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1. 发明专利

JP2008205017A Exposure state display method and system 有权
标题翻译：暴露状态显示方法和系统
公开(公告)号：JP2008205017A
公开(公告)日：2008-09-04
申请号：JP2007036521
申请日：2007-02-16
申请人： Hitachi High-Tech Science Systems Corp , Hitachi High-Technologies Corp , 株式会社日立ハイテクサイエンスシステムズ , 株式会社日立ハイテクノロジーズ
发明人： KOIKE HIROTO , MOROKUMA HIDETOSHI , SHISHIDO CHIE
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70641 , G03F7/70508 , G03F7/70625
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for easily and visually determining which chip has a normal exposure condition, and which chip has an abnormal exposure condition in an FEM wafer.
SOLUTION: A characteristic amount in the shape of cross-section of resist pattern of the FEM wafer is calculated for each chip region of the FEM wafer from an image of resist pattern of the FEM wafer. The characteristic amount in the shape of cross-section is displayed for each chip in a list of chips as a map showing locations of chip regions of the FEM wafer. In the list of chips, a deviation of the characteristic amount in the shape of cross-section of resist pattern of the FEM wafer for the adequate value is shown with color-display images.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于容易且可视地确定哪个芯片具有正常曝光条件的装置，以及哪个芯片在有限元晶片中具有异常曝光条件。解决方案：根据FEM晶片的抗蚀剂图案的图像，对FEM晶片的每个芯片区域计算有限元晶片的抗蚀剂图案的横截面形状的特征量。以芯片列表中的每个芯片显示横截面形状的特征量作为示出FEM晶片的芯片区域的位置的映射。在芯片列表中，利用彩色显示图像示出了有限元晶片的抗蚀剂图案的抗蚀剂图案的截面形状的特征量的适当值的偏差。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007101551A Scanning electron microscope 审中-公开
标题翻译：扫描电子显微镜
公开(公告)号：JP2007101551A
公开(公告)日：2007-04-19
申请号：JP2006287787
申请日：2006-10-23
申请人： Hitachi High-Tech Science Systems Corp , Hitachi Ltd , 株式会社日立ハイテクサイエンスシステムズ , 株式会社日立製作所
发明人： NAKADA YOSHINORI , KOSHIHARA SHUNSUKE , TAMOCHI RYUICHIRO , HOSOYA YAYOI , MOROKUMA HIDETOSHI
IPC分类号： G01B15/00 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a scanning electron microscope which can achieve the entire process from fine adjustment to review through complete automation. SOLUTION: This scanning electron microscope is provided with the function of computing corrected precision after coordinates compensation to be displayed by using a vector 39, the function of automatically determining scale factor during search in automatic detection of foreign materials/defects after coordinates compensation from acquired information, and the function of computing appearance ratio of foreign materials/defects and time required from search scale factor and measuring conditions. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种扫描电子显微镜，可以通过完全自动化实现从微调到审查的整个过程。
解决方案：该扫描电子显微镜具有通过使用矢量39显示坐标补偿后计算校正精度的功能，在坐标补偿后自动确定比例因子的自动检测异物/缺陷的功能从获取的信息，以及计算外来材料的外观比例/缺陷和从搜索比例因子和测量条件所需的时间的功能。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2013008606A Mass spectrometer and mass analyzing method 有权
标题翻译：质谱仪和质谱分析方法
公开(公告)号：JP2013008606A
公开(公告)日：2013-01-10
申请号：JP2011141388
申请日：2011-06-27
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： KUMANO SHUN , SUGIYAMA MASUYUKI , HASHIMOTO YUICHIRO , HASEGAWA HIDEKI , YAMADA MASUYOSHI , MOROKUMA HIDETOSHI , HASHIBA SHUHEI
IPC分类号： H01J49/10 , G01N27/62 , H01J49/04
CPC分类号： H01J49/0409 , H01J49/0495
摘要： PROBLEM TO BE SOLVED: To enable ionization with inconsiderable fragmentation at a high sensitivity with a high throughput.SOLUTION: A mass spectrometer includes a sample attaching member for attaching a sample; an ionizing chamber including an introductory port of the sample attaching member and an ionization source for generating a sample ion; a vacuum chamber having a mass analyzer for analyzing the sample ion; and an opening/closing mechanism provided between the ionizing chamber and the vacuum chamber. The opening/closing mechanism is controlled from a closed state to an open state after the sample attaching member is introduced into the ionizing chamber.
