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    • 1. 发明专利
    • 歪検知装置及びその製造方法
    • 失真检测装置及其制造方法
    • JP2015052571A
    • 2015-03-19
    • JP2013186705
    • 2013-09-09
    • 株式会社東芝Toshiba Corp
    • ASANO YUSAKUHIGUCHI KAZUTOMIYAGI TAKESHIHIGASHI YOSHIHIROHARA MICHIKOFUKUZAWA HIDEAKIKII MASAYUKIFUJISAWA EIZO
    • G01B7/24H01L43/02H01L43/08
    • G01L1/125
    • 【課題】磁気シールド特性に優れた製品を生産性高く提供することができる歪検知装置及びその製造方法を提供すること。【解決手段】実施形態に係る歪検知装置は、基板と、蓋部と、枠部と、検知部と、を含む。基板は、第1面を有する。蓋部は、第1面の上に設けられる。枠部は、基板と蓋部との間に設けられ、磁性体を含み、非導通性である。検知部は、基板と蓋部との間であって枠部の内側に設けられ、磁気抵抗効果素子を有する。検知部は、固体部と、磁気抵抗効果素子が設けられた可動部と、を有する。磁気抵抗効果素子は、磁化の向きが第1面に沿った方向に固定された固定層と、磁化の向きが固定されていない自由層と、を有する。【選択図】図1
    • 要解决的问题:提供一种能够以高生产率提供具有优异的磁屏蔽性能的产品的失真检测装置及其制造方法。根据实施例的失真检测装置包括基板,盖部分, 框架部分和检测部分。 基板包括第一表面。 盖部分设置在第一表面上。 框架部分设置在基板和盖部分之间,包括磁性物质,并且是不导电的。 检测部设置在基板和盖部之间以及框架部内部,并且包括磁阻效应元件。 检测部分还包括实心部分和设置有磁阻效应元件的可移动部分。 磁阻效应元件包括其中沿着第一表面的方向上固定磁化方向的固定层和其中磁化方向不固定的自由层。
    • 4. 发明专利
    • Light source device using semiconductor light-emitting device
    • 使用半导体发光器件的光源器件
    • JP2013077852A
    • 2013-04-25
    • JP2013016224
    • 2013-01-30
    • Toshiba Corp株式会社東芝
    • NISHIUCHI HIDEOHIGUCHI KAZUTOOBATA SUSUMUNAKAYAMA TOSHIYA
    • H01L33/64
    • PROBLEM TO BE SOLVED: To provide a light source device using a small semiconductor light-emitting device and having a high heat radiation property.SOLUTION: According to one embodiment, provided is a light source device having a semiconductor light-emitting device, a mounting substrate, a first connection material, and a second connection material. The semiconductor light-emitting device includes a light-emission part, a first conductive part, a second conductive part, an encapsulation part, and an optical layer. The mounting substrate includes a base substance, a first substrate electrode and a second substrate electrode. The connection materials electrically connect between the conductive parts and the substrate electrodes. The first and second conductive parts include first and second pillar parts electrically connected with an electrode of the light-emission part and erected on a second principal surface. The encapsulation part covers lateral faces of the first and second conductive parts. The optical layer includes a wavelength converter and is provided on an opposite side to the second principal surface, of a semiconductor lamination body. An area of the second substrate electrode is one hundred times as large as a cross sectional area of the second pillar part. A vertical length and a lateral length of a planar shape of the first substrate electrode and the second substrate electrode are equal to each other.
    • 解决的问题:提供一种使用小型半导体发光装置并具有高散热性的光源装置。 解决方案:根据一个实施例,提供了一种具有半导体发光器件,安装衬底,第一连接材料和第二连接材料的光源器件。 半导体发光器件包括发光部分,第一导电部分,第二导电部分,封装部分和光学层。 安装基板包括基体,第一基板电极和第二基板电极。 连接材料在导电部件和基板电极之间电连接。 第一和第二导电部分包括与发光部分的电极电连接并竖立在第二主表面上的第一和第二柱部分。 封装部分覆盖第一和第二导电部件的侧面。 光学层包括波长转换器,并且设置在半导体层叠体的与第二主表面相对的一侧。 第二基板电极的面积是第二柱部的截面积的一百倍。 第一基板电极和第二基板电极的平面形状的垂直长度和横向长度彼此相等。 版权所有(C)2013,JPO&INPIT
    • 5. 发明专利
    • Light emitting device, light emitting module, and method for manufacturing light emitting device
    • 发光装置,发光模块及制造发光装置的方法
    • JP2012146898A
    • 2012-08-02
    • JP2011005625
    • 2011-01-14
    • Toshiba Corp株式会社東芝
    • SUGIZAKI YOSHIAKIKOJIMA AKIHIROAKIMOTO YOSUKEHIGUCHI KAZUTOOBATA SUSUMUYASUDA HIDEFUMITAKAHASHI NOZOMITAMURA HIDEO
    • H01L33/62
    • H01L33/36H01L21/28H01L23/49805H01L33/486H01L33/50H01L33/52H01L33/62H01L2924/0002H01L2924/00
    • PROBLEM TO BE SOLVED: To provide a small and inexpensive light emitting device, a light emitting module, and a method for manufacturing the light emitting device.SOLUTION: According to an embodiment, a light emitting device comprises a semiconductor layer, a p-side electrode, an n-side electrode, a first insulation layer, a p-side wiring layer, an n-side wiring layer, and a second insulation layer. The semiconductor layer includes a first face, a second face formed opposite to the first face, and a light emitting layer. The p-side electrode is provided in a region having the light emitting layer on the second face. The n-side electrode is provided in a region not including the light emitting layer on the second face. The p-side wiring layer has a p-side external terminal exposed from the second insulation layer on a third face in an orientation different from those of the first face and the second face. The n-side wiring layer has an n-side external terminal exposed from the second insulation layer on the third face same as that of the p-side external terminal.
