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    • 3. 发明专利
    • Semiconductor device and method of manufacturing semiconductor device
    • 半导体器件及制造半导体器件的方法
    • JP2011066346A
    • 2011-03-31
    • JP2009217884
    • 2009-09-18
    • Toshiba Corp株式会社東芝
    • IGUCHI TOMOHIROHIGUCHI KAZUTOKITANI TOMOYUKINISHIUCHI HIDEOFUKUMITSU MASAKOTOJO HIROSHIKATO KYOKO
    • H01L23/12
    • H01L2224/34H01L2224/37599H01L2224/37647H01L2224/8385H01L2924/00014H01L2924/00012
    • PROBLEM TO BE SOLVED: To provide a semiconductor device and a method of manufacturing the semiconductor device, in which further reduction in size of the device and reduction of internal resistance are attained while the effects of manufacturing at low cost and improvement of manufacturing efficiency are maintained. SOLUTION: A semiconductor device comprises: a semiconductor element 2; a first wiring layer 3 connected with a first electrode 2a on a side of a first surface A1; a second wiring layer 4 connected with a second electrode 2b at a side of a second surface A2; an insulating layer 5 provided around the semiconductor element 2 excluding the first surface A1 and the second surface A2; a through-hole 6 passing through the side of the first surface A1 and the side of the second surface A2 in the insulating layer 5; a third wiring layer 7 provided at the side of the first surface A1 and connected with the second wiring layer 4; external electrodes 8 provided on the first wiring layer 3 and the third wiring layer 7 respectively; and an enclosure 9 sealing the side of the second surface A2 including the second wiring layer 4 and sealing the periphery of the external electrodes 8 excluding an area exposed at the side of the first surface A1, the semiconductor element 2, the first wiring layer 3, and the third wiring layer 7. COPYRIGHT: (C)2011,JPO&INPIT
    • 将要解决的问题:提供一种半导体器件和半导体器件的制造方法,其中,在制造成本低且制造性能提高的同时,实现器件尺寸的进一步减小和内阻的降低 保持效率。 解决方案:半导体器件包括:半导体元件2; 与第一面A1一侧的第一电极2a连接的第一布线层3; 与第二表面A2侧的第二电极2b连接的第二布线层4; 设置在除了第一面A1和第二面A2之外的半导体元件2周围的绝缘层5; 穿过绝缘层5中的第一表面A1侧和第二表面A2侧的通孔6; 设置在第一表面A1侧并与第二布线层4连接的第三布线层7; 设置在第一布线层3和第三布线层7上的外部电极8; 以及密封包括第二布线层4的第二表面A2的侧面并且密封外部电极8的外围的外壳9,除了暴露在第一表面A1,半导体元件2,第一布线层3 ,和第三布线层7.版权所有(C)2011,JPO&INPIT
    • 7. 发明专利
    • Semiconductor device and method of manufacturing semiconductor device
    • 半导体器件及制造半导体器件的方法
    • JP2010225951A
    • 2010-10-07
    • JP2009073047
    • 2009-03-25
    • Toshiba Corp株式会社東芝
    • NISHIUCHI HIDEOHIGUCHI KAZUTOKITANI TOMOYUKIIGUCHI TOMOHIROFUKUMITSU MASAKOTOJO HIROSHIKATO KYOKO
    • H01L23/12H01L21/3205H01L23/52
    • H01L24/97H01L2224/13
    • PROBLEM TO BE SOLVED: To provide a semiconductor device which has high insulation performance and high strength while maintaining such an effect as the miniaturization of the device, more reduction in the resistance of an internal resistance, manufacturing at low cost, and improvement in manufacturing efficiency, and a method of manufacturing the semiconductor device. SOLUTION: The device has a substrate 2 in which a source electrode S and a gate electrode G are prepared in a first surface S1, and a drain electrode D is prepared in a second surface S2, a first wiring layer 3 which is connected to the source electrode S prepared on the first surface S1, a second wiring layer 4 which is prepared on the first surface S1, and connected to the drain electrode D, copper posts 5 prepared on the first wiring layer 3 and on the second wiring layer 4, respectively, a third wiring layer 6 which is connected to the drain electrode D prepared on the second surface S2, a through-hole 7 which penetrates the substrate 2, and establishes conduction between the second wiring layer 4 and the third wiring layer 6, and an enclosure 9 in which only a first facing surface and a second facing surface of the copper post 5 are exposed, and the first wiring layer 3, the second wiring layer 4, the third wiring layer 6 and the substrate 2 are sealed. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:为了提供一种具有高绝缘性能和高强度的半导体器件,同时保持了器件的小型化的效果,内阻的电阻更多的降低,低成本的制造和改进 的制造效率,以及半导体装置的制造方法。 解决方案:器件具有在第一表面S1中制备源电极S和栅极电极G的衬底2,并且在第二表面S2中制备漏电极D,第一布线层3 连接到在第一表面S1上制备的源电极S,制备在第一表面S1上并连接到漏电极D的第二布线层4,在第一布线层3上准备的铜柱5和第二布线 层4分别连接到在第二表面S2上制备的漏电极D的第三布线层6,穿透基板2的通孔7,并且在第二布线层4和第三布线层之间建立导通 6以及仅露出铜柱5的第一面对面和第二面对面的壳体9,并且第一配线层3,第二配线层4,第三配线层6和基板2被密封 。 版权所有(C)2011,JPO&INPIT