摘要翻译：要解决的问题：以高产量的高灵敏度实现具有不可忽视的碎片化的电离。解决方案：质谱仪包括用于附着样品的样品附着构件; 电离室，其包括所述样品附着构件的导入口和用于产生样品离子的电离源; 具有用于分析样品离子的质量分析器的真空室; 以及设置在电离室和真空室之间的打开/关闭机构。样品安装构件被引入电离室之后，打开/关闭机构从关闭状态控制到打开状态。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2012216339A Mass spectrometer 有权
标题翻译：质谱仪
公开(公告)号：JP2012216339A
公开(公告)日：2012-11-08
申请号：JP2011079623
申请日：2011-03-31
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： NODA HIROYUKI , ONUMA MITSURU , SATO YOKO , ISHIGURO KOJI , MOROKUMA HIDETOSHI , OTSUKI SHIGEO , IBI NAMI
IPC分类号： H01J49/26
CPC分类号： H01J49/0022 , H01J49/0013 , H05K7/20136
摘要： PROBLEM TO BE SOLVED: To provide a small mass spectrometer with a sufficient heat-radiating effect and a good weight balance.SOLUTION: A weight material including a vacuum chamber 10, a vacuum pump 15 vacuuming the vacuum chamber 10, a sample insertion part 30, in which a sample to be measured is put and evaporated, and an ionization part for ionizing the evaporated sample and providing it to the vacuum chamber 10, and an ion detector connected to the vacuum chamber 10 is arranged at a center of a housing 100 having height dimension H smaller than lateral width dimension W and a depth dimension D smaller than the height dimension H. Circuit substrate housing parts 60 for distributing and housing plural circuit boards 50 are provided on both sides in the lateral width direction.
摘要翻译：要解决的问题：提供具有足够的散热效果和良好的重量平衡的小型质谱仪。解决方案：将真空室10，真空室10抽真空的真空泵15，待测量样品放置并蒸发的样品插入部30的重量材料和用于电离蒸发的样品并将其提供给真空室10，并且连接到真空室10的离子检测器布置在壳体100的中心，壳体100的高度尺寸H小于横向宽度尺寸W，深度尺寸D小于高度尺寸H 用于分配和容纳多个电路板50的电路基板壳体部分60设置在横向宽度方向上的两侧。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2010092869A Method of observing specimen 有权
标题翻译：观察样本的方法
公开(公告)号：JP2010092869A
公开(公告)日：2010-04-22
申请号：JP2009260569
申请日：2009-11-16
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MIYAMOTO ATSUSHI , TANAKA MAKI , MOROKUMA HIDETOSHI
IPC分类号： H01J37/22 , G01B15/04 , G01N23/00 , G01N23/225 , H01J37/147 , H01J37/28 , H01L21/66
CPC分类号： H01J37/28 , G01B15/04 , G01N23/2251 , H01J2237/226 , H01J2237/2814
摘要： PROBLEM TO BE SOLVED: To provide a method of accurately estimating an observation direction in specimen measurement, and carrying out shape measurement with higher accuracy and reproducibility. SOLUTION: A convergent electron beam is irradiated on a specimen with a known shape, electrons discharged from a specimen surface are detected, an image, which visualizes intensity of the detected electrons, is used, an incident direction of the convergent electron beam is estimated based on a geometric deformation on an image of the specimen with the known shape, and a 3D shape or a shape of a cross section of a specimen to be observed is obtained from an SEM image of the specimen to be observed by using information of the incident direction of the estimated convergent electron beam. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种准确估计样本测量中的观察方向并以更高精度和再现性进行形状测量的方法。解决方案：会聚电子束被照射在具有已知形状的样本上，检测从样本表面排出的电子，使用可视化检测到的电子强度的图像，会聚电子束的入射方向基于具有已知形状的样本的图像上的几何变形来估计，并且通过使用信息从待观察的样本的SEM图像获得待观察的样本的3D形状或截面形状的估计会聚电子束的入射方向。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2008256541A Charged particle system 有权
标题翻译：充电颗粒系统
公开(公告)号：JP2008256541A
公开(公告)日：2008-10-23
申请号：JP2007099363
申请日：2007-04-05
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SUGIYAMA AKIYUKI , MOROKUMA HIDETOSHI , HOJO MINORU , YOSHIZAWA YUKIO
IPC分类号： G01N23/225 , H01L21/66
CPC分类号： H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/265 , H01J37/28 , H01J37/3045 , H01J37/3174 , H01J2237/22 , H01J2237/2817 , H01J2237/31745
摘要： PROBLEM TO BE SOLVED: To provide a charged particle system capable of comparing easily an actual pattern with an ideal pattern by utilizing CAD data not only two-dimensionally but also three-dimensionally.
