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1. 发明专利

JP2007101551A Scanning electron microscope 审中-公开
标题翻译：扫描电子显微镜
公开(公告)号：JP2007101551A
公开(公告)日：2007-04-19
申请号：JP2006287787
申请日：2006-10-23
申请人： Hitachi High-Tech Science Systems Corp , Hitachi Ltd , 株式会社日立ハイテクサイエンスシステムズ , 株式会社日立製作所
发明人： NAKADA YOSHINORI , KOSHIHARA SHUNSUKE , TAMOCHI RYUICHIRO , HOSOYA YAYOI , MOROKUMA HIDETOSHI
IPC分类号： G01B15/00 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a scanning electron microscope which can achieve the entire process from fine adjustment to review through complete automation. SOLUTION: This scanning electron microscope is provided with the function of computing corrected precision after coordinates compensation to be displayed by using a vector 39, the function of automatically determining scale factor during search in automatic detection of foreign materials/defects after coordinates compensation from acquired information, and the function of computing appearance ratio of foreign materials/defects and time required from search scale factor and measuring conditions. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种扫描电子显微镜，可以通过完全自动化实现从微调到审查的整个过程。
解决方案：该扫描电子显微镜具有通过使用矢量39显示坐标补偿后计算校正精度的功能，在坐标补偿后自动确定比例因子的自动检测异物/缺陷的功能从获取的信息，以及计算外来材料的外观比例/缺陷和从搜索比例因子和测量条件所需的时间的功能。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2001325911A SAMPLE PLATFORM AND SCANNING ELECTRON MICROSCOPE EQUIPPED WITH THE SAMPLE PLATFORM 失效
公开(公告)号：JP2001325911A
公开(公告)日：2001-11-22
申请号：JP2000144573
申请日：2000-05-12
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： MUTO ATSUSHI , YAMADA MITSUHIKO , TAMOCHI RYUICHIRO , SUZUKI TAKEO , KUMADA TAKAO , KOSHIHARA SHUNSUKE
IPC分类号： G01N23/225 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To provide a sample platform which has the function of dispersing fine particles at stage of fixing fine particles suspended in liquid on a sample platform. SOLUTION: With the sample platform for the scanning electron microscope, a method is adopted to drop, dry and fix slurries by setting a patterned indented surface at a position where the slurries are to be dropped.

3. 发明专利

JP2002261136A METHOD FOR INSPECTING FOREIGN MATTER 失效
公开(公告)号：JP2002261136A
公开(公告)日：2002-09-13
申请号：JP2001054671
申请日：2001-02-28
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： HOSOYA YAYOI , KOSHIHARA SHUNSUKE , NAKADA YOSHINORI , AOKI KAZUO
IPC分类号： G01N23/225 , G01N21/956 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To easily and surely determine whether foreign matters are critical to a process for forming a pattern. SOLUTION: A secondary electron profile 29 only for the foreign matters is obtained from a secondary electron profile 28 of the foreign matters portion in a sample image 26 and a secondary electron profile 27 of the same portion in a reference image 21. By examining the overlapping 30 of peak waveforms of the secondary electron profile 27 only for the pattern and the secondary electron profile 29 only for the foreign matters, positions where the foreign matters 25a comes in contact with the pattern 23 is detected and whether the foreign matters are critical to the process is determined.

4. 发明专利

JP2001033231A SAMPLE MEASURING DEVICE 失效
公开(公告)号：JP2001033231A
公开(公告)日：2001-02-09
申请号：JP20723399
申请日：1999-07-22
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： KOSHIHARA SHUNSUKE , TAMOCHI RYUICHIRO , KUROSAWA KOICHI , MIZUNO TAKESHI , UEDA KAZUHIRO
IPC分类号： H01J37/22 , G01B11/24 , G01B15/04 , G06T1/00 , G06T7/00 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To make automatically performable multipoint measurement of a semiconductor wafer by storing an enlarged image when the degree of matching between the shape of a specified part of an enlarged image and the shape of a specified part of a sample image is out of a threshold. SOLUTION: A primary electron beam 4 drawn out by a draw-out voltage applied across a cathode 1 and a first anode 2 is accelerated by voltage Vacc applied to a second anode 3 to advance to a lens system. A scanning signal of a deflecting coil 8 is controlled according to an observation magnification by a deflection control device 9. A secondary electron 10 generated from the sample by the primary electron beam scanning on a wafer 7 is detected by a secondary electron detector 11. The secondary electron information detected by the secondary electron detector 1 is amplified by an amplifier 12 and displayed on a CRT 13. For multipoint measurement, an X-Y stage for moving the wafer 7 in the vertical direction to the radiating direction of the primary electron beam 4 and an image shift function of largely moving the irradiation portion of the primary electron beam 4 are provided.

