lasing in a second gain medium to produce a very narrow band laser beam useful for integrated circuit lithography.
摘要翻译：可调式注入种子非常窄的F2光刻激光。激光器结合了现有技术的长寿命可剥离光刻激光器的模块化设计特征，其具有应用于在第一增益介质中操作的种子光束的特殊F2线窄化和调谐技术，该光束用于在第二增益介质中刺激窄带激光以产生非常窄带激光束可用于集成电路光刻。

6. 发明授权

US5991324A Reliable. modular, production quality narrow-band KRF excimer laser 失效
标题翻译：可靠。模块化，生产质量好的窄带KRF准分子激光器
公开(公告)号：US5991324A
公开(公告)日：1999-11-23
申请号：US41474
申请日：1998-03-11
申请人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
发明人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/139 , H01S3/225 , H01S3/22
CPC分类号： G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/225 , H01S3/1392
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.
摘要翻译：一种可靠，模块化，生产质量好的窄带KrF准分子激光器，能够以1000Hz的频率产生10mJ的激光脉冲，带宽约为0.6μm或更小。本发明特别适用于集成电路的平版印刷生产中的长期全天候操作。现有技术的激光器的改进包括单个上游预分解器管和声学挡板。优选的实施例包括减少的氟浓度，阳极支撑杆形状以减小鼓风机轴承上的空气动力反作用力，改进的脉冲电源系统提供更快的脉冲上升时间，输出耦合器具有显着增加的反射率，具有CaF棱镜扩束器的线窄化模块，更准确的波长计，激光计算机控制器编程，具有新的改进的脉冲能量控制算法。

7. 发明授权

US07139301B2 Laser spectral engineering for lithographic process 有权
公开(公告)号：US07139301B2
公开(公告)日：2006-11-21
申请号：US10701280
申请日：2003-11-03
申请人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
发明人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

8. 发明授权

US07016388B2 Laser lithography light source with beam delivery 有权
公开(公告)号：US07016388B2
公开(公告)日：2006-03-21
申请号：US10712688
申请日：2003-11-12
申请人： Brian Klene , Palash P. Das , Steve Grove , Alexander Ershov , Scot Smith , Xiaojiang Pan , Richard L. Sandstrom
发明人： Brian Klene , Palash P. Das , Steve Grove , Alexander Ershov , Scot Smith , Xiaojiang Pan , Richard L. Sandstrom
IPC分类号： H01S3/22
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/036 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

9. 发明授权

US06693939B2 Laser lithography light source with beam delivery 有权
标题翻译：激光光刻光源带光束传输
公开(公告)号：US06693939B2
公开(公告)日：2004-02-17
申请号：US10141216
申请日：2002-05-07
申请人： Brian Klene , Palash P. Das , Steve Grove , Alexander Ershov , Scot Smith , Xiaojiang Pan , Richard L. Sandstrom
发明人： Brian Klene , Palash P. Das , Steve Grove , Alexander Ershov , Scot Smith , Xiaojiang Pan , Richard L. Sandstrom
IPC分类号： H01S322
CPC分类号： G03F7/70933 , G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.
摘要翻译：本发明提供一种用于生产线机器的模块化高重复率紫外线气体放电激光源。该系统包括用于将激光束传送到期望位置（例如生产线机器的入口）的封闭和清除的光束路径。在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

10. 发明申请

US20120298838A1 SYSTEMS AND METHODS FOR IMPLEMENTING AN INTERACTION BETWEEN A LASER SHAPED AS LINE BEAM AND A FILM DEPOSITED ON A SUBSTRATE 有权
标题翻译：用于实现激光形成的线束与基板上沉积的膜之间的相互作用的系统和方法
公开(公告)号：US20120298838A1
公开(公告)日：2012-11-29
申请号：US13571129
申请日：2012-08-09
申请人： Palash P. Das , Thomas Hofmann , Jesse D. Davis , Richard L. Sandstrom
发明人： Palash P. Das , Thomas Hofmann , Jesse D. Davis , Richard L. Sandstrom
IPC分类号： G01J1/16
CPC分类号： B23K26/043 , B23K26/04 , B23K26/0622 , B23K26/0738 , C30B1/023 , C30B13/24
摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.
摘要翻译：公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

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