SOLUTION: An ideal pattern (for example, design data such as CAD data) is converted from two-dimensional display to three-dimensional display by using information of an irradiation angle to a sample of a charged particle beam, and displayed together with an observation image. Comparison of both images is easy, when being overlapped. As the ideal pattern, an exposure mask pattern based on an exposure mask when performing exposure on a semiconductor wafer, and an exposure simulation pattern based on exposure simulation on the basis of the exposure mask and an exposure condition, or the like, can be used other than a circuit pattern (CAD data) based on design information of a semiconductor, and at least one of them is displayed three-dimensionally.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够通过不仅二维地而且三维地利用CAD数据而容易地将实际图案与理想图案进行比较的带电粒子系统。
解决方案：通过使用与带电粒子束的样本的照射角度的信息将理想图案（例如，CAD数据的设计数据）从二维显示转换为三维显示，并一起显示带有观察图像。当重叠时，两张图像的比较很容易。作为理想图案，可以使用在半导体晶片上进行曝光时基于曝光掩模的曝光掩模图案和基于曝光掩模和曝光条件的曝光模拟等的曝光模拟图案。除了基于半导体的设计信息的电路图案（CAD数据）之外，并且其三个中的至少一个被三维地显示。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2007256225A Pattern matching method and computer program for executing pattern matching 有权
标题翻译：图案匹配方法和计算机程序执行模式匹配
公开(公告)号：JP2007256225A
公开(公告)日：2007-10-04
申请号：JP2006084445
申请日：2006-03-27
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： SUGIYAMA AKIYUKI , SHINDO HIROYUKI , KOMURO HITOSHI , SUTANI TAKUJI , MOROKUMA HIDETOSHI
IPC分类号： G01N23/225 , G06T1/00 , G06T7/00 , G06T7/60 , H01L21/66
CPC分类号： G06K9/6204 , G06K9/4633
摘要： PROBLEM TO BE SOLVED: To provide a pattern matching method which enables the selection of an appropriate object pattern to be measured even on a sample including a periodic structure, and to provide a computer program for bringing a computer to execute the above pattern matching.
SOLUTION: The pattern matching method for executing a matching operation between a first image and a second image based on design data of the sample being an object, comprises: determining whether or not the periodic structure is included in a region to be subjected to the matching operation; and carrying out a pattern selection, based on a distance between the original point being set in the image and the pattern making up the periodic structure in the case of including the periodic structure, and based on a matching rate of the pattern in the image in the case of including no periodic structure.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种模式匹配方法，即使在包括周期性结构的样本上也能够选择要测量的适当对象图案，并且提供用于使计算机执行上述图案的计算机程序匹配。解决方案：用于基于作为对象的样本的设计数据执行第一图像和第二图像之间的匹配操作的图案匹配方法包括：确定周期性结构是否包括在要受影响的区域中到匹配操作; 并且基于在图像中设置的原始点之间的距离和构成周期性结构的图案在包括周期性结构的情况下执行图案选择，并且基于图像中的图案的匹配率不包括周期性结构的情况。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2005064023A Exposure process monitor method 有权
标题翻译：曝光过程监控方法
公开(公告)号：JP2005064023A
公开(公告)日：2005-03-10
申请号：JP2003207252
申请日：2003-08-12
申请人： Hitachi High-Technologies Corp , Hitachi Ltd , 株式会社日立ハイテクノロジーズ , 株式会社日立製作所
发明人： SHISHIDO CHIE , MOROKUMA HIDETOSHI , KOJIMA TAKEKI , TANAKA MAKI , NAGATOMO WATARU
IPC分类号： H01L21/66 , G03C5/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70641 , G03F7/705 , G03F7/70625 , Y10S430/143
摘要： PROBLEM TO BE SOLVED: To provide a means which successfully monitors/controls variation (deviation of light exposure and focal position) of exposure qualification in an exposure process monitor.
