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1. 发明专利

JP6437316B2 電子銃、三次元積層造形装置及び電子銃制御方法审中-公开
公开(公告)号：JP6437316B2
公开(公告)日：2018-12-12
申请号：JP2015003094
申请日：2015-01-09
申请人：日本電子株式会社
发明人：佐藤崇
IPC分类号： H01J37/063 , H01J37/06 , H01J37/302 , H01J37/04
CPC分类号： H01J3/08 , B22F3/1055 , B22F2003/1056 , B23K15/002 , B23K15/0026 , B23K15/0086 , B23K15/06 , B33Y30/00 , H01J3/02 , H01J3/024 , H01J3/027 , H01J37/063 , H01J37/305 , H01J2237/06308 , H01J2237/065 , H01J2237/3128 , Y02P10/295

2. 发明专利

JP5994271B2 電子ビーム発生装置、電子ビーム照射装置、電子ビーム露光装置、および製造方法有权
标题翻译：电子束发生器，电子束照射装置，电子束曝光装置，以及制造方法
公开(公告)号：JP5994271B2
公开(公告)日：2016-09-21
申请号：JP2012027488
申请日：2012-02-10
申请人：国立大学法人東北大学 , 国立大学法人東京農工大学 , 株式会社クレステック
发明人：江刺正喜 , 池上尚克 , 小島明
IPC分类号： H01J37/063 , H01J37/073 , H01J37/305 , H01J1/312 , H01J9/02 , H01J37/06

3. 发明专利

JP2013069661A Electrode frame body 审中-公开
标题翻译：电极框架体
公开(公告)号：JP2013069661A
公开(公告)日：2013-04-18
申请号：JP2012051870
申请日：2012-03-08
申请人： Nissin Ion Equipment Co Ltd , 日新イオン機器株式会社
发明人： INAI YUTAKA , TANII MASAHIRO
IPC分类号： H01J37/08 , H01J37/063
摘要： PROBLEM TO BE SOLVED: To improve work efficiency when replacing the electrode rod of a charged particle beam extraction electrode.SOLUTION: The extraction electrode is configured of a slit electrode 1 having a slit-like aperture 4. The slit electrode 1 consists of an electrode frame 2 and electrode rods 5. The electrode frame 2 has an integral structure and includes an aperture 3 for passing a charged particle beam and groove-like electrode supports. The electrode rods 5 are arranged on the electrode frame 2 while straddling over the aperture 3 and supported, at both ends thereof, by the electrode supports, thus forming the slit-like aperture 4.
摘要翻译：要解决的问题：为了在更换带电粒子束引出电极的电极棒时提高工作效率。解决方案：引出电极由具有狭缝状开口4的狭缝电极1构成。狭缝电极1由电极框架2和电极棒5组成。电极框架2具有一体结构并且包括孔 3用于通过带电粒子束和槽状电极支撑件。电极棒5被布置在电极框架2上，同时跨过孔3并在其两端由电极支撑件支撑，从而形成狭缝状的孔4.版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP4298399B2 Electron beam apparatus and an electron beam drawing apparatus using an electron beam apparatus 有权
公开(公告)号：JP4298399B2
公开(公告)日：2009-07-15
申请号：JP2003182364
申请日：2003-06-26
申请人：キヤノン株式会社 , 株式会社日立ハイテクノロジーズ
发明人：洋也太田 , 敬清由井
IPC分类号： H01J3/02 , H01J37/063 , H01J37/065 , H01J37/305 , H01L21/027
CPC分类号： H01J37/065 , H01J2237/3175

