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1. 发明专利

JP2014211440A 表面検査装置およびその方法有权
标题翻译：用于表面检查的装置和方法
公开(公告)号：JP2014211440A
公开(公告)日：2014-11-13
申请号：JP2014113696
申请日：2014-06-02
申请人：株式会社日立製作所 , Hitachi Ltd , 株式会社日立ハイテクノロジーズ , Hitachi High-Technologies Corp
发明人： ISHIMARU ICHIRO , NOGUCHI MINORU , MORIYAMA ICHIRO , TANABE YOSHIKAZU , HACHIKAKE YASUO , KENBO YUKIO , WATANABE KENJI , TSUCHIYAMA HIROSHI
IPC分类号： G01N21/88 , G01B11/02 , G01B11/30 , G01N21/84 , G01N21/956 , H01L21/027
CPC分类号： G01B11/02 , G01B11/30 , G01N21/84 , G01N21/88 , G01N21/95 , H01L21/30
摘要：【課題】半導体製造や磁気ヘッド製造において、被加工対象物(例えば、半導体基板上の絶縁膜)に対してCMPなどの研磨または研削加工を施した際、その表面に生じる様々な形状を有するスクラッチと付着する異物とを弁別して検査することができるようにした表面検査装置およびその方法を提供することにある。【解決手段】本発明は、研磨または研削された絶縁膜の表面に発生したスクラッチや異物に対してほぼ同じ光束で落射照明と斜方照明とを行い、該落射照明時と斜方照明時との間において浅いスクラッチと異物とから発生する散乱光強度の変化を検出することによって浅いスクラッチと異物とを弁別し、さらに、前記落射照明時における散乱光の指向性を検出することによって線状スクラッチと異物とを弁別することを特徴とする表面検査方法およびその装置である。【選択図】図1
摘要翻译：要解决的问题：提供一种表面检查装置和表面检查方法，该表面检查装置和表面检查方法可以鉴别出附着在外部材料上的处理物体（例如，半导体基板上的绝缘体膜）的表面上出现的各种形状的划痕在半导体制造和磁头制造中对被处理物进行抛光或研磨处理（例如CMP）进行检查。本发明的表面检查方法对划痕和外来物进行表面照明和倾斜照明在具有大致相等的光通量的抛光或接地绝缘体膜的表面上发生的材料，并且检测由外部光照时间和倾斜照明时间之间的浅划痕和异物产生的散射光的强度变化，从而区分来自异物的浅划痕。该方法通过检测外照射时间中的散射光的方向性来进一步鉴别异物的线性划痕。还提供了该方法的设备。