5. 发明专利

JPH08212963A ENERGY DISPERSING X-RAY DETECTING DEVICE 失效
公开(公告)号：JPH08212963A
公开(公告)日：1996-08-20
申请号：JP30094495
申请日：1995-11-20
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： KOSHIHARA SHUNSUKE , SATO MITSUGI , SUZUKI NAOMASA
IPC分类号： G01N23/225 , H01J37/252
摘要： PURPOSE: To provide an energy dispersing X-ray detecting device which can perform X-ray analysis of high sensitivity without worsening resolution, in a scanning electron microscope of system arranging a sample in an objective lens magnetic field. CONSTITUTION: An EDX detector device, provided with a detector element 12 and a collimator 13 positioned before this detector element, is used to detect an X-ray by arranging at least partly the collimator 13 in a leakage field of a field type objective lens. The collimator 13, in a cylindrical shape formed of non-magnetic material, has an irregular structure in the internal wall. A material of small generating a secondary electron due to electron irradiation, is applied to the internal wall of the collimator, or the collimator itself is made of material small generating an electron.

6. 发明专利

JP2001338601A SCANNING ELECTRON MICROSCOPE 失效
公开(公告)号：JP2001338601A
公开(公告)日：2001-12-07
申请号：JP2000159062
申请日：2000-05-29
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： NAKADA YOSHINORI , KOSHIHARA SHUNSUKE , TAMOCHI RYUICHIRO , HOSOYA YAYOI , MOROKUMA HIDETOSHI
IPC分类号： G01N23/225 , G01Q10/00 , G01Q30/02 , G01Q30/04 , G01Q30/06 , G21K7/00 , H01J37/20 , H01J37/26 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a scanning electron microscope which can completely automatically perform from fine adjustment to reviewing. SOLUTION: Functions of calculating a compensation accuracy after a coordinate compensation and displaying it with a vector 39, of determining magnifying ratio automatically in automatically detecting foreign goods/defects after the compensation from the informations gained, and of calculating incidence of foreign goods/defects and time needed from the search magnifying factor and measurement conditions are provided.

7. 发明专利

JPH07288095A SCANNING ELECTRON MICROSCOPE 失效
公开(公告)号：JPH07288095A
公开(公告)日：1995-10-31
申请号：JP7835794
申请日：1994-04-18
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： KOSHIHARA SHUNSUKE , YAMADA MITSUHIKO
IPC分类号： C22C19/03 , H01J37/20 , H01J37/28
摘要： PURPOSE:To prepare a cross-cut section of an optional part of a sample with high accuracy while observing it by a secondary electron image by using shape memory alloys capable of easily controlling stress to the sample in a sample cross-cut section preparing mechanism. CONSTITUTION:Shape memory alloys 5 are used in a cross-cut section preparing mechanism 4, and a sample 3 is arranged in the shape of being sandwiched by the two alloys 5. The sample 3 fixed by sample press-down springs 1 and sample fixing stands 2 is divided and cut by the mechanism 4, and after a cross-cut section is prepared, the alloys 5 are heated by heaters 6, and contract downward. At this time, the springs 1 are fixed to fixing plates 7, and a preparing cross-cut section sample can be observed. Motive power of a motor 8 is transmitted to a caterpillar 17 through shafts 9 and 10 gears 11, 12, 13, 14, 15 and 16, and the mechanism 4 can be moved to an optional part. Thereby, a cross-cut section or the like of a semiconductor film sample having high chemical activity can be observed without being influenced by pollution of the sample, and an optional part of the sample 3 can be accurately divided and cut.

8. 发明专利

JPH06267485A SCANNING ELECTRON MICROSCOPE 失效
公开(公告)号：JPH06267485A
公开(公告)日：1994-09-22
申请号：JP5542193
申请日：1993-03-16
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： KOSHIHARA SHUNSUKE , SHINOHARA MINORU
IPC分类号： H01J37/244 , H01J37/252
摘要： PURPOSE:To detect a proper amount of X-ray by providing a rotatable or slidable X-ray passage preventive plate having a plurality of X-ray passing holes which have different hole diameters between a sample and an energy dispersion type X-ray analyzer. CONSTITUTION:Incident electrons 2 produced from a filament 1 is applied to a sample 5, thereby producing characteristic X-rays 6a, 6b, 6c. At that time, optimal conditions are selected in a CPU 13 from the information of a Faraday's cup 10 to transmit a signal to a motor 9, which passes through a D/A converter and an amplifier 15 to rotate the X-ray passage preventive plate 7. Thereby, the X-ray passing hole of a proper hole diameter is selected from the plural X-ray passage holes 16a, 16b, 16c, 16d made in the X-ray passage preventive plate 7. Excessive characteristic X-rays 6b, 6c are not detected by the energy dispersion type X-ray detector 8 but only the characteristic X-ray 6a is detected. As a result, the simultaneous analysis of the energy dispersion type X-ray analyzer and a wavelength dispersion type X-ray analyzer circuit can be performed.

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