    • 要解决的问题:提供一种小型廉价的发光器件,发光模块和用于制造发光器件的方法。 解决方案:根据实施例,发光器件包括半导体层,p侧电极,n侧电极,第一绝缘层,p侧布线层,n侧布线层, 和第二绝缘层。 半导体层包括第一面,与第一面相对的第二面和发光层。 p侧电极设置在第二面上具有发光层的区域中。 n侧电极设置在不包括第二面上的发光层的区域中。 p侧配线层的p侧外部端子以与第一面和第二面不同的方向在第三面上从第二绝缘层露出。 n侧配线层具有从与p侧外部端子相同的第三面上的第二绝缘层露出的n侧外部端子。 版权所有(C)2012,JPO&INPIT
    • 9. 发明专利
    • Manufacturing method for semiconductor device
    • 半导体器件的制造方法
    • JP2008028112A
    • 2008-02-07
    • JP2006198429
    • 2006-07-20
    • Toshiba Corp株式会社東芝
    • TOGASAKI TAKASHIHIGUCHI KAZUTOUCHIDA MASAYUKIITO HISASHI
    • H01L21/60
    • H01L2224/0361H01L2224/03912H01L2224/11H01L2224/1147
    • PROBLEM TO BE SOLVED: To provide a fine and highly reliable semiconductor device manufacturing method by reducing the undercut of a UBM film under a bump electrode. SOLUTION: The method includes: a process for forming a first opening H to communicate with an external terminal 5 in passivation films 6 covering the external terminal 5 on a substrate, and forming underbump metal films 7 on the passivation films 6 by contact with the external terminal 5 via the first opening H; a process for forming a resist 9 to form a second opening I on the external terminal 5 and on the underbump metal films 7; a process for forming a soldering film 10 to be the bump electrode 8 in the second opening I; a process for removing the resist 9; an oxidizing process for oxidizing the underbump metal films 7 with the soldering film 10 as a mask; and an etching process for removing the oxidized region in the underbump metal film 7 by etching. COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:通过减少凸起电极下面的UBM膜的底切来提供精细且高度可靠的半导体器件制造方法。 解决方案:该方法包括:形成第一开口H以与覆盖基板上的外部端子5的钝化膜6中的外部端子5连通的工艺,以及通过接触在钝化膜6上形成下凸块金属膜7 外部端子5经由第一开口H; 形成抗蚀剂9以在外部端子5和下凸块金属膜7上形成第二开口I的工艺; 在第二开口I中形成作为凸块电极8的焊接膜10的工序; 去除抗蚀剂9的方法; 利用焊接膜10作为掩模氧化底部金属膜7的氧化工艺; 以及通过蚀刻去除下凸块金属膜7中的氧化区域的蚀刻工艺。 版权所有(C)2008,JPO&INPIT
    • 10. 发明专利
    • Semiconductor radiation detector and diagnostic imaging device using the same
    • 半导体辐射探测器及其诊断成像装置
    • JP2005026419A
    • 2005-01-27
    • JP2003189667
    • 2003-07-01
    • Toshiba Corp株式会社東芝
    • SUGA KENTAROHIGUCHI KAZUTOMIYAGI TAKESHISHUDO KEISEI
    • G01T1/24H01L27/14H01L31/09H04N5/32
    • PROBLEM TO BE SOLVED: To provide a semiconductor radiation detector for improving resolution by placing a plurality of semiconductor devices with no gaps therebetween, and to provide a diagnostic imaging device using the same.
      SOLUTION: The detector comprises the plurality of semiconductor devices 13 having a property of producing charges with the irradiation of radiant ray which are juxtaposed in a planar direction with nearly no gaps therebetween, provided with reference electrodes 14, respectively, on surfaces on which the irradiation is incident, and provided with charge collecting electrodes 15, respectively, on the rear; and a plurality of wirings 25 which allow the reference electrodes 14 to have the same electric potential by electrically connecting the reference electrodes 14.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种半导体辐射检测器,用于通过放置其间没有间隙的多个半导体器件来提高分辨率,并提供使用该半导体辐射检测器的诊断成像装置。 解决方案:检测器包括多个半导体器件13,其具有产生电荷的辐射线的辐射的特性,辐射线的辐射在平面方向上几乎没有间隙并置,其上分别设置有参考电极14, 照射入射,分别在后方设置有电荷收集电极15; 以及多个布线25,其允许参考电极14通过电连接参考电极14而具有相同的电位。版权所有(C)2005,JPO和NCIPI