2. 发明专利

JP2010001142A Elevator group control system 有权
标题翻译：电梯集团控制系统
公开(公告)号：JP2010001142A
公开(公告)日：2010-01-07
申请号：JP2008162672
申请日：2008-06-23
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YOSHIKAWA TOSHIFUMI , TOYABE SATOSHI , HOSHINO TAKAMICHI , AIDA KEIICHI , WATANABE KENJI , KUMADA KAZUYA , NISHIDA TAKEHITO
IPC分类号： B66B1/18 , B66B3/00
摘要： PROBLEM TO BE SOLVED: To improve operation efficiency and transport efficiency of a car as the whole system even if an elevator hall is likely to be crowded locally because of a small elevator hall. SOLUTION: In this elevator group control system, a plurality of elevators 3A, 3B are arranged in the elevator hall, a destination floor registration device 5A for registering a destination floor is provided, and an elevator in response to the registered destination floor, of the plurality of elevators, is allocated. When an allowable value for the number of passengers waiting is determined with respect to each of the elevators 3A, 3B and a new destination floor is registered, the elevator allotted with reference to the determined allowable value for the number of passengers waiting is selected. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提高作为整个系统的汽车的运行效率和运输效率，即使电梯厅由于小电梯厅而可能在本地拥挤。解决方案：在该电梯组控制系统中，多个电梯3A，3B布置在电梯厅中，提供用于登记目的地楼层的目的地楼层登记装置5A，并且响应于登记的目的地楼层的电梯，分配多个电梯。当对于每个电梯3A，3B确定了等待人数的允许值，并且登记了新的目的地楼层时，选择了参照所确定的等待乘客人数允许值分配的电梯。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2006201179A Surface inspection device and its method 有权
标题翻译：表面检测装置及其方法
公开(公告)号：JP2006201179A
公开(公告)日：2006-08-03
申请号：JP2006028261
申请日：2006-02-06
申请人： Hitachi High-Technologies Corp , Hitachi Ltd , 株式会社日立ハイテクノロジーズ , 株式会社日立製作所
发明人： ISHIMARU ICHIRO , NOGUCHI MINORU , MORIYAMA ICHIRO , TANABE YOSHIKAZU , HACHIKAKE YASUO , KENBO YUKIO , WATANABE KENJI , TSUCHIYAMA YOJI
IPC分类号： G01N21/956 , G01B11/30 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a surface inspection device and its method where a scratch, having various shapes occurring on the surface of a processed object (for example, an insulating film on a semiconductor substrate) and an adhering foreign substance are discriminated and inspected, when the processed object is polished or ground through CMP or the like, in the manufacturing of semiconductors or of magnetic heads. SOLUTION: In the surface inspection method and its device, epi-illumination and oblique illumination are applied to the scratch and the foreign substance occurring on the surface of the polished or ground insulating film with substantially the same luminous flux, a shallow scratch and foreign substance are discriminated by detecting variation of the intensity of the scattered light generated from the shallow scratch and foreign substance between the epi-illumination and oblique illumination, and a linear scratch and foreign substance are discriminated, by detecting the directivity of the scattered light in the epi-illumination. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决问题：提供一种表面检查装置及其方法，其中在加工对象（例如半导体基板上的绝缘膜）的表面上出现各种形状的刮痕和附着的异物为通过CMP等对被处理物进行抛光或研磨时，在半导体或磁头的制造中进行鉴别和检查。解决方案：在表面检查方法及其装置中，外露照明和倾斜照明被施加到具有基本上相同的光通量的抛光或接地绝缘膜的表面上产生的划痕和异物，浅划痕通过检测从外部照明和倾斜照明之间的浅划痕和异物产生的散射光的强度的变化来区分外来物质，并且通过检测散射光的方向性来区分线性划痕和异物在epi照明。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2004138012A Fuel vaporization accelerator and internal combustion engine equipped with the same 审中-公开
公开(公告)号：JP2004138012A
公开(公告)日：2004-05-13
申请号：JP2002305262
申请日：2002-10-21
申请人： Hitachi Car Eng Co Ltd , Hitachi Ltd , 株式会社日立カーエンジニアリング , 株式会社日立製作所
发明人： AMO KIYOSHI , SAEKI HIROAKI , WATANABE KENJI , ICHIHARA TAKANOBU , MAEDA NAOHIRO
IPC分类号： F02M31/16 , F02M31/125 , F02M31/18 , F02M51/06 , F02M53/02 , F02M69/00
摘要： PROBLEM TO BE SOLVED: To provide a small size fuel vaporization accelerator capable of increasing fuel vaporization amount without increasing heater capacity and heater heat transfer area in a fuel vaporization accelerator for an internal combustion engine in which further improvement of fuel vaporization capacity is required at the heat transfer surface when fuel injection quantity from a fuel injection valve is increased. SOLUTION: A flanged restrictor 220b is provided on the heat transfer surface 76 as an auxiliary passage 75 in the fuel vaporization accelerator 100. Consequently, thickness of fuel film can be almost equal and a contact surface of the heater heat transfer surface and the fuel film can be increased, resident time of the fuel film 106 injected to the heat transfer surface 76 on the heat transfer surface 76 can be increased, and quantity of heat transferred to the fuel film 106 from the heat transfer surface can be increased. COPYRIGHT: (C)2004,JPO