SOLUTION: A pattern having high isolating property (isolated line pattern etc.) wherein variation of cross section shape by variation of light exposure and focal source position is large is made an object to be observed. Especially, in order to catch variation of resist cross section shape which changes from forward taper to inverse taper, observation data are acquired by any one of observation methods: (1) a tilt image of a resist pattern is picturized by using an inclination image pick-up electron microscope; (2) the electronic beam image of the resist pattern is picturized on an image pick-up qualification which produces asymmetry on an electronic beam signal wave; and (3) dispersion characteristic data of the resist pattern are acquired with optical measurement system. The acquired data are applied to model data which are formed by applying exposure qualification beforehand, so that variation of light exposure and focal position is presumed.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供在曝光过程监视器中成功监控/控制曝光资格的变化（曝光和焦点位置的偏差）的手段。解决方案：具有高隔离性的图案（隔离线图案等），其中通过曝光和焦点位置的变化的横截面形状的变化大，成为观察对象。特别是，为了捕捉从正向锥度向逆锥形变化的抗蚀剂截面形状的变化，通过观察方法中的任一种来获取观察数据：（1）通过使用倾斜图像拾取法来抗蚀图案的倾斜图像电子显微镜; （2）抗电影图案的电子束图像是在电子束信号波上产生不对称的图像拾取鉴定图像上拍摄的; 和（3）光学测量系统获得抗蚀剂图案的色散特征数据。所获取的数据被应用于通过预先施加曝光资格形成的模型数据，从而推测曝光和焦点位置的变化。版权所有（C）2005，JPO＆NCIPI

9. 发明专利

JP2013069693A Method of observing specimen 有权
标题翻译：观察样本的方法
公开(公告)号：JP2013069693A
公开(公告)日：2013-04-18
申请号：JP2012252852
申请日：2012-11-19
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MIYAMOTO ATSUSHI , TANAKA MAKI , MOROKUMA HIDETOSHI
IPC分类号： H01J37/22 , G01B15/04 , G01N23/00 , G01N23/225 , H01J37/28
CPC分类号： H01J37/28 , G01B15/04 , G01N23/2251 , H01J2237/226 , H01J2237/2814
摘要： PROBLEM TO BE SOLVED: To perform high accuracy measurement by accurately estimating an observation direction when measuring a three-dimensional size or shape while observing a specimen from an oblique direction by using SEM.SOLUTION: A convergent electron beam is radiated on a specimen with a known shape. Electrons discharged from a specimen surface are detected. By using an image, which visualizes intensity of the detected electrons, an incident direction of the convergent electron beam is estimated on the basis of a geometric deformation on the image of the specimen with the known shape. And a three-dimensional shape or a shape of a cross section of a specimen to be observed is obtained from an SEM image of the specimen to be observed by using information of the estimated incident direction of the convergent electron beam.
摘要翻译：要解决的问题：通过使用SEM从倾斜方向观察样本时，通过精确地估计三维尺寸或形状的观察方向，进行高精度测量。解决方案：会聚电子束辐射在具有已知形状的样品上。检测从样品表面排出的电子。通过使用可视化检测到的电子的强度的图像，基于已知形状的样本的图像上的几何变形来估计会聚电子束的入射方向。并且通过使用收敛电子束的估计的入射方向的信息，从要观察的样本的SEM图像获得要观察的样本的三维形状或截面形状。版权所有（C）2013，JPO＆INPIT

10. 发明专利

JP2012178359A Imaging method and imaging apparatus 有权
标题翻译：成像方法和成像装置
公开(公告)号：JP2012178359A
公开(公告)日：2012-09-13
申请号：JP2012109073
申请日：2012-05-11
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MIYAMOTO ATSUSHI , NAGATOMO WATARU , MATSUOKA RYOICHI , MOROKUMA HIDETOSHI
IPC分类号： H01J37/22
CPC分类号： G01N23/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/1536 , H01J2237/216 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a scanning electron microscope device having a function to produce precisely and rapidly an imaging recipe having an equal or better performance than an imaging recipe produced manually by SEM operators based on their own unique know-how, and to provide an imaging method using the same.SOLUTION: (1) Points of imaging point, coordinates, size/shape, image sequence, a photographing position changing method, a photographing condition, and a part or the whole of the imaging sequence for observation are automatically calculated from CAD data. (2) Combination of input information and output information for producing an imaging recipe is made possible to set arbitrarily. (3) Success/failure determination to imaging or processing in an arbitrary imaging point is carried out, and when determined as failure, relief processing to make successful the imaging or processing is carried out by changing the imaging point and the imaging sequence.
摘要翻译：要解决的问题：提供一种扫描电子显微镜装置，其具有能够精确而快速地产生具有与由SEM操作者手动生成的成像配方相同或更好的成像的成像配方，其基于它们自己独特的专有技术，并提供使用该成像方法的成像方法。解决方案：（1）从CAD数据自动计算成像点，坐标，尺寸/形状，图像序列，拍摄位置改变方法，拍摄条件以及用于观察的成像序列的一部分或全部。（2）可以任意地设定用于产生成像配方的输入信息和输出信息的组合。（3）在任意成像点进行成像/处理的成功/失败确定，当确定为故障时，通过改变成像点和成像序列来进行成功或成像处理的浮雕处理。版权所有（C）2012，JPO＆INPIT

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