6. 发明专利

JP2007080704A Field emission type electron gun and its power supply voltage control method 审中-公开
标题翻译：现场排放型电子枪及其电源电压控制方法
公开(公告)号：JP2007080704A
公开(公告)日：2007-03-29
申请号：JP2005267899
申请日：2005-09-15
申请人： Mie Univ , 国立大学法人三重大学
发明人： HATA KOICHI
IPC分类号： H01J37/073 , H01J1/304 , H01J35/06 , H01J35/14 , H01J37/063 , H01J37/248
摘要： PROBLEM TO BE SOLVED: To provide an electron gun which is capable of obtaining a high electron current density, that is, has a high luminance and can focus finely (crossover is small), by focusing the electron current emitted from an emitter in a prescribed direction, and which is small in its device. SOLUTION: The field emission type electron gun comprises an electron emitter consisting of carbon nanotube (hereinafter, CNT) and a Butler type lens as an electrostatic lens for emitting, accelerating, and focusing electrons from the electron emitter. In the Butler type lens, the drawing electrodes are divided electrically into 2-16 independently. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够获得高电子密度的电子枪，即具有高亮度并且可以精细地聚焦（交叉小），通过聚焦从发射器发射的电子电流在规定的方向上，其装置小。解决方案：场发射型电子枪包括由碳纳米管（以下称为CNT）和作为静电透镜的巴特勒型透镜组成的电子发射体，用于从电子发射器发射，加速和聚焦电子。在Butler型透镜中，绘图电极被独立地分成2-16个。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2006338958A Electron beam light source 审中-公开
标题翻译：电子束光源
公开(公告)号：JP2006338958A
公开(公告)日：2006-12-14
申请号：JP2005160456
申请日：2005-05-31
申请人： Toshiba Corp , 株式会社東芝
发明人： HASHIMOTO SUSUMU
IPC分类号： H01J37/063 , G21K1/00 , G21K1/087 , G21K5/04 , H01J37/06 , H01J37/09 , H01J37/12 , H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an electron beam light source which can irradiate electrons having a uniform current density with respect to a wide area.
SOLUTION: The electron beam light source for irradiating an electron current EF against a target T, is provided with a plurality of number of electron guns 10 which are arranged two-dimensionally and which form electron beams EB, and a third grid 5 which forms the electron current EF, by making the current density have a Gaussian distribution and by making them overlapped.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题：提供一种能够相对于广泛的面积照射具有均匀电流密度的电子的电子束光源。解决方案：用于向目标T照射电子流EF的电子束光源设置有多个电子枪10，它们二维布置并形成电子束EB和第三栅极5 其通过使电流密度具有高斯分布并使其重叠而形成电子流EF。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2004534360A A device manufacturing method using an electron beam device and its electron beam apparatus 审中-公开
公开(公告)号：JP2004534360A
公开(公告)日：2004-11-11
申请号：JP2003505604
申请日：2002-06-11
申请人：株式会社荏原製作所
发明人：護中筋 , 徹佐竹 , 隆男加藤 , 武司村上 , 賢治渡辺 , 伸治野路
IPC分类号： G01N23/225 , H01J3/02 , H01J3/10 , H01J37/04 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/12 , H01J37/147 , H01J37/28 , H01J37/317 , H01L21/66
CPC分类号： H01J3/10 , B82Y10/00 , B82Y40/00 , G01N23/225 , H01J3/021 , H01J37/063 , H01J37/073 , H01J37/1471 , H01J37/1472 , H01J37/3174 , H01J2237/06316 , H01J2237/2817
摘要：カソード及びアノードを有する電子銃から放出された電子線を試料上に集束させて照射し、試料から放出された二次電子を検出器へ入射させる電子線装置であって、電子銃から試料へ放出される電子線の照射を最適化する手段を備え、該最適化手段は、電子銃に近接して配置された二段の偏向器より構成することができ、該二段の偏向器は、カソードの結晶方位のうち電子線放出が大きい結晶方位が光軸方向を向いていないことにより光軸に対して角度をなす方向に放出された電子線を、電子線装置の光軸方向に向かわせるよう偏向及び指向するようにした電子線装置。

9. 发明专利

JP2001052639A ELECTRON GUN, ELECTRON OPTICAL SYSTEM, AND ELECTRON BEAM DEVICE 失效
公开(公告)号：JP2001052639A
公开(公告)日：2001-02-23
申请号：JP22945499
申请日：1999-08-13
申请人： NIKON CORP
发明人： KANEMATSU ERIKA , KIHARA NAOTO , NISHIMURA HIROSHI
IPC分类号： H01J37/063 , H01J37/06 , H01J37/29
摘要： PROBLEM TO BE SOLVED: To provide an electron gun capable of adjusting both the position and diameter of a cross-over to the desired values. SOLUTION: A primary electron beam 28 emitted by a cathode 1 is released in widening, but constricted near between a Wehnelt 2 and first anode 3 under influence of a negative suppression voltage impressed on the Wehnelt 2 so that a first cross-over 29 is formed. The electron beam 28 is again constricted by regulating the voltages of a second anode 4 and a third anode 5 so that a second cross-over 30 is formed, which is located at the position of a gun aperture 6, and also it is possible to adjust the size of the second cross-over 30.

10. 发明专利

JP2000331632A ELECTRON GUN, ELECTRON BEAM EXPOSURE TRANSFER DEVICE, AND MANUFACTURE OF SEMICONDUCTOR DEVICE 失效
公开(公告)号：JP2000331632A
公开(公告)日：2000-11-30
申请号：JP13693499
申请日：1999-05-18
申请人： NIKON CORP
发明人： SUZUKI SHOHEI
IPC分类号： H01J37/065 , G03F7/20 , H01J37/063 , H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an electron gun not requiring a large capacity electric source or a large cooling mechanism, and an electron beam exposure transfer device using the electron gun. SOLUTION: An electron beam 2 emitted from a cathode 1 is accelerated by a positive voltage impressed on an extraction electrode 3 with respect to the cathode, and is emitted from an electron gun. A Wehnelt electrode 5 is provided around the cathode 1 to form a crossover where the electron beam 2 is focused by preventing the electron beam 2 from deflecting outward with a negative voltage with respect to the cathode 1. The electron beam emitted from the electron gun is accelerated by a cathode-earth voltage impressing power source 7 to use the electron beam for electron beam exposure transfer and the like. A first crossover is formed inside the extraction electrode 3 where an aperture 8 is provided to shield and absorb an electron beam 2' emitted from an end surface of the cathode, and positioned on the outer peripheral side of the crossover.

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