5. 发明专利

JP2002206471A FUEL SUPPLY DEVICE AND INTERNAL COMBUSTION ENGINE LOAD WITH THE SAME 失效
公开(公告)号：JP2002206471A
公开(公告)日：2002-07-26
申请号：JP2001005017
申请日：2001-01-12
申请人： HITACHI LTD , HITACHI CAR ENG CO LTD
发明人： AMO KIYOSHI , OKAMOTO YOSHIO , KADOMUKAI YUZO , NAGANO MASAMI , ICHIHARA TAKANOBU , WATANABE KENJI , SAEKI HIROAKI , SOMENO TEI
IPC分类号： F02M31/135 , F02D9/02 , F02D41/04 , F02M35/104 , F02M69/00 , F02M69/32
摘要： PROBLEM TO BE SOLVED: To realize fine atomization and even distribution of the injecting fuel, when warming up. SOLUTION: A warming-up fuel injection valve 507 is provided, so that a nozzle 509 is positioned inside of a recessed part 220 formed in a throttle body 206, opening in a main passage 205. A high concentration distribution part of the fuel injection 511 injected from the warming up fuel injection valve joins with the intake air 223 flowing at a relatively high speed inside the main passage.

6. 发明专利

JP2002144079A REPAIRING METHOD OF HEAT RESISTANT MEMBER AND REPAIRING METHOD OF GAS TURBINE 失效
公开(公告)号：JP2002144079A
公开(公告)日：2002-05-21
申请号：JP2000344246
申请日：2000-11-10
申请人： HITACHI LTD
发明人： FUKUMAKI TAKASHI , ARIKAWA HIDEYUKI , WATANABE KENJI , MORITOMO YOSHIKAZU
IPC分类号： B23P6/00 , B23K35/30 , B23P6/04 , C22C19/05 , F01D5/28 , F02C7/00
摘要： PROBLEM TO BE SOLVED: To provide a repairing method of a heat resistant member in which a void of a crack-repaired part can be considerably reduced by unifying a wet extension of a brazing filler metal when repairing a cracked part, and a repairing method of a gas turbine. SOLUTION: In this repairing method for repairing the cracked part of the heat resistant member by the brazing filler metal, the brazing filler metal is placed on the cracked part of the heat resistant member, and heated and maintained at the solid phase temperature lower than the melting point of the brazing filler metal lower than 200 deg.C, and heated and melted at the temperature higher than the melting point of the brazing filler metal or the liquid phase temperature of the brazing filler metal lower than 30 deg.C, and heated and maintained at the temperature higher than the heating and melting temperature by 50-100 deg.C compared with diffusion heating. This repairing method is used for repairing a rotor blade and a stator blade of the gas turbine.

7. 发明专利

JP2002138927A FLUID CONTROL VALVE FOR INTERNAL COMBUSTION ENGINE 失效
公开(公告)号：JP2002138927A
公开(公告)日：2002-05-17
申请号：JP2000333464
申请日：2000-10-31
申请人： HITACHI LTD , HITACHI CAR ENG CO LTD
发明人： WATANABE KENJI , SAEKI HIROAKI
IPC分类号： F02M69/32
摘要： PROBLEM TO BE SOLVED: To provide a fluid control valve for an internal combustion engine that does not require a temperature correction. SOLUTION: This fluid control valve comprises a servomechanism adapted to drive axially a shaft 3 with a valve element 4 mounted thereon by a control pressure acting on a diaphragm 10. A stepping motor SM controls a position of the valve element 4. The stepping motor SM is driven by a pulse signal from a control unit 20. Even when a coil resistance is changed by temperature, a controlled volume of a rotator at one step of the stepping motor SM does not change, therefore a shaft 13 is not influenced by a change in temperature resistance of a coil.

8. 发明专利

JP2002090312A DEFECT ANALYSIS SYSTEM 失效
公开(公告)号：JP2002090312A
公开(公告)日：2002-03-27
申请号：JP2000287081
申请日：2000-09-21
申请人： HITACHI LTD
发明人： SHIMODA ATSUSHI , ISHIMARU ICHIRO , TAKAGI YUJI , OBARA KENJI , NAKAGAKI AKIRA , WATANABE KENJI
IPC分类号： G01N21/956 , G01N1/28 , G01N1/32 , G01N33/00 , G01N35/00 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To efficiently sort inspected objects having new defects hard to solve by conventional knowledge, out of a large number of objects to be inspected. SOLUTION: This analysis system for defects detected in a plurality of objects to be inspected has an appearance inspection device 100 for detecting defective parts in the inspected objects; a defect classifying device 200 for detecting detailed information in the defective parts and classifying the defects into known defects whose appearance is confirmed, and new defects whose appearance is not confirmed; and a defect analysis device 300 for accepting the assignment of the inspected objects and analyzing the assigned inspected objects. The appearance inspection device 100, the defect classifying device 200 and the defect analysis device 300 can have display devices for displaying the number of defects every classification including the new defects.

9. 发明专利

JP2002043385A SEMICONDUCTOR WAFER HAVING TEST PATTERN, METHOD FOR INSPECTING SEMICONDUCTOR WAFER, METHOD FOR MANAGING MANUFACTURING PROCESS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR 失效
公开(公告)号：JP2002043385A
公开(公告)日：2002-02-08
申请号：JP2000226859
申请日：2000-07-27
申请人： HITACHI LTD
发明人： TANAKA MAKI , WATANABE MASAHIRO , HIROI TAKASHI , SHISHIDO CHIE , KUNI TOMOHIRO , WATANABE KENJI , SUGIMOTO ARITOSHI , NOZOE MARI
IPC分类号： G01R31/28 , H01L21/66 , H01L21/822 , H01L27/04
摘要： PROBLEM TO BE SOLVED: To provide a test pattern with which a circuit pattern can be inspected for defects with high sensitivity in a semiconductor manufacturing process, a method for detecting defect, and a method for managing manufacturing process both of which use the test pattern. SOLUTION: The variation of the misalignment amounts of an interlayer pattern is monitored from the occurring amounts of defects in the misalignment amounts of a plurality of test patterns having different misalignment amounts. Alternatively, defects such as short circuits, continuity defects, short circuits caused by foreign matters, etc., are detected by forming test patterns having different circuit patterns.

10. 发明专利

JP2001189358A HIGH-POWER IMAGE AUTOMATIC COLLECTION METHOD AND SYSTEM OF SEMICONDUCTOR WAFER DEFECT 失效
公开(公告)号：JP2001189358A
公开(公告)日：2001-07-10
申请号：JP37266199
申请日：1999-12-28
申请人： HITACHI LTD
发明人： SHISHIDO CHIE , TAKAGI YUJI , SHIMODA ATSUSHI , OBARA KENJI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO , BABA HIDEHARU , WATANABE KENJI
IPC分类号： G01B11/30 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To solve the problems, in which long time and labor are required to carry out review operation for improvement in quality and yield of a semiconductor because an inspection device indicates a large number of defects, and cope especially with the operation among the review operation to collect high magnification images by the use of a microscope system for strong desire for automation. SOLUTION: The inspection device detects defects in a semiconductor wafer through a comparison inspection in which repeated patterns are compared with each other taking advantage of the repeatability of the patterns formed on the semiconductor wafer, so that data as to what part of the defects shoud be compared with each other for detection of defects are stored in the check device. Then, not only the data on defects but also the data on objects of comparison are included in data on inspection result in a microscope system, the image of a defect and the image of an object of comparison are detected, based on the data on the object of comparison, and the images are compared with each other to locate the position of the defect.

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